Patents for C23F 3 - Brightening metals by chemical means (1,427)
07/2007
07/11/2007CN1326199C Polishing composition including inhibitor of tungsten etching
07/04/2007CN1993437A Polishing composition for noble metals
07/04/2007CN1992179A Method for forming microelectronics structure
06/2007
06/20/2007EP1797152A1 Polishing composition for noble metals
06/14/2007US20070135321 Removal of undesired matter from a semiconductor wafer by contacting the surface with a foam forming composition comprising: a fluoride, an organic polar solvent, a surfactant, water, and alkanolamine; forming a foam with a gas
06/12/2007US7229565 Chemically assisted surface finishing process
06/06/2007EP1793016A1 Polishing and deburring composition for workpieces of carbon steel and method of chemical polishing and deburring
06/06/2007CN1320610C CMP polishing pad including solid catalyst
05/2007
05/31/2007US20070122921 Copper Wiring Module Control
05/30/2007CN1970840A Chemical sanding smokeless-polishing technology for aluminium alloy
05/30/2007CN1970839A Bright levelling technology for aluminium alloy
05/30/2007CN1970838A Bright acid etching technology for aluminium alloy
05/30/2007CN1318529C Novel slurry for chemical mechanical polishing of metals
05/24/2007US20070113975 Plasma reaction chamber assemblies
05/23/2007CN1969024A Method of polishing a tungsten-containing substrate
05/23/2007CN1966594A Polishing composition for metal cmp
05/22/2007US7220984 Influence of surface geometry on metal properties
05/10/2007US20070105376 Copper-based metal polishing solution and method for manufacturing semiconductor device
05/09/2007CN1958847A Chemical treating liquid of shining sand face for surface of aluminum product and alloy, and treating technique
05/03/2007WO2007048559A1 Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces
05/02/2007EP1780309A1 Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces
04/2007
04/18/2007EP1773959A1 Method of polishing a tungsten-containing substrate
04/18/2007EP1230431B1 Machine for localised cleaning with electrolytic and/or ultrasound cell, for pickling and/or polishing
04/12/2007WO2007040956A1 Composition and method for enhancing pot life of hydrogen peroxide-containing cmp slurries
04/11/2007EP1772536A1 Electrolytic processing apparatus and method
04/10/2007US7201784 Surfactant slurry additives to improve erosion, dishing, and defects during chemical mechanical polishing of copper damascene with low k dielectrics
04/04/2007EP1631416A4 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same
03/2007
03/28/2007CN1307275C Tungsten polishing solution
03/22/2007US20070062030 Machine for localised cleaning with an electrolytic cell, for pickling and/or polishing metal surfaces
03/06/2007US7186653 Polishing slurries and methods for chemical mechanical polishing
03/06/2007US7186320 Submersible anode made of a resin matrix with a conductive powder supported therein
03/01/2007US20070045233 Polishing liquid composition
02/2007
02/28/2007EP1755491A1 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration
02/27/2007US7183212 Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device
02/22/2007US20070043230 Polishing slurries and methods for chemical mechanical polishing
02/15/2007US20070034601 Surface treating method and surface-treating apparatus
02/07/2007CN1908233A Rust remover
02/01/2007US20070023731 using an aqueous slurry comprising dissolved ammonium dimolybdate and ammonium octamolybdate in water and an oxidizing agent; apply aqueous slurry between the copper and a polishing pad; apply a low pressure with high polish rates on the surface of semiconductor wafer
01/2007
01/30/2007US7169315 Method of producing an aluminium surface with a high total reflectance
01/25/2007WO2006076392A3 Polishing slurries and methods for chemical mechanical polishing
01/10/2007EP1230430B1 Method of producing an aluminium surface with a high total reflectance
01/09/2007US7161247 Polishing composition for noble metals
01/09/2007US7160807 CMP of noble metals
01/04/2007WO2005110286A9 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration
01/03/2007EP1737793A1 Composition for chemo-mechanical polishing (cmp)
01/03/2007CN1888360A Lock barrel and producing method thereof
01/03/2007CN1887445A Prepn process of magnesium alloy supported nanometer TiO2 photocatalyst film
12/2006
12/28/2006DE10313920B4 Edelstahlseparator für eine Niedertemperatur-Brennstoffzelle Edelstahlseparator for a low-temperature fuel cell
12/28/2006DE102005027782A1 Process for radiation treatment of cast Magnesium alloy components using Aluminum particles of grain size at least 4 mm to smooth the component surface and a fan-blower useful for for treating the Magnesium parts of chill castings
12/20/2006CN1881540A A silica and a silica-based slurry
12/13/2006CN1289627C Silica and silica-based slurry
12/12/2006US7148189 Halides and salts on silica, alumina, titania and polishing films for integrated circuits
12/12/2006US7148147 Composition for polishing substrates for semiconductors or abrasives and reduction agents or oxidizers
11/2006
11/29/2006CN1869286A Polishing agent
11/23/2006US20060261040 Methods for planarization of group VIII metal-containing surfaces using oxidizing agents
11/21/2006US7138073 Slurry for chemical mechanical polishing for copper and method of manufacturing semiconductor device using the slurry
11/16/2006US20060257682 Corrosion protection of galvanized steel using a cerium salt-based solution and detection of the amount of corrosion resistance enhancement
11/15/2006CN1863883A Slurries and methods for chemical-mechanical planarization of copper
11/09/2006US20060249796 Influence of surface geometry on metal properties
11/08/2006EP1299489B1 Cmp polishing composition for metal
11/07/2006US7132058 Tungsten polishing solution
11/07/2006US7131391 Plasma reaction chamber liner comprising ruthenium
10/2006
10/26/2006US20060241006 Contains abrasive grains such as magnesium oxide (MnO, MnO2, Mn2O3, Mn3O4), with hydrogen peroxide as solvent, washing with hydrofluoric acid solution, spin drying
10/26/2006US20060240672 Polishing liquid composition
10/25/2006CN1850350A Air-intaking device for increasing intake evenness
10/10/2006US7118685 for polishing a surface comprising an insulating layer and a metal layer; comprising a compound having six or more carbon atoms and a structure in which each of two or more adjacent carbon atoms has a hydroxyl group in a molecule, and water
10/10/2006US7118683 Methods of etching silicon-oxide-containing compositions
09/2006
09/28/2006US20060216939 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same
09/27/2006CN1837319A Polishing composition and polishing method
09/12/2006US7105103 System and method for the manufacture of surgical blades
09/12/2006CA2466084C Cleaning compositions for ceramic and porcelain surfaces and related methods
09/06/2006CN1827857A Alkali compound brightening agent for chemical plating of nickel and use method thereof
09/06/2006CN1827856A Strip steel surface treatment device
09/06/2006CN1273267C Catalytic reactive pad for metal CMP
08/2006
08/29/2006US7097541 CMP method for noble metals
08/24/2006US20060189141 Solution for etching copper surfaces and method of depositing metal on copper surfaces
08/23/2006CN1821447A Aluminium material two-step chemical polishing method capable of reducing NO2 smoke hazard
08/17/2006US20060183334 Methods for planarization of group VIII metal-containing surfaces using oxidizing gases
08/17/2006US20060180788 an aqueous fluid comprising an oxidizer that produces oxygen-containing free radicals when contacted with an activator comprising oxides of iron or copper coated with tin, and abrasive particles comprising alumina or alumina-coated silica, used for chemical mechanical polishing (cmp)
08/02/2006CN1813038A Cmp of noble metals
07/2006
07/27/2006US20060166107 Method for plasma etching a chromium layer suitable for photomask fabrication
07/27/2006US20060166106 Including a film stack having a chromium layer and a patterned photoresist; depositing a conforming polymethylene protective layer on the patterned photoresist; etching the polymer to expose chromium and etching the chromium layer; patterns with small features; improves trenches
07/27/2006US20060163531 slurries containing hydrogen peroxide as an oxidizer and glycine as a corrosion inhibitor, used for planishing semiconductors
07/27/2006US20060163203 Methods and apparatus for etching metal layers on substrates
07/20/2006WO2006076392A2 Polishing slurries and methods for chemical mechanical polishing
07/20/2006US20060160472 Surface treated product, surface treatment method, and surface treatment apparatus
07/20/2006US20060157448 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses
07/19/2006CN1803964A Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same
07/18/2006US7077727 Process for chemical-mechanical polishing of metal substrates
07/13/2006DE102005058272A1 Mehrstufige Verfahren zum chemisch-mechanischen Polieren von Siliziumdioxid und Siliziumnitrid Multi-stage method for chemical mechanical polishing of silicon dioxide and silicon nitride,
07/11/2006US7074498 Influence of surface geometry on metal properties
07/06/2006WO2006071556A2 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses
07/04/2006US7070877 Stainless steel separator for low-temperature fuel cell
06/2006
06/28/2006EP1673416A2 Slurry for chemical mechanical polishing of metals comprising periodic acid
06/28/2006CN1261520C Grinding composition and its grinding method
06/22/2006US20060130936 Surface treatment of magnesium and its alloys
06/15/2006US20060124597 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member
06/14/2006CN1788070A Polishing fluid for metal and polishing Method
06/14/2006CN1787966A Silica and silica-based slurry
06/14/2006CN1787895A Improved chemical mechanical polishing compositions for copper and associated materials and method of using same
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