Patents for C23F 3 - Brightening metals by chemical means (1,427) |
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07/11/2007 | CN1326199C Polishing composition including inhibitor of tungsten etching |
07/04/2007 | CN1993437A Polishing composition for noble metals |
07/04/2007 | CN1992179A Method for forming microelectronics structure |
06/20/2007 | EP1797152A1 Polishing composition for noble metals |
06/14/2007 | US20070135321 Removal of undesired matter from a semiconductor wafer by contacting the surface with a foam forming composition comprising: a fluoride, an organic polar solvent, a surfactant, water, and alkanolamine; forming a foam with a gas |
06/12/2007 | US7229565 Chemically assisted surface finishing process |
06/06/2007 | EP1793016A1 Polishing and deburring composition for workpieces of carbon steel and method of chemical polishing and deburring |
06/06/2007 | CN1320610C CMP polishing pad including solid catalyst |
05/31/2007 | US20070122921 Copper Wiring Module Control |
05/30/2007 | CN1970840A Chemical sanding smokeless-polishing technology for aluminium alloy |
05/30/2007 | CN1970839A Bright levelling technology for aluminium alloy |
05/30/2007 | CN1970838A Bright acid etching technology for aluminium alloy |
05/30/2007 | CN1318529C Novel slurry for chemical mechanical polishing of metals |
05/24/2007 | US20070113975 Plasma reaction chamber assemblies |
05/23/2007 | CN1969024A Method of polishing a tungsten-containing substrate |
05/23/2007 | CN1966594A Polishing composition for metal cmp |
05/22/2007 | US7220984 Influence of surface geometry on metal properties |
05/10/2007 | US20070105376 Copper-based metal polishing solution and method for manufacturing semiconductor device |
05/09/2007 | CN1958847A Chemical treating liquid of shining sand face for surface of aluminum product and alloy, and treating technique |
05/03/2007 | WO2007048559A1 Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces |
05/02/2007 | EP1780309A1 Composition and method for improved adhesion of polymeric materials to copper or copper alloy surfaces |
04/18/2007 | EP1773959A1 Method of polishing a tungsten-containing substrate |
04/18/2007 | EP1230431B1 Machine for localised cleaning with electrolytic and/or ultrasound cell, for pickling and/or polishing |
04/12/2007 | WO2007040956A1 Composition and method for enhancing pot life of hydrogen peroxide-containing cmp slurries |
04/11/2007 | EP1772536A1 Electrolytic processing apparatus and method |
04/10/2007 | US7201784 Surfactant slurry additives to improve erosion, dishing, and defects during chemical mechanical polishing of copper damascene with low k dielectrics |
04/04/2007 | EP1631416A4 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |
03/28/2007 | CN1307275C Tungsten polishing solution |
03/22/2007 | US20070062030 Machine for localised cleaning with an electrolytic cell, for pickling and/or polishing metal surfaces |
03/06/2007 | US7186653 Polishing slurries and methods for chemical mechanical polishing |
03/06/2007 | US7186320 Submersible anode made of a resin matrix with a conductive powder supported therein |
03/01/2007 | US20070045233 Polishing liquid composition |
02/28/2007 | EP1755491A1 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration |
02/27/2007 | US7183212 Polishing method, metallization fabrication method, method for manufacturing semiconductor device and semiconductor device |
02/22/2007 | US20070043230 Polishing slurries and methods for chemical mechanical polishing |
02/15/2007 | US20070034601 Surface treating method and surface-treating apparatus |
02/07/2007 | CN1908233A Rust remover |
02/01/2007 | US20070023731 using an aqueous slurry comprising dissolved ammonium dimolybdate and ammonium octamolybdate in water and an oxidizing agent; apply aqueous slurry between the copper and a polishing pad; apply a low pressure with high polish rates on the surface of semiconductor wafer |
01/30/2007 | US7169315 Method of producing an aluminium surface with a high total reflectance |
01/25/2007 | WO2006076392A3 Polishing slurries and methods for chemical mechanical polishing |
01/10/2007 | EP1230430B1 Method of producing an aluminium surface with a high total reflectance |
01/09/2007 | US7161247 Polishing composition for noble metals |
01/09/2007 | US7160807 CMP of noble metals |
01/04/2007 | WO2005110286A9 Method for reducing stent weld profiles and a stent having reduced weld profiles and a closed-end wire configuration |
01/03/2007 | EP1737793A1 Composition for chemo-mechanical polishing (cmp) |
01/03/2007 | CN1888360A Lock barrel and producing method thereof |
01/03/2007 | CN1887445A Prepn process of magnesium alloy supported nanometer TiO2 photocatalyst film |
12/28/2006 | DE10313920B4 Edelstahlseparator für eine Niedertemperatur-Brennstoffzelle Edelstahlseparator for a low-temperature fuel cell |
12/28/2006 | DE102005027782A1 Process for radiation treatment of cast Magnesium alloy components using Aluminum particles of grain size at least 4 mm to smooth the component surface and a fan-blower useful for for treating the Magnesium parts of chill castings |
12/20/2006 | CN1881540A A silica and a silica-based slurry |
12/13/2006 | CN1289627C Silica and silica-based slurry |
12/12/2006 | US7148189 Halides and salts on silica, alumina, titania and polishing films for integrated circuits |
12/12/2006 | US7148147 Composition for polishing substrates for semiconductors or abrasives and reduction agents or oxidizers |
11/29/2006 | CN1869286A Polishing agent |
11/23/2006 | US20060261040 Methods for planarization of group VIII metal-containing surfaces using oxidizing agents |
11/21/2006 | US7138073 Slurry for chemical mechanical polishing for copper and method of manufacturing semiconductor device using the slurry |
11/16/2006 | US20060257682 Corrosion protection of galvanized steel using a cerium salt-based solution and detection of the amount of corrosion resistance enhancement |
11/15/2006 | CN1863883A Slurries and methods for chemical-mechanical planarization of copper |
11/09/2006 | US20060249796 Influence of surface geometry on metal properties |
11/08/2006 | EP1299489B1 Cmp polishing composition for metal |
11/07/2006 | US7132058 Tungsten polishing solution |
11/07/2006 | US7131391 Plasma reaction chamber liner comprising ruthenium |
10/26/2006 | US20060241006 Contains abrasive grains such as magnesium oxide (MnO, MnO2, Mn2O3, Mn3O4), with hydrogen peroxide as solvent, washing with hydrofluoric acid solution, spin drying |
10/26/2006 | US20060240672 Polishing liquid composition |
10/25/2006 | CN1850350A Air-intaking device for increasing intake evenness |
10/10/2006 | US7118685 for polishing a surface comprising an insulating layer and a metal layer; comprising a compound having six or more carbon atoms and a structure in which each of two or more adjacent carbon atoms has a hydroxyl group in a molecule, and water |
10/10/2006 | US7118683 Methods of etching silicon-oxide-containing compositions |
09/28/2006 | US20060216939 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
09/27/2006 | CN1837319A Polishing composition and polishing method |
09/12/2006 | US7105103 System and method for the manufacture of surgical blades |
09/12/2006 | CA2466084C Cleaning compositions for ceramic and porcelain surfaces and related methods |
09/06/2006 | CN1827857A Alkali compound brightening agent for chemical plating of nickel and use method thereof |
09/06/2006 | CN1827856A Strip steel surface treatment device |
09/06/2006 | CN1273267C Catalytic reactive pad for metal CMP |
08/29/2006 | US7097541 CMP method for noble metals |
08/24/2006 | US20060189141 Solution for etching copper surfaces and method of depositing metal on copper surfaces |
08/23/2006 | CN1821447A Aluminium material two-step chemical polishing method capable of reducing NO2 smoke hazard |
08/17/2006 | US20060183334 Methods for planarization of group VIII metal-containing surfaces using oxidizing gases |
08/17/2006 | US20060180788 an aqueous fluid comprising an oxidizer that produces oxygen-containing free radicals when contacted with an activator comprising oxides of iron or copper coated with tin, and abrasive particles comprising alumina or alumina-coated silica, used for chemical mechanical polishing (cmp) |
08/02/2006 | CN1813038A Cmp of noble metals |
07/27/2006 | US20060166107 Method for plasma etching a chromium layer suitable for photomask fabrication |
07/27/2006 | US20060166106 Including a film stack having a chromium layer and a patterned photoresist; depositing a conforming polymethylene protective layer on the patterned photoresist; etching the polymer to expose chromium and etching the chromium layer; patterns with small features; improves trenches |
07/27/2006 | US20060163531 slurries containing hydrogen peroxide as an oxidizer and glycine as a corrosion inhibitor, used for planishing semiconductors |
07/27/2006 | US20060163203 Methods and apparatus for etching metal layers on substrates |
07/20/2006 | WO2006076392A2 Polishing slurries and methods for chemical mechanical polishing |
07/20/2006 | US20060160472 Surface treated product, surface treatment method, and surface treatment apparatus |
07/20/2006 | US20060157448 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses |
07/19/2006 | CN1803964A Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using same |
07/18/2006 | US7077727 Process for chemical-mechanical polishing of metal substrates |
07/13/2006 | DE102005058272A1 Mehrstufige Verfahren zum chemisch-mechanischen Polieren von Siliziumdioxid und Siliziumnitrid Multi-stage method for chemical mechanical polishing of silicon dioxide and silicon nitride, |
07/11/2006 | US7074498 Influence of surface geometry on metal properties |
07/06/2006 | WO2006071556A2 Methods for removing black silicon and black silicon carbide from surfaces of silicon and silicon carbide electrodes for plasma processing apparatuses |
07/04/2006 | US7070877 Stainless steel separator for low-temperature fuel cell |
06/28/2006 | EP1673416A2 Slurry for chemical mechanical polishing of metals comprising periodic acid |
06/28/2006 | CN1261520C Grinding composition and its grinding method |
06/22/2006 | US20060130936 Surface treatment of magnesium and its alloys |
06/15/2006 | US20060124597 Polishing medium for chemical-mechanical polishing, and method of polishing substrate member |
06/14/2006 | CN1788070A Polishing fluid for metal and polishing Method |
06/14/2006 | CN1787966A Silica and silica-based slurry |
06/14/2006 | CN1787895A Improved chemical mechanical polishing compositions for copper and associated materials and method of using same |