| Patents for C23F 3 - Brightening metals by chemical means (1,427) |
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| 09/26/2001 | EP1137056A1 Abrasive liquid for metal and method for polishing |
| 09/25/2001 | US6294105 Chemical mechanical polishing slurry and method for polishing metal/oxide layers |
| 09/20/2001 | WO2001032959A3 Method of producing an aluminium surface with a high total reflectance |
| 09/18/2001 | US6290736 In chemical mechanical polishing (cmp) in planarization of noble metals, and the formation of noble metal damascene electrode structures |
| 09/13/2001 | US20010020348 Particle with a functional group capable of trapping a metal ion, an oxidizing agent and water for chemical mechanical polishing of a copper-based metal |
| 08/14/2001 | US6274063 Metal polishing composition |
| 08/01/2001 | CN1306560A CMP slurry contg. solid catalyst |
| 07/25/2001 | EP1118647A1 Polishing slurry |
| 07/18/2001 | EP1115584A1 Method of manufacturing enhanced finish sputtering targets |
| 07/12/2001 | WO2001049899A2 Brightening/passivating metal surfaces without hazard from emissions of oxides of nitrogen |
| 07/05/2001 | US20010006224 A slurry for chemical mechanical polishing of a substrate containing tantalum or tantalum nitride comprising a silica polishing grain and an inorganic salt to prevent dishing and erosion |
| 06/28/2001 | US20010005009 A slurry for chemical mechanical polishing a copper-containing metal film, comprising theta -alumina mainly comprising secondary particles made of aggregated primary particles as polishing grains, an oxidizer and an organic acid |
| 06/21/2001 | WO2001044396A1 Polishing compositions for noble metals |
| 06/12/2001 | US6245251 Method for production of slide fastener or stringers thereof |
| 06/06/2001 | CN1298038A Simple aluminium shape polishing liquid recovering method without power consumption |
| 05/16/2001 | EP0985059A4 Composition and method for polishing a composite comprising titanium |
| 05/10/2001 | WO2001032960A2 Machine for localised cleaning with electrolytic and/or ultrasound cell, for pickling and/or polishing |
| 05/10/2001 | WO2001032959A2 Method of producing an aluminium surface with a high total reflectance |
| 05/10/2001 | CA2389029A1 Method of producing an aluminium surface with a high total reflectance |
| 05/02/2001 | EP1096556A1 Chemical-mechanical planarisation of copper |
| 04/11/2001 | EP1090082A1 Cmp slurry containing a solid catalyst |
| 04/03/2001 | US6211132 Composition and method for deburring/degreasing/cleaning metal surfaces |
| 03/29/2001 | WO2001021724A1 Slurry solution for polishing copper or tungsten |
| 02/28/2001 | EP0909311A4 Post clean treatment |
| 02/22/2001 | WO2001013417A1 Polishing compound for chemimechanical polishing and method for polishing substrate |
| 02/22/2001 | WO2001012739A1 Chemical mechanical polishing systems and methods for their use |
| 02/22/2001 | CA2378771A1 Chemical mechanical polishing systems and methods for their use |
| 01/25/2001 | WO2001006555A1 Compositions and processes for spin etch planarization |
| 01/23/2001 | US6177026 CMP slurry containing a solid catalyst |
| 01/23/2001 | US6176937 Process for treating a metal surface with an acidic solution containing hydrogen peroxide and a stabilizer |
| 01/18/2001 | WO2001004231A1 Polishing liquid composition |
| 01/18/2001 | DE19927286A1 Schleiflösung und Verfahren zum chemisch-mechanischen Polieren einer Edelmetall-Oberfläche Grinding solution and method for chemical mechanical polishing a noble metal surface |
| 12/21/2000 | WO2000077107A1 Abrasive solution and method for chemically-mechanically polishing a precious metal surface |
| 12/05/2000 | US6156661 Post clean treatment |
| 11/30/2000 | WO2000071782A1 Methods for wet processing electronic components having copper containing surfaces |
| 11/15/2000 | CN2405942Y Metal capillary tube chemical-polishing device |
| 11/09/2000 | WO2000066808A1 Method for chemically processing articles made of titanium or alloys thereof |
| 11/02/2000 | DE10018244A1 Superconducting acceleration cavity, for a charged particle accelerator, is internally polished by chemical polishing and then electrolytic polishing |
| 11/01/2000 | CN1272221A Polishing composition including inhibitor of tungsten etching |
| 10/25/2000 | EP0979208A4 Composition and method for reducing copper oxide to metallic copper |
| 10/24/2000 | US6136711 Polishing composition including an inhibitor of tungsten etching |
| 10/03/2000 | US6126853 Comprising a film forming agent, urea hydrogen peroxide, a complexing agent, an abrasive, and an optional surfactant for removing copper alloy, titanium, and titanium nitride containing layers from substrate |
| 10/03/2000 | US6126755 Stabilizing hydrogen peroxide decomposition which is used for removal of metal oxide from the metal surface by employing a combination of a hydroxybenzoic acid, a hydrotropic aryl sulfonic acid, and a hydrophobic alkylaryl sulfonic acid |
| 09/21/2000 | DE19911381A1 Steel workpiece edges and surfaces, e.g. of distributor cross-bore interiors, are deburred and/or smoothed by immersion in an aqueous chemical medium |
| 09/14/2000 | WO2000053949A1 A friction member and a method for its surface treatment |
| 09/12/2000 | US6117783 The chemical and mechanical polishing solution comprises a hydroxylamine compound and octyphenyl polyethylene |
| 07/06/2000 | WO2000039844A1 Materials for polishing liquid for metal, polishing liquid for metal, method for preparation thereof and polishing method using the same |
| 07/05/2000 | EP1015672A1 A procedure for electrochemical polishing of an aluminium substrate to obtain certain topographical properties thereof |
| 07/04/2000 | US6083419 Polishing composition including an inhibitor of tungsten etching |
| 06/20/2000 | US6077785 Ultrasonic processing of chemical mechanical polishing slurries |
| 06/08/2000 | WO2000032713A1 Stabilized slurry compositions |
| 06/07/2000 | CN1255521A Stablizing method of polishing liquid containing peroxide for plane woring of chemical machinery |
| 05/31/2000 | EP1004648A1 Improvements in or relating to semiconductor devices |
| 05/30/2000 | US6068787 Chemical mechanical polishing; mixture of catalyst and stabilizer |
| 05/23/2000 | US6066028 Polishing of copper |
| 04/13/2000 | WO2000013917B1 Method of manufacturing enhanced finish sputtering targets |
| 04/06/2000 | WO2000018984A1 Multi-component solvent systems for fluorinated compounds and cleaners and delivery systems based thereon |
| 03/16/2000 | WO2000013917A1 Method of manufacturing enhanced finish sputtering targets |
| 03/15/2000 | EP0985059A1 Composition and method for polishing a composite comprising titanium |
| 03/09/2000 | WO2000013217A1 Abrasive liquid for metal and method for polishing |
| 03/09/2000 | CA2342332A1 Abrasive liquid for metal and method for polishing |
| 02/16/2000 | EP0979208A1 Composition and method for reducing copper oxide to metallic copper |
| 02/02/2000 | EP0975705A1 Buffer solutions for suspensions used in chemical-mechanical polishing |
| 01/26/2000 | CN1242729A Composition and slurry useful for metal CMP |
| 01/18/2000 | US6015506 Polishing computer disks by bringing surface of disk into contact with polishing pad and applying a dispersion to the rigid disk |
| 01/05/2000 | EP0969057A1 Dual-valent rare earth additives to polishing slurries |
| 12/29/1999 | WO1999067056A1 Composition for the chemical mechanical polishing of metal layers |
| 12/14/1999 | US6001269 Composite is polished in a standard polishing machine using an aqueous slurry comprising submicron abrasive particles, potassium iodate and hydrogen peroxide and a base to adjust the ph of used slurry |
| 12/02/1999 | WO1999061540A1 Cmp slurry containing a solid catalyst |
| 12/02/1999 | CA2336482A1 Cmp slurry containing a solid catalyst |
| 11/24/1999 | EP0958405A1 Metal surface treatment solutions and process |
| 11/16/1999 | US5985046 Process for making clear coated aluminum alloy lighting sheet |
| 11/09/1999 | US5981454 Post clean treatment composition comprising an organic acid and hydroxylamine |
| 11/09/1999 | US5980775 Composition and slurry useful for metal CMP |
| 09/30/1999 | DE19812005A1 Pulsed stream is used in the electrodialytic regeneration of process solutions in galvanic and other deposition processes |
| 09/28/1999 | US5958288 Chemical mechanical polishing metal layer containing substrate by using a hydrogen peroxide or monopersulfate oxidizer, a catalyst containing ferric nitrate or other metal compound with multiple oxidation state |
| 09/21/1999 | US5954997 Alumina abrasive; oxidizer, complexing agent such as ammonium oxalate, benzotriazole |
| 07/21/1999 | CN1044264C Baths and method for chemically polishing stainless steel surfaces |
| 06/02/1999 | EP0919602A1 Metal polishing agent and process for polishing metal using same |
| 05/04/1999 | CA2038403C Composition and method for surface refinement of titanium and nickel |
| 04/21/1999 | EP0909311A1 Post clean treatment |
| 04/20/1999 | US5895550 To enhance the planarization of semiconductor substrate wafer surfaces. |
| 04/01/1999 | WO1999015287A1 Brightening systems for copper-base alloys |
| 03/18/1999 | WO1999013133A1 A procedure for electrochemical polishing of an aluminium substrate to obtain certain topographical properties thereof |
| 02/24/1999 | CN1208779A Brightening solution for stainless steel |
| 02/10/1999 | EP0896042A1 A polishing composition including an inhibitor of tungsten etching |
| 02/04/1999 | WO1999005706A1 A polishing composition including an inhibitor of tungsten etching |
| 01/26/1999 | US5863838 Selectively polishing exposed metal layer on semiconductor substrate with stabilized abrasive mixture containing organic salt which decomposes into oxidizer and surfactant upon contact with metal layer |
| 01/12/1999 | US5858813 Chemical mechanical polishing a thin layer of metal or alloy with a slurry containing an abrasive, an oxidizing agent, and succinic acid |
| 12/09/1998 | EP0868543A4 Improved polishing slurries and methods for their use |
| 11/26/1998 | WO1998053488A1 Method for polishing a composite comprising an insulator, a metal, and titanium |
| 11/18/1998 | CN1199429A Improved polishing slurries and method for their use |
| 11/10/1998 | US5834129 Grained and anodized aluminum substrate for lithographic printing plates |
| 11/05/1998 | DE19817087A1 Production of buffer system, for polishing of silicon |
| 10/29/1998 | WO1998047976A1 Buffer solutions for suspensions used in chemical-mechanical polishing |
| 10/07/1998 | EP0868543A1 Improved polishing slurries and methods for their use |
| 09/24/1998 | WO1998041671A1 Composition and method for polishing a composite comprising titanium |
| 09/22/1998 | US5810938 Applying aqueous mixture containing acid fluoride ions and other acids in controlled concentrations to dulled metal surfaces |
| 08/20/1998 | WO1998036045A1 Post clean treatment |
| 08/18/1998 | US5795373 Ethanolamines and salts |