Patents for C23C 18 - Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating (16,252)
10/2004
10/28/2004US20040211998 Lanthanide series layered superlattice materials for integrated circuit applications
10/28/2004US20040211941 Composition for forming a transparent conducting film, solution for forming a transparent conducting film and method of forming a transparent conducting film
10/28/2004CA2523009A1 Use of an article as moulding tool
10/28/2004CA2522647A1 Use of an object as an electronic component
10/28/2004CA2522644A1 Use of an article as decorative structural part
10/28/2004CA2522641A1 Article with layers of composite material of a first non-metallic layer and a second metallic layer applied to the first layer
10/28/2004CA2522504A1 Rapid prototyping process
10/27/2004EP1471167A2 Electroless plating method
10/27/2004EP1471084A2 Polymers for metal coating and method for the preparation thereof
10/27/2004EP1470571A2 Electroless deposition apparatus and method
10/27/2004EP1470198A2 Polymer derivatives for the treatment of metals
10/27/2004EP1218315B1 Process for making chemically bonded sol-gel ceramics
10/27/2004CN1541143A Nickel plating solution and process for its use
10/27/2004CN1540810A Metal coated carbon brush
10/27/2004CN1540692A 镀覆接线端 Plated terminals
10/27/2004CN1539744A Composite powder of stannic oxide Nano crystal with silver being covered
10/27/2004CN1173401C Method for preparing non-electroplating more than two layers of metal convex blocks
10/27/2004CN1173073C Hardness increasing method for chemical nickel boron alloy cladding
10/26/2004US6809029 Semiconductor production device and production method for semiconductor device
10/21/2004WO2004069948A3 Method for adhesively coating a substrate with a metal layer
10/21/2004US20040209485 Fabrication of pure and modified Ta2O5 thin film with enhanced properties for microwave communication, dynamic random access memory and integrated electronic applications
10/21/2004US20040209188 Solvents and photoresists compositions for short wavelength imaging
10/21/2004US20040209004 apparatus comprising a coater for coating a liquid that reacts with an ultraviolet ray to deposit metal on the substrate, and an ultraviolet irradiating means; wiring pattern formed by ink jet printing of good adhesion
10/21/2004US20040208992 Method for producing conductive particles
10/21/2004US20040208817 Direct surface patterning of carbon
10/21/2004US20040206267 Aluminum phosphate coatings
10/20/2004EP1469099A1 A process to obtain chromium-plated effect coatings and a composition to carry out such process
10/20/2004CN1539028A Patterning method
10/20/2004CN1538523A Heavy current medium film and its manufadturng method, heavy-curent medium storage, pizeoelectric element
10/20/2004CN1537971A Electroplating pretreatment solution and electroplating pretreatment method
10/19/2004US6806224 Reducing metal halide in liquid phase in the presence of support material, an organic base and a reducing agent
10/19/2004US6806210 Tantalum oxide film, use thereof, process for forming the same and composition
10/19/2004US6805915 Electroless copper plating solution, electroless copper plating process and production process of circuit board
10/19/2004US6805911 Method and apparatus for improving interfacial chemical reactions
10/14/2004WO2004087992A2 Method for the formation of a coating of metal oxides on an electrically-conducting substrate, resultant activated cathode and use thereof for the electrolysis of aqueous solutions of alkaline metal chlorides
10/14/2004WO2004032831A3 Metalization of microtubules
10/14/2004US20040203221 Electronic device manufacturing method
10/14/2004US20040202958 an organic sulfonic acid, thiourea, fluoroboric acid and hypophosphorous acid; pretreating an insulating film to remove residual metals exposed by etching
10/14/2004US20040202861 Molybdenum disulfide coated with metal that softens or melts; preventing heat decomposition during application of thick solid lubricant layer
10/14/2004US20040201446 Conductive substrate with resistance layer, resistance board, and resistance circuit board
10/14/2004US20040200725 Application of antifoaming agent to reduce defects in a semiconductor electrochemical plating process
10/14/2004DE10315738A1 Device for stabilizing tin baths for tin plating circuit boards comprises a horizontal drum having openings for removing slurry and for introducing tin balls and bath liquid
10/14/2004DE10313517A1 Lösung zum Ätzen von Kupferoberflächen und Verfahren zum Abscheiden von Metall auf Kupferoberflächen Solution for etching copper surfaces and methods for depositing metal on copper surfaces
10/13/2004EP1466353A1 Contamination suppression in chemical fluid deposition
10/13/2004CN1536100A Environment-protecting catalytic liquor for chemically-plating copper, nikel and phosphorus three-element alloy and its preparation method
10/13/2004CN1535934A Ceramic material and its mfg. method
10/12/2004US6803134 Paraelectric thin film material and method statement of government interest
10/12/2004US6802985 Method for fabricating metal wirings
10/07/2004WO2004085706A1 Solution for etching copper surfaces and method of depositing metal on copper surfaces
10/07/2004US20040198190 Method and apparatus for reduction of defects in wet processed layers
10/07/2004US20040198081 Microelectronic spring contact elements
10/07/2004US20040197973 Component formation via plating technology
10/07/2004US20040197541 Selective electroless deposition and interconnects made therefrom
10/07/2004US20040197485 plating bath of a double bath structure including an inner bath holding a plating solution, and an outer bath surrounding the inner bath and is in communication with it; and a heater in the outer bath; uniform temperature control; especially for electroless deposition of copper or silver
10/07/2004US20040197478 After molding thermoplastic with a shear strength of 50 MPa or more, the surfaces are subjected to liquid honing treatment with an aluminum abrasive so that the surface roughness Rz is 10 mu m or more, adding catalyst, activation, and electroless plating
10/07/2004US20040197476 Process for producing aluminum oxide films at low temperatures
10/07/2004US20040194698 Plating apparatus
10/07/2004US20040194667 Aqueous sodium and potassium silicate blend; maintaining metallurgical strength properties and dimensions of parts
10/07/2004US20040194535 Nanodisk sensor and sensor array
10/06/2004EP1464410A1 Low dielectric materials and methods for making same
10/06/2004EP1332244A4 Method for enhancing the solderability of a surface
10/05/2004US6800121 Mixtures of nickel salts of alkylsulfonic acid and reducing agents such as hypophosphorous acid, used for coating alloy substrates
10/05/2004US6800111 Concentrating the catalytic metal colloid on a filter; removing the catalytic metal of the catalytic metal colloid from the filter with an oxidizer; collecting the catalytic metal
09/2004
09/30/2004WO2004084286A1 Film forming mehtod and film forming apparatus for semiconductor device
09/30/2004WO2004084285A1 Film forming method and film forming apparatus for semiconductor device
09/30/2004WO2004084284A1 Film forming method and apparatus
09/30/2004US20040192038 Methods for forming wiring and electrode
09/30/2004US20040191575 Servo pattern formation via transfer of sol-gel layer and magnetic media obtained thereby
09/30/2004US20040191423 spin coating amorphous films of silver-containing precursors such as silver trifluoroacetylacetonate on surfaces of substrates and irradiating to form electroconductive or semiconductor layers; microelectronics
09/29/2004EP1462544A2 Methods for forming wiring and electrode
09/29/2004EP1462230A1 Honeycomb structural body forming ferrule, and method of manufacturing the ferrule
09/29/2004EP1461471A2 Polymer derivatives for treating metals
09/29/2004EP1461345A2 Copper deposition using copper formate complexes
09/29/2004EP1461165A1 Metallic structures incorporating bioactive materials and methods for creating the same
09/29/2004CN1533448A Jet plating apparatus
09/29/2004CN1168850C Method for providing metal surface with vitreous layer
09/28/2004US6798127 Enhanced field emission from carbon nanotubes mixed with particles
09/28/2004US6798032 Metal film pattern and manufacturing method thereof
09/28/2004US6797531 Process for producing microlens array, array master, electrolytic solution and microlens array resin material therefor and apparatus for producing master
09/28/2004US6797312 Electroless plating solution and process
09/28/2004US6797278 Film exhibits a log kill rate for klebsiella pneumoniae of >/= .5 as measured under a modified plate contact method
09/28/2004US6796870 Field emission type cold cathode device, manufacturing method thereof and vacuum micro device
09/23/2004WO2004081261A2 Plating apparatus
09/23/2004WO2004081256A1 Activation-free electroless solution for deposition of cobalt and method for deposition of cobalt capping/ passivation layer on copper
09/23/2004WO2004081255A1 Semiconductor device
09/23/2004WO2004072357A3 Fiber and sheet equipment wear surfaces of extended resistance and methods for their manufacture
09/23/2004US20040186008 Catalyst-imparting treatment solution and electroless plating method
09/23/2004US20040185295 Applying protective diffusion aluminide coatings; gas turbines
09/23/2004US20040184691 Lightweight bearing and wave gear drive
09/23/2004US20040182714 Metal plating method, pretreatment agent, and semiconductor wafer and semiconductor device obtained using these
09/23/2004US20040182713 Article including a metal atom precursor is disproportionally exposed to electromagnetic radiation in an amount and intensity sufficient to convert some of the precursor to elemental meta; additional conductive material may then be deposited onto the elemental metal to produce a microstructure
09/23/2004US20040182694 Electrolzsis cell for restoring the concentration of metal ions in electroplating processes
09/23/2004US20040182277 Electroless Ni-B plating liquid, electronic device and method for manufacturing the same
09/22/2004EP1460049A2 Method of manufacturing ceramic film and pressure heat treatment device used therefor
09/22/2004EP1459367A2 Method for defining a source and a drain and a gap inbetween
09/22/2004EP1458905A2 Electrolzsis cell for restoring the concentration of metal ions in electroplating processes
09/22/2004CN1531749A Method for multilevel copper interconnects for ultra large scale integration
09/22/2004CN1531036A Producing method for ceramic membrane pressurized heat treater therefor
09/22/2004CN1530464A Method for producing molded goods plating
09/22/2004CN1168125C Copper deposit process
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