Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2013
03/06/2013CN102041474B Preparation method for nano precious metal particle modified tin dioxide gas sensitive material
03/06/2013CN102033361B Manufacture method of liquid crystal orientation layer
03/06/2013CN101960061B Strand-like material composite with cnt yarns and method for the manufacture thereof
03/06/2013CN101935824B Ion injection method, equipment and method for forming light-dope structure
03/06/2013CN101935821B Preparation method of polymaleic anhydride film
03/06/2013CN101841049B Titanium electrode material and surface treatment method of titanium electrode material
03/06/2013CN101821424B High-frequency sputtering device
03/06/2013CN101775579B Preparation method of microwave plasma of titanium dioxide film
03/06/2013CN101680109B Apparatus and method for manufacturing compound semiconductor single crystal
03/06/2013CN101627147B Vacuum treatment of strip-shaped substrates
03/06/2013CN101360843B 溅射靶结构体 Sputtering target structure
03/06/2013CN101291742B Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
03/05/2013US8389072 System, method, and apparatus for variable hardness gradient armor alloys
03/05/2013US8389068 Boron ion implantation using alternative fluorinated boron precursors, and formation of large boron hydrides for implantation
03/05/2013US8388819 Magnet target and magnetron sputtering apparatus having the same
03/05/2013US8388815 Coated article and method of making the same
03/05/2013US8388757 Electrostatic chuck and apparatus for treating substrate including the same
03/05/2013US8388753 Coating apparatus
03/05/2013US8388643 Bioabsorbable polymeric implants and a method of using the same to create occlusions
02/2013
02/28/2013WO2013028977A2 Apparatus and method for the evaporation and deposition of materials
02/28/2013WO2013028970A1 Ionic liquid release coat for use in metal flake manufacture
02/28/2013WO2013027839A1 Superconductor substrate manufacturing method, superconductor manufacturing method, superconductor substrate, and superconductor
02/28/2013WO2013027443A1 Ferromagnetic sputtering target with minimized particle generation
02/28/2013WO2013027425A1 Titanium target for sputtering
02/28/2013WO2013027391A1 In-ga-sn based oxide sintered compact
02/28/2013WO2013026493A1 Corner cut mask
02/28/2013WO2013026492A1 Protection of edge exclusion mask shielding
02/28/2013WO2013026491A1 Sputtering apparatus and method
02/28/2013WO2013026376A1 Method for preparing conducting film on ultra-thin glass substrate, lcd substrate, liquid crystal panel, and liquid crystal display device
02/28/2013US20130052476 Housing and method for making same
02/28/2013US20130052365 Dielectric film defect reduction
02/28/2013US20130051206 Method and system for optical calibration
02/28/2013US20130049555 Selective plating of frame lid assembly
02/28/2013US20130049064 Epitaxial film forming method, vacuum processing apparatus, semiconductor light emitting element manufacturing method, semiconductor light emitting element, and illuminating device
02/28/2013US20130048502 Systems and processes for forming molds such as nickel molds
02/28/2013US20130048494 Sputtering device
02/28/2013US20130048490 Synthesis of metal oxides by reactive cathodic arc evaporation
02/28/2013US20130048489 Electronic device manufacturing method and sputtering method
02/28/2013US20130048488 Impermeable PVD Target Coating for Porous Target Materials
02/28/2013US20130048060 Transparent conductive zinc oxide film, process for production thereof, and use thereof
02/28/2013DE112008000544B4 Schichtabscheidevorrichtung und Schichtabscheideverfahren Film deposition and layer deposition
02/28/2013DE102012014675A1 Radiation-selective absorber multilayer system useful for coating absorber for solar thermal power station, comprises silicon nitride that forms matrix in absorbent layer, in which nano-crystalline grains are bound, and absorbent layer
02/28/2013DE102011111686A1 Processing substrate using ion beam, comprises generating ion beam from ion beam source, and directing ion beam on surface for processing substrate, in which ion beam is passed through aperture that is made of carbon-containing material
02/28/2013DE102011111629A1 Verfahren zur Herstellung periodischer kristalliner Silizium-Nanostrukturen A process for preparing crystalline silicon-periodic nanostructures
02/28/2013DE102011111613A1 Sensoranordnung zur Charakterisierung von Plasmabeschichtungs-, Plasmaätz- und Plasmabehandlungsprozessen sowie Verfahren zur Ermittlung von Kenngrößen in diesen Prozessen Sensor arrangement for the characterization of plasma coating, plasma etching and plasma treatment processes and procedures for the determination of parameters in these processes
02/28/2013DE102011081905A1 Producing layers in coating plant, comprises providing substrate, forming layer, and short-time annealing of layer, where energy input of the short-time annealing of deposited layer is adjusted to obtain predetermined final temperature
02/28/2013DE102011081878A1 Transparent light-scattering layer stuck to transparent substrate e.g. glass substrate, has surface structure comprising recesses with flat bottom and top surface portions which form lower and upper plateau surfaces, respectively
02/28/2013DE102011081441A1 Target, useful for sputtering substrates, comprises polygon-type flattened portions with decreasing angle of incidence to a horizontal line, where the target is present in the form of an elongated target for an elongated plasmatron
02/28/2013DE102011053104A1 Radom Radom
02/28/2013DE102009025422B9 Verfahren und Anordnung zur Steuerung eines RF-Generators für Magnetrons in Vakuumbeschichtungsanlagen Method and apparatus for controlling an RF generator for magnetron vacuum coating systems
02/27/2013EP2562288A2 Vacuum deposition apparatus
02/27/2013EP2562139A1 Perovskite oxide, process for producing the same, piezoelectric film, and piezoelectric device
02/27/2013EP2562138A1 Preparation method for copper oxide nanowires
02/27/2013EP2561118A1 Pvd coating for metal machining
02/27/2013EP2561114A2 Apparatus and method for coating substrates using the eb/pvd process
02/27/2013EP2561113A1 Apparatus for coating substrates using the eb/pvd method
02/27/2013EP2561112A2 Pvd coating for metal machining
02/27/2013CN202755056U Coating film fixture magnet frame
02/27/2013CN202755055U Combined type ceramic target for magnetron sputtering coating
02/27/2013CN202755054U Traveling device of piece-scattering machine on magnetic control film-coating line
02/27/2013CN202755053U Transmission device on magnetron sputtering film-coating line
02/27/2013CN202755052U Driving device on magnetron sputtering film-coating line
02/27/2013CN202755051U Conveying device on magnetron sputtering film-coating line
02/27/2013CN202755050U Device adjusting uniformity of vacuum magnetic control glow
02/27/2013CN202755049U Cathode electric arc device for vacuum tool film coating
02/27/2013CN202755048U Evaporation film
02/27/2013CN202755047U System for evaporating casting polypropylene (CPP) membrane
02/27/2013CN202755046U Film-forming device
02/27/2013CN202755045U Mould for preparing alkali-metal evaporator evaporation body for night-vision device
02/27/2013CN202752180U Flexible decorative composite coating with dewatering and self-cleaning functions
02/27/2013CN102947987A Conductive-material manufacturing method, conductive material, and battery
02/27/2013CN102947896A Transparent conductive film, method for manufacturing a transparent conductive film, dye-sensitized solar cell, and solid-electrolyte cell
02/27/2013CN102947481A Substrate inverting apparatus, vacuum film-forming apparatus, and substrate inverting method
02/27/2013CN102947480A Method for bonding components of a sputtering target, a bonded assembly of sputtering target components and the use thereof
02/27/2013CN102947479A Method and device for coating a surface
02/27/2013CN102947478A Arc deposition source having a defined electric field
02/27/2013CN102947084A Molded article, method for producing same, electronic device member, and electronic device
02/27/2013CN102945788A Shielding device and semiconductor processing equipment using same
02/27/2013CN102945728A High-temperature welding sputtering inductance skeleton
02/27/2013CN102945694A ITO (indium tin oxide) base plate and preparation method of ITO base plate
02/27/2013CN102944542A Surface-enhanced Raman substrate of ground glass, and preparation method thereof
02/27/2013CN102943293A Manufacturing process of electroplating pieces with wire drawing veins
02/27/2013CN102943246A Method for preparing metal surface super-hydrophobicity aluminum coating
02/27/2013CN102943245A Ion implanting method and ion implanting machine
02/27/2013CN102943244A Preparation method for LiTaO3 film through ion beam enhanced deposition (IBED)
02/27/2013CN102943243A Magnetron sputtering coating production line for capacitive touch screens
02/27/2013CN102943242A Radio-frequency ionization selenium source device
02/27/2013CN102943241A Method for manufacturing sodium-doped absorbing layer on reel-to-reel flexible polyimide (PI) substrate
02/27/2013CN102943240A Multifunctional plasma enhanced coating system
02/27/2013CN102943239A Aluminum die-cast alloy surface corrosion-resistant silver-based amorphous film and preparation process thereof
02/27/2013CN102943238A Preparation method of thin-film solar cell
02/27/2013CN102943237A Preparation method of copper indium gallium diselenide thin film solar cell absorbing layer
02/27/2013CN102942704A Polyurethane/cellulose composite membrane electro-active material and preparation method thereof
02/27/2013CN102942178A Compound base of precious metal nanometer array and single layer graphene and preparation method thereof
02/27/2013CN102941712A Polymer material-metal oxide film composite material and preparation method thereof
02/27/2013CN102306601B Image enhancer structure for removing phenomenon of outputting dark grids of optical fiber panel
02/27/2013CN102251221B Target and semiconductor device processing apparatus using same
02/27/2013CN101924015B Gas input device and semiconductor processing device
02/27/2013CN101688286B Thin film semiconductor material produced through reactive sputtering of zinc target using nitrogen gases
02/27/2013CN101373731B Electrostatic chuck apparatus and temperature control method thereof
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