| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/13/2013 | CN102933736A Multilayer nitride hard coatings |
| 02/13/2013 | CN102933735A Substrate coating on one or more sides |
| 02/13/2013 | CN102931433A Preparation method of electrolyte thin film for all-solid-state thin film lithium ion battery |
| 02/13/2013 | CN102931421A Fuel cell metal bipolar plate with conductive and anti-corrosion plating and preparation method thereof |
| 02/13/2013 | CN102931414A Preparation process for copper foil for lithium ion battery current collector |
| 02/13/2013 | CN102931285A Method for preparing niobium-doped titanium dioxide transparent conducting film |
| 02/13/2013 | CN102931277A Method for preparing black silicon by Ni assisted chemical etching method |
| 02/13/2013 | CN102931274A Method for manufacturing semiconductor compound film layer from pre-alloy target by using once sputtering mode |
| 02/13/2013 | CN102928985A Spectroscope and coating process method thereof |
| 02/13/2013 | CN102928894A Method for preparing reflection-reduction film element of light P with thickness of 193nm in large angle mode |
| 02/13/2013 | CN102928074A Preparation of up-conversion luminescence imaging reinforced film |
| 02/13/2013 | CN102925871A Composite thermal barrier coating and preparation method thereof |
| 02/13/2013 | CN102925870A Preparation method of Zr-Cu-Ni-Al-Si metal amorphous film material |
| 02/13/2013 | CN102925869A Method for preparing amorphous/nanometer crystal multilayer-structure film |
| 02/13/2013 | CN102925868A Method for preparing indium target metal film |
| 02/13/2013 | CN102925867A Sputtering apparatus |
| 02/13/2013 | CN102925866A Preparation technology for single-phase Mg2Si semiconductor film |
| 02/13/2013 | CN102925865A Modularized configuration system for crucible mechanism of vacuum coating machine |
| 02/13/2013 | CN102925864A Evaporation coating device and method for obtaining working temperature of source furnace of evaporation coating device |
| 02/13/2013 | CN102925863A Gas phase method for generating metastable phase nanometer particle beam and depositing nanometer film |
| 02/13/2013 | CN102925862A Preparation method of Ti-doped diamond-like carbon (DLC) coating |
| 02/13/2013 | CN102925861A Cu-Ni-Sn alloy film with high conductibility and high thermal stability and preparation technology thereof |
| 02/13/2013 | CN102925860A Preparation method for carbon layer material with protective layer structure |
| 02/13/2013 | CN102925859A Preparation method for carbon layer material with protective layer structure |
| 02/13/2013 | CN102925858A Carbon layer materials with protection layer structure |
| 02/13/2013 | CN102925857A Preparation method for carbon layer materials with protection layer structure |
| 02/13/2013 | CN102925856A Method for directly preparing nitrogen-doped zinc oxide film by taking zinc film as base material |
| 02/13/2013 | CN102925855A Coated member and its manufacturing method |
| 02/13/2013 | CN102925727A Preparation method for high-performance Zn@W-Cu heat composite |
| 02/13/2013 | CN102922225A Preparation method of molybdenum target |
| 02/13/2013 | CN102922052A AlTiN-AlCrN super hard nano multilayer composite coating hob and preparation method thereof |
| 02/13/2013 | CN102373433B Method for preparing ultrathin carbon film by using carbon cluster ion beam |
| 02/13/2013 | CN102286743B Steel-based mosaic diamond coating and preparation method thereof |
| 02/13/2013 | CN102242336B Film preparation method for reducing stress of hard film |
| 02/13/2013 | CN102208520B Light emitting diode (LED) wafer anode pad and manufacturing process thereof |
| 02/13/2013 | CN102119237B Method for forming protective film on plasma display panel bases, and device for forming the protective film |
| 02/13/2013 | CN102102189B Ion implantation system and method for improving beam current intensity and angle distribution |
| 02/13/2013 | CN102061443B Method for plating tin oxide film through magnetic sputtering |
| 02/13/2013 | CN102007583B Processes for producing dielectric film and semiconductor device, dielectric film, and recording medium |
| 02/13/2013 | CN101985733B Target, method for producing the same, memory, and method for producing the same |
| 02/13/2013 | CN101983255B Sputtering system and method including an arc detection system |
| 02/13/2013 | CN101974731B Vacuum magnetic control coating process |
| 02/13/2013 | CN101748365B Tungsten titanium target material with high purity and high tungsten-rich phase, and preparation method thereof |
| 02/13/2013 | CN101736293B Metal filling method and system for evaporating electrode of organic electroluminescent diode |
| 02/13/2013 | CN101712215B TiCN series nanometer gradient compound multi-layer coating and method for preparing same |
| 02/13/2013 | CN101555585B 溅射靶 Sputtering target |
| 02/12/2013 | US8372488 Methods and apparatus for thermal barrier coatings with improved overall thermal insulation characteristics |
| 02/12/2013 | US8372250 Gas-timing method for depositing oxynitride films by reactive R.F. magnetron sputtering |
| 02/12/2013 | US8372204 Susceptor for MOCVD reactor |
| 02/07/2013 | WO2013019846A2 Rotary cathodes for magnetron sputtering system |
| 02/07/2013 | WO2013018768A1 Surface-modified wc-based cemented carbide member, hard film-coated wc-based cemented carbide member, method for producing surface-modified wc-based cemented carbide member, and method for producing hard film-coated wc-based cemented carbide member |
| 02/07/2013 | WO2013018192A1 Method for forming silicon carbide thin film |
| 02/07/2013 | WO2013018027A1 Target for barium - scandate dispenser cathode |
| 02/07/2013 | WO2013017250A1 Method for sanifying/sterilizing cork stoppers |
| 02/07/2013 | WO2012165793A3 Fuel supply unit for a thin film deposition apparatus |
| 02/07/2013 | WO2012165792A3 Vacuum deposition apparatus |
| 02/07/2013 | US20130034746 Recording medium |
| 02/07/2013 | US20130033779 Air bearing surface overcoat with soft intermediate film, and methods of producing the same |
| 02/07/2013 | US20130033671 Liquid crystal polymer (lcp) surface layer adhesion enhancement |
| 02/07/2013 | US20130032798 Oxide for semiconductor layer of thin-film transistor, sputtering target, and thin-film transistor |
| 02/07/2013 | US20130032477 Ni ALLOY SPUTTERING TARGET, Ni ALLOY THIN FILM AND Ni SILICIDE FILM |
| 02/07/2013 | US20130032476 Rotary cathodes for magnetron sputtering system |
| 02/07/2013 | US20130032469 Arc pvd plasma source and method of deposition of nanoimplanted coatings |
| 02/07/2013 | US20130032468 Vacuum processing apparatus, vacuum processing method, and electronic device manufacturing method |
| 02/07/2013 | US20130031794 RAZOR BLADES WITH ALUMINUM MAGNESIUM BORIDE (AlMgB14)-BASED COATINGS |
| 02/07/2013 | DE102011080553A1 Formation of graphene layer for electrode of e.g. emitter layer system, involves forming amorphous carbon layer on substrate by physical vapor deposition, and carrying out flash annealing in atmosphere of controlled composition |
| 02/07/2013 | DE102011052325A1 Reinigungsmodul und Reinigungsverfahren für Substrate und/oder Substratträger Cleaning module and cleaning process for substrates and / or substrate carrier |
| 02/06/2013 | EP2554954A2 Apparatus for metering granular source material in a thin film vapor deposition apparatus |
| 02/06/2013 | EP2554866A1 Anti-friction bearing |
| 02/06/2013 | EP2554711A1 Plated article having metal thin film formed by electroless plating, and manufacturing method thereof |
| 02/06/2013 | EP2554710A1 Tantalum coil for sputtering and method for processing the coil |
| 02/06/2013 | EP2554602A1 Molded object, process for producing same, member for electronic device, and electronic device |
| 02/06/2013 | EP2554582A1 Compact, production method therefor, electronic device member and electronic device |
| 02/06/2013 | EP2554368A1 Molded article, method for producing the same, electronic device member, and electronic device |
| 02/06/2013 | EP2554304A1 Cutting tool |
| 02/06/2013 | EP2554303A1 Cutting tool |
| 02/06/2013 | EP2553687A2 High temperature-resistant, electrically conductive thin films |
| 02/06/2013 | EP2553138A2 Target utilization improvement for rotatable magnetrons |
| 02/06/2013 | EP2553137A2 Cylindrical rotating magnetron sputtering cathode device and method of depositing material using radio frequency emissions |
| 02/06/2013 | EP2553136A1 Method and device for refilling an evaporator chamber |
| 02/06/2013 | EP2553135A1 Method for the production of functionalized elastomeric manufactured articles and manufactured articles thus obtained |
| 02/06/2013 | CN202719135U Double-channel water-cooling rotating shaft type vacuum dynamic sealing device |
| 02/06/2013 | CN202717844U Horizontal vacuum coating transmission system |
| 02/06/2013 | CN202717843U Driving device of scattering and slicing machine on magnetic control film coating line |
| 02/06/2013 | CN202717842U 磁控溅射设备 Magnetron sputtering equipment |
| 02/06/2013 | CN202717841U Equipment for preparing indium tin oxide film for resistance-type touch screen |
| 02/06/2013 | CN202717840U Continuous sputtering coating equipment |
| 02/06/2013 | CN202717839U Film coating jig with quartz chip |
| 02/06/2013 | CN202717838U Low-temperature ionic film plating device |
| 02/06/2013 | CN202717837U Water-cooled type electric arc evaporation assembly for improving utilization rate of target |
| 02/06/2013 | CN202717836U Pre-cleaning process chamber |
| 02/06/2013 | CN202717835U Multi-beam traveling wave tube cathode coating mold |
| 02/06/2013 | CN102918633A Film forming method and film forming device |
| 02/06/2013 | CN102918622A Chamber for physical vapor deposition |
| 02/06/2013 | CN102918463A Multilayer mirror |
| 02/06/2013 | CN102918183A PVD coating for metal machining |
| 02/06/2013 | CN102918176A Hard carbon coating and method of forming the same |
| 02/06/2013 | CN102918175A Physical vapor deposition chamber with rotating magnet assembly and centrally fed RF power |
| 02/06/2013 | CN102918004A 溅射靶 Sputtering target |
| 02/06/2013 | CN102918003A Sintered oxide material, target comprising same, and oxide semiconductor thin film |