Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
01/2013
01/02/2013CN102851666A Method for processing surfaces of composite antimicrobial coatings coated with copper layer substrates
01/02/2013CN102851646A Surface anticorrosion treatment method of neodymium-iron-boron ferrite
01/02/2013CN102851645A Preparation method of low-residual-stress copper film
01/02/2013CN102851644A Preparation method for photoelectric material
01/02/2013CN102851643A Non-adhesive sputtering structure and method for forming the structure for sputtering
01/02/2013CN102851642A Target, and hard coating film coated cutting tool
01/02/2013CN102851641A Vacuum coater and metal high-temperature vacuum coating method
01/02/2013CN102851640A 成膜装置 Film forming apparatus
01/02/2013CN102851639A Environment-friendly electroless plating drawn wire-imitating surface treatment method for engineering plastic
01/02/2013CN102851638A Mask assembly and mask frame assembly using the same
01/02/2013CN102851637A Transferring device for transferring device between glove box and vacuum chamber
01/02/2013CN102847962A Surface coating cutting tool with hard coating layer playing excellent fracture resistance
01/02/2013CN102337508B Method for preparing titanium nitride/aluminum nitride/nickel nanometer multilayer film
01/02/2013CN102330062B Preparation method of titanium/nickel nitride nano multilayer film
01/02/2013CN102260853B Method for depositing silicon membrane for solar cell on basis of magnetic control sputtering technology
01/02/2013CN102234764B Metallization process and welding method for pyrolytic graphite
01/02/2013CN102212780B Method for preparing p-type cadmium sulfide film
01/02/2013CN102134698B Al-Sb-Te series phase change material for phase change memory and preparation method thereof
01/02/2013CN102084023B Magnetron sputtering method, and magnetron sputtering device
01/02/2013CN102061451B Preparation method of L10-FePt granular film
01/02/2013CN102051589B Method for preparing amorphous silicon carbide film and epitaxial film at low temperature
01/02/2013CN102051588B Germanium-containing vacuum plating method for noble metal assembly
01/02/2013CN102046835B Sputtering target and non-crystalline optical thin film
01/02/2013CN102016135B Method of manufacturing Si(1-v-w-x)CwAlxNv substrate, method of manufacturing epitaxial wafer, Si(1-v-w-x)CwAlxNv substrate, and epitaxial wafer
01/02/2013CN101942644B Translucent reflective film and reflective film for optical recording medium, and ag alloy sputtering target for forming such translucent reflective film and reflective film
01/02/2013CN101931025B Method of manufacturing solar battery
01/02/2013CN101896636B Application of hipims to through silicon via metallization in three-dimensional wafer packaging
01/02/2013CN101861410B Sputtering film forming method and sputtering film forming apparatus
01/02/2013CN101789469B Method for preparing light absorption layer of Cu-In-Ga-Se-S thin film solar cell
01/02/2013CN101780727B White film and preparation method thereof
01/02/2013CN101687708B Composite oxide sinter, process for producing amorphous composite oxide film, amorphous composite oxide film, process for producing crystalline composite oxide film, and crystalline composite oxide fi
01/02/2013CN101634010B Polycrystalline magnesium oxide material, manufacturing method thereof and manufacturing method for magnesium oxide membrane
01/02/2013CN101595239B Ultra smooth face sputter targets and methods of producing same
01/02/2013CN101547549B Plasma process apparatus, plasma process method, and object processed by the plasma process method
01/01/2013US8343591 Method for use with a coating process
01/01/2013US8343589 Methods for making environmental barrier coatings and ceramic components having CMAS mitigation capability
01/01/2013US8343319 Method and system for providing an improved hard bias structure
01/01/2013US8343318 Magnetic lensing to improve deposition uniformity in a physical vapor deposition (PVD) process
12/2012
12/27/2012WO2012176990A1 Anti-fingerprint and anti-reflection coating method and apparatus
12/27/2012WO2012176847A1 Piston ring
12/27/2012WO2012176846A1 Piston ring
12/27/2012WO2012176827A1 Surface coating cutting tool with excellent defect resistance and abrasion resistance
12/27/2012WO2012176407A1 Conductive film and method for producing same, and sputtering target used for same
12/27/2012WO2012175651A1 Device and method for coating a substrate
12/27/2012WO2012175621A1 Method for producing coated vacuum metallized substrates with high vapour and oxygen barrier properties
12/27/2012WO2012175494A1 Method for producing a reflective optical element for euv lithography
12/27/2012WO2012175315A1 Device for generating aerosol and depositing a light-emitting layer
12/27/2012WO2012175307A1 Method and device for depositing oleds
12/27/2012WO2012175289A1 Polymeric substrate material for physical and chemical vapor deposition processes, containing an adhesion-promoting polymeric layer, and the use thereof for producing concentrators of solar radiation
12/27/2012WO2012175128A1 Vapor deposition system and supply head
12/27/2012WO2012175126A1 Method and apparatus for vapor deposition
12/27/2012WO2012175124A1 Vapor deposition material source and method for making same
12/27/2012US20120328803 Substrates or assemblies having two-color laser-fused frits, and/or method of making the same
12/27/2012US20120328771 Closed loop process control of plasma processed materials
12/27/2012US20120328468 Processed high-purity copper material having uniform and fine crystalline structure, and process for production thereof
12/27/2012US20120326714 Method for the production of printed magnetic functional elements for resistive sensors and printed magnetic functional elements
12/27/2012US20120325774 Methods of making medical devices
12/27/2012US20120325655 A1-based alloy sputtering target
12/27/2012US20120325651 Sputtering apparatus and method of manufacturing electronic device
12/27/2012US20120325650 Sputtering target, method for manufacturing sputtering target, and method for forming thin film
12/27/2012US20120325649 Method of supporting a workpiece during physical vapour deposition
12/27/2012US20120325404 Plasma processing apparatus
12/27/2012US20120325310 Laminate, method for producing same, and functional element using same
12/27/2012US20120325140 Transfer chamber with vacuum extension for shutter disks
12/27/2012US20120324956 Press molding glass material, manufacturing method thereof, and manufacturing method of optical element
12/27/2012DE112010003274T5 Verfahren zur Herstellung eines Sputtertargets sowie Sputtertarget A process for producing a sputtering target and sputtering target
12/27/2012DE102012200528A1 Modifying surface properties e.g. transmissivity of substrate, comprises depositing functional layer on surface of substrate, and treating entire surface of functional layer by laser beam such that property of functional layer is changed
12/27/2012DE102012105419A1 Nicht-verbundene drehende Halbleitertargets und Verfahren zu ihrer Sputterung Non-affiliated rotating semiconductor targets and methods of sputtering
12/27/2012DE102011112698A1 Optical control device used for vacuum treatment of glass substrate, has viewing window that is arranged at predetermined interior space within housing in which passage opening is extended within channel formed at housing
12/27/2012DE102011077878A1 Polymeres Substratmaterial für physikalische und chemische Vapor Deposition-Prozesse, eine haftvermittelnde polymere Schicht enthaltend, und dessen Verwendung zur Herstellung von Konzentratoren solarer Strahlung Polymeric substrate material for physical and chemical vapor deposition processes, an adhesion-promoting polymeric layer containing, and the use thereof for the production of solar radiation concentrators
12/27/2012DE102011051263A1 Vorrichtung zur Aerosolerzeugung und Abscheiden einer lichtemittierenden Schicht Device for aerosol generation and deposition of a light-emitting layer
12/27/2012DE102011051261A1 Verfahren und Vorrichtung zum Abscheiden von OLEDs insbesondere Verdampfungsvorrichtung dazu Method and apparatus for depositing OLEDs in particular evaporation apparatus to
12/27/2012DE102011051260A1 Verfahren und Vorrichtung zum Abscheiden von OLEDs Method and apparatus for depositing OLEDs
12/27/2012DE102011051226A1 Plasma-assisted deposition for depositing dielectric layer on silicon-containing substrate, useful for manufacturing a solar cell, comprises e.g. supplying a gas, monitoring an emission intensity of gas, and controlling a process parameter
12/27/2012DE102009014891B4 Vorrichtung zum Verdampfen eines Materials in einer Vakuumkammer Apparatus for evaporating a material in a vacuum chamber
12/27/2012DE10122598B4 Verfahren für die Ionisierung eines Arbeitsgases zur Oberflächenbehandlung eines Werkstückes A process for the ionization of a working gas for the surface treatment of a workpiece
12/26/2012EP2538458A2 Methods of making absorber layers for photovoltaic devices and photovoltaic devices
12/26/2012EP2538417A1 Transparent conductive film, process for producing same, and electronic device employing transparent conductive film
12/26/2012EP2537955A1 A method of supporting a workpiece during physical vapour deposition
12/26/2012EP2537398A1 Device and method for generating a plasma discharge for patterning the surface of a substrate
12/26/2012EP2536865A1 Coating device, and method for operating a coating device with a shielding plate
12/26/2012CN202626285U Equipment for preparing two-dimensional nano-film
12/26/2012CN202626284U Thin film deposition equipment
12/26/2012CN202626283U Optical coating measurement and control system
12/26/2012CN202626282U Workpiece support frame used for vacuum coating equipment
12/26/2012CN202626281U Laminated vacuum plating clamp
12/26/2012CN202626280U Magnetron sputtering device
12/26/2012CN202626279U Upward film formation magnetron sputtering device
12/26/2012CN202626278U 组合挂具 Combination hanging
12/26/2012CN202626277U Optical coating device with ultrasonic dust removal function
12/26/2012CN102844847A Deposition method and method for manufacturing semiconductor device
12/26/2012CN102844460A Sputter target
12/26/2012CN102844134A Method for producing cu-ga alloy powder, cu-ga alloy powder, method for producing cu-ga alloy sputtering target, and cu-ga alloy sputtering target
12/26/2012CN102843888A Casing and preparation method thereof
12/26/2012CN102842682A Stacked organic electroluminescence device and manufacturing method thereof
12/26/2012CN102842478A Non-bonded rotary semiconducting targets and methods of their sputtering
12/26/2012CN102842312A Preparation method of perpendicular magnetic recording material
12/26/2012CN102839357A Transmission mechanism of continuous horizontal sputtering machine
12/26/2012CN102839356A Loading frame for non-blocking coating of annular product
12/26/2012CN102839355A Method of supporting workpiece during physical vapour deposition