Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/1988
05/31/1988CA1237279A1 Information medium adapted to be written by thermo- optical means and method of manufacturing same
05/24/1988US4746548 Thin-film display panels
05/24/1988US4746542 Coating method for use in the production of magnetic recording medium
05/24/1988US4746417 Circular target plate of material to be sputtered
05/24/1988US4745878 Vapor masking device
05/18/1988EP0267679A1 Coated article and method of manufacturing the article
05/18/1988EP0267233A1 Modular semiconductor wafer transport and processing system.
05/18/1988CN87106947A Planar magnet-controlled sputtering source with separated magnets
05/17/1988US4745287 Ion implantation with variable implant angle
05/17/1988US4745035 Article having a wear resisting precious metal coating
05/17/1988US4745005 Multilayer, titanium, cobaltchromium thin film formed by vacuum deposition
05/11/1988EP0266818A1 Feed-through element for vacuum apparatus and apparatus provided with such feed-through elements
05/11/1988DE3735385A1 Process for producing a magneto-optic recording medium
05/11/1988DE3638286A1 Electrical component, made of ceramic and having multilayer metallisation, and a method for its production
05/11/1988CN87107161A Composition film forming device
05/10/1988US4743806 Process and arrangement to irradiate solid state materials with ions
05/10/1988US4743570 Facilitating heat exchange between wafer and heat sink by gas
05/10/1988US4743514 Nickel base alloy
05/10/1988US4743467 Method for preparing magnetic recording medium
05/10/1988US4743463 Method for forming patterns on a substrate or support
05/10/1988US4743308 Corrosion inhibition of metal alloys
05/10/1988EP0216919A4 Method and target for sputter depositing thin films.
05/10/1988CA1236537A1 Wire and cable
05/04/1988EP0266315A1 Method and equipment for the control and the regulation of the evaporation of a metal such as aluminum or other, in plants for metalization under vacuum
05/04/1988EP0266225A1 Method of producing plastic-moulded articles with hard coated surface layers
05/04/1988EP0266214A2 Interference film filters, optical waveguides and methods for producing them
05/04/1988EP0266178A2 Method and apparatus for forming a thin film
05/04/1988EP0265992A1 Feed-through element for application in a vacuum apparatus; apparatus provided with such feed-through elements as well as wire material formed in such an apparatus
05/04/1988EP0265937A2 Slide bearing
05/04/1988EP0265886A2 Process for forming an ultrafine-particle film
05/04/1988EP0265512A1 Sputter-coated thin glass sheeting in roll form and method for continuous production thereof
04/1988
04/28/1988DE3735162A1 Vapour deposition apparatus
04/28/1988DE3636524A1 Apparatus for applying coatings in a vacuum by magnetron atomisation
04/27/1988EP0265320A1 Apparatus for vacuum deposition by reactive cathodic sputtering onto a glass sheet
04/27/1988EP0264654A1 Zircomium nitride coated article and method for making same
04/27/1988EP0264371A1 Device for making metallized plastic films with clearly defined non-metallized areas.
04/27/1988EP0213191A4 Thin-film storage disk and method.
04/27/1988CN87206452U Evaporation source with multiple layer structure
04/26/1988US4740429 Metal-ceramic joined articles
04/26/1988US4740386 Method for depositing a ternary compound having a compositional profile
04/26/1988US4740385 Apparatus for producing coils from films of insulating material, conductively coated in a vacuum
04/26/1988US4740267 Energy intensive surface reactions using a cluster beam
04/26/1988US4739818 Solidification while in contact with backing
04/26/1988CA1235632A1 Modifications of the properties of metals
04/21/1988WO1988002791A1 Thin film formation apparatus
04/21/1988WO1988002790A1 Process and apparatus for film deposition utilizing volatile clusters
04/20/1988EP0263880A1 Continuous ion plating device for rapidly moving film
04/20/1988EP0263846A1 Method and apparatus for sputtering a dielectric target or for reactive sputtering
04/19/1988CA1235385A1 Hard layer formed by incorporating nitrogen into mo or w metal and method for obtaining this layer
04/19/1988CA1235384A1 Dual ion beam deposition of amorphous semiconductor films
04/14/1988DE3633386A1 Method and device for treating substrates in a vacuum
04/13/1988EP0263747A1 Surface coated tungsten carbide-base sintered hard alloy material for inserts of cutting tools
04/13/1988EP0082189B1 Masking portions of a substrate
04/12/1988US4737416 Electroless plating, heat treatment in weakly oxidizing atmosphere
04/12/1988US4737252 Sputtered protective coating
04/12/1988US4737232 Laser passes through transparent substrate to polymerize monomer onto surface of substrate
04/12/1988CA1235087A1 Diamond-like thin film and method for making the same
04/12/1988CA1235086A1 Method and apparatus for evaporation arc stabilization for non-permeable targets utilizing permeable stop ring
04/07/1988WO1988002548A1 Ion implantation
04/06/1988EP0262939A2 A static pressure gas bearing assembly
04/06/1988EP0262861A2 Apparatus for coating substrate devices
04/06/1988EP0262323A2 Process for the interior coating of electrically non-conducting hollow bodies
04/05/1988US4735699 Methods of depositing germanium carbide
04/05/1988US4735698 Method of making magneto-optical recording medium
04/05/1988CA1234776A1 Disordered coating and method
03/1988
03/30/1988EP0261973A1 Device and process for treating fine particles
03/30/1988EP0261347A1 Sputtering apparatus
03/30/1988EP0261245A1 Process for producing transparent conductive film
03/30/1988CN87105700A Aerator for sputtering sources
03/30/1988CN87104730A Iionic coating device of the plasma accelerator process
03/29/1988US4734183 Sputtering cathode on the magnetron principle
03/29/1988US4734178 Multistep crystallization, carbidization and nitriding; titanium nitride coating
03/29/1988US4733631 Apparatus for coating substrate devices
03/24/1988WO1988002034A1 Process and device for metallizing foil surfaces
03/24/1988WO1988002033A1 Method for making an amorphous aluminum-nitrogen alloy layer
03/23/1988EP0260410A2 Process for selective physical vapour deposition
03/23/1988CN87212023U Magnetic control sputtering source for s-gun
03/22/1988US4733137 For powering a gaseous discharge device
03/22/1988US4732792 Method for treating surface of construction material for vacuum apparatus, and the material treated thereby and vacuum treatment apparatus having the treated material
03/22/1988US4732761 Applying high frequency bias voltage to gas mixture-perpendicular impingement onto substrate
03/22/1988US4732659 Sputtering method for making thin film field effect transistor utilizing a polypnictide semiconductor
03/16/1988EP0260150A2 Vacuum processing apparatus wherein temperature can be controlled
03/16/1988EP0259961A2 Ion beam dosimetry
03/16/1988EP0259934A1 Sputtering apparatus with a device for the measurement of a critical target depletion
03/15/1988US4731540 Ion beam materials processing system with neutralization means and method
03/15/1988US4731539 Glow discharging; alloying
03/15/1988US4731302 Hard coatings for mechanically and corrosively stressed elements
03/15/1988US4731293 Fabrication of devices using phosphorus glasses
03/15/1988US4731288 Heat stability, tear strength
03/15/1988US4731172 Method for sputtering multi-component thin-film
03/15/1988US4731116 Sputter target and process for producing sputter target
03/09/1988EP0258966A2 Multi-chamber deposition system
03/09/1988EP0258752A2 Article having surface layer of uniformly oriented, crystalline, organic microstructures
03/09/1988EP0258283A1 Method for depositing on a substrate a wear-resistant decorative coating layer, and object produced according to this method.
03/08/1988US4729906 Method for producing glow polymerisate layers
03/08/1988US4729905 Iron alloy, wear-resistant coating, arc discharging, titanium cathode, redox, annealing
03/08/1988CA1233782A1 Method for producing glow polymerisate layers
03/03/1988DE3728836A1 Goldfarbene beschichtung fuer artikel Gold-colored coating for articles
03/02/1988EP0257872A2 A masking member
03/02/1988EP0257783A1 Control system and method for controlling the reactive sputtering of a metallic compound