Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
05/1989
05/16/1989EP0313580A4 Radiation curable temporary solder mask.
05/11/1989DE3737142A1 Erzeugung von (duennen) schichten aus hochschmelzender bzw. sublimierender materie (leitender, halbleitender und nichtleitender) und gemischen davon mit pseudofunkenelektronenstrahlen Production of (thin) layer of high-melting or sublimating matter (key, semi-conductive and non-conductive) and mixtures thereof pseudo radio with electron beams
05/11/1989DE3716011A1 Protective layer on aluminium and aluminium alloys against corrosion in a maritime climate
05/10/1989EP0314859A1 Magneto-optic memory device
05/10/1989CN1032885A Sputtering device for mfg. superconducting oxide material and method therefor
05/10/1989CN1032884A Method of growth of thin film layer for use in composite semiconductor
05/09/1989US4828872 Method and apparatus for the reactive vapor depositing of metal compounds
05/09/1989US4828870 Irradiating with ion beam, depositing vaporized aluminum
05/09/1989US4828668 Sputtering system for deposition on parallel substrates
05/09/1989US4828391 Test-glass changer
05/03/1989EP0314230A1 Steel substrate with metal coatings for the reinforcement of vulcanisable elastomers
05/03/1989EP0313996A2 Superconductive thin film, its production and use
05/03/1989EP0313750A1 Magnetron sputter etching/deposition system
05/03/1989EP0313580A1 Radiation curable temporary solder mask.
05/03/1989CN2036956U Metallic products plated with metallic film
05/03/1989CN1032681A Method for vacuum film-plating of porous non-metallic material surface
05/03/1989CN1032640A Method for baking finish or vacuum deposition film on fiberglass articles
05/02/1989US4826720 Polyetherimide or polyether ketone polymers
05/02/1989US4826707 Method for coating webs of material having an open structure in depth
05/02/1989US4826705 Radiation curable temporary solder mask
05/02/1989US4825808 Substrate processing apparatus
04/1989
04/27/1989DE3832655A1 Magneto-optical recording medium
04/26/1989EP0312694A1 Apparatus according to the principle of carousel for depositing substrates
04/26/1989CN2036533U Multitarget plating chamber of vertical vacuum sputtering machine
04/25/1989US4825087 System and methods for wafer charge reduction for ion implantation
04/25/1989US4824735 Casting transition metal alloy containing rare earth metal
04/25/1989US4824545 Apparatus for coating substrates
04/25/1989US4824544 Large area cathode lift-off sputter deposition device
04/25/1989US4824540 Method and apparatus for magnetron sputtering
04/25/1989US4824481 Alloying rare earth and transition metal
04/25/1989US4824309 Vacuum processing unit and apparatus
04/19/1989EP0312447A1 Process and element for the production, using plasma, of thin films for electronic and/or optoelectronic applications
04/19/1989EP0312170A2 Process for step and repeat vacuum-deposition of large-area thin-film transistor matrix-circuits on monolithic glass panels through perforated metal masks
04/19/1989EP0311697A2 Magnetically enhanced sputter source
04/19/1989EP0197990B1 Method for forming by low pressure deposition a layer of insulating material on a substrate, and product obtained thereby
04/19/1989CN1032428A Automatical device for rapid heat chemical processing
04/18/1989US4823291 Radiometric measurement of wafer temperatures during deposition
04/18/1989US4823073 Sensor for measuring the current or voltage of electrically conductive layers present on a reference substrate
04/18/1989US4822641 Method of manufacturing a contact construction material structure
04/18/1989US4822466 Chemically bonded diamond films and method for producing same
04/12/1989EP0311302A1 Apparatus and method for the production of a coating on a web
04/12/1989EP0310656A1 Surface treatment of polymers.
04/11/1989US4820651 Method of treating bodies of III-V compound semiconductor material
04/11/1989US4820397 Quick change sputter target assembly
04/11/1989US4820393 High density
04/11/1989US4820392 Cleansing with ion beam; coating with titanium boride by sputtering
04/11/1989US4820377 Method for cleanup processing chamber and vacuum process module
04/11/1989US4820106 Apparatus for passing workpieces into and out of a coating chamber through locks
04/11/1989CA1252417A1 Reactive planar magnetron sputtering of sio.sub.2
04/05/1989EP0310590A2 Ion treatment of the inner surfaces of objects connected as cathodes
04/05/1989EP0310560A2 Process for low-temperature coating with a hard layer, and products obtained by this process
04/05/1989EP0309733A1 Process for the production of layers with a high degree of hardness and/or low friction properties and containing at least two components
04/05/1989CN1032123A Shield material and forming model of making it
04/04/1989US4818636 Films of catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them
04/04/1989US4818561 Thin film deposition apparatus and method
04/04/1989US4818359 Low contamination RF sputter deposition apparatus
04/04/1989US4818358 Magnetron cathode sputter coating apparatus
04/04/1989US4818357 Using inert gas supplied at different partial pressures to control ratio of elements deposited
04/04/1989US4817559 Vacuum vapor-deposition apparatus for coating an optical substrate
03/1989
03/29/1989EP0309354A1 Automatic apparatus for fast thermochemical treatment
03/29/1989EP0309294A2 Method and apparatus for the manufacture of superconducting oxide materials
03/29/1989EP0309273A2 Method of producing a superconductive oxide layer on a substrate
03/29/1989EP0309022A1 Method of producing thin magnetic metallic layers having a low thermal coefficient of expansion
03/29/1989EP0308680A1 Cathode sputtering apparatus
03/29/1989EP0308658A1 Apparatus and method for evaporating metallic films
03/29/1989EP0164383B1 Support for producing abrasion-proof catalysts
03/29/1989CN1032037A Method of producing thin magnetic metallic layers having low thermal coefficient of expansion
03/28/1989US4816341 Magnetic recording medium
03/28/1989US4816293 Axially rotating and advancing rod, energy beam evaporation
03/28/1989US4816291 Process for making diamond, doped diamond, diamond-cubic boron nitride composite films
03/28/1989US4816133 Apparatus for preparing thin film optical coatings on substrates
03/28/1989US4816128 Process for producing substrate member for magnetic recording disc
03/28/1989US4816127 Magnetic recording medium, sputtering
03/28/1989US4816125 Transducers, integrated circuits, zinc oxide films
03/28/1989US4816124 Multilayer, resin, sputtering
03/28/1989US4816046 Fine particle collector trap for vacuum evacuating system
03/28/1989US4815962 Low temperature ion bombardment pretreatment using inert gas
03/28/1989US4815415 Apparatus for producing coils from films of insulating material, conductively coated under vacuum
03/23/1989DE3830963A1 Process for metallising non-metallic carriers
03/22/1989EP0308275A2 Sputter module for modular wafer processing machine
03/22/1989EP0308201A1 Method of forming a sputtering target for use in producing a magneto-optic recording medium
03/22/1989EP0308166A2 Polycrystalline film formation
03/22/1989EP0307929A1 Plated steel sheet for a can
03/22/1989EP0307675A1 Process for the production of layers with high hardness and/or low friction properties
03/22/1989EP0307539A2 Process and apparatus for coating substrates
03/21/1989US4814232 Method for depositing laser mirror coatings
03/21/1989US4814199 Process for preparing metallizable polyolefin films
03/21/1989US4814056 Apparatus for producing graded-composition coatings
03/21/1989US4814053 Sputtering target and method of preparing same
03/21/1989EP0222877A4 IN-lINE DISK SPUTTERING SYSTEM.
03/16/1989DE3816578C1 Process and device for the vapour deposition of graded-light filter layers on transparent plates
03/15/1989EP0306612A1 Process for depositing layers on substrates
03/15/1989EP0306491A1 Arc coating of refractory metal compounds.
03/15/1989CN2034175U Magnetic controlled sputtering coating machine
03/15/1989CN1031749A Heavy-duty sliding surface bearing
03/14/1989US4812370 Surface coated tungsten carbide-base sintered hard alloy material for inserts of cutting tools
03/14/1989US4812352 Article having surface layer of uniformly oriented, crystalline, organic microstructures
03/14/1989US4812326 Nozzle with gradually opening cross-section, controlled atom cluster size
03/14/1989US4812217 Continuous transporting, cleaning
03/14/1989US4812101 Method and apparatus for continuous throughput in a vacuum environment