| Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378) |
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| 02/22/2012 | CN102362005A Sputter deposition device |
| 02/22/2012 | CN102362004A In-ga-zn-o type sputtering target |
| 02/22/2012 | CN102362003A In-Ga-Zn type oxide sputtering target |
| 02/22/2012 | CN102362002A Cu-Ga alloy sputtering target and manufacturing method thereof |
| 02/22/2012 | CN102361062A Preparation method of p-Si-based hetero-structure with large magneto-resistance effect |
| 02/22/2012 | CN102361004A Integration of barrier layer and seed layer |
| 02/22/2012 | CN102360944A Method for preparing iron-doped titanium nitride ferromagnetic film based on oriented growth |
| 02/22/2012 | CN102360709A Lithium niobate thin film with room temperature ferromagnetism and preparation method for lithium niobate thin film |
| 02/22/2012 | CN102360670A Composite material with ferrite magnetic layer and amorphous soft magnetic core as well as preparation method thereof |
| 02/22/2012 | CN102360669A Magnetic sensing composite material of inorganic material layer and amorphous soft magnetic core and preparation method thereof |
| 02/22/2012 | CN102360667A Amorphous nanocrystalline soft magnetic magneto-sensitive composite material for sensing and preparation method thereof |
| 02/22/2012 | CN102360666A Magnetically sensitive composite wire and preparation method thereof |
| 02/22/2012 | CN102358937A Continuous preparation method of cermet conposite membrane with large-area flexible metal substrate and high heat absorption |
| 02/22/2012 | CN102358936A Preparation method of photonic crystal multilayer film |
| 02/22/2012 | CN102358935A Method for preparing arsenium target by coating and hot pressing |
| 02/22/2012 | CN102013279B 氧化铟锡靶材浆料的制备方法 Preparation of a slurry of indium tin oxide target |
| 02/22/2012 | CN101970712B 溅射设备 Sputtering Equipment |
| 02/22/2012 | CN101962751B 一种多步物理气相沉积设备 A multi-step PVD |
| 02/22/2012 | CN101949005B 一种用于真空磁控溅射的香槟色金靶材及其制备方法 Champagne gold targets and preparation method for vacuum magnetron sputtering |
| 02/22/2012 | CN101932748B 蒸镀膜的形成方法 The method for forming a deposited film |
| 02/22/2012 | CN101624295B 氮化钨基三元纳米复合超硬薄膜材料及其制备方法 Tungsten nitride-based three yuan Nanocomposite Thin Films and its preparation method |
| 02/22/2012 | CN101619437B 硅基金属合金薄膜、具该薄膜的外壳和电子装置及制造方法 Silicon-metal alloy thin film, an electronic device having a housing and a method of manufacturing the film, and |
| 02/22/2012 | CN101543935B 靶材组件的制作方法 Target component production methods |
| 02/22/2012 | CN101298662B 用于加工和观测样品的设备以及加工和观测截面的方法 Sample processing and observation apparatus and a method for processing and observing a cross-sectional |
| 02/22/2012 | CN101164773B 涂层切削刀具 Coated cutting tool |
| 02/21/2012 | US8119571 High performance electrical, magnetic, electromagnetic and electrooptical devices enabled by three dimensionally ordered nanodots and nanorods |
| 02/21/2012 | US8119208 Enclosure; vacuum pump; sample holder ; supplying gaseous or vaporized material; controlling potential |
| 02/21/2012 | US8119204 Film formation method and method for manufacturing light-emitting device |
| 02/21/2012 | US8119190 Method for applying electrode mixture paste and application apparatus |
| 02/21/2012 | US8119189 Method of manufacturing a display device |
| 02/21/2012 | US8118989 Methods of bonding pure rhenium to a substrate |
| 02/21/2012 | US8118984 Sintered sputtering target made of refractory metals |
| 02/21/2012 | US8118982 Gas flow set-up for multiple, interacting reactive sputter sources |
| 02/21/2012 | US8118981 Sputtering apparatus and method for controlling the same |
| 02/21/2012 | US8118936 Method and apparatus for an improved baffle plate in a plasma processing system |
| 02/21/2012 | US8117985 Laser cladding device with an improved nozzle |
| 02/21/2012 | CA2412265C Thermal barrier coating |
| 02/16/2012 | WO2012020662A1 Tantalum spattering target |
| 02/16/2012 | WO2012020638A1 Method for manufacturing piezoelectric thin film element, piezoelectric thin film element, and member for piezoelectric thin film element |
| 02/16/2012 | WO2012020631A1 Tantalum spattering target |
| 02/16/2012 | WO2012019982A1 Thermoplastic moulding compositions with improved adhesion of electroplated metal layer |
| 02/16/2012 | WO2012019882A1 Method and use of a device for producing a layer of an organic material on a substrate |
| 02/16/2012 | US20120040516 Method and device for depositing semiconductor film on substrate using close-spaced sublimation process |
| 02/16/2012 | US20120040485 Thermal management of film deposition processes |
| 02/16/2012 | US20120040273 Proton conductive inorganic thin film, method of forming the same, and fuel cell including the proton conductive inorganic thin film |
| 02/16/2012 | US20120040233 Barrier for thin film lithium batteries made on flexible substrates and related methods |
| 02/16/2012 | US20120040163 Coating, article coated with coating, and method for manufacturing article |
| 02/16/2012 | US20120040160 Method of making heat treated and ion-beam etched/milled coated article using diamond-like carbon (dlc) protective film |
| 02/16/2012 | US20120040140 Multi-layered article and method of fabricating the same |
| 02/16/2012 | US20120040136 Ceramic coating, article coated with coating, and method for manufacturing article |
| 02/16/2012 | US20120038713 Piezoelectric film and method of manufacturing same, piezoelectric device and liquid ejection apparatus |
| 02/16/2012 | US20120038050 Sputtering target |
| 02/16/2012 | US20120037504 Multiply Divided Anode Wall Type Plasma Generating Apparatus and Plasma Processing Apparatus |
| 02/16/2012 | US20120037503 Rotatable sputter target base, rotatable sputter target, coating installation, method of producing a rotatable sputter target, target base connection means, and method of connecting a rotatable target base device for sputtering installations to a target base support |
| 02/16/2012 | US20120037502 Sintered Body for ZnO-Ga2O3-Based Sputtering Target and Method of Producing the Same |
| 02/16/2012 | US20120037501 Tantalum Sputtering Target |
| 02/16/2012 | US20120037500 Hollow target assembly |
| 02/16/2012 | US20120037493 Arc evaporation source and film forming method using the same |
| 02/16/2012 | US20120037492 Magnet transportation system, sputtering apparatus including the same and sputtering method |
| 02/16/2012 | US20120037077 Large area deposition in high vacuum with high thickness uniformity |
| 02/16/2012 | US20120037076 Multi-environment coating device |
| 02/16/2012 | DE102011052540A1 Mehrschichtiger Gegenstand und Verfahren zu seiner Herstellung The multilayer article and process for its preparation |
| 02/16/2012 | DE102011007632B3 Device useful for depositing material layer derived from process gas on substrate disc, comprises reactor chamber, which is bound by upper cover, lower cover and side wall, susceptor, preheat ring, chuck, and spacer |
| 02/16/2012 | DE102010043204A1 Verfahren und Verwendung einer Vorrichtung zur Erzeugung einer Schicht eines organischen Materials auf einem Substrat The method and use of an apparatus for producing a layer of organic material onto a substrate |
| 02/16/2012 | DE102010029689B4 Elektronenstrahlverdampfer und dazugehöriges Betriebsverfahren Electron beam evaporator and associated operational procedures |
| 02/16/2012 | DE102010007111B4 Verfahren und Pulvermischung zur Beschichtung von Substraten aus der Dampfphase The method and powder mixture for coating substrates from the vapor phase |
| 02/16/2012 | DE102010002688B4 Schraubendruckfeder für einen Ölabstreifring eines Kolbens in einem Verbrennungsmotor und Verfahren zur Beschichtung einer Schraubendruckfeder Helical compression spring for an oil scraper ring of a piston in an internal combustion engine and method for coating a helical compression spring |
| 02/16/2012 | DE102010002687B4 Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring A method of coating at least the inner surface of a piston ring and piston ring |
| 02/16/2012 | DE102008034145B4 Sputtertarget aus einer Legierung auf Al-Basis des Al-Ni-La-Si- Systems und Verfahren zu dessen Herstellung Sputtering target of an alloy of Al-based Al-Ni-La-Si system, and method for its production |
| 02/16/2012 | DE102008026001B4 Verfahren und Vorrichtung zur Erzeugung und Bearbeitung von Schichten auf Substraten unter definierter Prozessatmosphäre und Heizelement Method and apparatus for creating and editing layers on substrates with defined process atmosphere and heating elements |
| 02/16/2012 | DE102008015078B4 Vakuumverdampfer Vacuum evaporator |
| 02/16/2012 | DE102004043550B4 Verschleißfeste Beschichtung, ihre Verwendung und Verfahren zur Herstellung derselben A wear-resistant coating, their use and method for producing the same |
| 02/16/2012 | DE10035719B4 Verfahren zum Herstellen von intermetallischen Sputtertargets A method for producing of intermetallic sputter targets |
| 02/15/2012 | EP2418722A1 Proton conductive inorganic thin film, method of forming the same, and fuel cell including the proton conductive inorganic thin film |
| 02/15/2012 | EP2418545A1 Mask carrier, mask handling module and method for adjusting a mask |
| 02/15/2012 | EP2418299A1 Tantalum sputtering target |
| 02/15/2012 | EP2418298A1 Method for producing a urea coating on metallic, ceramic or hard metallic components and a urea coating produced according to the method |
| 02/15/2012 | EP2417282A1 Plain copper foodware and metal articles with durable and tarnish free multilayer ceramic coating and method of making |
| 02/15/2012 | EP2417280A2 Production method with thermal projection of a target |
| 02/15/2012 | CN202144513U 真空设备的转轴装置 Spindle apparatus of a vacuum device |
| 02/15/2012 | CN202144512U Vapor deposition source and vapor deposition equipment |
| 02/15/2012 | CN202144511U 一种蒸镀用的油屏蔽装置 An oil with a vapor barrier means |
| 02/15/2012 | CN102356180A Lanthanum target for sputtering |
| 02/15/2012 | CN102356179A Tantalum sputtering target |
| 02/15/2012 | CN102356178A Charged particle beam pvd device, shielding device, coating chamber for coating substrates, and method of coating |
| 02/15/2012 | CN102356177A Covering member for preventing erosion |
| 02/15/2012 | CN102354658A Method of manufacturing thin film transistor |
| 02/15/2012 | CN102353687A Preparation method of Al sample film for ultrafast electronic diffraction instrument |
| 02/15/2012 | CN102353165A Solar flat plate collector board core and manufacturing method thereof |
| 02/15/2012 | CN102353164A High-temperature solar selective absorption coating and preparation method thereof |
| 02/15/2012 | CN102352845A 20CrMnTi compressor blade through composite surface modification and preparation process thereof |
| 02/15/2012 | CN102352512A Method for preparing high-adhesion diamond coating with pulse laser |
| 02/15/2012 | CN102352489A Method for preparing anti-fingerprint film for touch screen |
| 02/15/2012 | CN102352487A Preparation method of silicon quantum dot doped nano titanium dioxide film composite material |
| 02/15/2012 | CN102352486A Magnetron sputtering target with adjustable magnetic shoe |
| 02/15/2012 | CN102352485A Preparation method of Si-doped AlN diluted magnetic semiconductor film |
| 02/15/2012 | CN102352484A Method for preparing titanium-doped zinc oxide transparent conductive film on polyethylene terephthalate (PET) flexible substrate |
| 02/15/2012 | CN102352483A Preparation method of silicon-aluminium alloy hollow rotary target for vacuum sputtering coating |
| 02/15/2012 | CN102352482A Preparation method for Ni-Cr-Si sputtering targets for metal resistance films |
| 02/15/2012 | CN102352481A Method for ion vacuum plating of titanium composition |