Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23C - Coating metallic material; Coating material with metallic material; Surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general › C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
03/2012
03/28/2012CN102392215A Preparation method of polycrystalline zinc nitride film
03/28/2012CN102392214A Radiofrequency power supply used for vacuum coating
03/28/2012CN102390607A Anti-static wrapper for electronic component wrapping, coated with nano film and manufacturing method thereof
03/28/2012CN102108485B Method for preparing antibacterial coating on surface of plastic
03/28/2012CN102054897B Method for preparing thin film solar cell from multi-element alloy single target material
03/28/2012CN101964368B Laminated solar battery and manufacturing method thereof
03/28/2012CN101845629B Composite process for plating molybdenum plate with ruthenium
03/28/2012CN101643892B Sputtering tool
03/28/2012CN101600815B Deposition apparatus, deposition method and deposition apparatus manufacturing method
03/28/2012CN101517119B Hard coating film excellent in lubrication characteristics, process for formation thereof, and tool for the plastic working of metal
03/28/2012CN101405430B Ternary aluminum alloy films and targets
03/28/2012CN101395296B Sputtering target
03/28/2012CN101376963B Ag-based alloy sputtering target
03/28/2012CN101286422B A light sensitive press key and manufacturing method therefor
03/27/2012US8143595 Ion implanter
03/27/2012US8142989 Textured chamber surface
03/27/2012US8142622 Coated article with low-E coating including IR reflecting layer(s) and corresponding method
03/27/2012CA2583683C Surface reconstruction method for silicon carbide substrate
03/22/2012WO2012037007A2 Method for extending lifetime of an ion source
03/22/2012WO2012036936A2 Methods for depositing metal in high aspect ratio features
03/22/2012WO2012036720A1 Coated article having boron doped zinc oxide based seed layer with enhanced durability under functional layer and method of making the same
03/22/2012WO2012036718A1 Improved method of co-sputtering alloys and compounds using a dual c-mag cathode arrangement and corresponding apparatus
03/22/2012WO2012036525A2 Method for improving hydrophilicity of a coating film through treatment on a surface morphology and super hydrophilic glass coating layer produced by the method
03/22/2012WO2012036079A1 Manufacturing method for semiconductor device
03/22/2012WO2012035970A1 Magnetic field generator, magnetron cathode, and sputtering device
03/22/2012WO2012035603A1 Magnetic field generating device, magnetron cathode, and sputter device
03/22/2012WO2012034587A1 A system and a method for processing a flexible substrate
03/22/2012WO2012001321A3 Method for treating an elastomeric surface of a device for dispensing a fluid product
03/22/2012US20120071003 Vacuum Processing Apparatus, Vacuum Processing Method, and Micro-Machining Apparatus
03/22/2012US20120070741 High capacity battery electrode structures
03/22/2012US20120070693 Magnetic sensor stack body, method of forming the same, film formation control program, and recording medium
03/22/2012US20120070672 Coated article having boron doped zinc oxide based seed layer with enhanced durability under functional layer and method of making the same
03/22/2012US20120070653 Coated article and method for making the same
03/22/2012US20120070652 Coated article having zinc oxide seed layer with reduced stress under functional layer and method of making the same
03/22/2012US20120070589 Creation of magnetic field (vector potential) well for improved plasma deposition and resputtering uniformity
03/22/2012US20120070332 Sputtering target material
03/22/2012US20120069487 Stacked structure and method of manufacturing the same
03/22/2012US20120069442 Polymeric based lens comprising a hardening layer, an absorbent layer and interferential multi-layer and corresponding manufacturing method
03/22/2012US20120068130 Sputtering Target, Transparent Conductive Film, and Their Manufacturing Method
03/22/2012US20120067721 Target assembly
03/22/2012US20120067718 Method and apparatus for producing three dimensional nano and micro scale structures
03/22/2012US20120067717 Method of co-sputtering alloys and compounds using a dual C-MAG cathode arrangement and corresponding apparatus
03/22/2012DE102010045670A1 Device, useful for the thermal protection of feed through in and out of process chamber, comprising disc shaped cooling elements, which are held by connection means in spacing and mold to each other with recesses for the rod-shaped element
03/22/2012DE102010041110A1 Substrate treatment plant for treating e.g. glass substrate, has flap valve installed at vertical chamber wall or bulkhead wall, that is selectively opened and closed through opening for allowing passage of substrates
03/22/2012DE102008026000B4 Verfahren und Vorrichtung zur Beschichtung flächiger Substrate Method and apparatus for coating flat substrates
03/21/2012EP2431494A1 Barrier film for semiconductor wiring, sintered sputtering target, and method of manufacturing sputtering targets
03/21/2012EP2431493A1 Evaporation boat for vacuum vapor deposition and vacuum vapor deposition system
03/21/2012EP2430209A1 Process for synthesizing a thin film or composition layer via non-contact pressure containment
03/21/2012EP1690279B1 Plasma source with segmented magnetron cathode
03/21/2012EP1680527B1 Apparatus and process for high rate deposition of rutile titanium dioxide
03/21/2012CN202170363U 平板集热条带卧式镀膜机收、放卷室密封门 Horizontal flat-plate collector strip coating machine winding and rewinding room sealed door
03/21/2012CN202170362U 一种新型可调基片输送辊装置 A novel substrate transport roller means is adjustable
03/21/2012CN202170361U 真空镀膜装置 Vacuum coating apparatus
03/21/2012CN1795284B Ultra low residual reflection, low stress lens coating
03/21/2012CN102388160A Molded body, method for producing same, electronic device member, and electronic device
03/21/2012CN102387921A Molded body, method for producing same, electronic device member, and electronic device
03/21/2012CN102387676A Shell body and manufacture method thereof
03/21/2012CN102386326A Preparation method of copper nitride resistive material for high-density resistive random access memory
03/21/2012CN102386071A Electronic device, manufacturing method of electronic device, and sputtering target
03/21/2012CN102383129A Shell and manufacturing method thereof
03/21/2012CN102383104A Microspherical film preparation device and method of preparing boron carbide microspherical film and pellet by vacuum evaporation technique
03/21/2012CN102383103A Film coating bearing device and optical film coating equipment having same
03/21/2012CN102383102A Magnetic nano anti-dot array film and preparation method thereof
03/21/2012CN102383101A Composite vacuum plating method
03/21/2012CN102383100A Target capable of preventing stripping of reverse sputtered material and forming method of film layer
03/21/2012CN102383099A Method for manufacturing target material structure
03/21/2012CN102383098A Method for forming metal compound film
03/21/2012CN102383097A Method for preparing aluminum-silicon-copper films
03/21/2012CN102383096A System for assisting enhancement of electron beam physical vapor deposition by adopting electromagnetism to accelerate united plasma
03/21/2012CN102383095A Method for sputtering and deposition of aluminum nitride piezoelectric thin film on flexible substrate through room-temperature reaction
03/21/2012CN102383094A Shell and manufacturing method thereof
03/21/2012CN102383093A Coating, covered element having coating and preparation method of covered element
03/21/2012CN102383092A Coating, coated part with same and preparation of coated part
03/21/2012CN102383091A Method for producing functional film
03/21/2012CN102383090A Vapor phase deposition material for forming film, film sheet with the film, and laminated sheet
03/21/2012CN102383089A Manufacturing method of separation deposition membrane layer
03/21/2012CN102382648A Method for enhancing photosynthesis spectral intensity of LED phosphor by using plasma
03/21/2012CN101942638B Preparation method of bionic controllable adhesive hydrophobic gold surface
03/21/2012CN101921990B Ion implanter
03/21/2012CN101880856B Equipment for performing local vacuum evaporation on printing material
03/21/2012CN101818294B Nanometer composite phase-change material, preparation method and optimization method
03/21/2012CN101755071B Sputtering apparatus
03/21/2012CN101724824B Over-current protection device for physical vapor deposition heating system
03/21/2012CN101717914B Double-phase nano multi-layer chromium-aluminum nitride coating and deposition method thereof
03/21/2012CN101713065B Device for microwave plasma based low-energy ion implantation on internal surface of metal round pipe with small pipe diameter
03/21/2012CN101710493B Graphite radiating module and manufacturing process thereof
03/21/2012CN101688292B Low-refractive index film, method for forming the low-refractive index film, and antireflection film
03/21/2012CN101631893B Sputtering target material and sputtering target obtained by using the sputtering target material
03/21/2012CN101611165B Process for producing molybdenum-based sputtering target plate
03/21/2012CN101588912B Method for producing a nanostructure on a plastic surface
03/21/2012CN101572999B Method for forming conducting wire on insulated heat-conducting metal substrate in a vacuum sputtering way
03/21/2012CN101481789B Film coating system and isolation device thereof
03/21/2012CN101460873B Thin film for use as reflective film or semi-transmissive reflective film, sputtering target and optical recording medium
03/21/2012CN101413105B Membrane thickness modulation method for optimizing ZnO film field emission characteristic
03/21/2012CN101220460B Target device for sputtering
03/20/2012US8137868 Photomask blank, photomask, and methods of manufacturing the same
03/20/2012US8137867 Photomask blank, photomask, and methods of manufacturing the same
03/20/2012US8137763 Method of producing a layer of material on a support
03/20/2012US8137519 Sputtering cathode, sputtering apparatus provided with sputtering cathode, film-forming method, and method for manufacturing electronic device
03/20/2012US8137518 Magnetic shunts in tubular targets
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