Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
04/2012
04/11/2012CN102409312A 少落尘的真空磁控溅射镀膜设备 Less dust vacuum magnetron sputtering equipment
04/11/2012CN102409311A 一种阴极均匀性修正挡板 A cathode uniformity correction baffle
04/11/2012CN102409310A 柔性金属基底双靶共溅射连续镀制梯度金属陶瓷膜层方法 Flexible metal substrate coated dual target co-sputtering system of continuous gradient metallic ceramic coating method
04/11/2012CN102409309A 一种共格/半共格结构的Al/W 多层膜制备方法 Al / W multilayers method for preparing a coherent / semi-coherent structure
04/11/2012CN102409308A Preparation and heat treatment method of Ti-Mo-N multi-element film
04/11/2012CN102409307A Cutting tool with Ti-Mo-N multi-element surface film
04/11/2012CN102409306A Preparation method of Ti-Mo-N multi-element film
04/11/2012CN102409305A Preparation method B-C-N optical thin film
04/11/2012CN102409304A 聚焦反射镜的镀膜方法 Focusing mirror coating method
04/11/2012CN102409303A Target power loading method, target power supply and semiconductor processing equipment
04/11/2012CN102409302A 涂层、具有该涂层的被覆件及该被覆件的制备方法 Coating, the coating is prepared with a covering member and the covering member
04/11/2012CN102409301A Magnetron sputtering target structure
04/11/2012CN102409300A Oxide ceramic sputtering target and preparation method thereof and used brazing alloy
04/11/2012CN102409299A 一种氧化物陶瓷溅射靶及其制备方法和所用的钎焊合金 An oxide ceramic sputtering target and its preparation method and brazing alloys used
04/11/2012CN102409298A 第二代高温超导带材中超导层的连续化快速激光镀膜方法 The second-generation high-temperature superconducting tapes in continuous rapid laser deposition method superconducting layer
04/11/2012CN102409297A 第二代高温超导带材用的简化CeO<sub>2</sub>/LaZrO<sub>3</sub>复合隔离层及其制备方法 The second-generation high-temperature superconducting tapes with simplified CeO <sub> 2 </ sub> / LaZrO <sub> 3 </ sub> composite insulating layer and its preparation method
04/11/2012CN102409296A 真空蒸镀用镀材舟及真空蒸镀系统 Vacuum deposition plated timber boat and vacuum deposition system
04/11/2012CN102409295A 一种童车轮毂真空镀膜工艺 One kind of vacuum coating technology youngster wheel hub
04/11/2012CN102409294A Glass substrate thin film sputtering target and preparation method thereof
04/11/2012CN102409293A 一种氧化铝薄膜的制备方法 A film preparation of alumina
04/11/2012CN102409292A 强激光辐照碳纳米管连续合成制备金刚石薄膜方法和装置 Continuous synthesis of carbon nanotubes strong laser irradiation method and apparatus for preparing diamond films
04/11/2012CN102409291A 掺杂超细纳米结构金属粒子的金刚石薄膜制备方法与装置 Method and apparatus for preparing ultrafine diamond film doped nanostructured metal particles
04/11/2012CN102409290A Hard Ti-Mo-N multi-element thin film
04/11/2012CN102409289A Preparation method of B-C-N ternary film
04/11/2012CN102409288A 一种柔性材料的镀膜方法 A method of coating a flexible material
04/11/2012CN102406290A Fantastic artificial jewelry and preparation method thereof
04/11/2012CN101928921B 一种镀膜工件高温蒸镀硬膜的镀膜支撑机构 One kind of high-temperature vapor deposition coating the workpiece support mechanism dura coating
04/11/2012CN101880860B 一种不锈钢表面铜银渗镀层的制备方法 A surface coating penetration of copper and silver stainless steel preparation
04/11/2012CN101831611B 真空镀膜装置及镀膜方法 Vacuum coating equipment and coating method
04/11/2012CN101765676B 真空气相沉积材料的多用途载体及其方法 Multi-purpose vehicle and method for vacuum vapor deposition material
04/11/2012CN101736300B Magnetic control sputtering target
04/11/2012CN101307442B Method for making high-temperature articles
04/11/2012CN101128083B 等离子体生成装置、等离子体控制方法和基板制造方法 The plasma generating apparatus, the plasma control method and substrate manufacturing method
04/10/2012US8153281 Metalorganic chemical vapor deposition (MOCVD) process and apparatus to produce multi-layer high-temperature superconducting (HTS) coated tape
04/10/2012US8153207 Fine particle-containing body, fine particle-containing body manufacturing method, storage element, semiconductor device and electronic equipment
04/10/2012US8152976 AG-based alloy sputtering target
04/10/2012US8152975 Two target pieces configured for position and/or orientation switching after sputtering; simultaneous operation; uniform erosion minimizing waste
04/10/2012US8152972 Method for forming fine particles, method for forming concavities and convexities, and device for forming fine particles
04/10/2012US8151727 Perovskite-oxide film, piezoelectric device, and liquid discharge device
04/10/2012CA2675271C Method for coating a substrate, equipment for implementing said method and metal supply device for such equipment
04/05/2012WO2012044193A1 A method of extraction and purification of nucleic acids from liquid medium and a vessel of plastic for nucleic acids sorption from liquid medium
04/05/2012WO2012044054A2 Method for forming nanostructure for implementing highly transparent and super water-repellent surface
04/05/2012WO2012043885A1 Method for producing substrate for group iii nitride semiconductor element fabrication, method for producing group iii nitride semiconductor free-standing substrate or group iii nitride semiconductor element, and group iii nitride growth substrate
04/05/2012WO2012043732A1 Film forming method
04/05/2012WO2012043571A1 Sintered composite oxide, manufacturing method therefor, sputtering target, transparent conductive oxide film, and manufacturing method therefor
04/05/2012WO2012043570A1 Sintered oxide material, method for manufacturing same, sputtering target, oxide transparent electrically conductive film, method for manufacturing same, and solar cell
04/05/2012WO2012043490A1 Al alloy film, wiring structure having al alloy film, and sputtering target used in producing al alloy film
04/05/2012WO2012043487A1 Vapor deposition apparatus
04/05/2012WO2012043478A1 Film forming method and film forming device
04/05/2012WO2012043459A1 Cutting tool
04/05/2012WO2012043258A1 Vapor deposition method, vapor deposition device, and organic el display device
04/05/2012WO2012043228A1 High-hardness pre-hardened cold-rolled tool steel for surface pvd, method for producing same, and surface pvd method for same
04/05/2012WO2012043227A1 Method for producing molybdenum target
04/05/2012WO2012043150A1 Film-forming apparatus
04/05/2012WO2012042959A1 Cu-in-ga-se quaternary alloy sputtering target
04/05/2012WO2012042791A1 Tungsten target and method for producing same
04/05/2012WO2012041920A1 Coating substrates with an alloy by means of cathode sputtering
04/05/2012WO2012040993A1 Method for continuously producing flexible copper clad laminates
04/05/2012WO2012040986A1 Plasma processing apparatus
04/05/2012WO2012001325A3 Method for the surface treatment of a fluid product dispensing device
04/05/2012WO2011146673A3 High target utilization moving magnet planar magnetron scanning method
04/05/2012WO2011137448A3 Silicon-carbon nanostructured electrodes
04/05/2012US20120082828 Laser pattern mask and method for fabricating the same
04/05/2012US20120082800 Method for manufacturing magnetic recording medium
04/05/2012US20120080407 Multi-Source Plasma Focused Ion Beam System
04/05/2012US20120080309 Systems and methods for forming a layer of sputtered material
04/05/2012US20120080308 Plume steering
04/05/2012US20120080307 Ion beam distribution
04/05/2012US20120080306 Photovoltaic device and method for making
04/05/2012US20120080090 Transparent conductor film stack with cadmium stannate, corresponding photovoltaic device, and method of making same
04/05/2012DE102010047197A1 Corrosion-prone material made work piece for use during manufacture of motor vehicle e.g. car, has protection layer whose edge portions are coated with physical vapor deposition coating
04/05/2012DE102010041858A1 Controlling layer thickness during the coating of substrates in vacuum, comprises determining growth of the layer on a substrate in a vacuum coating system
04/05/2012DE102010017354A9 Verfahren zum Herstellen eines warmgeformten und gehärteten, mit einer metallischen Korrosionsschutzbeschichtung überzogenen Stahlbauteils aus einem Stahlflachprodukt A method for producing a thermoformed and cured, coated with a metallic anti-corrosion coating the steel member from a steel flat product
04/04/2012EP2436800A1 High-throughput deposition system for oxide thin film growth by reactive coevaporation
04/04/2012EP2436799A1 Sintered body target and method for producing sintered body
04/04/2012EP2436798A1 Masking material, masking device, method for masking a substrate and method for coating a substrate
04/04/2012EP2435603A1 Method for producing a flat steel product and flat steel product
04/04/2012EP2435602A1 Coating method
04/04/2012EP2434993A1 Method for producing a medical functional element comprising a self-supporting lattice structure
04/04/2012EP1401013B1 Plasma processing device
04/04/2012CN202181349U 真空镀膜自动转换装置 Vacuum coating automatic switching device
04/04/2012CN202181348U 往复式连续镀膜装置 Reciprocating continuous coating apparatus
04/04/2012CN202181347U 改进真空镀膜机传动机构 Improved transmission mechanism of Vacuum Coaters
04/04/2012CN202181346U 一种阴极电弧蒸发源非接触式直流高压电引弧装置 DC high voltage source non-contact ignition device for cathodic arc evaporation
04/04/2012CN202181345U 真空磁控溅射的旋转靶装置 Rotary vacuum magnetron sputtering of the target device
04/04/2012CN202181344U 真空镀膜装置 Vacuum coating apparatus
04/04/2012CN202181343U 带表面活化的连续真空溅镀装置 Continuous vacuum sputtering with a surface activation device
04/04/2012CN202181342U 气流封隔门阀装置 Packer patriarch airflow device
04/04/2012CN202181341U 用于真空溅镀的气体混合控制装置 Gas mixture for controlling the vacuum sputtering apparatus
04/04/2012CN202181340U 真空镀膜机转动机构 Vacuum coating machines rotating mechanism
04/04/2012CN202181339U 一种镀膜机真空室 One kind of coating machine vacuum chamber
04/04/2012CN1846988B 阻气性薄膜和使用其的有机器件 The gas barrier film and the organic device using the same
04/04/2012CN102405303A 溅射靶材料、其制备方法、及使用其制备的薄膜 A sputtering target material, preparation method, and use of the film for its preparation
04/04/2012CN102405302A 特征在于锥形沉积室中密度优化的hula衬底支架的剥离沉积系统 Characterized by peeling cone deposition chamber deposition system optimization hula density substrate holder
04/04/2012CN102403465A 有机电致发光用掩模 Organic electroluminescence mask
04/04/2012CN102400108A 薄膜沉积机台及其承载件 Thin film deposition machine and its carrier
04/04/2012CN102400107A 磁控溅射源及磁控溅射设备 Magnetron sputtering source and magnetron sputtering equipment
04/04/2012CN102400106A 磁控源和磁控溅射设备、以及磁控溅射方法 Magnetron source and magnetron sputtering equipment, and magnetron sputtering
04/04/2012CN102400105A 旋转接头以及溅射装置 Rotary joint and sputtering apparatus
04/04/2012CN102400104A 加热器用反射板 Heater reflector plate