Patents for C23C 14 - Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material (67,378)
06/2012
06/07/2012US20120138457 Encapsulated sputtering target
06/07/2012US20120138453 Silicon target for sputtering film formation and method for forming silicon-containing thin film
06/07/2012US20120138452 Method and Apparatus for Super-High Rate Deposition
06/07/2012US20120138451 In-mould molding touch module and method for manufacturing the same
06/07/2012US20120138385 Acoustic resistance member and method for making the same
06/07/2012US20120137974 Method and Apparatus For Application of Metallic Alloy Coatings
06/07/2012US20120137971 Hydrophobic property alteration using ion implantation
06/06/2012EP2461387A1 Vapor deposition material for organic device and method for manufacturing organic device
06/06/2012EP2461354A1 Semiconductor device and manufacturing method therefor
06/06/2012EP2460908A1 Sanitary item
06/06/2012EP2460907A1 Vapor deposition device for optical lenses
06/06/2012EP2460197A2 Superconducting article with prefabricated nanostructure for improved flux pinning
06/06/2012EP2460174A1 Plasma stamp and method for plasma treating a surface
06/06/2012DE102011000752B3 Verfahren zum Herstellen eines Dünnfilms aus Blei-Zirkonat-Titanat, elektronisches Bauteil mit dem Dünnfilm und Verwendung des Bauteils A method of manufacturing a thin film of lead zirconate titanate, electronic component with the thin film and use of the component
06/06/2012CN202265606U 金属带材真空密封装置 Vacuum sealing means of the metal strip
06/06/2012CN202265605U 真空镀膜机工件架 Vacuum coating machine the workpiece holder
06/06/2012CN202265604U 金属板带立式真空镀膜设备 Metal plate with vertical vacuum coating equipment
06/06/2012CN202265603U 真空镀铝机的蒸发舟电极 Aluminum vacuum evaporation boat electrode machine
06/06/2012CN102487590A Housing and method for manufacturing the same
06/06/2012CN102486465A Multifunctional ion beam sputtering and etching and in-situ physical property analysis system
06/06/2012CN102485959A Metal porous material and preparation method of the metal porous material
06/06/2012CN102485955A Method for preparing thin silicon steel strip through vacuum film plating
06/06/2012CN102485950A Film-coated part and preparation method thereof
06/06/2012CN102485949A Film forming device, film forming substrate manufacturing method and film forming substrate
06/06/2012CN102485948A FeCoTaZr alloy sputtering target material and manufacture method thereof
06/06/2012CN102485947A Control system of oxygen content of sputtering target surface, probe and method for producing PET plate coated with ITO film
06/06/2012CN102485946A Target material used for rearview mirror, rearview mirror and its manufacture method
06/06/2012CN102485945A Porous silicon material and preparation method thereof
06/06/2012CN102485944A Epitaxial structure having epitaxial defect barrier layer
06/06/2012CN102485943A Housing and manufacture method thereof
06/06/2012CN102485942A Metal member and manufacturing method thereof
06/06/2012CN102485941A Coating member and manufacture method thereof
06/06/2012CN102485940A Shell and method for producing the same
06/06/2012CN102485939A Plated film member and its preparation method
06/06/2012CN102485938A Part coated with anti-fingerprint coating and its manufacturing method
06/06/2012CN102485937A Deposition device and method of film pattern
06/06/2012CN102485936A Shell and manufacture method thereof
06/06/2012CN102485935A Vapor chamber and substrate processing equipment applied with the vapor chamber
06/06/2012CN102485378A Preparation method of ruthenium metal sputtering target material
06/06/2012CN102485356A Method for removing contamination particles on electrostatic chuck in process chamber
06/06/2012CN101994089B Method for forming antifouling layers of workpieces by utilizing continuous vacuum sputtering coating equipment
06/06/2012CN101884006B Process for producing liquid crystal display device
06/06/2012CN101805883B Film plating plate and preparation method thereof
06/06/2012CN101704124B Surface processing method of large-size sputtering target material
06/06/2012CN101660124B Preparing method of porous tungsten oxide film
06/06/2012CN101654770B Production process for preparing indium tin oxide conductive film on flexible base material
06/06/2012CN101572997B Method for forming conducting wire on insulated heat-conducting metal substrate in a vacuum sputtering way
06/06/2012CN101409217B Method of forming an electrical circuit with overlaying integration layer
06/06/2012CN101368262B Method for coating surface
06/06/2012CN101248208B Holding assembly for handling lenses and method for finishing lenses
06/05/2012US8193623 Support with integrated deposit of gas absorbing material for manufacturing microelectronic, microoptoelectronic or micromechanical devices
06/05/2012US8192809 Scanning probe assisted localized CNT growth
06/05/2012US8192805 Method to improve electrical leakage performance and to minimize electromigration in semiconductor devices
06/05/2012US8192789 Method for manufacture and structure of multiple electrochemistries and energy gathering components within a unified structure
06/05/2012US8192652 Tin-doped indium oxide thin films and method for making same
06/05/2012US8192598 End-block for a magnetron device with a rotatable target, and vacuum coating apparatus
06/05/2012US8192597 Coating apparatus
06/05/2012US8192596 Electrolytic purification; anode, cathode partitioned with anion exchange membrane; anolyte intermittently, continuously extracted, added to active carbon treatment vessel with chlorine compounds; impurities precipitate as chlorides; filter; purity of 8N or higher from impure raw material
06/05/2012US8192592 Substrate with chalcogenide target containing germanium, antimony and tellurium; controlling temperature; sputtering
06/05/2012US8192576 Methods of and apparatus for measuring and controlling wafer potential in pulsed RF bias processing
06/05/2012US8192548 Arrangement for coating a substrate
05/2012
05/31/2012WO2012070894A2 Method for separating a target of a rotary target
05/31/2012WO2012070882A2 Bonding composition for a rotary target for sputtering and bonding method of a rotary target using same
05/31/2012WO2012070676A1 Oxide for semiconductor layer of thin-film transistor, spattering target, and thin-film transistor
05/31/2012WO2012070675A1 Oxide for semiconductor layer of thin-film transistor, spattering target, and thin-film transistor
05/31/2012WO2012070403A1 Disiloxane derivative having silacycloalkane structure, method for producing disiloxane derivative, film produced using disiloxane derivative, method for producing this film, and material and electronic device using this film
05/31/2012WO2012070290A1 Surface coated sintered body
05/31/2012WO2012070209A1 Photomask blank, process for production of photomask, and chromium-containing material film
05/31/2012WO2012070195A1 Sputtering method
05/31/2012WO2012069583A1 Apparatus for producing multilayer systems on tape-like substrates
05/31/2012WO2012069475A1 Coated cutting tool insert
05/31/2012WO2012069395A1 Vapour deposition
05/31/2012WO2012036936A3 Methods for depositing metal in high aspect ratio features
05/31/2012WO2012036525A3 Method for improving hydrophilicity of a coating film through treatment on a surface morphology and super hydrophilic glass coating layer produced by the method
05/31/2012WO2011056531A3 Manufacture of n-type chalcogenide compositions and their uses in photovoltaic devices
05/31/2012US20120135273 Structure and method for enhancing interfacial perpendicular anisotropy in CoFe(B)/MgO/CoFe(B) Magnetic Tunnel Junctions
05/31/2012US20120135269 Coated article and method for manufacturing
05/31/2012US20120135222 Aluminum article and method for manufacturing same
05/31/2012US20120135212 Coated article and method for making same
05/31/2012US20120135157 Coating and Ion Beam Mixing Apparatus and Method to Enhance the Corrosion Resistance of the Materials at the Elevated Temperature Using the Same
05/31/2012US20120132660 Device housing and method for making the same
05/31/2012US20120132523 Method of Manufacturing a Sputtering Target and Sputtering Target
05/31/2012US20120132522 Deposition/bonding chamber for encapsulated microdevices and method of use
05/31/2012US20120132518 Method for Predicting and Compensating Erosion in a Magnetron Sputtering Target
05/31/2012US20120132517 Method for coating a substrate in a vacuum chamber having a rotating magnetron
05/31/2012DE112004000651B4 Gleitelement Slider
05/31/2012DE102011119597A1 Verfahren und Vorrichtung zum Aufbringen von Schichten auf ein Bauteil Method and apparatus for application of layers to a component
05/31/2012DE102011005757B3 Manufacturing an optical scattering transparent conducting oxide layer on a substrate for solar cells/modules, by depositing the layer on the substrate, and structuring the layer surface by wet etching process
05/31/2012DE102010062114A1 Gleitelement, insbesondere Kolbenring, mit einer Beschichtung Sliding element, in particular piston ring with a coating
05/31/2012DE102010060910A1 Verfahren und Vorrichtung zur Ionenimplantation Method and apparatus for ion implantation
05/31/2012DE102010053722A1 Verfahren und Vorrichtung zur Herstellung von Deckelektroden auf organischen elektronischen Elementen Method and apparatus for the production of top electrodes on the organic electronic elements
05/31/2012DE102010052971A1 Werkstück mit Si-DLC Beschichtung und Verfahren zur Herstellung von Beschichtungen Workpiece with Si-DLC coating and process for the production of coatings
05/31/2012DE102010052761A1 Vorrichtung zum Beschichten eines Substrats An apparatus for coating a substrate
05/31/2012DE102010052687A1 Multi-layer, oxynitride layer system with cubic aluminum nitride and aluminum oxynitride on substrate such as hard metal, comprises a first layer, a second layer, an oxygen-containing third layer, and an oxygen-containing oxynitride layer
05/31/2012DE102010052341A1 Protection device on tube target in vacuum process chamber, useful for detecting its minimum cross-sectional minimum diameter predetermined by diameter, comprises radially directed capillary line running from interior of the tube target
05/31/2012DE102009038519B4 Verfahren und Vorrichtung zur Herstellung von Stöchiometriegradientenschichten Method and apparatus for the production of Stöchiometriegradientenschichten
05/31/2012DE102007052524B4 Transportmittel und Vakuumbeschichtungsanlage für Substrate unterschiedlicher Größe Transport equipment and vacuum coating system for substrates of different sizes
05/30/2012EP2458029A1 Film material and method for prediction of film material
05/30/2012EP2456905A1 Method for producing coatings with a single composite target
05/30/2012EP2456904A1 Method for producing a structured coating on a substrate, coated substrate, and semi-finished product having a coated substrate