| Patents for B23H 5 - Combined machining (1,281) |
|---|
| 06/27/2006 | US7067048 Method to improve the control of electro-polishing by use of a plating electrode an electrolyte bath |
| 06/27/2006 | US7066800 Conductive polishing article for electrochemical mechanical polishing |
| 06/22/2006 | WO2006065436A2 Gear surface treatment procedure |
| 06/22/2006 | US20060131185 Gear surface treatment procedure |
| 06/22/2006 | US20060131184 Electrochemical machining in which the linear oscillation of the electrode acting as a tool is superimposed by a circular oscillation, enabling the electrode to turn into the workpiece conformally with its shape; further forming by circular oscillation with circular feed in the and/or the other direction |
| 06/21/2006 | EP1672101A1 Process for the electrochemical removal of refractory metals or their alloys and use of a solution for this process |
| 06/15/2006 | US20060124474 Method and apparatus for local polishing control |
| 06/14/2006 | DE102005058934A1 Verfahren und Vorrichtung für das ELID-Schleifen des Düsentyps Method and apparatus for the ELID grinding of the nozzle type |
| 06/14/2006 | CN2787355Y Electrolytic machinery combined cutter for ultra-thick metal material |
| 06/14/2006 | CN1785566A Electric spark-mechanical compound shaping method of metal bindnig agent extra hard abradant sand wheel |
| 06/13/2006 | US7059948 Articles for polishing semiconductor substrates |
| 05/31/2006 | EP1381491B1 Conductive polishing article for electrochemical mechanical polishing |
| 05/11/2006 | WO2005092010A3 Chemical mechanical polishing retaining ring |
| 05/11/2006 | WO2005090648A3 Electrolytic processing apparatus and electrolytic processing method |
| 05/10/2006 | CN1771355A Method and apparatus for local polishing control |
| 05/02/2006 | US7037414 Photoelectrolysis of water using proton exchange membranes |
| 04/27/2006 | WO2006043688A1 Method of processing electrically conductive workpiece and combined processing apparatus |
| 04/26/2006 | EP1648658A2 Cell, system and article for electrochemical mechanical processing (ecmp) |
| 04/25/2006 | US7033464 Apparatus for electrochemically depositing a material onto a workpiece surface |
| 04/20/2006 | US20060081460 Method and apparatus for electrochemical planarization of a workpiece |
| 04/18/2006 | US7029365 Pad assembly for electrochemical mechanical processing |
| 04/13/2006 | WO2006039627A2 Active matrix electrochemical machining apparatus and method |
| 04/13/2006 | CA2582147A1 Active matrix electrochemical machining apparatus and method |
| 04/11/2006 | US7025861 Contact plating apparatus |
| 04/11/2006 | US7025860 Method and apparatus for the electrochemical deposition and removal of a material on a workpiece surface |
| 04/06/2006 | WO2006036412A1 Endpoint adjustment in electroprocessing |
| 04/06/2006 | US20060070887 Arrayed multi-electrode electrochemical machining apparatus and shaping an infinite variety of part surfaces fromstatic, generically-shaped cathode array.eliminate sacrificial stock for less energy/material consumption and higher accuracy; programmable control of the part surface profile by a computer |
| 04/04/2006 | US7021991 Polishing apparatus |
| 03/30/2006 | US20060065548 Method for removing lead sulfate film formed in lead-acid battery |
| 03/30/2006 | US20060065518 Method and apparatus for polishing an internal surface of an aluminum extrusion hollow shape |
| 03/29/2006 | EP1640113A1 Conductive polishing article for electrochemical mechanical polishing |
| 03/29/2006 | EP1638733A1 Polishing pad for electrochemical-mechanical polishing |
| 03/22/2006 | EP1637265A1 Rotation surface-reducing head, electrolytic surface-reducing device, and electrolytic surface-reducing method |
| 02/07/2006 | US6995089 Method to remove copper without pattern density effect |
| 02/07/2006 | US6994610 Electrolytic integrated polishing apparatus that integrates elution by electrolyte and abrasion by a grindstone and enables high precision polishing of the internal surface of a long sized cylindrical aluminum tube such as hydraulic cylinder |
| 01/31/2006 | US6991528 Polishing article for processing a substrate comprises a fabric layer having a conductive layer disposed thereover. The conductive layer has an exposed surface adapted to polish a substrate. The fabric layer may be woven or non-woven. The |
| 01/31/2006 | US6991526 Control of removal profile in electrochemically assisted CMP |
| 01/24/2006 | US6988942 Conductive polishing article for electrochemical mechanical polishing |
| 01/18/2006 | CN2751972Y Polishing product for processing base material |
| 01/12/2006 | US20060006074 Method and composition for polishing a substrate |
| 01/11/2006 | EP1613794A2 Algorithm for real-time process control of electro-polishing |
| 12/29/2005 | WO2005123317A1 Edge bead removal by an electro polishing process |
| 12/29/2005 | US20050284770 A multilayer pad having a ring-shaped upper polish layer and replaceable conductive layer; attaching to exterior power source; controlling the rate of copper material removal from printed circuits, determining each polishing time in each zone; tools for making semiconductors |
| 12/29/2005 | DE102005024406A1 Verfahren und System zur Herstellung von Komponenten A method and system for the production of components |
| 12/27/2005 | US6979248 Conductive polishing article for electrochemical mechanical polishing |
| 12/22/2005 | US20050282322 Retaining ring with conductive portion |
| 12/20/2005 | US6977036 includes a conductive polishing pad and an electrode having a spacer disposed therebetween; chemical mechanical polishing |
| 12/15/2005 | US20050274626 Polishing pad and polishing method |
| 12/15/2005 | US20050273999 Method and system for fabricating components |
| 12/14/2005 | CN1706580A Method and system for fabricating components |
| 12/13/2005 | US6974525 Method and apparatus for electrochemical planarization of a workpiece |
| 12/08/2005 | US20050269212 Method of making rolling electrical contact to wafer front surface |
| 12/01/2005 | US20050263406 Polishing pad for electrochemical mechanical polishing |
| 11/30/2005 | CN1702840A Polishing pad for electrochemical mechanical polishing |
| 11/23/2005 | CN1701136A Low-force electrochemical mechanical processing method and apparatus |
| 11/23/2005 | CN1700970A Control of removal profile in electrochemically assisted CMP |
| 11/16/2005 | EP1594656A1 Polishing article for electro-chemical mechanical polishing |
| 11/10/2005 | WO2005105356A2 Electrochemical mechanical planarization process and apparatus |
| 11/10/2005 | WO2005083159A3 Apparatus adapted for membrane mediated electropolishing |
| 11/08/2005 | US6962524 Conductive polishing article for electrochemical mechanical polishing |
| 11/03/2005 | US20050245086 Adaptive electropolishing using thickness measurement and removal of barrier and sacrificial layers |
| 11/02/2005 | CN2737501Y Polising product for processing base material |
| 10/27/2005 | US20050239283 Polishing method, polishing apparatus, and method of manufacturing semiconductor device |
| 10/26/2005 | CN1688411A Methods and apparatus for electromechanically and/or electrochemically removing conductive material from a microelectronic substrate |
| 10/26/2005 | CN1686652A Composite processing technology of fine injection type hole |
| 10/25/2005 | US6957511 Single-step electromechanical mechanical polishing on Ni-P plated discs |
| 10/20/2005 | US20050233578 Method and composition for polishing a substrate |
| 10/13/2005 | WO2005042810A3 Membrane -mediated electropolishing |
| 10/13/2005 | US20050227483 Planar metal electroprocessing |
| 10/13/2005 | US20050224368 Polishing system and polishing method |
| 10/06/2005 | WO2005093135A1 Electrolytic processing apparatus |
| 10/06/2005 | WO2005092010A2 Chemical mechanical polishing retaining ring |
| 10/06/2005 | US20050221608 Method for manufacturing semiconductor device and apparatus for manufacturing thereof |
| 10/06/2005 | US20050218010 Chelating agents, corrosion inhibitors, a suppresor, a solvent, a passivating polymer, and inorganic acid based electrolyte; minimal damage to the substrate during planarization; microelectronics |
| 10/06/2005 | US20050218009 Electrochemical planarization system and method of electrochemical planarization |
| 10/05/2005 | CN2730554Y Polishing-part for polishing substrate |
| 10/05/2005 | CN2730553Y Polishing-part for electrochemical mechanical polishing |
| 09/29/2005 | WO2005090648A2 Electrolytic processing apparatus and electrolytic processing method |
| 09/29/2005 | US20050215181 Chemical mechanical polishing retaining ring, apparatuses and methods incorporating same |
| 09/28/2005 | CN1220798C Pad designs and structures for universal material working equipment |
| 09/22/2005 | US20050205432 Method, an apparatus, a control system and a computer program to perform an automatic removal of cathode depositions during a bipolar electrochemical machining |
| 09/15/2005 | US20050199511 Semiconductor electrochemical etching processes employing closed loop control |
| 09/14/2005 | EP1573783A2 Adaptive electropolishing using thickness measurements and removal of barrier and sacrificial layers |
| 09/09/2005 | WO2005083159A2 Apparatus adapted for membrane mediated electropolishing |
| 09/09/2005 | WO2005082574A1 Methods and apparatuses for electrochemical-mechanical polishing |
| 09/08/2005 | US20050196963 Methods and apparatuses for electrochemical-mechanical polishing |
| 09/06/2005 | US6939457 Using rotating, electroconductive superabrasive grindstone; supplying direct current voltage |
| 08/25/2005 | US20050184596 Safety system for power equipment |
| 08/18/2005 | US20050178743 A multilayer pad having a plurality of independent electrical biasable zones, attaching to exterior power source from one layer; controlling the rate of copper material removal from printed circuits, determining each polishing time in each zone; electrical apparatus for making semiconductors |
| 08/18/2005 | US20050178672 electropolishing a metallic film formed on a substrate by passing an electric current to the metallic film; current passing electrode is used in non-contact state and no pressure is exerted on inter-layer insulation film at the time of passing the electric current, breakage of inter-layer insulation film |
| 08/17/2005 | CN1654148A Electric spark machining liquid storage case device for treatment fluid containing addition agent |
| 08/11/2005 | WO2005008806A3 Photoelectrolysis of water using proton exchange membranes |
| 08/11/2005 | US20050173259 Endpoint system for electro-chemical mechanical polishing |
| 08/11/2005 | US20050172487 Method for working nut screw for ball screw |
| 08/10/2005 | CN1653597A Substrate processing apparatus and substrate processing method |
| 08/10/2005 | CN1652898A Process control in electro-chemical mechanical polishing |
| 08/10/2005 | CN1214133C Method and apparatus for electrochemical mechanical deposition |
| 07/28/2005 | US20050161341 Electrochemical machining, applying different voltage potentials to different electrodes; supply a higher potential to the substrate edge, removing the copper conductive layer from the substrate edge; making semiconductor, integrated circuits |
| 07/27/2005 | CN1646649A Method and composition for polishing a substrate |
| 07/27/2005 | CN1646264A Methods and apparatus for electrochemical-mechanical processing of microelectronic workpieces |