| Patents for B08B 6 - Cleaning by electrostatic means (1,400) |
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| 05/03/2007 | US20070095282 Apparatus for manufacturing semiconductor device with pump unit and method for cleaning the pump unit |
| 04/24/2007 | US7207339 Method for cleaning a plasma enhanced CVD chamber |
| 04/19/2007 | US20070084481 System and method of cleaning substrates using a subambient process solution |
| 04/12/2007 | WO2007005197A3 Removal of residues for low-k dielectric materials in wafer processing |
| 04/10/2007 | US7202951 Laser-based cleaning device for film analysis tool |
| 04/10/2007 | US7201174 Silicon oxyfluoride film is formed on a wafer using a plasma vapor deposition method; film remaining inside chamber is cleaned up using a gas containing nitrogen trifluoride |
| 04/05/2007 | WO2007038427A2 Method and apparatus for electronic device manufacture using shadow masks |
| 04/05/2007 | US20070074745 Exhaust system for use in processing a substrate |
| 04/05/2007 | US20070074737 Method of surface treatment of composite material structures with atmospheric plasma beams |
| 04/03/2007 | US7198660 Electrostatic device for ionic air emission |
| 03/29/2007 | US20070068559 Method and apparatus for electronic device manufacture using shadow masks |
| 03/27/2007 | US7195021 In-situ cleaning of light source collector optics |
| 03/22/2007 | US20070062558 Apparatus and method for surface treatment to substrate |
| 03/22/2007 | US20070062557 Lithographic apparatus comprising an electrical discharge generator and method for cleaning an element of a lithographic apparatus |
| 03/21/2007 | CN1934221A Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers |
| 03/15/2007 | US20070056605 Megasonic cleaning using supersaturated solution |
| 03/13/2007 | US7188630 Method to passivate conductive surfaces during semiconductor processing |
| 03/08/2007 | US20070054496 Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof |
| 03/08/2007 | US20070052697 Method and system for detecting a body in a zone located proximate an interface |
| 03/08/2007 | US20070051699 Methods of removing metal contaminants from a component for a plasma processing apparatus |
| 03/08/2007 | US20070051470 Plasma processing apparatus and method |
| 03/08/2007 | US20070051388 Apparatus and methods for using high frequency chokes in a substrate deposition apparatus |
| 03/08/2007 | US20070051387 Method of cleaning plasma applicator in situ and plasma applicator employing the same |
| 03/07/2007 | EP1759776A1 Static charge and dust removing device |
| 03/06/2007 | US7186299 Method of rinsing and drying semiconductor substrates |
| 02/27/2007 | US7182205 Magnet sweep |
| 02/22/2007 | WO2005099917A3 Flat surface washing apparatus |
| 02/22/2007 | US20070040999 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus |
| 02/21/2007 | CN2872733Y Intelligent high-voltage silicon rectifier voltage adjuster for electric dust collector |
| 02/14/2007 | EP1750862A2 Pharmaceutical composition containing irbesartan |
| 02/08/2007 | WO2006125426A8 Device for cleaning the interior of vacuum chambers |
| 02/08/2007 | US20070028944 Method of using NF3 for removing surface deposits |
| 02/08/2007 | US20070028943 Method of using sulfur fluoride for removing surface deposits |
| 02/07/2007 | CN1910059A Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 02/07/2007 | CN1298827C Aqueous stripping and cleaning composition |
| 02/01/2007 | US20070023066 Multilayer substrate cleaning method, substrate bonding method, and bonded wafer manufacturing method |
| 02/01/2007 | US20070023065 Method of removing particles on an object, apparatus for performing the removing method, method of measuring particles on an object and apparatus for performing the measuring method |
| 01/30/2007 | US7170190 Apparatus for oscillating a head and methods for implementing the same |
| 01/25/2007 | WO2006096814A3 Method and system for processing substrates with sonic energy that reduces or eliminates damage to semiconductor devices |
| 01/25/2007 | US20070017548 System and method for cleaning or sanitizing items intended for re-use |
| 01/23/2007 | US7165560 Oxidizing an incompletely oxidized compound containing at least a metal and silicon and formed on a surface of a substrate; removing the oxidized compound by wet etching,wherein first step includes irradiating the compound with ultraviolet light in an oxygen-containing atmosphere |
| 01/18/2007 | WO2007007731A1 Apparatus for removing foreign material from substrate and method for removing foreign material from substrate |
| 01/18/2007 | WO2006083693B1 Etchant treatment processes for substrate surfaces and chamber surfaces |
| 01/18/2007 | WO2006079335A3 Method and device for treating surfaces of materials by means of radiation while using an electrostatic field |
| 01/18/2007 | US20070012337 In-line metrology for supercritical fluid processing |
| 01/18/2007 | US20070012335 Photomask cleaning using vacuum ultraviolet (VUV) light cleaning |
| 01/17/2007 | EP1565592B1 Method for cleaning a process chamber |
| 01/16/2007 | US7163018 Single wafer cleaning method to reduce particle defects on a wafer surface |
| 01/16/2007 | US7163017 Polysilicon etch useful during the manufacture of a semiconductor device |
| 01/11/2007 | US20070006893 Free radical initiator in remote plasma chamber clean |
| 01/11/2007 | US20070006892 Uniform, far-field megasonic cleaning method and apparatus |
| 01/03/2007 | CN1890034A Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon |
| 12/28/2006 | US20060289034 Compositions containing free radical quenchers |
| 12/28/2006 | US20060289033 Method of cleaning semiconductor surfaces |
| 12/27/2006 | CN2852523Y High-frequency high-voltage power supply for electrical dust collection |
| 12/27/2006 | CN2852517Y High power automatic high-frequency high-voltage constant-current direct current power supply |
| 12/21/2006 | WO2006135453A1 Method and apparatus for cleaning vehicles |
| 12/21/2006 | US20060286806 Plasma etching method and plasma etching apparatus |
| 12/21/2006 | CA2611614A1 Method and apparatus for cleaning vehicles |
| 12/20/2006 | CN1882397A Cleaning masks |
| 12/14/2006 | WO2006130963A1 Portable dusting tool |
| 12/14/2006 | US20060279222 Dense fluid delivery apparatus |
| 12/14/2006 | US20060278254 Method and apparatus for treating a substrate with dense fluid and plasma |
| 12/14/2006 | US20060278253 Method and apparatus for wafer cleaning |
| 12/13/2006 | EP1729896A2 Flat surface washing apparatus |
| 12/12/2006 | US7147723 Electroconductive means in contact with segments of cleaning target; grounding means |
| 12/12/2006 | US7147722 Method for in-situ cleaning of carbon contaminated surfaces |
| 12/07/2006 | WO2006083693A3 Etchant treatment processes for substrate surfaces and chamber surfaces |
| 12/07/2006 | US20060272675 Method and apparatus for cleaning and surface conditioning objects using plasma |
| 12/07/2006 | US20060272674 Method and apparatus for cleaning and surface conditioning objects using plasma |
| 12/07/2006 | US20060272673 Method and apparatus for cleaning and surface conditioning objects using plasma |
| 11/30/2006 | WO2006125426A1 Device for cleaning the interior of vacuum chambers |
| 11/30/2006 | WO2006050332A3 Method, apparatus, and system for bi-solvent based cleaning of precision components |
| 11/30/2006 | US20060270242 Cleaning method and solution for cleaning a wafer in a single wafer process |
| 11/30/2006 | US20060266392 Method and apparatus for wafer cleaning |
| 11/30/2006 | US20060266288 High plasma utilization for remote plasma clean |
| 11/29/2006 | EP1725344A2 System, method and apparatus for self-cleaning dry etch |
| 11/28/2006 | US7141123 Method of and apparatus for removing contaminants from surface of a substrate |
| 11/23/2006 | US20060264051 Method for formng impurity-introduced layer, method for cleaning object to be processed apparatus for introducing impurity and method for producing device |
| 11/23/2006 | US20060260937 Interior antenna for substrate processing chamber |
| 11/23/2006 | US20060260645 Methods and apparatus for processing wafers |
| 11/23/2006 | US20060260644 Method and apparatus for wafer cleaning |
| 11/23/2006 | US20060260643 Method and apparatus for wafer cleaning |
| 11/23/2006 | US20060260642 Method and apparatus for wafer cleaning |
| 11/23/2006 | US20060260640 Method of manufacturing external panel of laundry treatment apparatus, and pattern formation apparatus and cleaning apparatus of the external panel |
| 11/22/2006 | CN2840508Y High frequency high voltage DC power supply for electric dust-cleaner |
| 11/16/2006 | US20060254614 Deposition tool cleaning process having a moving plasma zone |
| 11/16/2006 | US20060254613 Method and process for reactive gas cleaning of tool parts |
| 11/16/2006 | US20060254612 Polar fluid removal from surfaces using supercritical fluids |
| 11/16/2006 | US20060254611 Acid-free cleaning process for substrates, in particular masks and mask blanks |
| 11/02/2006 | WO2006115542A2 Method and apparatus for cleaning and surface conditioning objects with plasma |
| 10/26/2006 | US20060237030 Method and apparatus for cleaning and surface conditioning objects with plasma |
| 10/25/2006 | CN1852778A Method and apparatus for dispensing a rinse solution on a substrate |
| 10/19/2006 | WO2006047226A3 Ultrasonic optical cleaning system |
| 10/19/2006 | US20060231207 System and method for surface treatment |
| 10/19/2006 | US20060231119 Apparatus and method for cleaning a substrate |
| 10/18/2006 | CN1849182A Megasonic cleaning using supersaturated cleaning solution |
| 10/17/2006 | CA2274017C Method for controlling and removing dust and other particles from a material |
| 10/12/2006 | WO2005102545A3 System and method of removing chamber residues from a plasma processing system in a dry cleaning process |
| 10/12/2006 | US20060228890 Cleaning solution and method of forming a metal pattern for a semiconductor device using the same |