| Patents for B08B 6 - Cleaning by electrostatic means (1,400) |
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| 04/25/2006 | US7033845 Phase control of megasonic RF generator for optimum operation |
| 04/25/2006 | US7033068 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 04/06/2006 | US20060070979 Using ozone to process wafer like objects |
| 03/30/2006 | WO2005094244A3 System, method and apparatus for self-cleaning dry etch |
| 03/30/2006 | US20060065636 Method and system for controlling a velocity field of a supercritical fluid in a processing system |
| 03/30/2006 | US20060065627 Processing electronic devices using a combination of supercritical fluid and sonic energy |
| 03/30/2006 | US20060065286 Method to address carbon incorporation in an interpoly oxide |
| 03/23/2006 | US20060063280 Lamp heating apparatus and method for producing semiconductor device |
| 03/23/2006 | US20060060303 Plasma processing system and method |
| 03/22/2006 | EP1638134A2 Thin plate supporting container |
| 03/16/2006 | US20060057853 Thermal oxidation for improved silicide formation |
| 03/16/2006 | US20060054205 Nanobubble utilization method and device |
| 03/16/2006 | US20060054190 Plate washing system with ultrasonic cleaning of pipes |
| 03/16/2006 | US20060054184 Plasma treatment for purifying copper or nickel |
| 03/16/2006 | US20060054183 Method to reduce plasma damage during cleaning of semiconductor wafer processing chamber |
| 03/09/2006 | US20060051966 In-situ chamber clean process to remove by-product deposits from chemical vapor etch chamber |
| 03/08/2006 | EP1631396A2 Megasonic cleaning using supersaturated cleaning solution |
| 03/02/2006 | US20060042653 Method of forming contact hole |
| 03/02/2006 | DE202005019251U1 Equipment for absorption of particles e.g. dust or sawdust has receptacle component connected to electric supply which is so charged by electricity that particles get attracted and stick to component |
| 02/23/2006 | US20060040066 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device |
| 02/16/2006 | US20060032516 Method for the recovery of ash rate following metal etching |
| 02/15/2006 | CN1735467A Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 02/02/2006 | US20060022606 Arrangement, method and electrode for generating a plasma |
| 02/02/2006 | US20060021634 Method and apparatus for creating ozonated process solutions having high ozone concentration |
| 02/02/2006 | US20060021633 Closed loop clean gas control |
| 02/02/2006 | US20060021581 Plasma nozzle array for providing uniform scalable microwave plasma generation |
| 02/01/2006 | CN1729063A Apparatus and method for cleaning surfaces of semiconductor wafers using ozone |
| 01/26/2006 | WO2006010109A2 Method and apparatus for creating ozonated process solutions having high ozone concentration |
| 01/26/2006 | US20060017043 Method for enhancing fluorine utilization |
| 01/26/2006 | US20060016459 High rate etching using high pressure F2 plasma with argon dilution |
| 01/19/2006 | US20060011213 Substrate transfer device and cleaning method thereof and substrate processing system and cleaning method thereof |
| 01/18/2006 | CN1236853C Electrokinetic air delivering-treater with non-equidistance collector |
| 01/12/2006 | US20060009040 Method for manufacturing semiconductor device |
| 01/11/2006 | CN1720347A Method for cleaning a process chamber |
| 01/05/2006 | US20060000489 In-situ cleaning of light source collector optics |
| 01/05/2006 | US20060000488 Methods for removal of polymeric coating layers from coated substrates |
| 12/29/2005 | WO2005123284A1 Static charge and dust removing device |
| 12/29/2005 | WO2005123283A1 Method and apparatus for cleaning vehicles |
| 12/29/2005 | CA2570071A1 Method and apparatus for cleaning vehicles |
| 12/22/2005 | US20050279382 Method for cleaning a process chamber |
| 12/15/2005 | WO2005118166A2 Pharmaceutical composition containing irbesartan |
| 12/08/2005 | US20050271720 Pharmaceutical composition containing irbesartan |
| 12/08/2005 | US20050268408 Cleaning system |
| 12/07/2005 | CN1230954C Ion producer and static charge removing apparatus |
| 11/17/2005 | US20050252536 Wiper blade wash station, spray bar and process for cleaning the wiper blade |
| 11/17/2005 | US20050252525 Method of cleaning a semiconductor substrate and cleaning recipes |
| 11/17/2005 | US20050251936 Apparatus and method for cleaning electronic articles |
| 11/10/2005 | US20050246989 Backsplash assembly and method |
| 11/03/2005 | WO2005102545A2 System and method of removing chamber residues from a plasma processing system in a dry cleaning process |
| 11/03/2005 | US20050241672 Extraction of impurities in a semiconductor process with a supercritical fluid |
| 10/27/2005 | US20050236013 Marine air conditioner decontamination system |
| 10/27/2005 | DE102004016961A1 System for processing bank notes comprises a sorting device in a sealed housing, and a cleaning device arranged outside the sorting device housing |
| 10/19/2005 | CN2735649Y High-voltage DC power supply for electric dust collector |
| 10/13/2005 | US20050224458 System and method of removing chamber residues from a plasma processing system in a dry cleaning process |
| 10/06/2005 | US20050217696 Methods using a peroxide-generating compound to remove group VIII metal-containing residue |
| 10/02/2005 | CA2503753A1 Backsplash assembly and method |
| 09/22/2005 | US20050205108 Method and system for immersion lithography lens cleaning |
| 09/20/2005 | US6946399 Cleaning system method and apparatus for the manufacture of integrated cicuits |
| 09/15/2005 | WO2005006396A3 Megasonic cleaning using supersaturated cleaning solution |
| 09/15/2005 | US20050202167 Adding to a reactor a fluorine-containing cleaning agent, a chlorine-containing cleaning agent; reacting the TiO2 with the reactive gas to form a volatile product; and removing it from the reactor |
| 09/13/2005 | US6943062 Contaminant particle removal by optical tweezers |
| 09/13/2005 | US6941606 Sheet and web cleaner on suction hood |
| 09/01/2005 | US20050191861 Using supercritical fluids and/or dense fluids in semiconductor applications |
| 08/31/2005 | EP1567290A2 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves |
| 08/31/2005 | EP1567066A2 Apparatus and method for steam reprocessing flexible endoscopes |
| 08/24/2005 | EP1565592A2 Method for cleaning a process chamber |
| 08/23/2005 | US6932092 power is applied to gas distribution manifold within chamber which comprises parallel plate electrodes |
| 08/18/2005 | WO2005075118A1 Cleaning device of board and cleaning method, flat display panel, mounting equipment of electronic parts and mounting method |
| 08/18/2005 | US20050178401 applying heated ozone-solvent solution to the material at the elevated pressure; reduces the rate of loss of ozone from the ozone-solvent solution resulting from heating the ozone-solvent solution |
| 08/10/2005 | EP1561841A2 Cleaning CVD Chambers following deposition of porogen-containing materials |
| 08/10/2005 | CN1651159A Cleaning CVD chambers following deposition of porogen-containing materials |
| 08/10/2005 | CN1651158A Dust collector |
| 07/28/2005 | US20050161061 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 07/28/2005 | US20050161060 Including a proton donor (e.g., a hydrogen plasma step) to react with the porogen, then reacting with a fluorine donor, the plasma enhanced chemical vapor deposition (PECVD) chamber is more effectively cleaned following a porous interlayer dielectric (ILD) deposition |
| 07/21/2005 | WO2005029553A3 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 07/21/2005 | US20050155624 deflect dust eroded from discharge electrodes by hot plasma by use of a solenoid surrounding the optics |
| 07/19/2005 | USRE38760 Controlled etching of oxides via gas phase reactions |
| 07/07/2005 | US20050145263 Curved edges connecting center to expertior; cutting printing paper; thermal printing |
| 06/23/2005 | US20050133059 Performing a plasma process using an oxygen plasma from gases free of nitrogen and fluorine; performing a second plasma process using argon; performing a third plasma process using fluorine |
| 06/14/2005 | US6905974 Methods using a peroxide-generating compound to remove group VIII metal-containing residue |
| 06/07/2005 | US6902630 Method for cleaning charged particles from an object |
| 05/19/2005 | US20050104696 Magnet sweep |
| 05/12/2005 | US20050098040 Electrostatic device for ionic air emission |
| 05/10/2005 | US6891107 Device for electric contact for textile material and use thereof for joule heating |
| 04/28/2005 | US20050087211 System for rinsing and drying semiconductor substrates and method therefor |
| 04/21/2005 | US20050082000 Method for cleaning elements in vacuum chamber and apparatus for processing substrates |
| 04/21/2005 | US20050081824 Prevent damage to semiconductor surfaces using laser light and lens systems |
| 04/20/2005 | CN1607921A Method of charging and distributing particles |
| 04/19/2005 | US6880560 Producing sonic energy perpendicularly to substrate inside of processing chamber using sonic box comprising transducer coupled to membrane; dense phase gases such as supercritical fluids can be used in combination with sonic energy |
| 03/31/2005 | WO2005029553A2 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system |
| 03/31/2005 | US20050066993 Thin film forming apparatus and method of cleaning the same |
| 03/30/2005 | CN1195246C 胶片清洁器 Film cleaner |
| 03/09/2005 | CN1591777A Unit cleaning method and substrate treater for depressurizing chamber |
| 03/03/2005 | US20050044653 Cleaning apparatus and cleaning method |
| 02/24/2005 | US20050039677 Method of charging and distributing particles |
| 02/16/2005 | EP1507281A1 Arrangement, method and electrode for generating a plasma |
| 02/09/2005 | CN1575872A A cleaning device and cleaning method |
| 01/20/2005 | WO2005006396A2 Megasonic cleaning using supersaturated cleaning solution |
| 12/02/2004 | DE10321889A1 Surface treatment method e.g. for flat substrates and circuit-boards, involves treating surface with air-ionization by electrical discharge at high-voltage |
| 11/16/2004 | US6818565 Gate insulator pre-clean procedure |