Patents
Patents for B08B 6 - Cleaning by electrostatic means (1,400)
12/2007
12/13/2007WO2007095388A3 Plasma processing reactor with multiple capacitive and inductive power sources
12/13/2007US20070285631 Lithographic apparatus and lithographic apparatus cleaning method
12/11/2007US7306681 Method of cleaning a semiconductor substrate
12/06/2007WO2006080977A3 Method and apparatus for cleaning and surface conditioning objects with plasma
12/05/2007CN200984577Y Decontaminating apparatus
12/05/2007CN200984576Y Fibre dust-cleaning equipment
12/05/2007CN101084586A Ultrasonic processing method and apparatus with multiple frequency transducers
12/05/2007CN101081394A Dust-blowing device
12/04/2007US7303636 Method of laser cleaning surfaces on a head suspension
11/2007
11/29/2007US20070272270 Single-wafer cleaning procedure
11/22/2007WO2006078894A3 Method and apparatus for cleaning and surface conditioning objects using non-equilibrium atmospheric pressure plasma
11/15/2007US20070261718 Method and apparatus for ozone-enhanced cleaning of flat objects with pulsed liquid jet
11/08/2007WO2007126469A2 Method for conditioning a process chamber
11/08/2007US20070256704 Method and apparatus for improved operation of an abatement system
11/08/2007US20070256703 Method for removing contaminant from surface of glass substrate
11/08/2007US20070256563 Electrostatic ionic air emission device
11/07/2007EP1852192A2 Dust remover
11/07/2007CN101068630A Method, apparatus, and system for bi-solvent based cleaning of precision components
11/01/2007US20070254112 Apparatus and method for high utilization of process chambers of a cluster system through staggered plasma cleaning
11/01/2007US20070251543 Methods to clean a surface, a device manufacturing method, a cleaning assembly, cleaning apparatus, and lithographic apparatus
10/2007
10/30/2007US7288491 Plasma immersion ion implantation process
10/30/2007US7287535 Work washing apparatus
10/25/2007WO2007120276A2 An apparatus and a method for cleaning a dielectric film
10/25/2007US20070248767 Method of self-cleaning of carbon-based film
10/25/2007US20070246063 Method of performing a pressure calibration during waferless autoclean process
10/25/2007US20070246062 Method of cleaning deposition chamber
10/23/2007US7284558 Enhanced megasonic based clean using an alternative cleaning chemistry
10/17/2007EP1843863A2 Method and apparatus for cleaning and surface conditioning objects with plasma
10/11/2007US20070238321 Method of manufacturing semiconductor device
10/11/2007US20070238199 Method for conditioning a process chamber
10/11/2007US20070235060 Ignition control of remote plasma unit
10/11/2007US20070235059 Method of recovering valuable material from exhaust gas stream of a reaction chamber
10/10/2007CN200957422Y Manual electrostatic dust-collecting cabinet
10/09/2007US7278272 Marine air conditioner decontamination system
10/04/2007US20070227555 Method to manipulate post metal etch/side wall residue
10/03/2007CN200956546Y High-frequency high-voltage power supply for electric dust extraction
09/2007
09/20/2007US20070215173 Heated single wafer megasonic processing plate
09/19/2007CN200948461Y 静电清扫器 Electrostatic Cleaner
09/19/2007CN101036913A Method and device of eliminating dust
09/11/2007US7267842 Method for removing titanium dioxide deposits from a reactor
09/11/2007US7267127 Method for manufacturing electronic device
08/2007
08/30/2007US20070199658 Integrated capacitive and inductive power sources for a plasma etching chamber
08/30/2007US20070199577 Method And Device For Removing Liquids From The Surface Of A Strip
08/28/2007US7261110 Shaving apparatus cleaning device
08/23/2007US20070197037 Surface preparation for gate oxide formation that avoids chemical oxide formation
08/23/2007US20070193602 Systems and Methods for Photoresist Strip and Residue Treatment in Integrated Circuit Manufacturing
08/22/2007CN2936462Y Self-cleaning type static dust removing roller
08/16/2007US20070190266 Water vapor passivation of a wall facing a plasma
08/16/2007US20070186953 Systems and Methods for Photoresist Strip and Residue Treatment in Integrated Circuit Manufacturing
08/16/2007US20070186952 Method of cleaning substrate processing chamber, storage medium, and substrate processing chamber
08/16/2007US20070186857 Plasma processing apparatus and method of using the same
08/16/2007US20070186855 Plasma processing reactor with multiple capacitive and inductive power sources
08/16/2007US20070186854 Apparatus and method for plasma processing
08/15/2007CN101018620A Flat surface washing apparatus
08/15/2007CN101015830A Self-cleaning electrostatic dust collection roller
08/09/2007US20070184659 Method for Cleaning a Semiconductor Wafer
08/09/2007US20070181170 Apparatus including an improved nozzle unit
08/09/2007US20070181147 Processing-fluid flow measuring method
08/09/2007US20070181146 Plasma cvd apparatus and dry cleaning method of the same
08/09/2007US20070181145 Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate
08/08/2007CN101011698A Self-cleaning electrostatic dedusting roller
08/07/2007US7253901 Laser-based cleaning device for film analysis tool
08/02/2007US20070175495 Apparatus for Treating Plasma and Method for Cleaning the Same
08/01/2007EP1812190A2 Electrode array device having an adsorbed porous reaction layer
07/2007
07/26/2007WO2006017164A3 Filter back-flushing and rinsing device
07/26/2007US20070169798 Automatic Paint Roller Cover Washer
07/19/2007US20070163618 Cleaning solution for silicon surface and methods of fabricating semiconductor device using the same
07/19/2007US20070163617 Method for cleaning treatment chamber iIn substrate treating apparatus and method for detecting endpoint of cleaning
07/18/2007CN2923038Y Integrated electric duster high-frequency power supply
07/18/2007CN100998983A Cleaning method and device
07/17/2007US7244313 Plasma etch and photoresist strip process with intervening chamber de-fluorination and wafer de-fluorination steps
07/11/2007CN1325177C A cleaning device and cleaning method
07/05/2007US20070151946 Method for monitoring edge bead removal process of copper metal interconnection
06/2007
06/28/2007US20070144557 Cleaning method of apparatus for depositing AI-containing metal film and AI-containing metal nitride film
06/28/2007US20070144555 Supercritical CO2 cleaning system and method
06/26/2007US7234185 Apparatus for removing particles
06/21/2007US20070137671 Fluorine based cleaning of an ion source
06/20/2007CN2912843Y High reliable control of constant flow high-voltage direct current power supply
06/19/2007US7232492 Method of forming thin film for improved productivity
06/14/2007US20070134821 Cluster tool for advanced front-end processing
06/14/2007US20070131249 Probe washing method of scanning probe microscope
06/14/2007US20070131246 Substrate processing method and substrate processing apparatus
06/14/2007US20070131245 Method of cleaning plasma etching apparatus, and thus-cleanable plasma etching apparatus
06/14/2007US20070131244 Method and apparatus for removing minute particles from a surface
06/12/2007US7228865 FRAM capacitor stack clean
06/07/2007US20070128375 Method and device for continuously treating the surface of an elongate object
06/07/2007US20070125749 Apparatus and method for removing protective film on article
05/2007
05/31/2007US20070123052 Process sequence for photoresist stripping and cleaning of photomasks for integrated circuit manufacturing
05/31/2007US20070119477 Method and Apparatus for Semiconductor Wafer Cleaning Using High-Frequency Acoustic Energy with Supercritical Fluid
05/31/2007US20070119476 Substrate processing apparatus and substrate processing method
05/30/2007CN2906414Y Intelligent dust-removing sterilizing sound-insulating ventilation device for room
05/30/2007CN1972763A Static charge and dust removing device
05/30/2007CN1319131C Process and apparatus for treating a workpiece such as a semiconductor wafer
05/24/2007US20070113868 Apparatus and a method for cleaning a dielectric film
05/24/2007US20070113867 Polymer treatment using a plasma brush
05/17/2007US20070107750 Method of using NF3 for removing surface deposits from the interior of chemical vapor deposition chambers
05/17/2007US20070107749 Process chamber cleaning method
05/10/2007WO2005044440A3 Ultrasonic apparatus with multiple frequency transducers
05/09/2007CN2897464Y Electrostatic bottle washing system
05/03/2007US20070095476 Plasma discharger
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