Patents
Patents for B08B 6 - Cleaning by electrostatic means (1,400)
11/2004
11/04/2004US20040218157 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
10/2004
10/07/2004US20040198066 Using supercritical fluids and/or dense fluids in semiconductor applications
10/06/2004EP1463434A1 Method of charging and distributing particles
10/06/2004CN1534381A Cleaning method of photoetching projection device component element surface photo etching projection device, device manufacturing method and cleaning system
09/2004
09/15/2004EP1455947A1 Electrostatic device for ionic air emission
09/15/2004CN1529636A Electrostatic ionic air emittor
08/2004
08/26/2004WO2004050936A3 Method for cleaning a process chamber
08/20/2004CA2458166A1 Magnet sweep
07/2004
07/22/2004WO2004045739A3 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
07/13/2004US6761773 Method for controlling and removing dust and other particles from a material
07/01/2004DE10261875A1 Cleaning system for removing contamination from surface of component in lithographic projection apparatus that is used in manufacture of integrated circuits, comprises cleaning particle provider with electric field generator
06/2004
06/24/2004US20040118428 Portable; using compressed gas; ionizers; high voltage; cleaning surfaces
06/23/2004EP1431828A1 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
06/23/2004CN1154430C Method and apparatus for controlling and removing dust and other particles from material or distributing or transferring charged particle to one surface
06/17/2004WO2004050936A2 Method for cleaning a process chamber
06/17/2004DE10255988A1 Verfahren zum Reinigen einer Prozesskammer A method of cleaning a process chamber
06/03/2004WO2004045739A2 Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
05/2004
05/27/2004US20040099281 Method for cleaning plasma enhanced chemical vapor deposition chamber using very high frequency energy
05/20/2004US20040094183 Dense phase gases such as supercritical fluids can be used in combination with sonic energy (e.g., megasonic acoustic waves) to process substrates such as semiconductor wafers
03/2004
03/18/2004US20040053518 Device for electric contact for textile material and use thereof for joule heating
02/2004
02/19/2004DE10236071A1 Verfahren und Vorrichtung zur Reinigung von Oberflächen bewegter Materialbahnen Method and apparatus for cleaning surfaces of moving material webs
02/18/2004EP1100630B1 Process and apparatus for treating a workpiece such as a semiconductor wafer
02/12/2004US20040029392 Methods using a peroxide-generating compound to remove group VIII metal-containing residue
02/12/2004US20040025902 Electroconductive means in contact with segments of cleaning target; grounding means
02/12/2004DE10140906B4 Verfahren und Vorrichtung zum Ausblasen von Vorformlingen aus Kunststoff Method and apparatus for blowing plastic preforms
02/11/2004EP1388375A2 Method and device for cleaning the surfaces of moving material webs
02/04/2004CN1472774A Micro-powder remover
01/2004
01/29/2004US20040016443 Effectively eliminates particles in the vacuum container unit without degrading the rate of operation of the processing device
01/21/2004EP1382714A2 Apparatus for removing particles
01/08/2004US20040003475 Sheet and web cleaner on suction hood
12/2003
12/09/2003US6659849 Platen with debris control for chemical mechanical planarization
12/04/2003WO2003090792A3 Method and apparatus for treating a substrate with an ozone-solvent solution iii
11/2003
11/13/2003US20030209315 Process for adhering a component on a counter surface and apparatus therefor
11/12/2003CN1127428C Packaging machine, in particular for cigarettes
11/06/2003WO2003090792A2 Method and apparatus for treating a substrate with an ozone-solvent solution iii
11/06/2003US20030207655 Dense fluid spray cleaning process and apparatus
11/05/2003CN1126609C Process and apparatus for treating workpiece of semiconductor wafer
10/2003
10/21/2003US6636411 Gas-purged ionizers and methods of achieving static neutralization thereof
10/15/2003EP1352449A1 Device for electric contact for textile material and use thereof for joule heating
10/08/2003EP1349479A1 Storage device for a feather duster
09/2003
09/03/2003EP0942680B1 Method for controlling and removing dust and other particles from a material
08/2003
08/13/2003CN1117639C Device for cleaning electrode unit of electroslatically oily dust collecting apparatus
07/2003
07/02/2003CN1426817A Container cleaner
06/2003
06/26/2003US20030115710 Apparatus for cleaning bottles
06/18/2003CN2556848Y High-frequency inverter for electric removing dust
06/05/2003WO2003045217A1 Method of charging and distributing particles
05/2003
05/20/2003US6565669 Vibrating wafer particle cleaner
04/2003
04/16/2003CN1410165A Electrokinetic air delivering-treater with non-equidistance collector
04/10/2003WO2003029830A1 Cleaning method
04/08/2003US6543078 Apparatus and method for cleaning object having generally irregular surface features
03/2003
03/04/2003US6526997 Dry cleaning method for the manufacture of integrated circuits
02/2003
02/27/2003DE20023082U1 Dust extraction device has corona charging electrode and counter electrode on either side of material, discharge electrode and suction device close to discharge electrode, preferably after it
12/2002
12/31/2002US6500268 Dry cleaning method
12/10/2002US6490746 Apparatus and method for cleaning objects having generally irregular, undulating surface features
12/03/2002US6489394 Charged ion cleaning devices and cleaning system
11/2002
11/20/2002EP1142455B1 Gas-purged ionizers and methods of achieving static neutralization thereof
10/2002
10/30/2002CN1093435C Wet electric dust-removing process and its special-purpose equipment
10/24/2002US20020152636 Apparatus and method for cleaning charged particles from objects
09/2002
09/19/2002WO2000040778A3 Solvent removal
09/18/2002CN1369743A Film cleaner
07/2002
07/25/2002WO2002058194A1 Device for electric contact for textile material and use thereof for joule heating
07/18/2002WO2002054930A1 Storage device for a feather duster
07/17/2002CN1358580A Washing method and equipment, object being washed and material feeding bucket
07/02/2002US6412498 For semiconductors; process control
06/2002
06/27/2002WO2002049767A1 Electrostatic device for ionic air emission
06/27/2002US20020082179 Pneumatically feeding a carrier gas to the blast nozzle which blasts a target with dry ice pellets charging the gas (air) to destaticize and prevent fusion of the dry ice; cleaning appliances, televisions, copiers, printers, and computers
06/19/2002EP0996510B1 Can cleaning and delivery apparatus
06/12/2002CN2495061Y High-voltage electric power for electrostatic fumes purifier
05/2002
05/21/2002US6391118 Method for removing particles from surface of article
04/2002
04/23/2002US6374832 Performing a dry cleaning process in the etching chamber with oxygen/hydrogen bromide plasma to restore an etching environment in the etching chamber, wherein the etching chamber is free of wafers
04/17/2002CN1082849C Method and apparatus for removing dust particles from relatively moving material web
04/16/2002US6371135 Using a charged particle beam directed at the particle to be removed.
03/2002
03/28/2002US20020036060 Method for adhering a component to a counter- surface and an apparatus therefor
03/19/2002US6357201 Packaging machine, in particular for cigarettes
03/13/2002CN2482270Y High-voltage ac power supply for electrostatic dust-collector
03/06/2002CN2481055Y High-voltage pulse type power source for dust cleaner
02/2002
02/21/2002DE10038516A1 Verfahren zum Aufkleben eines Bauteils auf eine Gegenfläche und Vorrichtung zu seiner Durchführung A method for bonding a component to a mating surface and device for its implementation
02/13/2002EP1179576A1 Process for the adhesion of a component to a surface and apparatus for such a process
12/2001
12/04/2001US6325862 Method for removing stains from structural surfaces
11/2001
11/29/2001US20010046769 Waferless seasoning process
11/21/2001CN2460230Y Power device of multifunctional self-regualtion high-voltage electrostatic dust remover
11/13/2001US6315501 Air stream particulate collecting transfer apparatus
10/2001
10/25/2001DE10018010A1 Dust extraction device has corona charging electrode and counter electrode on either side of material, discharge electrode and suction device close to discharge electrode, preferably after it
10/18/2001US20010029964 Method and apparatus for removing particles from surface of article
10/10/2001EP1142455A1 Gas-purged ionizers and methods of achieving static neutralization thereof
10/03/2001CN1315778A Public power unit and device for mounting same
08/2001
08/02/2001DE10003227A1 Verfahren zum Reinigung und Lackieren von Separatteilen von Kraftfahrzeugen und Vorrichtung zur Durchführung des Verfahrens A method of cleaning and painting of separate parts of motor vehicles and apparatus for performing the method
07/2001
07/17/2001US6260224 Material collector having electrical power supplies and electrical conductors
07/10/2001US6256825 Removal of particulate contamination in loadlocks
07/04/2001EP1100630A4 Process and apparatus for treating a workpiece such as a semiconductor wafer
06/2001
06/21/2001US20010003852 Cathode ray tube screen cleaner
06/05/2001US6240931 Method for removing particles from a surface of an article
05/2001
05/30/2001CN2431980Y Cleaning device for electrostatic oil-dust collector
05/30/2001CN1297385A Process and apparatus for treating workpiece such as semiconductor wafer
05/30/2001CN1297269A Ion producer and static charge removing apparatus
05/23/2001EP1100630A1 Process and apparatus for treating a workpiece such as a semiconductor wafer
05/10/2001WO2000038484A9 Gas-purged ionizers and methods of achieving static neutralization thereof
05/09/2001CN1294034A Method and equipment for cleaning electrode unit for apparatus to electrostatically collect oily dust
04/2001
04/10/2001US6214160 Method and apparatus for removing particulates from semiconductor substrates in plasma processing chambers
04/05/2001DE19946195C1 Removal of alumina particle layer sintered onto sintered multilayer ceramic substrate, employs two stages of dry grit blasting followed by electrostatic repulsion of submicron residue
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