Patents
Patents for B08B 6 - Cleaning by electrostatic means (1,400)
10/2006
10/12/2006US20060228473 Semiconductor-processing apparatus provided with self-cleaning device
10/12/2006US20060226119 Method for generating plasma method for cleaning and method for treating substrate
10/12/2006US20060225767 Method and apparatus for cleaning a cvd chamber
10/11/2006CN2826642Y Three-phase electrostatic dust collection transformer
10/05/2006WO2006039090A3 Solutions for cleaning silicon semiconductors or silicon oxides
10/03/2006US7116394 Method for cleaning a surface of a component of a lithographic projection apparatus, lithographic projection apparatus, device manufacturing method and cleaning system
10/03/2006US7114509 Dishwashing machine with improved washing liquor distribution valve
09/2006
09/28/2006US20060213534 Integrated ashing and implant annealing method using ozone
09/27/2006CN2820355Y Cleaning device for sprayed products
09/26/2006US7112247 Canned gas dust remover with air ionizer
09/26/2006US7111629 Method for cleaning substrate surface
09/21/2006US20060207631 Apparatus and method of cleaning a sustrate
09/21/2006US20060207630 Device for cleaning cvd device and method of cleaning cvd device
09/20/2006EP1701781A2 Ultrasonic processing method and apparatus with multiple frequency transducers
09/14/2006US20060205191 Substrate processing method
09/14/2006US20060201625 Apparatus for manufacturing semiconductor
09/14/2006US20060201539 Method and apparatus for cleaning and sealing display packages
09/14/2006US20060201534 Method and apparatus for cleaning and surface conditioning objects using plasma
09/14/2006US20060201533 Cvd apparatus and method for cleaning cvd apparatus
09/12/2006US7107158 Inspection system and apparatus
09/12/2006US7104268 Megasonic cleaning system with buffered cavitation method
09/05/2006US7103482 Inspection system and apparatus
08/2006
08/31/2006WO2006091909A2 Etching and cleaning bpsg material using supercritical processing
08/31/2006WO2006091316A2 Improved rinsing step in supercritical processing
08/31/2006WO2006091312A2 Improved cleaning step in supercritical processing
08/31/2006US20060191555 Method of cleaning etching apparatus
08/24/2006US20060186088 Etching and cleaning BPSG material using supercritical processing
08/23/2006EP1691938A2 Silicon carbide components of semiconductor substrate processing apparatuses treated to remove free-carbon
08/17/2006US20060180175 Method and system for determining flow conditions in a high pressure processing system
08/17/2006US20060180174 Method and system for treating a substrate with a high pressure fluid using a peroxide-based process chemistry in conjunction with an initiator
08/17/2006US20060180172 Enhanced megasonic based clean using an alternative cleaning chemistry
08/16/2006CN2807595Y Three-phase high-voltage direct current power supply used for electric precipitator
08/15/2006US7092826 Semiconductor wafer inspection system
08/15/2006US7089947 Apparatus and method for cleaning a semiconductor wafer
08/10/2006WO2006083693A2 Etchant treatment processes for substrate surfaces and chamber surfaces
08/10/2006WO2006047373A8 Novel methods for cleaning ion implanter components
08/10/2006WO2005104214A3 Composition useful for removal of bottom anti-reflection coatings from patterned ion-implanted photoresist wafers
08/10/2006US20060175297 Metallization method for a semiconductor device and post-CMP cleaning solution for the same
08/10/2006US20060175291 Control of process gases in specimen surface treatment system
08/10/2006US20060175014 Specimen surface treatment system
08/10/2006US20060175013 Specimen surface treatment system
08/10/2006US20060174912 Wafer cleaning solution for cobalt electroless application
08/09/2006CN2805212Y Three phase, AC and voltage-regulation power supply device for electric dust-removing
08/09/2006CN1268437C Electrostatic ionic air emittor
08/09/2006CN1268278C Method of charging and distributing particles
08/03/2006WO2006080977A2 Method and apparatus for cleaning and surface conditioning objects with plasma
08/03/2006WO2006079335A2 Method and device for treating surfaces of materials by means of radiation while using an electrostatic field
08/03/2006US20060169669 Etchant treatment processes for substrate surfaces and chamber surfaces
08/03/2006US20060169668 Low temperature etchant for treatment of silicon-containing surfaces
07/2006
07/27/2006WO2005118166A3 Pharmaceutical composition containing irbesartan
07/27/2006US20060162742 Cleaning method of processing apparatus, program for performing the method, and storage medium for storing the program
07/27/2006US20060162741 Method and apparatus for cleaning and surface conditioning objects with plasma
07/27/2006US20060162740 Method and apparatus for cleaning and surface conditioning objects using non-equilibrium atmospheric pressure plasma
07/27/2006US20060162739 Cleaning chuck in situ
07/27/2006US20060162661 Mixing energized and non-energized gases for silicon nitride deposition
07/26/2006CN1266740C Micro-powder remover
07/20/2006WO2006060234A3 Wet cleaning of electrostatic chucks
07/20/2006US20060157079 Method for cleaning substrate surface
07/19/2006EP1681106A1 Cleaning station for an installation for surface treatment of workpieces
07/13/2006US20060154495 Device for cleaning the surface of a component
07/13/2006US20060151002 Method of CVD chamber cleaning
07/13/2006DE102005025101B3 Device for cleaning interior of vacuum chamber, used e.g. for physical or chemical vapor deposition, comprising carrier with electrode(s) connected to D.C. source, for electrostatically fixing contaminants
07/06/2006WO2006071552A2 Cleaning methods for silicon electrode assembly surface contamination removal
07/06/2006US20060144820 Remote chamber methods for removing surface deposits
07/06/2006US20060144520 Viewing window cleaning apparatus
07/06/2006US20060144418 Components for film forming device and method of washing the component
07/06/2006US20060144417 Method of lowering contact angles on an optical film surface
06/2006
06/29/2006US20060141787 Cleaning methods for silicon electrode assembly surface contamination removal
06/29/2006US20060137711 Single-wafer cleaning procedure
06/29/2006US20060137710 Method for controlling corrosion of a substrate
06/22/2006US20060134534 Photomask and method for maintaining optical properties of the same
06/22/2006US20060130873 Plasma cleaning of deposition chamber residues using duo-step wafer-less auto clean method
06/20/2006US7063091 Method for cleaning the surface of a substrate
06/15/2006US20060124151 Method for cleaning substrate processing chamber
06/14/2006EP1667850A2 Methods for cleaning a set of structures comprising yttrium oxide in a plasma processing system
06/08/2006US20060121210 Plasma processing equipment and method of operating the same
06/08/2006US20060118133 Board cleaning method, board cleaning apparatus, and component mounting method
06/07/2006CN2785729Y Equipment for cleaning glass screen surface of liquid crystal display by plasma under normal pressure
06/06/2006US7055532 Method to remove fluorine residue from bond pads
06/01/2006US20060113282 Method of depositing an epitaxial layer of SiGe subsequent to a plasma etch
06/01/2006US20060112970 Electrostatic chuck cleaning method
06/01/2006DE102004057445A1 Vorrichtung zum kontaktlosen Reinigen eines Förderelementes und Anordnung zum Transportieren und/oder Speichern stabförmiger Artikel mit einer Vorrichtung zum kontaktlosen Reinigen eines Förderelementes Device for contactless cleaning a conveyor element arrangement and for transporting and / or storing rod-shaped articles with a device for contactless cleaning a conveyor element
05/2006
05/30/2006US7052553 Wet cleaning of electrostatic chucks
05/26/2006WO2006055810A2 Electrode array device having an adsorbed porous reaction layer
05/25/2006US20060107969 Ozonated water flow and concentration control apparatus and method
05/23/2006US7047984 Device and method for cleaning articles used in the production of semiconductor components
05/18/2006US20060102471 Electrode array device having an adsorbed porous reaction layer
05/18/2006US20060102197 Post-etch treatment to remove residues
05/18/2006US20060102196 Atmospheric pressure non-thermal plasma device to clean and sterilize the surfaces of probes, cannulas, pin tools, pipettes and spray heads
05/11/2006WO2006049954A2 Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing
05/11/2006WO2006049886A2 Euv collector debris management
05/04/2006WO2006047373A2 Novel methods for cleaning ion implanter components
05/04/2006US20060091109 EUV collector debris management
05/04/2006US20060091104 Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing
05/04/2006US20060090773 Sulfur hexafluoride remote plasma source clean
05/02/2006US7037852 For removing a photoresist pattern from an underlying layer; for manufacturing a semiconductor device
04/2006
04/27/2006US20060086376 Novel methods for cleaning ion implanter components
04/27/2006US20060086372 Composition for the removing of sidewall residues
04/27/2006US20060086322 Device for production of a plasma sheet
04/26/2006EP1650000A1 Apparatus and method for in-mold forming, and dust collector
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