Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
---|
10/03/2012 | CN101779085B Processing apparatus and clean system including processing apparatus |
10/03/2012 | CN101770988B Semicondcutor device having vertical gate and method for fabricating the same |
10/03/2012 | CN101764159B Metallic oxide semiconductor field effect tube with reduced breakdown voltage |
10/03/2012 | CN101752314B Surface channel PMOS device with self-aligned contact hole and manufacturing method |
10/03/2012 | CN101752313B Surface P-channel metal oxide semiconductor (PMOS) device with self-aligned contact hole and method for producing same |
10/03/2012 | CN101740334B Photoetching pretreating method and photoetching method |
10/03/2012 | CN101707190B Method for making metal gate stacks and ic having metal gate stacks |
10/03/2012 | CN101697340B Catch for etching process and method for preventing catch from jumping |
10/03/2012 | CN101692455B SOI-based capacitor |
10/03/2012 | CN101663734B Apparatus and method for atomic layer deposition |
10/03/2012 | CN101663629B Optimized power supply for an electronic system |
10/03/2012 | CN101617241B Device for pressing electronic component and device for testing electronic component |
10/03/2012 | CN101604102B Array substrate for liquid crystal display device and method of manufacturing the same |
10/03/2012 | CN101584031B Methods and apparatus for wafer edge processing |
10/03/2012 | CN101581884B Intaglio printing plate, production method for intaglio printing plate, production method for electronic substrate, and production method for display device |
10/03/2012 | CN101571714B Method for controlling result parameter of integrated circuit manufacturing procedure |
10/03/2012 | CN101568990B Methods, apparatuses, and systems for fabricating three dimensional integrated circuits |
10/03/2012 | CN101556929B Method for measuring thickness of grid oxide layer |
10/03/2012 | CN101548362B Ultralow dielectric constant layer with controlled biaxial stress |
10/03/2012 | CN101542759B Semiconductor wafer and semiconductor device and manufacture methods thereof |
10/03/2012 | CN101533769B Method for manufacturing soi substrate |
10/03/2012 | CN101528991B Sapphire substrate, nitride semiconductor luminescent element using the sapphire substrate, and method for manufacturing the nitride semiconductor luminescent element |
10/03/2012 | CN101523576B Plasma oxidizing method |
10/03/2012 | CN101517710B Cutting method and epitaxial wafer manufacturing method |
10/03/2012 | CN101496145B Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ uv cure |
10/03/2012 | CN101479611B Methods and apparatus for sensing unconfinement in a plasma processing chamber |
10/03/2012 | CN101469420B Electroless gold-plating method and electronic component |
10/03/2012 | CN101466866B Thin film production apparatus and inner block for thin film production apparatus |
10/03/2012 | CN101466807B Bonding method with flowable adhesive composition |
10/03/2012 | CN101445919B Semiconductor manufacturing apparatus and manufacturing method of semiconductor device |
10/03/2012 | CN101444897B 抛光设备和方法 Polishing apparatus and method |
10/03/2012 | CN101402226B Cutting device |
10/03/2012 | CN101399262B Power semiconductor arrangement and assembling method thereof |
10/03/2012 | CN101392159B Adhesive sheet, dicing tape integrated type adhesive sheet, and method of producing semiconductor device |
10/03/2012 | CN101391397B grinding system |
10/03/2012 | CN101355028B Method for repairing grid pole oxide layer |
10/03/2012 | CN101346207B Laser material processing system |
10/03/2012 | CN101313246B Radiation-sensitive resin composition |
10/03/2012 | CN101303965B Method and apparatus for eliminating migration of etching pattern |
10/03/2012 | CN101283121B Methods and apparatus for epitaxial film formation |
10/03/2012 | CN101276111B Liquid crystal display panel, manufacturing method thereof, and liquid crystal display device |
10/03/2012 | CN101202305B Semiconductor device with improved source and drain and method of manufacturing the same |
10/03/2012 | CN101137269B Plasma processing apparatus of substrate and plasma processing method thereof |
10/03/2012 | CN101090025B Helix induction element with multilayer structure |
10/03/2012 | CN101053063B Apparatus and plasma ashing process for increasing photoresist removal rate |
10/03/2012 | CN101022107B Versatile semiconductor test structure array |
10/03/2012 | CN101015053B 半导体装置 Semiconductor device |
10/02/2012 | US8280664 XY-coordinate compensation apparatus and method in sample pattern inspection apparatus |
10/02/2012 | US8280632 Apparatus and method for inspecting overlapping figure, and charged particle beam writing apparatus |
10/02/2012 | US8280531 Method and computer program for controlling the heat treatment of metal workpieces |
10/02/2012 | US8280147 Pattern verification method, pattern verification apparatus, and pattern verification program |
10/02/2012 | US8279703 Sub-word line driver circuit and semiconductor memory device having the same |
10/02/2012 | US8279576 Electrostatic chuck |
10/02/2012 | US8279384 Substrate for display panel, liquid crystal display panel having the substrate, and method of manufacturing the same |
10/02/2012 | US8278802 Planarized sacrificial layer for MEMS fabrication |
10/02/2012 | US8278760 Semiconductor integrated circuit and method for manufacturing same, and mask |
10/02/2012 | US8278755 Heat dissipation structure for electronic device and fabrication method thereof |
10/02/2012 | US8278751 Methods of adhering microfeature workpieces, including a chip, to a support member |
10/02/2012 | US8278749 Integrated antennas in wafer level package |
10/02/2012 | US8278746 Semiconductor device packages including connecting elements |
10/02/2012 | US8278737 Structure for improving die saw quality |
10/02/2012 | US8278735 Yttrium and titanium high-k dielectric films |
10/02/2012 | US8278731 Semiconductor device having SOI substrate and method for manufacturing the same |
10/02/2012 | US8278730 High voltage resistance coupling structure |
10/02/2012 | US8278726 Controlling electromechanical behavior of structures within a microelectromechanical systems device |
10/02/2012 | US8278725 Micromechanical structure and a method of fabricating a micromechanical structure |
10/02/2012 | US8278722 Flat panel display device |
10/02/2012 | US8278721 Contact hole, semiconductor device and method for forming the same |
10/02/2012 | US8278718 Stressed barrier plug slot contact structure for transistor performance enhancement |
10/02/2012 | US8278717 Semiconductor memory device and method of manufacturing the same |
10/02/2012 | US8278716 Method of fabricating polysilicon, thin film transistor, method of fabricating the thin film transistor, and organic light emitting diode display device including the thin film transistor |
10/02/2012 | US8278714 Semiconductor device |
10/02/2012 | US8278713 Display device and manufacturing method thereof |
10/02/2012 | US8278708 Insulated gate type semiconductor device and method for fabricating the same |
10/02/2012 | US8278707 Field effect transistors having a double gate structure |
10/02/2012 | US8278700 Semiconductor device |
10/02/2012 | US8278686 Structure and method for forming planar gate field effect transistor with low resistance channel region |
10/02/2012 | US8278683 Lateral insulated gate bipolar transistor |
10/02/2012 | US8278660 Semiconductor device and method for manufacturing the same |
10/02/2012 | US8278659 Uniform large-grained and grain boundary location manipulated polycrystalline thin film semiconductors formed using sequential lateral solidification and devices formed thereon |
10/02/2012 | US8278592 Laser processing method |
10/02/2012 | US8278225 Hafnium tantalum oxide dielectrics |
10/02/2012 | US8278224 Flowable oxide deposition using rapid delivery of process gases |
10/02/2012 | US8278223 Method for forming hole pattern |
10/02/2012 | US8278222 Selective etching and formation of xenon difluoride |
10/02/2012 | US8278221 Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same |
10/02/2012 | US8278220 Method to direct pattern metals on a substrate |
10/02/2012 | US8278219 Method for purifying chemical added with chelating agent |
10/02/2012 | US8278218 Electrical conductor line having a multilayer diffusion barrier for use in a semiconductor device and method for forming the same |
10/02/2012 | US8278217 Semiconductor device and method of producing the same |
10/02/2012 | US8278216 Selective capping of copper |
10/02/2012 | US8278215 Noble metal activation layer |
10/02/2012 | US8278214 Through mold via polymer block package |
10/02/2012 | US8278213 Semiconductor device and manufacturing method of the same |
10/02/2012 | US8278212 Method for manufacturing semiconductor memory element and sputtering apparatus |
10/02/2012 | US8278211 Thin film forming method |
10/02/2012 | US8278210 Manufacturing method of semiconductor device |
10/02/2012 | US8278209 Method for manufacturing a semiconductor device using a hardmask layer |
10/02/2012 | US8278208 Semiconductor device having decreased contact resistance and method for manufacturing the same |
10/02/2012 | US8278207 Methods of manufacturing semiconductor devices |