| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/29/1980 | US4186410 Epitaxial growth, metal deposition, transistor |
| 01/29/1980 | US4186408 Field effect transistor, silicon substrate, silicon dioxide insulator layer |
| 01/29/1980 | US4186032 Superheated steam |
| 01/29/1980 | US4186017 Diazonium salt condensation product, stabilizer, polyurethane prepolymer |
| 01/29/1980 | US4185814 Pick up and placement head for green sheet and spacer |
| 01/29/1980 | US4185585 Apparatus for simultaneously processing a plurality of substrates |
| 01/29/1980 | CA1070854A1 Integrated semiconductor circuit arrangement |
| 01/29/1980 | CA1070853A1 Seal for a semiconductor device and method therefor |
| 01/29/1980 | CA1070836A1 Insulated gate field-effect transistor read-only memory cell |
| 01/24/1980 | WO1980000073A1 Diffusion boat and grip |
| 01/23/1980 | EP0007192A1 Process for preparing hetrojunction solar-cell devices |
| 01/23/1980 | EP0007108A1 A method of manufacturing a diffraction grating structure |
| 01/23/1980 | EP0007016A2 Voltage-to-charge transducer |
| 01/23/1980 | EP0007005A1 Method of producing field-effect transistors of the MOS type with self-aligned gate and contact vias |
| 01/23/1980 | EP0007004A1 Test circuit for a charge coupled device (CCD) register |
| 01/23/1980 | EP0006985A1 Method and device for the determination of the focal length of electrooptical lenses of long focal length |
| 01/23/1980 | EP0006983A1 Controlled-avalanche tension transistor that can be sensitive to a magnetic field |
| 01/23/1980 | EP0006975A1 Process for the non-destructive reading of an output signal coming from a CCD register and device therefor |
| 01/23/1980 | EP0006958A1 Complementary mis-semiconductor integrated circuits |
| 01/23/1980 | EP0006939A1 Positive type resist polymer composition and method of making resist patterns |
| 01/23/1980 | EP0006938A1 Positive type resist polymer composition and method of making resist patterns |
| 01/22/1980 | US4185319 Non-volatile memory device |
| 01/22/1980 | US4185294 Semiconductor device and a method for manufacturing the same |
| 01/22/1980 | US4185291 Junction-type field effect transistor and method of making the same |
| 01/22/1980 | US4185202 X-ray lithography |
| 01/22/1980 | US4184909 Masking, multilayer |
| 01/22/1980 | US4184908 With submicroscopic silica, simultaneous etching with iodine |
| 01/22/1980 | US4184897 Droplet migration doping using carrier droplets |
| 01/22/1980 | US4184896 At the silicon dioxide-silicon interface to control potential |
| 01/22/1980 | US4184428 Perforating-printing device for making and using thermal stencils |
| 01/22/1980 | CA1070437A2 Semiconductor integrated circuit device composed of insulated gate field-effect transistors |
| 01/22/1980 | CA1070436A1 Semiconductor integrated circuit device composed of insulated gate field-effect transistors |
| 01/22/1980 | CA1070427A1 N-channel storage field effect transistors |
| 01/22/1980 | CA1070264A1 Process for the production of etched structures in a surface of a solid body by ionic etching |
| 01/22/1980 | CA1070222A1 Zone refiner automatic control |
| 01/15/1980 | US4184207 High density floating gate electrically programmable ROM |
| 01/15/1980 | US4184188 Substrate clamping technique in IC fabrication processes |
| 01/15/1980 | US4184172 Semiconductor transistors |
| 01/15/1980 | US4184133 Assembly of microwave integrated circuits having a structurally continuous ground plane |
| 01/15/1980 | US4184085 Semiconductor memory device comprising a p-n junction in a polycrystalline semiconductor layer |
| 01/15/1980 | US4184043 Method of providing spacers on an insulating substrate |
| 01/15/1980 | US4183797 Two-sided bias sputter deposition method and apparatus |
| 01/15/1980 | US4183781 Stabilization process for aluminum microcircuits which have been reactive-ion etched |
| 01/15/1980 | US4183780 Photon enhanced reactive ion etching |
| 01/15/1980 | US4183460 In-situ test and diagnostic circuitry and method for CML chips |
| 01/15/1980 | US4183135 Hermetic glass encapsulation for semiconductor die and method |
| 01/15/1980 | US4183134 High yield processing for silicon-on-sapphire CMOS integrated circuits |
| 01/15/1980 | CA1070029A1 Methods for forming semiconductor waveguide devices |
| 01/15/1980 | CA1070028A1 Method of producing a semiconductor arrangement |
| 01/15/1980 | CA1070027A1 Method for manufacturing an oxide of semiconductor |
| 01/15/1980 | CA1070016A1 Semiconductor floating gate storage device |
| 01/15/1980 | CA1070015A1 Charge transfer memory |
| 01/09/1980 | EP0006810A1 Method of producing an integrated hybrid circuit |
| 01/09/1980 | EP0006706A1 Process for producing a semiconductor device having an insulating layer of silicon dioxide covered by a film of silicon oxynitride |
| 01/09/1980 | EP0006702A1 Semiconductor integrated memory circuit |
| 01/09/1980 | EP0006701A1 A process for channelling ion beams |
| 01/09/1980 | EP0006561A1 Light-sensitive composition |
| 01/09/1980 | EP0006510A1 Method of forming adjacent impurity regions of different doping in a silicon substrate |
| 01/09/1980 | EP0006509A1 Process for the manufacturing of a passivating coating on electronic circuits and material for the coating |
| 01/09/1980 | EP0006474A1 Method of compensating for the voltage coefficient of ion-implanted or diffused semiconductor resistors |
| 01/09/1980 | EP0006470A2 Charge coupled memory and method of manufacturing it |
| 01/09/1980 | EP0006466A2 Charge coupled device and method for operating this device |
| 01/09/1980 | EP0006465A1 Dual-channel charge-coupled semi-conductor device |
| 01/09/1980 | EP0006437A1 Method and device for adjusting and correcting the aberrations of an electrooptical condensor in a microprojector |
| 01/09/1980 | EP0006428A2 Constant voltage threshold semiconductor device |
| 01/09/1980 | EP0006125A1 Photopolymerisable mixture and light-sensitive coating material |
| 01/09/1980 | EP0006124A1 Photopolymerisable mixture and light-sensitive coating material |
| 01/09/1980 | EP0006119A1 Integrated junction field effect transistor and method for making same |
| 01/09/1980 | EP0006118A1 Process for vapor-phase growing of gallium arsenide containing a large concentration of germanium |
| 01/08/1980 | US4183093 Semiconductor integrated circuit device composed of insulated gate field-effect transistor |
| 01/08/1980 | US4183041 Self biasing of a field effect transistor mounted in a flip-chip carrier |
| 01/08/1980 | US4183040 Random memory intergrated circuit of doped polycrystalline silicon formed by self-registering electrical connection |
| 01/08/1980 | US4183039 Light emitting semiconductor device |
| 01/08/1980 | US4183037 Semiconductor device |
| 01/08/1980 | US4183036 Schottky-transistor-logic |
| 01/08/1980 | US4182965 Semiconductor device having two intersecting sub-diodes and transistor-like properties |
| 01/08/1980 | US4182781 Low cost method for forming elevated metal bumps on integrated circuit bodies employing an aluminum/palladium metallization base for electroless plating |
| 01/08/1980 | US4182646 Process of etching with plasma etch gas |
| 01/08/1980 | US4182636 Twice patterned oxidation barrier layer |
| 01/08/1980 | US4182265 Wafer support |
| 01/08/1980 | US4182025 Manufacture of electroluminescent display devices |
| 01/08/1980 | US4182024 Automatic control of integrated circuit trimming |
| 01/08/1980 | US4182023 Process for minimum overlap silicon gate devices |
| 01/08/1980 | CA1069620A1 Semiconductor device having a passivated surface |
| 01/01/1980 | US4181981 Bipolar two device dynamic memory cell |
| 01/01/1980 | US4181860 Radiant beam exposure method |
| 01/01/1980 | US4181755 Thin film pattern generation by an inverse self-lifting technique |
| 01/01/1980 | US4181751 Process for the preparation of low temperature silicon nitride films by photochemical vapor deposition |
| 01/01/1980 | US4181564 Fabrication of patterned silicon nitride insulating layers having gently sloping sidewalls |
| 01/01/1980 | US4181542 Channel-gate structure formed by double diffusion process |
| 01/01/1980 | US4181538 Method for making defect-free zone by laser-annealing of doped silicon |
| 01/01/1980 | US4181537 Method of fabricating an insulated gate field effect device |
| 01/01/1980 | US4181249 By use of an intermediate au-si alloy layer |
| 01/01/1980 | US4181214 Wafer transfer apparatus |
| 01/01/1980 | US4180893 Apparatus for cutting a segment from a strip of film and mounting the segment in a fixture |
| 01/01/1980 | CA1069221A Anodic etching method for the detection of electrically active defects in silicon |
| 01/01/1980 | CA1069220A Integrated circuit package |
| 12/25/1979 | US4180828 Hybrid circuit having a semiconductor circuit |
| 12/25/1979 | US4180827 NPN/PNP Fabrication process with improved alignment |
| 12/25/1979 | US4180826 MOS double polysilicon read-only memory and cell |