Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/1980
07/09/1980EP0012863A2 Method of making semiconductor devices with reduced parasitic capacitance
07/09/1980EP0012861A1 Method for the selective detection of defects, caused by polishing, on the surface of silicon wafers
07/09/1980EP0012859A2 Process for the deposition of a thin-film pattern on a substrate
07/09/1980EP0012843A1 Arrangements for semi-conductor components with Schottky contact
07/09/1980EP0012840A2 Line-addressable memory with serial-parallel-serial configuration
07/09/1980EP0012838A1 Ion source, especially for ion implantation apparatus
07/09/1980EP0012765A1 Method of operating a raster-scan electron beam lithographic system.
07/08/1980US4212083 MOS Integrated with implanted resistor elements
07/08/1980US4212031 Method of aligning a body
07/08/1980US4212025 Voltage dividing integrated circuit device
07/08/1980US4211834 Method of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure mask
07/08/1980US4211821 Monocrystalline like layers, processes of manufacturing such layers, and articles comprising such layers
07/08/1980US4211601 Device fabrication by plasma etching
07/08/1980US4211600 Pulling crystal from melt through slit
07/08/1980US4211587 Process for producing a metal to compound semiconductor contact having a potential barrier of predetermined height
07/08/1980US4211582 Process for making large area isolation trenches utilizing a two-step selective etching technique
07/08/1980US4211505 Fluidic transport intersection
07/08/1980US4211489 Photomask alignment system
07/08/1980US4210996 Trimming method for resistance value of polycrystalline silicon resistors especially used as semiconductor integrated circuit resistors
07/08/1980US4210993 Method for fabricating a field effect transistor
07/08/1980CA1081368A1 Field effect transistor with a short channel length
07/08/1980CA1081362A1 Balanced regenerative charge detection circuit for semiconductor charge transfer devices
07/08/1980CA1081351A1 Method of manufacturing a semiconductor laser
07/01/1980US4210950 High-ratio-accuracy capacitor geometries for integrated circuits
07/01/1980US4210926 Intermediate member for mounting and contacting a semiconductor body
07/01/1980US4210925 I2 L Integrated circuit and process of fabrication
07/01/1980US4210885 Thin film lossy line for preventing reflections in microcircuit chip package interconnections
07/01/1980US4210806 High brightness electron probe beam and method
07/01/1980US4210704 Electrical devices employing a conductive epoxy resin formulation as a bonding medium
07/01/1980US4210689 Self-aligning
07/01/1980US4210498 Camma-pyrones, nitrated catechols, and flavones as chelating agents
07/01/1980US4210486 Process for determining the effective doping agent content of hydrogen for the production of semiconductors
07/01/1980US4210473 Process for producing a semiconductor device
07/01/1980US4210472 Coating with dope to form p-n junction, mesa structure, diffusion, passivation
07/01/1980US4210470 Epitaxial tunnels from intersecting growth planes
07/01/1980US4210466 Silicon substrate, impurity diffusion coating metal electrodes, ion implantation
07/01/1980US4210465 CISFET Processing including simultaneous implantation of spaced polycrystalline silicon regions and non-memory FET channel
07/01/1980US4210464 Method of simultaneously controlling the lifetimes and leakage currents in semiconductor devices by hot electron irradiation through passivating glass layers
07/01/1980CA1080858A1 Semiconductor thyristor device
07/01/1980CA1080847A1 Charge coupled circuits
07/01/1980CA1080835A1 Method for forming p-n junctions
06/1980
06/26/1980WO1980001338A1 High voltage junction solid-state switch
06/26/1980WO1980001337A1 High voltage dielectrically isolated solid-state switch
06/26/1980WO1980001335A1 Dielectrically-isolated integrated circuit complementary transistors for high voltage use
06/26/1980WO1980001334A1 Semiconductor device
06/26/1980WO1980001333A1 Semiconductor device production
06/26/1980WO1980001321A1 Dry film photoresist
06/25/1980EP0012667A1 Method of filtering an electric signal by charge transfer in a semi-conductor and switched capacitor filter utilizing such a method
06/25/1980EP0012561A1 Semiconductor charge transfer devices
06/25/1980EP0012545A1 Semiconductor integrated circuit and fabrication method
06/25/1980EP0012393A1 Clock controlled monolithically integrable scanning circuit
06/25/1980EP0012327A1 Lithographic reactive ion etching method
06/25/1980EP0012324A1 Method for forming contacts on shallow semiconductor regions
06/25/1980EP0012244A1 Programmable logic array
06/25/1980EP0012220A1 Method of making a Schottky contact with a self aligned guard ring
06/24/1980US4209849 Non-volatile memory which can be erased word by word constructed in the floating gate technique
06/24/1980US4209797 Complementary semiconductor device
06/24/1980US4209796 Charge-flow transistors having metallization patterns
06/24/1980US4209795 Reducing storage effect
06/24/1980US4209716 Semiconductor integrated circuit with implanted resistor element in second-level polycrystalline silicon layer
06/24/1980US4209702 Multiple electron lens
06/24/1980US4209477 Dielectric or semiconductive films
06/24/1980US4209358 Method of fabricating a microelectronic device utilizing unfilled epoxy adhesive
06/24/1980US4209357 Plasma reactor apparatus
06/24/1980US4209356 Selective etching of polymeric materials embodying silicones via reactor plasmas
06/24/1980US4209355 Manufacture of bumped composite tape for automatic gang bonding of semiconductor devices
06/24/1980US4209350 Method for forming diffusions having narrow dimensions utilizing reactive ion etching
06/24/1980US4209349 Method for forming a narrow dimensioned mask opening on a silicon body utilizing reactive ion etching
06/24/1980US4209257 Apparatus for detecting defects in patterns
06/24/1980US4208781 Semiconductor integrated circuit with implanted resistor element in polycrystalline silicon layer
06/24/1980US4208780 Last-stage programming of semiconductor integrated circuits including selective removal of passivation layer
06/24/1980US4208760 Apparatus and method for cleaning wafers
06/24/1980CA1080355A1 Double split-electrode for charge transfer device
06/24/1980CA1080238A1 Polymerisable esters
06/17/1980US4208726 Programming of semiconductor read only memory
06/17/1980US4208670 One-transistor storage element and a process for the production thereof
06/17/1980US4208668 Charge coupled device with buried zones in a semiconductor substrate for use especially as a light sensor
06/17/1980US4208595 Substrate generator
06/17/1980US4208257 Method of forming an interconnection
06/17/1980US4208241 Device fabrication by plasma etching
06/17/1980US4208211 Dry treatment of integrated circuits
06/17/1980US4208159 Apparatus for the treatment of a wafer by plasma reaction
06/17/1980US4207670 Method for making a solid state neuron
06/17/1980CA1079868A1 Plastic encapsulated semiconductor devices and method of making same
06/17/1980CA1079867A1 Schottky barrier contact and methods of fabrication thereof
06/17/1980CA1079866A1 Fet one-device memory cells with two layers of polycrystalline silicon
06/17/1980CA1079865A2 Semiconductor integrated circuit device composed of insulated gate field-effect transistors
06/17/1980CA1079864A1 Process for making field effect and bipolar transistors on the same semiconductor chip
06/17/1980CA1079863A1 Method of gettering using backside polycrystalline silicon
06/17/1980CA1079819A1 Mtl (merged transistor logic) or i2l (integrated injection logic) circuitry
06/17/1980CA1079683A1 Forming feedthrough connections for multilevel interconnection metallurgy systems
06/17/1980CA1079612A1 Method and apparatus for reducing residual stresses in crystals
06/17/1980CA1079566A1 Method for manufacturing a mask with an aspect ratio>1
06/17/1980CA1079565A1 Dot-etchable photopolymerizable elements and image reproduction process
06/12/1980WO1980001222A1 Method of manufacturing semiconductor laser devices
06/12/1980WO1980001220A1 Three-dimensionally structured microelectronic device
06/11/1980EP0012019A1 An electrode for a semiconductor device and method of making such an electrode
06/11/1980EP0011988A1 Laser beam annealing
06/11/1980EP0011979A1 Processor-controlled drive apparatus for a semiconductor-wire bonder and method of operating same
06/11/1980EP0011964A1 Semiconductor device including a diode and a bipolar transistor
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