Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/1981
03/24/1981US4257827 Using lasers to displace impurities and crystal defects to a surface of a semiconductor
03/24/1981US4257826 Photoresist masking in manufacture of semiconductor device
03/24/1981US4257825 Method of manufacturing semiconductor devices having improvements in device reliability by thermally treating selectively implanted test figures in wafers
03/24/1981US4257824 Photo-induced temperature gradient zone melting
03/24/1981US4257156 First and second metallic coating layers on semiconductor
03/19/1981WO1981000791A1 Ram having a stabilized substrate bias and low-threshold narrow-width transfer gates
03/19/1981WO1981000790A1 Silicon gate non-volatile memory device
03/19/1981WO1981000789A1 Improved method of crystallizing amorphous material with a moving energy beam
03/19/1981WO1981000784A1 Electron beam system
03/19/1981WO1981000681A1 Boat for wafer processing
03/18/1981EP0025380A1 Process for transferring onto a support the true shadow of a mask pierced with regularly distributed slits, and application of this process to photolithography in particular
03/18/1981EP0025362A2 A semiconductor light emitting device
03/18/1981EP0025325A2 Semiconductor memory device and the process for producing the same
03/18/1981EP0025324A2 Semiconductor light-emitting device
03/18/1981EP0025311A2 Non-volatile semiconductor memory device
03/18/1981EP0025289A2 Semiconductor memory device with multi-emitter transistor cells
03/18/1981EP0025261A1 A method of manufacturing a semiconductor device
03/18/1981EP0025250A1 Display device
03/18/1981EP0025247A1 Anti-contamination diaphragm for an electron beam apparatus
03/18/1981EP0025177A2 Monolithic integrated circuit comprising a two-dimensional image sensor
03/18/1981EP0025176A2 Integrated circuit to differentiate between two charges
03/18/1981EP0025173A2 Integrated rectifier circuit
03/18/1981EP0025169A2 Integrated circuit with two CTD arrangements
03/18/1981EP0025167A2 Input stage for a monolithic integrated charge transfer device
03/18/1981EP0025155A2 Nonvolatile semiconductor memory device
03/18/1981EP0025130A2 High-density read-only memory
03/18/1981EP0025129A2 Process for the formation of isolation regions in silicon
03/18/1981EP0025102A1 Large scale integrated programmable logic array
03/18/1981EP0025088A2 Photoresist films, processes for their production and process for modifying substrate surfaces
03/18/1981EP0025057A1 Thermo-compression bonding a semiconductor to strain buffer.
03/18/1981EP0025050A1 Dielectrically isolated high voltage semiconductor devices.
03/18/1981EP0025038A1 Process and equipment for copying masks on a piece
03/18/1981EP0025036A1 Process for focusing a mask image onto a workpiece.
03/17/1981US4257061 Thermally isolated monolithic semiconductor die
03/17/1981US4257060 Semiconductor switch
03/17/1981US4256974 Metal oxide semiconductor (MOS) input circuit with hysteresis
03/17/1981US4256829 Method of manufacturing solid-state devices in which planar dimensional distortion is reduced
03/17/1981US4256816 Three layer lift-off stencil of photoresist-metal-photoresist type
03/17/1981US4256792 Thermoconductivity, casting, sintering
03/17/1981US4256778 Method of inspecting and retouching a photo mask
03/17/1981US4256534 Of aluminum using reactive boron trichloride-chlorine mixture
03/17/1981US4256532 Method for making a silicon mask
03/17/1981US4256520 Etching of gallium stains in liquid phase epitoxy
03/17/1981US4256515 P-n-p and n-p-n transistors
03/17/1981US4256514 Method for forming a narrow dimensioned region on a body
03/17/1981US4256229 Boat for wafer processing
03/17/1981US4255851 Method and apparatus for indelibly marking articles during a manufacturing process
03/17/1981CA1097826A1 Method for forming isolated regions of silicon
03/17/1981CA1097825A1 High performance bipolar device and method for making same
03/17/1981CA1097824A1 Semiconductor switching device
03/17/1981CA1097813A1 Charge injection transistor memory
03/17/1981CA1097809A1 Charge-coupled-device quantizing circuit
03/17/1981CA1097808A1 Input circuit for inserting charge packets into a charge-transfer device
03/17/1981CA1097770A1 Controls for semiconductor wafer orientor
03/11/1981EP0024923A1 Transistor structure
03/11/1981EP0024918A2 Method of producing dynamic random-access memory cells
03/11/1981EP0024916A2 Improved positive-working resist materials and their use in a formation of a negative resist pattern on a substrate
03/11/1981EP0024903A2 A MIS device including a substrate bias generating circuit
03/11/1981EP0024896A2 A semiconductor device and a method of manufacturing the device
03/11/1981EP0024884A2 Method of detecting the position of a substrate using an electron beam
03/11/1981EP0024883A2 Semiconductor integrated memory device
03/11/1981EP0024775A2 A silver containing thick film conductor composition, a method for producing such a composition, a method of preparing a solar cell comprising screen printing said composition on an n-type layer of a semiconductor wafer and the solar cells thus obtained
03/11/1981EP0024735A2 Nonvolatile semiconductor memory device
03/11/1981EP0024657A2 Thyristor with continuous emitter shunt
03/11/1981EP0024625A2 Method of producing an electrical contact on a Si substrate
03/11/1981EP0024614A1 Process for purifying crude silicon
03/11/1981EP0024572A2 Electrically conductive contact or metallizing structure for semiconductor substrates
03/11/1981EP0024571A2 Selective metal removal in the presence of a metal silicide
03/10/1981US4255756 Substrate bias generator
03/10/1981US4255755 Heterostructure semiconductor device having a top layer etched to form a groove to enable electrical contact with the lower layer
03/10/1981US4255677 Charge pump substrate bias generator
03/10/1981US4255674 Semiconductor device having a multiple-emitter transistor
03/10/1981US4255673 Input charge corrected monolithically integrated charge transfer device (CTD) arrangement
03/10/1981US4255672 Large scale semiconductor integrated circuit device
03/10/1981US4255671 IIL Type semiconductor integrated circuit
03/10/1981US4255513 Photosensitive iniating mixture comprising an oxime ester and a p-dialkylaminobenzene; synergistic
03/10/1981US4255230 Plasma etching process
03/10/1981US4255229 Stripping fuses and connectors, etching raised doped oxide layer
03/10/1981US4255210 Method for manufacturing a read-only memory device
03/10/1981US4255209 Process of fabricating an improved I2 L integrated circuit utilizing diffusion and epitaxial deposition
03/10/1981US4255207 Fabrication of isolated regions for use in self-aligning device process utilizing selective oxidation
03/10/1981US4255206 Epitaxially depositing a layer
03/10/1981US4254590 Method for the production of a disk-shaped silicon semiconductor component with negative beveling
03/10/1981US4254548 Method of fabricating electrode plate for supporting semiconductor device
03/10/1981CA1097434A1 Semiconductor etching process
03/10/1981CA1097433A1 Method for manufacturing a layer of amorphous silicon usable in an electronic device
03/10/1981CA1097432A1 Method of etching a semiconductor device
03/10/1981CA1097431A1 Molecular beam deposition process
03/10/1981CA1097430A1 Semiconductor device
03/10/1981CA1097429A1 Method of manufacturing a charge transfer device
03/10/1981CA1097124A1 Photosensitive composition including a halogen- containing diazonium salt and an organic salt-forming dye
03/05/1981WO1981000646A1 Device manufacture involving pattern delineation in thin layers
03/04/1981EP0024320A2 Method of manufacturing thermally sensitive semiconductor switch
03/04/1981EP0024311A2 Process for producing a high-density integrated read-only memory
03/03/1981US4254428 Making further miniaturization of computers possible
03/03/1981US4254427 Semiconductor device having a compact read-only memory
03/03/1981US4254426 Pretreatment with carbon-containing film
03/03/1981US4254340 High current ion implanter
03/03/1981US4254197 Bis-azide photocrosslinker, polymer, dihydric alcohol fluidizer
03/03/1981US4254161 Prevention of low pressure chemical vapor deposition silicon dioxide undercutting and flaking