| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 05/08/1985 | EP0139835A2 Plasma reactor apparatus and method |
| 05/08/1985 | EP0139833A2 CMOS transmission circuit |
| 05/08/1985 | EP0139764A1 Method of manufacturing thin-film integrated devices |
| 05/08/1985 | EP0139663A1 Self-aligned ldmos and method |
| 05/07/1985 | US4516254 X-Ray lithographic apparatus |
| 05/07/1985 | US4516223 Semiconductor read-only memory |
| 05/07/1985 | US4516149 Semiconductor device having ribbon electrode structure and method for fabricating the same |
| 05/07/1985 | US4516147 Semiconductor device having a substrate covered with a high impurity concentration first polycrystalline layer and then a lower impurity concentration second polycrystalline layer |
| 05/07/1985 | US4516145 Reduction of contact resistance in CMOS integrated circuit chips and the product thereof |
| 05/07/1985 | US4516143 Self-aligned power MOSFET with integral source-base short and methods of making |
| 05/07/1985 | US4516123 Integrated circuit including logic array with distributed ground connections |
| 05/07/1985 | US4516030 Scanning electron beam exposure system |
| 05/07/1985 | US4516029 E beam stage with below-stage X-Y drive |
| 05/07/1985 | US4515898 Glass bonding means and method |
| 05/07/1985 | US4515887 Photopatternable dielectric compositions, method for making and use |
| 05/07/1985 | US4515668 Dopes, sputtering, semiconductors |
| 05/07/1985 | US4515654 Method for making semiconductor devices utilizing eutectic masks |
| 05/07/1985 | US4515652 Plasma sculpturing with a non-planar sacrificial layer |
| 05/07/1985 | US4515642 Method of forming deep aluminum doped silicon by implanting Al and Si ions through alumina layer and device formed thereby |
| 05/07/1985 | US4515481 Apparatus for processing a signal for aligning |
| 05/07/1985 | US4515107 Apparatus for the manufacture of photovoltaic devices |
| 05/07/1985 | US4515104 Contiguous wafer boat |
| 05/07/1985 | US4514898 Method of making a self protected thyristor |
| 05/07/1985 | US4514895 Method of forming field-effect transistors using selectively beam-crystallized polysilicon channel regions |
| 05/07/1985 | US4514894 Semiconductor integrated circuit device manufacturing method |
| 05/07/1985 | US4514893 Fabrication of FETs |
| 05/07/1985 | CA1186811A1 Method for producing a vertical channel transistor |
| 05/07/1985 | CA1186809A1 Method for defining submicron features in semiconductor devices |
| 05/07/1985 | CA1186808A1 Method of fabrication of dielectrically isolated cmos device with an isolated slot |
| 05/07/1985 | CA1186805A1 Insulation process for integrated circuits |
| 05/07/1985 | CA1186787A1 Magnetic gas gate |
| 05/07/1985 | CA1186601A1 Radiation induced deposition of metal on semiconductor surfaces |
| 05/07/1985 | CA1186600A1 Method of forming patterns |
| 05/07/1985 | CA1186599A1 Epitaxial crystals and fabrication thereof |
| 05/07/1985 | CA1186523A1 Coating of plant seeds |
| 05/02/1985 | EP0139587A2 Fabrication process for a dielectric isolated complementary ic |
| 05/02/1985 | EP0139585A1 Process for producing of a thin film transistor with self-aligned gate |
| 05/02/1985 | EP0139549A1 Method for aligning a connecting line above an electrical contact hole of an integrated circuit |
| 05/02/1985 | EP0139505A1 Proximity doping of multilayered amorphous semiconductors |
| 05/02/1985 | EP0139488A1 A method for sputtering a pin or nip amorphous silicon semiconductor device with the P and N-layers sputtered from boron and phosphorus heavily doped targets |
| 05/02/1985 | EP0139487A1 A method for sputtering a pin or nip amorphous silicon semi-conductor device having partially crystallised P and N-layers |
| 05/02/1985 | EP0139467A1 Method of manufacturing an insulated-gate field-effect transistor |
| 05/02/1985 | EP0139435A2 Improving compound semiconductor crystal by heat treatment and crystals improved thereby |
| 05/02/1985 | EP0139428A2 High-density semiconductor memory device |
| 05/02/1985 | EP0139427A1 Semiconductor integrated circuit device |
| 05/02/1985 | EP0139409A1 Method of forming photovoltaic quality amorphous alloys by passivating defect states |
| 05/02/1985 | EP0139377A1 Apparatus and methods for ion implantation |
| 05/02/1985 | EP0139371A1 Process for manufacturing a MOS integrated circuit employing a method of forming refractory metal silicide areas |
| 05/02/1985 | EP0139364A2 Multiple path signal distribution to large scale integration chips |
| 05/02/1985 | EP0139334A2 Semiconductor-glass support structure and devices provided with such a structure |
| 05/02/1985 | EP0139325A1 Electron lithography apparatus |
| 05/02/1985 | EP0139266A2 A semiconductor integrated circuit device comprising an MOS transistor and a bipolar transistor and a manufacturing method of the same |
| 05/02/1985 | EP0139205A2 Method of producing semiconductor components having a metal substrate |
| 05/02/1985 | EP0139165A2 Method of making a trench isolated integrated circuit device |
| 05/02/1985 | EP0139134A2 Deposition and diffusion source control means and method |
| 05/02/1985 | EP0139130A1 Method for making a high performance transistor integrated circuit and the resulting integrated circuit |
| 05/02/1985 | EP0139063A1 Substition method for an electronic component connected to the conductor tracks of a substrate carrier |
| 05/02/1985 | EP0139027A1 Monolithic integrated circuit with at least one integrated resistor |
| 05/02/1985 | EP0139019A1 Semiconductor device and method of manufacture thereof |
| 05/02/1985 | EP0138978A1 Method of manufacturing a semiconductor device having small dimensions. |
| 05/02/1985 | EP0138963A1 Diethylberyllium dopant source for mocvd grown epitaxial semiconductor layers. |
| 04/30/1985 | US4514857 X-Ray lithographic system |
| 04/30/1985 | US4514830 Defect-remediable semiconductor integrated circuit memory and spare substitution method in the same |
| 04/30/1985 | US4514752 Displacement compensating module |
| 04/30/1985 | US4514751 Compressively stresses titanium metallurgy for contacting passivated semiconductor devices |
| 04/30/1985 | US4514749 VLSI Chip with ground shielding |
| 04/30/1985 | US4514682 Secondary electron spectrometer for measuring voltages on a sample utilizing an electron probe |
| 04/30/1985 | US4514646 Semiconductor integrated circuit device including a protective resistor arrangement for output transistors |
| 04/30/1985 | US4514638 Electron-optical system with variable-shaped beam for generating and measuring microstructures |
| 04/30/1985 | US4514637 Atomic mass measurement system |
| 04/30/1985 | US4514636 Ion treatment apparatus |
| 04/30/1985 | US4514440 Spin-on dopant method |
| 04/30/1985 | US4514321 Thick film conductor compositions |
| 04/30/1985 | US4514265 Electrodeposition by modulating current |
| 04/30/1985 | US4514254 Groundplane post-etch anodization |
| 04/30/1985 | US4514253 By masking, photolithography |
| 04/30/1985 | US4514252 Technique of producing tapered features in integrated circuits |
| 04/30/1985 | US4514251 Heat treatment to obtain doped etching-resistant negtives |
| 04/30/1985 | US4514233 Method of making improved aluminum metallization in self-aligned polysilicon gate technology |
| 04/30/1985 | US4514130 Substrate elevator mechanisms |
| 04/30/1985 | US4513942 Plate molding apparatus with interlocking cavity plates |
| 04/30/1985 | US4513905 Nitride barrier layer to improve conductor bonding |
| 04/30/1985 | US4513855 Substrate elevator mechanisms |
| 04/30/1985 | US4513684 Upstream cathode assembly |
| 04/30/1985 | US4513494 Late mask process for programming read only memories |
| 04/30/1985 | CA1186420A1 Method of forming a thin film transistor |
| 04/30/1985 | CA1186280A1 Multiple chamber deposition and isolation system and method |
| 04/30/1985 | CA1186193A1 Clean room wiper |
| 04/25/1985 | WO1985001836A1 Semiconductor integrated circuits containing complementary metal oxide semiconductor devices |
| 04/25/1985 | WO1985001834A1 Optical exposure apparatus |
| 04/25/1985 | WO1985001751A1 Method and apparatus for fabricating devices using reactive ion etching |
| 04/25/1985 | EP0074378A4 Semiconductor device including plateless package. |
| 04/25/1985 | EP0070862A4 Button rectifier package for non-planar die. |
| 04/24/1985 | EP0138650A1 Integrated circuit chip wiring arrangement providing reduced circuit inductance and controlled voltage gradients |
| 04/24/1985 | EP0138645A1 Procedure for measuring the depth of an ion-etching |
| 04/24/1985 | EP0138639A2 Inspection method for mask pattern used in semiconductor device fabrication |
| 04/24/1985 | EP0138638A2 Field effect transistor having an ultra-short gate and a horizontal structure, and process for manufacturing the same |
| 04/24/1985 | EP0138602A2 Method of fabricating a photomask pattern |
| 04/24/1985 | EP0138563A2 Lateral transistors |
| 04/24/1985 | EP0138517A1 Semiconductor integrated circuits containing complementary metal oxide semiconductor devices |