Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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01/02/1986 | EP0166121A2 Integrated circuit isolation structure and method of making it |
01/02/1986 | EP0166120A1 A method of gas plasma depositing a film of insulating material |
01/02/1986 | EP0166119A1 Method for depositing material with nanometer dimensions |
01/02/1986 | EP0166032A2 Carrier rack of quartz glass for substrate wafers |
01/02/1986 | EP0166004A1 Proximity effect correction method for E-beam lithography |
01/02/1986 | EP0166003A1 Semiconductor integrated circuit |
01/02/1986 | EP0165971A1 Method of making a bipolar junction transistor. |
12/31/1985 | US4562513 Process for forming a high density metallurgy system on a substrate and structure thereof |
12/31/1985 | US4562455 Semiconductor element |
12/31/1985 | US4562453 Complementary metal-oxide semiconductor integrated circuit device of master slice type |
12/31/1985 | US4562452 Charge coupled device having meandering channels |
12/31/1985 | US4562451 Semiconductor device having a resistor region with an enhanced breakdown voltage |
12/31/1985 | US4562100 Polyimide coating compositions from diesterified anhydride and aromatic diamine |
12/31/1985 | US4561960 Treating several pairs of substrates at same time |
12/31/1985 | US4561932 Method of producing integrated silicon structures on isolated islets of the substrate |
12/31/1985 | US4561916 Method of growth of compound semiconductor |
12/31/1985 | US4561915 Process for epitaxial growth on a corrugated wafer |
12/31/1985 | US4561907 Process for forming low sheet resistance polysilicon having anisotropic etch characteristics |
12/31/1985 | US4561906 Doping polysilicon applying absorption mask, applying laser to diffuse dopant, forming additional connectors |
12/31/1985 | US4561773 Projection exposure apparatus |
12/31/1985 | US4561688 Method of and apparatus for adsorbingly fixing a body |
12/31/1985 | US4561219 Process and apparatus for finishing electronic device |
12/31/1985 | US4561173 Method of manufacturing a wiring system |
12/31/1985 | US4561172 Integrated circuit fabrication method utilizing selective etching and oxidation to form isolation regions |
12/31/1985 | US4561171 Process of gettering semiconductor devices |
12/31/1985 | US4561170 Method of making field-plate isolated CMOS devices |
12/31/1985 | US4561169 Method of manufacturing semiconductor device utilizing multilayer mask |
12/31/1985 | US4561168 Method of making shadow isolated metal DMOS FET device |
12/31/1985 | CA1198833A1 Tape-automated-bonding of integrated circuits |
12/31/1985 | CA1198832A1 Polycrystalline silicon diode with metal silicide contact |
12/31/1985 | CA1198831A1 Nondestructive dimensional detection system |
12/31/1985 | CA1198797A1 X-y addressable workpiece positioner having an improved x-y address indicia sensor |
12/31/1985 | CA1198620A1 Process for fabricating semiconductor devices |
12/27/1985 | EP0165871A1 Process and appliance for the handling of circular plates, for their registration by a laser beam |
12/27/1985 | EP0165863A1 Method of manufacturing at least one thin film field-effect transistor, and transistor produced by this method |
12/27/1985 | EP0165826A1 Photoelectrochemical etching of a semiconductor body |
12/27/1985 | EP0165798A1 Semiconductor device comprising N-channel and P-channel transistors and production method |
12/27/1985 | EP0165772A2 Charged particle sources |
12/27/1985 | EP0165766A1 Integrated circuit filter |
12/27/1985 | EP0165686A2 Method for repairing a photomask by laser-induced polymer degradation |
12/27/1985 | EP0165685A2 Laser-based system for the total repair of photomasks |
12/27/1985 | EP0165626A1 Method of manufacturing an electronic microcircuit provided with contact elevations |
12/27/1985 | EP0165618A2 Glow-discharge decomposition apparatus |
12/27/1985 | EP0165575A2 Method for forming vias in a planar structure |
12/27/1985 | EP0165547A2 A method of forming a shallow doped region in a semiconductor substrate |
12/27/1985 | EP0165538A2 A resistor for a group III-V intermetallic compound semiconductor integrated circuit |
12/27/1985 | EP0165513A2 Semiconductor contact metal protection |
12/27/1985 | EP0165507A2 Phosphoric triamides and polymers thereof as dopants |
12/27/1985 | EP0165493A2 Liquid replenishing apparatus |
12/27/1985 | EP0165449A1 Process for making semi-conductor films |
12/27/1985 | EP0165433A2 High-speed field-effect transistor |
12/27/1985 | EP0165427A2 Semiconductor package substrate and manufacturing process |
12/27/1985 | EP0165400A1 Apparatus for plasma etching |
12/27/1985 | EP0165364A1 Method of standardization and stabilization of semiconductor wafers |
12/27/1985 | EP0165314A1 Method for making a conductive silicon substrate and a semiconductor device formed therein |
12/27/1985 | EP0165309A1 High-bandwidth, high radiance, surface emitting led, and method therefor |
12/24/1985 | US4561009 Semiconductor device |
12/24/1985 | US4561004 High density, electrically erasable, floating gate memory cell |
12/24/1985 | US4561003 Field effect transistor |
12/24/1985 | US4560880 Apparatus for positioning a workpiece in a localized vacuum processing system |
12/24/1985 | US4560642 Method of manufacturing a semiconductor device |
12/24/1985 | US4560640 Glycidol methacrylate and methacryloyloxybenzalacetophenones; for integrated circuits |
12/24/1985 | US4560636 Novolaks and naphthoquinone diazides; rough surface |
12/24/1985 | US4560590 Floating substrate on gaseous medium in confined passageways; |
12/24/1985 | US4560583 Doping, calibration resistance, forming metal contactors with precise positioning |
12/24/1985 | US4560582 Single crystal silicon substrate; double doping with arsenic or boron and phosphorous |
12/24/1985 | US4560436 Process for etching tapered polyimide vias |
12/24/1985 | US4560435 Placing stencil over critical areas beford back-etching |
12/24/1985 | US4560422 Method for forming integrated circuits bearing polysilicon of reduced resistance |
12/24/1985 | US4560421 Forming insulative film on substrate, masking, removal of mask pattern, and selectively etching to give isolation regions |
12/24/1985 | US4560420 Reflecting and absorbing radiant energy |
12/24/1985 | US4560419 Doping different regions with two different types of impurities and heat treating |
12/24/1985 | US4560278 Fixed-slit type photoelectric microscope |
12/24/1985 | US4560217 Chip carrier connector |
12/24/1985 | US4560084 Heater preform for sealing a closure |
12/24/1985 | US4559696 Doping silicon with carbon and nitrogen |
12/24/1985 | US4559693 Process for fabricating field effect transistors |
12/20/1985 | CN85100896A Method for passivating the surface of semiconductors |
12/19/1985 | WO1985005758A1 Gaseous lock for entrance and exit of tunnel, in which transport and processing of wafers take place under double floating condition |
12/19/1985 | WO1985005757A1 Apparatus for double floating wafer transport and processing |
12/19/1985 | WO1985005736A1 Tri-well cmos technology |
12/19/1985 | WO1985005735A1 Integrated circuit package |
12/19/1985 | WO1985005734A1 Film for machining wafers |
12/18/1985 | EP0165148A1 Assembly process for at least two ceramic pieces each having at least one plane surface |
12/18/1985 | EP0165085A1 Method of manufacturing aluminium contacts through a thick insulating layer in a circuit |
12/18/1985 | EP0165055A2 Method and apparatus for exposing photoresist by using an electron beam and controlling its voltage and charge |
12/18/1985 | EP0165027A2 Thin film field effect transistors utilizing a polypnictide semiconductor |
12/18/1985 | EP0164976A2 Method of producing a contact for a semiconductor device |
12/18/1985 | EP0164928A2 Vertical hot wall CVD reactor |
12/18/1985 | EP0164924A2 Step coverage method for dielectrics in VLSI circuits |
12/18/1985 | EP0164892A1 Horizontal furnace apparatus |
12/18/1985 | EP0164841A1 Ceramic composition for dielectrics |
12/18/1985 | EP0164829A1 Semiconductor memory device and method of manufacturing the same |
12/18/1985 | EP0164820A2 Mask structure for x-ray lithography and method for making same |
12/18/1985 | EP0164781A2 A self-aligned split gate EPROM and a method of manufacturing the same |
12/18/1985 | EP0164750A2 Antireflective coatings for use in the manufacture of semiconductor devices, methods and solutions for making such coatings, and the method for using such coatings to absorb light in ultraviolet photolithography processes |
12/18/1985 | EP0164737A2 A method of fabricating self-aligned regions in a substrate |
12/18/1985 | EP0164729A2 Control system for an engine |
12/18/1985 | EP0164720A2 An ohmic contact for an intermetallic compound semiconductor and a method of providing such a contact |
12/18/1985 | EP0164715A2 Microwave ion source |