Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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05/13/1986 | US4589005 Charge transfer device having improved electrodes |
05/13/1986 | US4589004 Semiconductor device monolithically comprising a V-MOSFET and bipolar transistor isolated from each other |
05/13/1986 | US4588950 Test system for VLSI digital circuit and method of testing |
05/13/1986 | US4588942 Thickness monitoring system for intermittently exposing a quartz crystal to a material to be deposited |
05/13/1986 | US4588928 Electron emission system |
05/13/1986 | US4588801 Polysilane positive photoresist materials and methods for their use |
05/13/1986 | US4588675 Vapor deposition of metal film onto substrate, impregnation with polymerizable material, and polymerization |
05/13/1986 | US4588671 Quione diazide, iodine |
05/13/1986 | US4588610 Ammonia or hydrazine, monosilane or polysilane, ultraviolet light |
05/13/1986 | US4588609 Process for the photochemical vapor deposition of aromatic polymers |
05/13/1986 | US4588571 Process for the purification of silicon by the action of an acid |
05/13/1986 | US4588473 Semiconductor wafer process |
05/13/1986 | US4588472 Piezoresistive pressure sensor, diaphragm configuration, dopes, masking, epitaxial, etching |
05/13/1986 | US4588455 Planar diffusion source |
05/13/1986 | US4588454 Diffusion of dopant into a semiconductor wafer |
05/13/1986 | US4588451 Metal organic chemical vapor deposition of 111-v compounds on silicon |
05/13/1986 | US4588447 Method of eliminating p-type electrical activity and increasing channel mobility of Si-implanted and recrystallized SOS films |
05/13/1986 | US4588421 Aqueous silica compositions for polishing silicon wafers |
05/13/1986 | US4588379 Configuration for temperature treatment of substrates, in particular semi-conductor crystal wafers |
05/13/1986 | US4588343 Workpiece lifting and holding apparatus |
05/13/1986 | US4588342 IC magazine supply system |
05/13/1986 | US4588293 Method and apparatus for inspecting photomasks to detect defects |
05/13/1986 | US4588185 Transfer device of sheet object |
05/13/1986 | US4587928 Impeameable process tube of sintered silicon carbide |
05/13/1986 | US4587771 Process for the backside-gettering surface treatment of semiconductor wafers |
05/13/1986 | US4587720 Process for the manufacture of a self-aligned thin-film transistor |
05/13/1986 | US4587719 Method of fabrication of long arrays using a short substrate |
05/13/1986 | US4587718 Forming silicon dioxide and silicon nitride segments, pattering, heating with metal to give silicide |
05/13/1986 | US4587713 Method for making vertical MOSFET with reduced bipolar effects |
05/13/1986 | US4587712 Method for making vertical channel field controlled device employing a recessed gate structure |
05/13/1986 | US4587711 Process for high density VLSI circuits, having self-aligned gates and contacts for FET devices and conducting lines |
05/13/1986 | US4587710 Method of fabricating a Schottky barrier field effect transistor |
05/13/1986 | US4587709 Method of making short channel IGFET |
05/13/1986 | CA1204527A1 Polymeric films for electronic circuits |
05/13/1986 | CA1204526A1 Liquid phase epitaxial growth method |
05/13/1986 | CA1204525A1 Method for forming an isolation region for electrically isolating elements |
05/13/1986 | CA1204524A1 Semiconductor device having a protection circuit |
05/13/1986 | CA1204521A1 Semiconductor device |
05/13/1986 | CA1204370A1 Method of forming a shallow and high conductivity boron doped layer in silicon |
05/10/1986 | CN85108969A 互补半导体器件 Complementary semiconductor device |
05/10/1986 | CN85108470A Manufacturing apparatus |
05/10/1986 | CN85108008A Horizontal structure transistor and method of fabrication |
05/10/1986 | CN85107627A Process for making isothemal power transistor |
05/09/1986 | WO1986002779A1 Nonvolatile memory cell |
05/09/1986 | WO1986002778A1 Folded logic gate |
05/09/1986 | WO1986002777A1 Process for forming isolation regions in a semiconductor substrate |
05/09/1986 | WO1986002776A1 Technique for the growth of epitaxial compound semiconductor films |
05/09/1986 | WO1986002744A1 Method of producing devices using nonplanar lithography |
05/07/1986 | EP0180457A2 Semiconductor integrated circuit device and method for producing same |
05/07/1986 | EP0180430A2 A process of reducing a wafer size |
05/07/1986 | EP0180373A2 Automated single slice powered load lock plasma reactor |
05/07/1986 | EP0180363A2 Horizontal structure transistor and method of fabrication |
05/07/1986 | EP0180315A2 High breakdown voltage semiconductor device |
05/07/1986 | EP0180268A1 Process for manufacturing a semiconductor device, including a plasma treatment |
05/07/1986 | EP0180256A1 Method of manufacturing contacts on a semiconductor device |
05/07/1986 | EP0180255A2 Semiconductor device comprising a bipolar transistor and an insulated-gate FET |
05/07/1986 | EP0180222A2 Surface roughening method |
05/07/1986 | EP0180172A1 Process for the assembly and the connection of integrated circuits to circuit units, and machine for carrying it out |
05/07/1986 | EP0180101A2 Deposition of patterns using laser ablation |
05/07/1986 | EP0180091A2 Method of selectively depositing metal layers on a substrate |
05/07/1986 | EP0180078A2 Apparatus and method for applying coating material |
05/07/1986 | EP0180072A1 Method for fault-analyse of integrated circuit |
05/07/1986 | EP0180026A2 Dram cell and method |
05/07/1986 | EP0180025A2 Semiconductor device comprising a bipolar transistor and a MOSFET |
05/07/1986 | EP0180020A2 Plasma etching system |
05/07/1986 | EP0180010A2 Processing materials in furnaces |
05/07/1986 | EP0180009A2 A process of forming a contact to a compound semiconductor body |
05/07/1986 | EP0180003A2 Bipolar power transistor |
05/07/1986 | EP0179980A1 Method of forming alignment marks in a semiconductor body |
05/07/1986 | EP0179914A1 Liquid crystal display element and a method of producing the same |
05/07/1986 | EP0179802A1 Integrated circuits with contact pads in a standard array |
05/07/1986 | EP0047308B1 Centrifugal wafer processor |
05/07/1986 | CN85202316U Election device ageing experiment desk |
05/06/1986 | USH67 Conveyor mechanism for thin plate |
05/06/1986 | USH64 Full-wave rectifier for CMOS IC chip |
05/06/1986 | US4587656 High voltage solid-state switch |
05/06/1986 | US4587617 Image inspection system for defect detection |
05/06/1986 | US4587550 Press-packed semiconductor device with lateral fixing member |
05/06/1986 | US4587549 Multilayer interconnection structure for semiconductor device |
05/06/1986 | US4587545 High voltage dielectrically isolated remote gate solid-state switch |
05/06/1986 | US4587542 Guard ring for reducing pattern sensitivity in MOS/LSI dynamic RAM |
05/06/1986 | US4587540 Vertical MESFET with mesa step defining gate length |
05/06/1986 | US4587464 Electron beam control system |
05/06/1986 | US4587432 Apparatus for ion implantation |
05/06/1986 | US4587395 Bonding leads to semiconductor devices |
05/06/1986 | US4587185 Photomask for use in making a carrier tape |
05/06/1986 | US4587184 Method for manufacturing accurate structures with a high aspect ratio and particularly for manufacturing X-ray absorber masks |
05/06/1986 | US4587171 Hydrogenated silocon and conductive electrode |
05/06/1986 | US4587138 Metal oxide semiconductor, silkon-metal alloy |
05/06/1986 | US4587002 Apparatus for floating transport and processing of substrate or tape |
05/06/1986 | US4586988 Method of forming an electrically conductive member |
05/06/1986 | US4586980 Thin films, lift-off, multilayer |
05/06/1986 | US4586968 Process of manufacturing a high frequency bipolar transistor utilizing doped silicide with self-aligned masking |
05/06/1986 | US4586743 Robotic gripper for disk-shaped objects |
05/06/1986 | US4586642 Wire bond monitoring system |
05/06/1986 | US4586243 Photolithographic method |
05/06/1986 | US4586240 Vertical IGFET with internal gate and method for making same |
05/06/1986 | US4586238 Method for manufacturing semiconductor devices |
05/06/1986 | CA1204224A1 Lift-off process for fabricating self-aligned contacts |
05/06/1986 | CA1204223A1 Method for forming submicron bipolar transistor without epitaxial growth and the resulting structure |