Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/2008
09/12/2008WO2008108041A1 Surface inspecting method and device
09/12/2008WO2008107962A1 Method of evaluating semiconductor device
09/12/2008WO2008107955A1 Mask for multicolumn electron beam exposure, electron beam exposure device and exposure method employing mask for multicolumn electron beam exposure
09/12/2008WO2008107933A1 Cleaning device and cleaning method
09/12/2008WO2008107751A1 Process for fabricating a substrate comprising a deposited buried oxide layer
09/12/2008WO2008107419A1 Formation of a reliable diffusion-barrier cap on a cu-containing interconnect element having grains with different crystal orientations
09/12/2008WO2008107287A1 Moment-based method and system for evaluation of the reliability of a metal layer in an integrated circuit
09/12/2008WO2008107263A1 Method for the production of a schottky diode and semiconductor element having a schottky diode
09/12/2008WO2008107194A2 Method for the precision processing of substrates and use of said method
09/12/2008WO2008107029A1 Method of bonding two substrates
09/12/2008WO2008106913A2 Automation carrier for substrates in particular for wafers for producing silicon-based solar cells
09/12/2008WO2008094653A3 Method for forming silicon/germanium containing drain/source regions in transistors with reduced silicon/germanium loss
09/12/2008WO2008089153A3 Methods of forming spacer patterns using assist layer for high density semiconductor devices
09/12/2008WO2008086282A3 Methods and systems for using electrical information for a device being fabricated on a wafer to perform one or more defect-related functions
09/12/2008WO2008083133A3 Semiconductor device having multiple die redistribution layer
09/12/2008WO2008082977A3 Electrostatic chuck and method of forming
09/12/2008WO2008078301A3 Iii-nitride light emitting devices grown on tempaltes to reduce strain
09/12/2008WO2008073906A3 Dry photoresist stripping process and apparatus
09/12/2008WO2008073776A3 Transistor gates including cobalt silicide, semiconductor device structures including the transistor gates, precursor structures, and methods of fabrication
09/12/2008WO2008067213A3 Techniques for low temperature ion implantation
09/12/2008WO2008066999A3 Devices, methods, and systems with mos-gated trench-to-trench lateral current flow
09/12/2008WO2008061128A3 Copper-metallized integrated circuits having an overcoat for protecting bondable metal contacts and improving mold compound adhesion
09/12/2008WO2008057184A3 Transistor having field plate
09/12/2008WO2008055134A3 Electronic device with inductor and integrated componentry
09/12/2008WO2008055095A3 Junction isolated poly-silicon gate jfet
09/12/2008WO2008045989A3 Enhanced interconnect structure
09/12/2008WO2008045230A9 Contact electrode for microdevices and etch method of manufacture
09/12/2008WO2008042020A3 Nitride semiconductor heterostructures and related methods
09/12/2008WO2008036552A3 Array of non-volatile memory cells with floating gates formed of spacers in substrate trenches
09/12/2008WO2008027281A3 Interconnecting bit lines in memory devices for multiplexing
09/12/2008WO2008027239A3 Single spacer process for multiplying pitch by a factor greater than two and related intermediate ic structures
09/12/2008WO2008019039A3 Memory cell with nanodots as charge storage elements and corresponding manufacturing method
09/12/2008WO2007027994A3 Method for fabricating low resistance, low inductance interconnections in high current semiconductor devices
09/12/2008WO2006039699A3 Ceramic antenna module and methods of manufacture thereof
09/11/2008US20080222597 Photo mask, exposure method using the same, and method of generating data
09/11/2008US20080222579 Moment-Based Method and System for Evaluation of Metal Layer Transient Currents in an Integrated Circuit
09/11/2008US20080221816 Data verification method, charged particle beam writing apparatus, and computer-readable storage medium with program
09/11/2008US20080221709 Control method, control system, and program
09/11/2008US20080220738 Wireless communication system
09/11/2008US20080220684 Electronic component and method of producing same
09/11/2008US20080220622 Substrate processing pallet with cooling
09/11/2008US20080220621 Substrate treatment apparatus and substrate treatment method
09/11/2008US20080220620 Method of manufacturing silicon carbide semiconductor device
09/11/2008US20080220619 Method for increasing mechanical strength of dielectric film by using sequential combination of two types of uv irradiation
09/11/2008US20080220618 Zirconium silicon oxide films
09/11/2008US20080220617 Deep STI trench and SOI undercut enabling STI oxide stressor
09/11/2008US20080220616 Process for manufacturing a semiconductor device
09/11/2008US20080220615 Method for producing self-aligned mask, articles produced by same and composition for same
09/11/2008US20080220614 Method for manufacturing image sensor device
09/11/2008US20080220613 Protection of polymer surfaces during micro-fabrication
09/11/2008US20080220612 Protection of polymer surfaces during micro-fabrication
09/11/2008US20080220611 Method of forming fine patterns of semiconductor devices using double patterning
09/11/2008US20080220610 Silicon oxide polishing method utilizing colloidal silica
09/11/2008US20080220609 Methods of Forming Mask Patterns on Semiconductor Wafers that Compensate for Nonuniform Center-to-Edge Etch Rates During Photolithographic Processing
09/11/2008US20080220608 Modified via bottom structure for reliability enhancement
09/11/2008US20080220607 Signal routing on redistribution layer
09/11/2008US20080220606 SELF-ALIGNED METAL TO FORM CONTACTS TO Ge CONTAINING SUBSTRATES AND STRUCTURE FORMED THEREBY
09/11/2008US20080220605 Method of manufacturing flash memory device
09/11/2008US20080220604 Air break for improved silicide formation with composite caps
09/11/2008US20080220603 Method of manufacturing semiconductor device
09/11/2008US20080220602 Method of manufacturing semiconductor device
09/11/2008US20080220601 Methods for forming nonvolatile memory elements with resistive-switching metal oxides
09/11/2008US20080220600 Semiconductor constructions, methods of forming multiple lines, and methods of forming high density structures and low density structures with a single photomask
09/11/2008US20080220599 Method of fabricating short-gate-length electrodes for integrated III-V compound semiconductor devices
09/11/2008US20080220598 Method for Dopant Diffusion
09/11/2008US20080220597 Photoresists and methods for use thereof
09/11/2008US20080220596 Delivery of Low Pressure Dopant Gas to a High Voltage Ion Source
09/11/2008US20080220595 Method for fabricating a hybrid orientation substrate
09/11/2008US20080220594 Fabrication method of a mixed substrate and use of the substrate for producing circuits
09/11/2008US20080220593 Nanoparticles
09/11/2008US20080220592 Substrate processing apparatus, substrate processing method, and substrate planarization method
09/11/2008US20080220591 Method of manufacturing device
09/11/2008US20080220590 Thin wafer dicing using UV laser
09/11/2008US20080220589 Method for evaluation of bonded wafer
09/11/2008US20080220588 STRAINED Si MOSFET ON TENSILE-STRAINED SiGe-ON-INSULATOR (SGOI)
09/11/2008US20080220587 Dual Stress STI
09/11/2008US20080220586 Methods for forming semiconductor structures with buried isolation collars and semiconductor structures formed by these methods
09/11/2008US20080220585 Method of manufacturing a semiconductor device
09/11/2008US20080220583 Semiconductor device structures for bipolar junction transistors and methods of fabricating such structures
09/11/2008US20080220582 Semiconductor device and method of fabricating the same
09/11/2008US20080220581 Opto-thermal annealing methods for forming metal gate and fully silicided gate-field effect transistors
09/11/2008US20080220580 Semiconductor device and a method of manufacturing the same
09/11/2008US20080220579 Stress enhanced mos transistor and methods for its fabrication
09/11/2008US20080220578 Method of fabricating a non-volatile memory device
09/11/2008US20080220577 Scalable high density non-volatile memory cells in a contactless memory array
09/11/2008US20080220576 Manufacturing method of anti-punch-through semiconductor device
09/11/2008US20080220574 Method of fabricating semiconductor device
09/11/2008US20080220573 Method for manufacturing semiconductor device
09/11/2008US20080220572 Silicon rich barrier layers for integrated circuit devices
09/11/2008US20080220571 High mobility power metal-oxide semiconductor field-effect transistors
09/11/2008US20080220570 Semiconductor device and manufacturing method thereof
09/11/2008US20080220569 Method for manufacturing a field effect transistor with auto-aligned grids
09/11/2008US20080220567 Semiconductor Component and Production Method
09/11/2008US20080220566 Substrate process for an embedded component
09/11/2008US20080220565 Design techniques for stacking identical memory dies
09/11/2008US20080220564 Semiconductor module
09/11/2008US20080220563 Module having stacked chip scale semiconductor packages
09/11/2008US20080220560 Programmable resistance memory element and method for making same
09/11/2008US20080220557 Sensor manufacture with data storage
09/11/2008US20080220556 Method of manufacturing enhancement type semiconductor probe and information storage device having the semiconductor probe using the same
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