| Patents for G21G 5 - Alleged conversion of chemical elements by chemical reaction (927) |
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| 02/01/2005 | US6849858 Apparatus and method for forming alignment layers |
| 02/01/2005 | US6849856 Electron beam duplication lithography method and apparatus |
| 01/20/2005 | US20050012050 Method and device for aligning a charged particle beam column |
| 01/13/2005 | US20050008946 Mask for charged particle beam exposure, and method of forming the same |
| 01/13/2005 | US20050008945 plasma/dry etching; photolithographic reticle; oxygen-free gas etches anti-reflective coating and patterned photoresistive material; integrated circuits |
| 01/13/2005 | US20050006598 Method and device for aligning a charged particle beam column |
| 01/06/2005 | WO2005001876A2 Electrostatic parallelizing lens for ion beams |
| 01/06/2005 | WO2004027684B1 Photolithography mask repair |
| 01/06/2005 | US20050001177 Apparatus and method for forming alignment layers |
| 01/05/2005 | EP1283734B1 Device for positioning a tumour patient with a tumour in the head or neck region in a heavy-ion therapy chamber |
| 01/04/2005 | US6838683 Focused ion beam microlathe |
| 12/30/2004 | US20040265709 Method for manufacturing mask for focus monitoring, and method for manufacturing semiconductor device |
| 12/30/2004 | US20040263819 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus |
| 12/30/2004 | US20040262542 Electrostatic lens for ion beams |
| 12/29/2004 | WO2004114369A2 Three-dimensional and color sensing |
| 12/29/2004 | WO2004013692A3 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 12/23/2004 | WO2004031861A3 Method for fabrication of diffractive optical elements for maskless lithography |
| 12/23/2004 | US20040256577 Focused ion beam microlathe |
| 12/16/2004 | US20040253523 Embedded bi-layer structure for attenuated phase shifting mask |
| 12/14/2004 | US6831419 Exhaust system for a microwave excited ultraviolet lamp |
| 12/09/2004 | US20040248044 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same |
| 12/02/2004 | US20040239256 Exhaust system for a microwave excited ultraviolet lamp |
| 11/11/2004 | US20040224238 maintenance of photomasks by coating photoresist layers on masks, then aligning using optical projectors, exposing and developing; microelectronics |
| 11/04/2004 | WO2004027684A3 Photolithography mask repair |
| 10/20/2004 | EP1468426A2 Air-cooled lamp, and article treatment system and method utilizing an air-cooled lamp |
| 10/07/2004 | WO2004086143A2 Multi-step process for etching photomasks |
| 10/05/2004 | US6800865 Adhering nanotubes to be used as probe needles to electrode in protruding fashion, adhering base end of nanotube to surface of holder with tip end protruding, irradiating with electron beam to fasten nanotube to holder with coating film |
| 09/23/2004 | WO2004031867A3 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 09/16/2004 | US20040178363 Method and apparatus for irradiation of active energy beam |
| 09/02/2004 | US20040168527 Coated nanotube surface signal probe |
| 08/12/2004 | WO2004053592A8 Reticle manipulations |
| 08/12/2004 | US20040155204 Mask and method for producing thereof and a semiconductor device using the same |
| 08/10/2004 | US6774377 Electrostatic parallelizing lens for ion beams |
| 08/05/2004 | US20040151991 Photolithography mask repair |
| 08/04/2004 | CN1160762C Electronic beam exposure mask, exposure method and equipment and method for making semiconductor device |
| 08/03/2004 | US6770402 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 07/29/2004 | WO2004044653A3 Method and device for rastering source redundancy |
| 07/15/2004 | US20040135100 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 07/08/2004 | US20040131953 Photomask correction method using composite charged particle beam, and device used in the correction method |
| 07/08/2004 | US20040131946 System and method for fabrication and replication of diffractive optical elements for maskless lithography |
| 07/07/2004 | CN1510719A Mask and producing method, producing method for semiconductor device with this mask |
| 07/01/2004 | US20040124372 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 06/24/2004 | WO2004053592A1 Reticle manipulations |
| 06/17/2004 | US20040117757 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program |
| 06/03/2004 | US20040105160 Particle-optical apparatus, electron microscopy system and electron lithography system |
| 06/03/2004 | US20040104357 Electron beam exposure apparatus, electron beam exposing method, semiconductor element manufacturing method, and pattern error detection method |
| 05/27/2004 | WO2004044653A2 Method and device for rastering source redundancy |
| 05/18/2004 | US6737660 Electron beam irradiation apparatus and electron beam irradiating method |
| 05/11/2004 | US6734437 System and method for electron beam irradiation |
| 05/06/2004 | US20040085024 Method and device for rastering source redundancy |
| 04/27/2004 | US6727508 Method and apparatus for irradiating active energy ray |
| 04/15/2004 | WO2004031867A2 System and method for holographic fabrication and replication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2004031861A2 Method for fabrication of diffractive optical elements for maskless lithography |
| 04/15/2004 | WO2002080213A9 Irradiation system and method |
| 04/01/2004 | WO2004027684A2 Photolithography mask repair |
| 03/25/2004 | US20040056215 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 03/11/2004 | US20040048169 For use in irradiating a wafer with an electron beam for cell projection |
| 03/04/2004 | US20040041103 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method |
| 02/26/2004 | WO2004017140A1 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank |
| 02/19/2004 | WO2003081286A3 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 02/19/2004 | US20040031935 Thermoelectron generating source and ion beam radiating apparatus with the same |
| 02/18/2004 | EP1389797A2 Particle-optical apparatus, electron microscopy system and electron lithography system |
| 02/12/2004 | WO2004013692A2 System and method for maskless lithography using an array of sources and an array of focusing elements |
| 02/11/2004 | EP1388854A1 Optical disc adhesive curing device |
| 02/05/2004 | US20040023133 Photoresist pattern and forming method thereof |
| 02/05/2004 | US20040022426 Apparatus and method for inspecting articles |
| 02/05/2004 | US20040021093 Optical disk adhesive curing device |
| 12/04/2003 | US20030223053 Methods and devices for charge management for three-dimensional and color sensing |
| 11/13/2003 | US20030209673 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method |
| 11/11/2003 | US6645676 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus |
| 10/02/2003 | WO2003081286A2 Swinging objectif retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 09/30/2003 | US6627903 Methods and devices for calibrating a charged-particle-beam microlithography apparatus, and microelectronic-device fabrication methods comprising same |
| 09/25/2003 | US20030178582 System and method for electron beam irradiation |
| 09/25/2003 | US20030178581 Electron beam irradiation apparatus and electron beam irradiating method |
| 09/10/2003 | EP0904594B9 Monolithic anode adapted for inclusion in an actinic radiation source and method of manufacturing the same |
| 09/09/2003 | US6617597 Circuits and methods for electron-beam control |
| 09/09/2003 | US6617596 On-line measurement of absorbed electron beam dosage in irradiated product |
| 09/04/2003 | US20030164459 Device for positioning a tumour patient with a tumour in the head or neck region in a heavy-ion theraphy chamber |
| 08/28/2003 | WO2003071358A1 Method and system for repairing defected photomasks |
| 08/27/2003 | EP1339085A2 System and method for electron beam irradiation |
| 08/27/2003 | EP1339084A2 Electron beam irradiation apparatus and method |
| 08/21/2003 | US20030155523 Quantum wells; etching, writing using electron beams; forming semiconductors |
| 08/13/2003 | EP1334378A1 On-line measurement of absorbed electron beam dosage in irradiated product |
| 08/12/2003 | US6605805 Swinging objective retarding immersion lens electron optics focusing, deflection and signal collection system and method |
| 07/03/2003 | US20030122073 Coated nanotube surface signal probe and method of attaching nanotube to probe holder |
| 06/05/2003 | US20030102442 Circuits and methods for electron-beam control |
| 05/08/2003 | US20030087191 Applying photosensitive layer to substrate; electron beam exposure; contacting developers |
| 05/02/2003 | EP1306878A2 Method and device for aligning a charged particle beam column |
| 05/02/2003 | EP0904594B1 Monolithic anode adapted for inclusion in an actinic radiation source and method of manufacturing the same |
| 04/16/2003 | EP1302971A2 Method and device for aligning a charged particle beam column |
| 03/05/2003 | EP1287549A1 An apparatus and a method for forming a pattern using a crystal structure of material |
| 03/04/2003 | US6528785 Microscope probe needle |
| 02/27/2003 | WO2002080213A3 Irradiation system and method |
| 02/19/2003 | EP1283734A2 Device for positioning a tumour patient with a tumour in the head or neck region in a heavy-ion therapy chamber |
| 12/19/2002 | WO2002101463A1 Patterning compositions using e-beam lithography and structures and devices made thereby |
| 11/21/2002 | WO2002093570A1 Optical disc adhesive curing device |
| 11/07/2002 | US20020162971 Irradiation system and method |
| 10/17/2002 | WO2002082518A1 An apparatus and a method for forming a pattern using a crystal structure of material |
| 10/10/2002 | WO2002080213A2 Irradiation system and method |
| 10/10/2002 | CA2443150A1 Irradiation system and method |