Patents
Patents for G21G 5 - Alleged conversion of chemical elements by chemical reaction (927)
11/2006
11/21/2006US7138641 Beam deflecting method, beam deflector for scanning, ion implantation method, and ion implantation system
11/21/2006US7138627 Nanotube probe and method for manufacturing same
11/16/2006US20060255294 Ion optical mounting assemblies
11/16/2006US20060255293 Method for decreasing chemical diffusion in parylene and trapping at parylene-to-parylene interfaces
11/09/2006US20060249694 Marking of diamond
11/02/2006WO2006116326A2 Method for decreasing chemical diffusion in parylene and trapping at parylene-to-parylene interfaces
10/2006
10/26/2006US20060237668 Dual hemispherical collectors
10/26/2006US20060237667 Submicron particle removal
10/24/2006US7126141 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
10/19/2006US20060231773 Charged particle beam apparatus
10/19/2006US20060231772 Charged particle beam device with cleaning unit and method of operation thereof
10/17/2006US7123765 Apparatus and method for inspecting articles
10/17/2006US7122811 Particle beam irradiation apparatus, treatment planning unit, and particle beam irradiation method
10/12/2006US20060228634 Beam-induced etching
10/10/2006US7119348 Charged beam writing apparatus and writing method
10/05/2006US20060219951 Charged particle beam exposure equipment and charged particle beam exposure method
10/05/2006US20060219948 Charged particle therapy apparatus and charged particle therapy system
10/05/2006US20060219947 Dedicated metrology stage for lithography applications
10/05/2006US20060219946 Electron beam apparatus and method for production of its specimen chamber
10/05/2006US20060219945 Radiation therapy machine calibration apparatus providing multiple angle measurements
10/05/2006US20060219944 Multichannel ion gun
09/2006
09/28/2006US20060214118 Exposure apparatus and device manufacturing method
09/28/2006US20060214117 Electron-beam exposure system and electron-beam exposure method
09/28/2006US20060214116 Charged beam exposure apparatus, charged beam exposure method, method of manufacturing mask, and method of manufacturing semiconductor device
09/26/2006US7112809 Electrostatic lens for ion beams
09/21/2006US20060208201 Apparatus and method for substrate neutralization and glass substrate charging prevention
09/19/2006US7109498 Radiation source, lithographic apparatus, and device manufacturing method
09/14/2006US20060204869 Laser processing device
09/12/2006US7105845 Liquid crystal alignment using electron beam exposure
09/12/2006US7105843 Method and system for controlling focused ion beam alignment with a sample
09/07/2006US20060197036 Lithographic apparatus and device manufacturing method
09/05/2006US7102748 Lithographic apparatus, device manufacturing method, and computer program
09/05/2006US7102144 Particle beam irradiation apparatus, treatment planning unit, and particle beam irradiation method
08/2006
08/31/2006US20060192147 Multilayer mirror, method for manufacturing the same, and exposure equipment
08/31/2006US20060192146 Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device
08/31/2006US20060192145 Charged particle beam apparatus and method for operating the same
08/31/2006US20060192144 Electron beam welding method and apparatus
08/31/2006US20060192143 Charged particle beam lithography apparatus and method
08/31/2006US20060192142 Ion implanter, and angle measurement apparatus and beam divergence measurement apparatus for ion implanter
08/31/2006US20060192141 Method and devices for producing corpuscular radiation systems
08/31/2006US20060192140 Process for electron sterilization of a container
08/31/2006US20060192139 Device for irradiating a target with a hadron-charged beam, use in hadrontherapy
08/29/2006US7098468 Raster frame beam system for electron beam lithography
08/29/2006US7098467 Measuring method and apparatus, exposure method and apparatus, and device manufacturing method
08/24/2006US20060188797 Apparatus and method for optical interference fringe based integrated circuit processing
08/24/2006US20060186353 Lithographic apparatus, radiation system and filter system
08/24/2006US20060186352 Measuring method, exposure apparatus, and device manufacturing method
08/24/2006US20060186351 Inspection method and inspection apparatus using charged particle beam
08/22/2006US7095035 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus
08/17/2006WO2006014633A3 Electrostatic lens for ion beams
08/17/2006US20060183025 Methods of forming mask patterns, methods of correcting feature dimension variation, microlithography methods, recording medium and electron beam exposure system
08/15/2006US7091507 Light generator and exposure apparatus
08/15/2006US7091505 Collector with fastening devices for fastening mirror shells
08/15/2006US7091478 Method and device for controlling a beam extraction raster scan irradiation device for heavy ions or protons
08/10/2006US20060175557 Apparatus for projecting a reduced image of a photomask using a schwarzschild objective
08/10/2006US20060175556 Illumination optical system, exposure apparatus, and device manufacturing method
08/09/2006CN1268981C Attenuated phase shifting mask having embedded bi-layer structure for and method for making same
08/02/2006CN1813331A Electrostatic lens for ion beams
07/2006
07/27/2006US20060163494 Ion implantation method and method for manufacturing semiconductor device
07/13/2006US20060151719 Electron beam duplication lithography method
07/13/2006US20060151716 Micro-column electron beam apparatus
07/12/2006CN1802711A Lithographic systems and methods with extended depth of focus
07/11/2006US7076761 Method for creating charged-particle-beam exposure data, method for manufacturing semiconductor device, and program
07/06/2006US20060147814 Methods for repairing an alternating phase-shift mask
07/06/2006US20060145093 Method and device for electron beam irradiation
07/04/2006US7071476 Illumination system with a plurality of light sources
06/2006
06/29/2006US20060141370 Photomasks and methods of manufacturing the same
06/29/2006US20060138348 Method for providing an operable filter system for filtering particles out of a beam of radiation, filter system, apparatus and lithographic apparatus comprising the filter system
06/29/2006US20060138347 Level sensor, lithographic apparatus and device manufacturing method
06/22/2006US20060134534 Photomask and method for maintaining optical properties of the same
06/20/2006US7064341 Coated nanotube surface signal probe
06/15/2006US20060124865 Energetic neutral particle lithographic apparatus and process
06/13/2006US7060994 Exposure apparatus and method
06/01/2006US20060115745 Electron beam exposure mask, electron beam exposure method, and electron beam exposure system
05/2006
05/30/2006US7054801 Radiation treatment plan making system and method
05/30/2006US7053389 Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device
05/18/2006US20060102854 Apparatus and method for polishing gemstones and the like
05/16/2006US7045801 Charged beam exposure apparatus having blanking aperture and basic figure aperture
05/11/2006US20060097186 Liquid metal ion gun
05/09/2006US7041988 Electron beam exposure apparatus and electron beam processing apparatus
05/09/2006US7041512 Electron beam exposure apparatus, electron beam exposing method, semiconductor element manufacturing method, and pattern error detection method
05/04/2006WO2006047611A2 Apparatus and method for polishing gemstones and the like
05/04/2006US20060091323 Exposure apparatus and exposure method for performing high-speed and efficient direct exposure
05/04/2006US20060091322 Scanning probe-based lithography (SPL) method in which patterning of resist medium is produced by Atomic Force Microscope (AFM) probe-surface contact; in particular it relates to "writing" of pattern of lines and similar features in resist; resist polymer contains thermally reversible crosslinkages
05/04/2006US20060090848 Laser processing apparatus and laser processing method
05/02/2006US7038226 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
04/2006
04/25/2006US7034308 Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
04/25/2006US7034297 Method and system for use in the monitoring of samples with a charged particle beam
04/18/2006US7030396 Medical particle irradiation apparatus
04/18/2006US7029802 Embedded bi-layer structure for attenuated phase shifting mask
04/12/2006EP1644700A2 Methods and devices for charge management for three-dimensional and color sensing
04/11/2006US7026635 Particle beam processing apparatus and materials treatable using the apparatus
04/06/2006US20060071180 Radiation generating device, lithographic apparatus, device manufacturing method and device manufactured thereby
04/04/2006US7023002 Surface treating device and surface treating method
04/04/2006US7022984 Biased electrostatic deflector
03/2006
03/28/2006US7019312 Adjustment in a MAPPER system
03/23/2006US20060063078 Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
03/23/2006US20060060798 Method and apparatus for multi-beam exposure
03/23/2006US20060060793 Laparoscopic tumor therapy using high energy electron irradiation
03/22/2006EP1636821A2 Electrostatic parallelizing lens for ion beams
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