| Patents for G21G 5 - Alleged conversion of chemical elements by chemical reaction (927) |
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| 09/07/2007 | WO2007100933A2 Etch selectivity enhancement, deposition quality evaluation, structural modification and three-dimensional imaging using electron beam activated chemical etch |
| 09/06/2007 | US20070205376 Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method |
| 09/04/2007 | US7266802 Drawing apparatus and drawing method |
| 09/04/2007 | US7265368 Ion optical mounting assemblies |
| 09/04/2007 | US7265366 Lithographic apparatus and device manufacturing method |
| 08/22/2007 | CN101023506A Electrostatic lens for ion beams |
| 08/16/2007 | US20070192757 Pattern generation method and charged particle beam writing apparatus |
| 08/09/2007 | US20070181828 E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same |
| 08/09/2007 | US20070181827 Lithographic apparatus, calibration method, device manufacturing method and computer program product |
| 08/02/2007 | US20070176561 Electrical energy discharge control |
| 08/02/2007 | US20070176120 Method for the selective sterilization of diagnostic test elements |
| 07/24/2007 | US7247866 Contamination barrier with expandable lamellas |
| 07/19/2007 | US20070164235 Method for fabricating semiconductor device |
| 07/12/2007 | US20070160932 Electron beam lithography apparatus |
| 07/12/2007 | US20070158587 Mehtod for generating oscillation data for supporting vitality of living body |
| 07/12/2007 | US20070158539 Radiation system |
| 07/12/2007 | US20070158304 Etch selectivity enhancement in electron beam activated chemical etch |
| 07/12/2007 | US20070158303 Structural modification using electron beam activated chemical etch |
| 07/11/2007 | CN1996547A Electronic optical focusing, deflexion and signals collection method for the turning gear immerged object lens |
| 07/05/2007 | WO2005079360A3 Advanced optics for rapidly patterned lasser profiles in analytical spectrometry |
| 07/05/2007 | US20070152169 Move mechanism for moving target object and charged particle beam writing apparatus |
| 07/05/2007 | US20070152168 Substrate protecting member and method of forming analysis sample using the same |
| 07/05/2007 | US20070152167 Reticle discerning device, exposure equipment comprising the same and exposure method |
| 06/26/2007 | US7235801 Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby |
| 06/26/2007 | US7235794 System and method for inspecting charged particle responsive resist |
| 06/26/2007 | US7235783 Gas blowing nozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method |
| 06/21/2007 | US20070139855 Lithographic apparatus and method of manufacturing an electrostatic clamp for a lithographic apparatus |
| 06/21/2007 | US20070138411 Visible light curing systems, methods for reducing health risks to individuals exposed to systems designed to cure curable compositions by exposure to radiation, methods for bonding substrates and visible light curing compositions |
| 06/19/2007 | US7232631 Silicon oxide on silicon substrate; controlling thickness; doping with boron, phorphosus |
| 06/14/2007 | US20070131876 Multiple room radiation treatment system |
| 06/12/2007 | US7230964 Lithography laser with beam delivery and beam pointing control |
| 06/07/2007 | US20070125962 Observation unit |
| 06/07/2007 | US20070125961 Micromechanical system |
| 06/05/2007 | US7227161 Particle beam irradiation apparatus, treatment planning unit, and particle beam irradiation method |
| 06/05/2007 | US7227140 Method, system and device for microscopic examination employing fib-prepared sample grasping element |
| 05/31/2007 | US20070120072 Illumination system particularly for microlithography |
| 05/31/2007 | US20070120071 Electron-beam device and detector system |
| 05/30/2007 | EP1287549A4 An apparatus and a method for forming a pattern using a crystal structure of material |
| 05/24/2007 | US20070117032 Method for determining an exposure dose and exposure apparatus |
| 05/24/2007 | US20070114451 Lithographic apparatus and device manufacturing method |
| 05/18/2007 | WO2005092025A3 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis |
| 05/17/2007 | US20070111114 Silicon thin film in which an opening for selectively irradiating charged particles to a semiconductor substrate is provided and whose irradiation surface on which the charged particles are irradiated is implanted with an impurity, and selectively irradiating charged particles to semiconductor substrate |
| 05/15/2007 | US7217934 Wafer scanning device |
| 05/10/2007 | US20070102651 includes semiconductor substrate and bottom coupled die |
| 05/10/2007 | US20070102650 Charged particle beam apparatus |
| 05/08/2007 | US7214951 Charged-particle multi-beam exposure apparatus |
| 05/01/2007 | US7211805 Liquid metal ion gun |
| 04/26/2007 | US20070090302 Display device and fabricating method thereof |
| 04/19/2007 | US20070085033 Electron beam column for writing shaped electron beams |
| 04/19/2007 | US20070085031 Placement effects correction in raster pattern generator |
| 04/19/2007 | US20070085030 Critical dimension effects correction in raster pattern generator |
| 04/19/2007 | US20070085029 DC only tool cell with a charged particle beam system |
| 04/18/2007 | EP1774559A2 Electrostatic lens for ion beams |
| 04/12/2007 | WO2007041056A2 Critical dimension effects correction in raster pattern generator |
| 04/10/2007 | US7202486 Treatment planning tool for multi-energy electron beam radiotherapy |
| 04/05/2007 | WO2007038134A2 Method of aligning a particle-beam-generated pattern to a pattern on pre-patterned substrate |
| 04/05/2007 | US20070077501 Stencil masks, method of manufacturing stencil masks, and method of using stencil masks |
| 04/05/2007 | US20070077366 Plasma doping method and plasma doping apparatus for performing the same |
| 04/03/2007 | US7199383 Method for reducing particles during ion implantation |
| 03/29/2007 | WO2007035389A2 Vacuum reaction chamber with x-lamp heater |
| 03/29/2007 | US20070072099 used to correct for drift, or thermal expansion, or gravitational sag in fabrication of a semiconductor device or a photomask/reticle; using optical measurement to register the particle beam to the pre-existing pattern |
| 03/15/2007 | US20070057200 Electron beam apparatus and method of generating an electron beam irradiation pattern |
| 03/14/2007 | EP1761822A2 A dynamic fluid control system for immersion lithography |
| 03/08/2007 | US20070051904 Gantry system for particle therapy, therapy plan or radiation method for particle therapy with such a gantry system |
| 03/08/2007 | US20070051160 Position measurement system and lithographic apparatus |
| 03/07/2007 | EP1054249B1 Electronic device surface signal control probe and method of manufacturing the probe |
| 03/01/2007 | US20070045567 Particle Beam Processing Apparatus and Materials Treatable Using the Apparatus |
| 02/27/2007 | US7183565 Source multiplexing in lithography |
| 02/20/2007 | US7180080 Method for retrofitting concrete structures |
| 02/20/2007 | US7179569 Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the same |
| 02/08/2007 | DE112005000660T5 Methoden und Systeme zum Messen einer Eigenschaften eines Substrats oder zur Vorbereitung eines Substrats zur Analyse Methods and systems for measuring properties of a substrate or the preparation of a substrate for analysis |
| 02/06/2007 | US7173260 Removing byproducts of physical and chemical reactions in an ion implanter |
| 02/06/2007 | US7172839 Preventing surface damage; coarse focused ion etching followed by gas assisted electron beam removal of thin film contaminated with gallium |
| 02/01/2007 | US20070023712 System and method to pattern an object through control of a radiation source |
| 02/01/2007 | US20070023654 Charged particle beam application system |
| 01/16/2007 | US7164141 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device |
| 01/11/2007 | US20070010104 Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions |
| 01/09/2007 | US7160673 Illuminating the master element to make a first diffractive pattern on the target surface at a first location by interfering first and third order diffracted beams from the master element; moving the master element to a second location on the target surface and illuminating to produce a second pattern |
| 01/09/2007 | US7160475 Fabrication of three dimensional structures |
| 01/04/2007 | US20070003874 Exposing a resist on a substrate to a rectangularly-shaped shot from an electron beam to form a non-angled feature; altering the rotational orientation by a predetermined angle; and forming a 2nd feature by exposing to a 2nd shot from the new angle to form an angled feature |
| 01/04/2007 | US20070001125 Size of the area of illumination produced by each aperture is reduced by using the combination of a metallic layer on which surface plasmons are induced by incident light and a surface of a material of different dielectric function; feature that forms a non-periodic structure together with the aperture |
| 12/28/2006 | US20060289805 Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device |
| 12/28/2006 | US20060289796 UV-C sensitive composition and dosimeter |
| 12/28/2006 | US20060289795 Vacuum reaction chamber with x-lamp heater |
| 12/28/2006 | US20060289794 Immersion lithography with equalized pressure on at least projection optics component and wafer |
| 12/26/2006 | US7154090 Method for controlling charged particle beam, and charged particle beam apparatus |
| 12/21/2006 | WO2006083928A3 Apparatus and method for modifying an object |
| 12/21/2006 | WO2006007111A3 A dynamic fluid control system for immersion lithography |
| 12/21/2006 | US20060284113 Off-axis projection optical system and extreme ultraviolet lithography apparatus using the same |
| 12/21/2006 | US20060284112 Apparatus and method for specimen fabrication |
| 12/21/2006 | US20060284111 Device and method for electron beam irradiation |
| 12/19/2006 | US7151271 System and method for passing high energy particles through a mask |
| 12/12/2006 | US7148498 Externally controlled electromagnetic energy spot curing system |
| 12/07/2006 | US20060277521 Method, program product and apparatus for performing double exposure lithography |
| 12/05/2006 | US7145158 Device for treating a packaging material by means of UV radiation |
| 11/30/2006 | WO2006127025A2 Method of expanding mineral ores using microwave radiation |
| 11/30/2006 | US20060266956 Method of expanding mineral ores using microwave radiation |
| 11/30/2006 | US20060266954 Specific macromolecule crystal evaluator |
| 11/23/2006 | US20060261289 Method of forming optical images, a control circuit for use with this method, apparatus for carrying out said method and process for manufacturing a device using said method |
| 11/23/2006 | US20060261288 liquid removal in a method an device for irradiating spots on a layer |