Patents
Patents for G21G 5 - Alleged conversion of chemical elements by chemical reaction (927)
03/2006
03/22/2006EP1240557A4 Imaging method using phase boundary masking with modified illumination
03/21/2006US7015146 for die or wafer backside thinning prior to electrical probing and/or characterization of a site specific MOSFET device; using collimated ion plasma; avoids damaging or rupturing the gate film
03/21/2006US7014960 Chelation cleaning process for repairing photomasks
03/14/2006US7011927 Electron beam duplication lithography method and apparatus
03/09/2006US20060049367 Cooling apparatus, exposure apparatus, and device fabrication method
03/09/2006US20060049137 Multi-step process for etching photomasks
02/2006
02/28/2006US7005651 Liquid metal ion gun
02/28/2006US7005640 Method and apparatus for the characterization of a depth structure in a substrate
02/28/2006US7005219 Defect repair method employing non-defective pattern overlay and photoexposure
02/21/2006US7002164 Source multiplexing in lithography
02/16/2006US20060033042 Apparatus and method for compensation of movements of a target volume during ion beam irradiation
02/09/2006WO2006014633A2 Electrostatic lens for ion beams
02/09/2006US20060027762 Light irradiation apparatus, crystallization apparatus, crystallization method and device
01/2006
01/31/2006US6992308 Modulating ion beam current
01/31/2006US6992307 Electron beam source and electron beam exposure apparatus employing the electron beam source
01/31/2006US6992287 Apparatus and method for image optimization of samples in a scanning electron microscope
01/26/2006US20060019199 applying a crosslinkable polyvinyllphenol homo or copolymer, a bishydroxymethylbenze or naphthalene a crosslinking compound, a triphenylsulfonium hexaflate photoacid generator and propylene glycol/1,2-/, 1-methyl ether 2-acetate solvent on a substrate having prestructure gate electrode, photocrosslinking
01/26/2006US20060017020 Electron beam lithography method, patterned master carrier for magnetic transfer, lithography method for patterned master carrier for magnetic transfer, and method for producing performatted magnetic recording media
01/26/2006US20060017014 Patterned wafer inspection method and apparatus therefor
01/26/2006US20060017013 Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device
01/26/2006US20060017012 Ion implantation apparatus
01/26/2006US20060017011 Ion source with particular grid assembly
01/26/2006US20060017010 Magnet for scanning ion beams
01/19/2006US20060015837 System and method for designing and manufacturing LSI
01/19/2006US20060011869 Measurement method of electron beam current, electron beam lithography method and system
01/19/2006US20060011863 Electron beam method and apparatus for improved melt point temperatures and optical clarity of halogenated optical materials
01/17/2006US6987278 Gas flushing system with recovery system for use in lithographic apparatus
01/17/2006US6986868 Method for sterilizing a medical device having a hydrophilic coating
01/03/2006US6982428 Particle detection by electron multiplication
12/2005
12/22/2005WO2005029551A3 Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
12/22/2005US20050279951 Grazing incidence mirror, lithographic apparatus including a grazing incidence mirror, method for providing a grazing incidence mirror, method for enhancing EUV reflection of a grazing incidence mirror, device manufacturing method and device manufactured thereby
12/08/2005US20050271949 Reticle manipulations
12/06/2005US6972419 Extreme ultraviolet radiation imaging
11/2005
11/17/2005US20050253082 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
11/15/2005US6965153 Electrooptic system array, charged-particle beam exposure apparatus using the same, and device manufacturing method
11/15/2005US6965115 Airtight processing apparatus, airtight processing method, and electron beam processing apparatus
11/10/2005US20050250017 Mask blank manufacturing method, transfer mask manufacturing method, sputtering target for manufacturing mask blank
11/09/2005CN1695222A Particle-optical device and detection means
11/03/2005US20050243390 Extreme ultraviolet radiation imaging
11/01/2005US6960413 Multi-step process for etching photomasks
10/2005
10/25/2005US6958201 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
10/06/2005WO2005092025A2 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221229 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
10/06/2005US20050221207 Method and apparatus for monitoring exposure process
09/2005
09/29/2005US20050214683 Method and apparatus for reforming film and controlling slimming amount thereof
09/29/2005US20050211929 Charged particle beam photolithography machine, standard substrate for correcting misalignment factor of charged particle beam photolithography machine, correcting method for charged particle beam photolithography machine, and method of manufacturing electronic device
09/29/2005US20050211928 Charged-particle-beam lithographic system
09/29/2005US20050211922 Minute three dimensional structure producing apparatus and method
09/22/2005US20050205805 Scratch repairing processing method and scanning probe microscope (SPM) used therefor
09/22/2005US20050205804 Method for manufacturing light guide plate stamper
09/22/2005US20050205108 Method and system for immersion lithography lens cleaning
09/01/2005US20050189498 Irradiation apparatus
08/2005
08/18/2005US20050181314 Light emitting diodes; semiconductor lasers
08/18/2005US20050178979 Light generator and exposure apparatus
08/18/2005US20050178977 Irradiation system and method
08/16/2005US6930315 Method and apparatus for irradiation of active energy beam
08/11/2005US20050176225 Method of manufacturing electronic device capable of controlling threshold voltage and ion implanter controller and system that perform the method
08/11/2005DE10393131T5 Verfahren zum Herstellen von Maskenrohlingen, Verfahren zum Herstellen von Transfermasken, Sputtertarget zum Herstellen von Maskenrohlingen A method for producing mask blanks, A method for producing transfer masks, sputtering target for fabricating mask blanks
08/04/2005US20050170268 Circuit patterning substrate, providing mask, collimating incident direction of particles, irradiating
08/04/2005US20050167615 Charged beam writing apparatus and writing method
08/04/2005US20050167614 Gas blowingnozzle of charged particle beam apparatus and charged particle beam apparatus as well as working method
07/2005
07/27/2005CN2713515Y Dim light phase shift light cover having double embedded layers
07/21/2005US20050156121 Methods and devices for charge management for three-dimensional and color sensing
07/19/2005US6919164 Applying photosensitive layer to substrate; electron beam exposure; contacting developers
07/12/2005US6917046 Positioning apparatus, charged-particle-beam exposure apparatus, and device manufacturing method
07/05/2005US6914249 Particle-optical apparatus, electron microscopy system and electron lithography system
06/2005
06/23/2005DE10359148A1 Low activity radioisotope deactivation unit, comprises focussing lenses in the form of regular pyramids
06/22/2005CN1630926A Swinging retarding immersion type lens electron optics focusing, deflection and signal collection system and method
06/16/2005US20050127304 Liquid metal ion gun
06/15/2005EP1540665A2 Photolithography mask repair
06/14/2005US6906793 Methods and devices for charge management for three-dimensional sensing
06/09/2005US20050121623 Electron beam duplication lithography method and apparatus
06/09/2005DE10354252A1 Device for the accelerated deactivation of fuel cassettes comprises focusing lenses in the form of regular pyramids made from metal with metal plates as side surfaces which lie on the side surfaces of the lenses
06/02/2005US20050116183 Radiation source, lithographic apparatus, and device manufacturing method
05/2005
05/19/2005WO2005021048A3 Method of irradiating frozen material
05/19/2005DE10297658T5 Verfahren und System zum Reparieren defekter Photomasken Method and system for repairing defective photomasks
05/17/2005US6894435 Method and device for rastering source redundancy
05/17/2005US6894292 System and method for maskless lithography using an array of sources and an array of focusing elements
05/12/2005WO2005022553A3 Radiation system
04/2005
04/28/2005US20050089773 System and method for measuring overlay errors
04/26/2005US6885011 Irradiation system and method
04/21/2005US20050084767 directing pulsed laser beams through substrates and focusing it on a target located in the substrate adjacent to coating layers, to write a diffractive optical element, thus changing the scattering properties of the substrate at the target location; masks for use in photolithography
04/20/2005EP1524012A1 Device for positioning a patient with a tumor in the head or neck region in a heavy-ion therapy chamber
04/14/2005WO2004086143A3 Multi-step process for etching photomasks
04/14/2005US20050077485 System and method for passing high energy particles through a mask
03/2005
03/31/2005WO2005029551A2 Processes and systems for laser crystallization processing of film regions on a substrate utilizing a line-type beam, and structures of such film regions
03/31/2005US20050069786 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/30/2005EP1519226A2 Stencil mask, production method thereof, exposure apparatus, exposure method and electronic device production method
03/30/2005CN1602537A System and method for fast focal length alterations
03/29/2005US6872959 Thermoelectron generating source and ion beam radiating apparatus with the same
03/24/2005WO2005001876A3 Electrostatic parallelizing lens for ion beams
03/10/2005WO2005022553A2 Radiation system
03/10/2005WO2005021048A2 Method of irradiating frozen material
03/10/2005WO2004114369A3 Three-dimensional and color sensing
03/10/2005US20050051740 Charged particle therapy system, range modulation wheel device, and method of installing range modulation wheel device
03/01/2005US6861657 Electron beam exposure mask, electron beam exposure method, method of fabricating semiconductor device, and electron beam exposure apparatus
02/2005
02/24/2005US20050040339 Method of irradiating frozen material
02/15/2005US6855481 Apparatus and a method for forming a pattern using a crystal structure of material
02/10/2005US20050031965 Removing the defect area by gallium chelation with a water-soluble amine polymer containing carboxyl, hydroxyl and amine groups; polymer is never specified
02/02/2005CN1573538A Attenuated phase shifting mask having embedded bi-layer structure for and method for making same
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