| Patents for G03C 1 - Photosensitive materials (26,817) |
|---|
| 05/12/2005 | US20050100840 X-ray films comprising supports, multilayer of silver halide emulsions, hydrophilic colloid layers, merocyanine or oxonol dyes, and fluorescence intensifier screens having phosphors and polymer binders, used in medical diagnosis |
| 05/12/2005 | US20050100839 formed from silver halide emulsions and hydrophilic colloid layers; improved contrast/sharpness and reduced fog; for black-and-white imaging for medical diagnosis |
| 05/12/2005 | US20050100838 improved medical diagnostic images at lower dosage; especially for pediatric radiography; symmetric silver halide film (at least 400 film speed) and fluorescent intensifying screens on opposing sides |
| 05/12/2005 | US20050100837 Multilayer x-ray film containing sivler halide emulsion, hydrophilic colloids, merocyanine or oxonol dyes; fluorescence screen containing phosphor in binder; medical diagnosis |
| 05/12/2005 | US20050100836 Phosphor screen and imaging assembly |
| 05/12/2005 | US20050100819 photoresists comprising mixtures of acrylic ester copolymers, acid generators and quenchers, having improved sensitivity, suitable for excimer laser lithography |
| 05/12/2005 | US20050100818 Composition for an organic bottom anti-reflective coating and method for forming pattern using the same |
| 05/12/2005 | US20050100817 Compositions, systems, and methods for imaging |
| 05/12/2005 | US20050100677 Simultaneous coating of support and silicone layers; utilizing increased gap; pressure sensitive adhesive labels |
| 05/12/2005 | US20050100502 Carbon black |
| 05/12/2005 | US20050098738 Absorption x-rays; emission of electromagnetic waves; on support having a reflective polyester surfaces containing barium sulfate particles; radiology images |
| 05/11/2005 | EP1530079A1 Silver salt photothermographic dry imaging material |
| 05/11/2005 | EP1529240A2 Electrolytes for electrooptic devices comprising ionic liquids |
| 05/11/2005 | CN1615351A Photochromic polymer compositions and articles thereof |
| 05/11/2005 | CN1614701A Information recording materials |
| 05/11/2005 | CN1614507A Indirect ammoniating preparation for silver halides sensitive emulsion |
| 05/11/2005 | CN1200978C Coloring composition |
| 05/10/2005 | US6891038 Provide substantial increase of photoactivation and decoloration rates while retaining high optical density in photoactivated state; used in plastic lenses |
| 05/10/2005 | US6890707 Silver halide crystals of the red-sensitive layer contain 20 to 500 nmol of iridium per mol of silver halide; N-acyl-N'-(thiophenylsulfonylmethylcarbonyl)-2-hydroxy-p-phenylene-diamine |
| 05/10/2005 | US6890706 Process for removing stain in a photographic material |
| 05/10/2005 | US6890705 Silver halide photosensitive material and image-forming method using same |
| 05/10/2005 | CA2487530A1 Method and device for targeted delivery of materials to selected single cells |
| 05/06/2005 | WO2005040918A2 Low-activation energy silicon-containing resist system |
| 05/06/2005 | WO2005040915A1 Thermally developable imaging materials having backside stabilizers |
| 05/06/2005 | WO2005040914A1 Thermally developable imaging materials having backside stabilizers |
| 05/06/2005 | WO2003055684A3 Laser engraving methods and compositions |
| 05/05/2005 | US20050095541 comprises photosensitive silver halide grains, light-insensitive organic silver salt grains, reducing agent for silver ions and butylene oxide-ethylene oxide-propylene oxide terpolymer which dissolves in water and organic solvent; high photographic speed, improved fog prevention and lightfastness |
| 05/05/2005 | US20050095540 thermography/photothermography; prevents migration of diffusible imaging components and by-products from high temperature imaging and/or development; black-and-white latent imaging/medical diagnosis |
| 05/05/2005 | US20050095533 Nitrogen-containing organic compound, resist composition and patterning process |
| 05/05/2005 | US20050095529 Alkali-soluble polymer and polymerizable composition thereof |
| 05/05/2005 | US20050095527 Radiation-sensitive resin composition |
| 05/05/2005 | US20050095408 Laser engraving methods and compositions, and articles having laser engraving thereon |
| 05/04/2005 | EP1528428A2 Silver halide emulsion |
| 05/04/2005 | CN1611527A Electroconductive cellulose-based film |
| 05/04/2005 | CN1611495A Compound having an epoxy group and a chalcone group, method of preparing the same, and photoresist composition comprising the same |
| 05/04/2005 | CN1200318C Photoactive silver-halide photography emuslion, photoactive material containing same, and method for increasing photoactivity of said emulsion |
| 05/03/2005 | US6887656 Light sensitive silver halide emulsion layer containing a thiadiazole or an oxadiazole or a 1,2,4 triazole bearing an amido substituent, and for each compound doesn't containing a hydroxy or thiol group on the azole ring |
| 05/03/2005 | US6887641 Mammography imaging method using high peak voltage and rhodium or tungsten anodes |
| 05/03/2005 | CA2218920C Base film for photographic films |
| 04/28/2005 | WO2005038528A2 Method of coating a multilayered element |
| 04/28/2005 | WO2005038522A2 Transparent invisible conductive grid |
| 04/28/2005 | US20050089807 also comprising a bisphenol or bisphenol sulfide compounds as an image tone control agent; improving storage stability, image lasting quality, non-fogging; use in medical diagnosis and graphic arts |
| 04/28/2005 | US20050089806 Method of preparation of direct dispersions of photographically useful chemicals |
| 04/28/2005 | US20050089801 Coating film layer moisture adjusting device and planographic printing plate producing method |
| 04/28/2005 | US20050089800 Photoresist polymer and photoresist composition containing the same |
| 04/28/2005 | US20050089797 Polymers, resist compositions and patterning process |
| 04/28/2005 | US20050089796 Acrylic ester terpolymer having units of a C5-C6 cycloalkyl (meth)acrylate, a hydroxy-adamantanyl acrylate, and acrylate of cyclic lactone; high resolution, patterns with less sidewall roughness, acceptable dry etch resistance, and a good margin allowed for heat treatment temperature after exposure |
| 04/28/2005 | US20050089795 Light sensitive media for optical devices using organic mesophasic materials |
| 04/28/2005 | US20050089794 Silver powder, an organic binder, a photopolymerizable monomer,a photopolymerization initiator and a lead-free glass; |
| 04/28/2005 | US20050089793 a photoresist composition of a polyether; a diphenyl propenol polymerized with epichlorhydrin, an acrylate resin, a curing agent, and an organic solvent; a high curing efficiency, brightness; prevents the formation of remnant in photoresist patterns |
| 04/28/2005 | US20050089792 Low-activation energy silicon-containing resist system |
| 04/28/2005 | US20050089782 matrices having antennas and activators; with a dispersed alloy as an independent phase, said alloy having an antenna and further having a leuco-dye and an accelerator uniformly distributed; for use in fast-marking coatings, initiated and addressable by low-energy |
| 04/28/2005 | US20050089504 Hyperbranched polymeric micelles for encapsulation and delivery of hydrophobic molecules |
| 04/27/2005 | EP1459110B1 Composite mask for producing a diffuser |
| 04/27/2005 | EP1214310B1 Novel photochromic naphthopyrans |
| 04/27/2005 | CN1609707A Over-coating composition for photoresist and process for forming photoresist pattern using the same |
| 04/27/2005 | CN1199085C Silver halides colour photographic sensitive material and image forming method |
| 04/27/2005 | CN1198806C Oxodiethylenediamine derivative and light stabilized composition |
| 04/26/2005 | US6884891 Methine dyes, manufacturing methods thereof, and silver halide photographic materials containing same dyes |
| 04/26/2005 | US6884281 Method and apparatus for preparation and deaeration of coating liquid |
| 04/21/2005 | WO2005036270A1 Radiation-curing composition, method for storing same, method for forming cured film, method for forming pattern, method for using pattern, electronic component, and optical waveguide |
| 04/21/2005 | WO2005036265A2 Photoresist compositions comprising diamondoid derivatives |
| 04/21/2005 | WO2005036261A1 Negative resist composition with fluorosulfonamide-containing polymer |
| 04/21/2005 | WO2005035602A1 Photoresist resin and photoresist resin composition |
| 04/21/2005 | WO2004099373A3 Biocompatible resists |
| 04/21/2005 | US20050084810 Highly lubricated imaging element with elastomeric matte |
| 04/21/2005 | US20050084809 Thermally development imaging materials having backside stabilizers |
| 04/21/2005 | US20050084808 Photothermography; antifogging agents; shelf life; storage stability; mixture of silver halide emulsion and reducible silver compound with stabilizer on support; exposure to electromagneti waves; forming latent images |
| 04/21/2005 | US20050084798 Light absorbent agent polymer useful for organic anti-reflective coating, its preparation method and organic anti-reflective coating composition comprising the same |
| 04/21/2005 | US20050084796 Resist compositions and patterning process |
| 04/21/2005 | US20050084795 (Meth)acrylic acid-alkyl acrylate copolymer, distilled water and an amine salt of a halide or carboxylate or a crown compound; neutralize acid produced in the upper portion of a photoresist film to uniform the vertical distribution of the acids allowing vertical and fine patterns to be obtained |
| 04/21/2005 | US20050084794 Altering the liquid-contact properties of the photoresist by adding constituent(s) such as a hydrophobic ionic photoacid generator or a non-ionic photoacid generator into the liquid photoresist; reducing diffusion between the photoresist and the water; liquid immersion lithography |
| 04/21/2005 | US20050084789 Substrate of polyolefin or a copolymer thereof, wherein said substrate has a density of greater than 0.9 grams/cc; support free of paper fiber; high stiffness, excellent surface uniformity and smoothness, high opacity, humidity curl resistance, recyclable |
| 04/21/2005 | US20050084788 Method of coating a multilayered element |
| 04/21/2005 | US20050082535 Thin film transistor array panel and manufacturing method thereof |
| 04/21/2005 | CA2540570A1 Photoresist compositions comprising diamondoid derivatives |
| 04/20/2005 | EP1524552A2 Silver halide color photographic light-sensitive material |
| 04/20/2005 | CN1197658C Screen coating machine |
| 04/19/2005 | US6881840 Useful in imaging elements including silver halide photographic materials and inkjet materials; do not cause undesirable fluorescence |
| 04/19/2005 | US6881810 Microcapsule and process for manufacturing the same |
| 04/19/2005 | US6881529 Positive photoresist transfer material and method for processing surface of substrate using the transfer material |
| 04/19/2005 | US6881492 Primer composition for polyesters |
| 04/14/2005 | WO2005032840A1 Antistatic conductive grid pattern with integral logo |
| 04/14/2005 | US20050079457 Photothermographic material and method for preparing photosensitive silver halide emulsion |
| 04/14/2005 | US20050079455 Colour photographic recording material |
| 04/14/2005 | US20050079446 Base resin polymer for a positive-resist composition of acrylic ester monomers with pendant adamantine and norbornene groups ; high sensitivity, high resolution in exposure with a high energy beam, reduced line edge roughness due to suppressed swelling at the time of development |
| 04/14/2005 | US20050079445 improvement in resolution, a reduction in LER (line edge roughness) and level of defects |
| 04/14/2005 | US20050079443 Radiation-sensitive polymer composition and pattern forming method using the same |
| 04/14/2005 | US20050079441 A resin whose solubility increases in an alkali developer by acid action, a triarylsulfonium salt optionally with fluorine atoms in the cation portion, a nitrogen-containing base, and an organic solvent; improved resolution, sensitivity, initial particle level, profile, and curvature reproducibility |
| 04/14/2005 | US20050079440 Novel polymer, positive resist composition, and patterning process using the same |
| 04/14/2005 | US20050079438 Photoresists with reduced outgassing for extreme ultraviolet lithography |
| 04/13/2005 | EP1522891A1 Positive resist composition and pattern forming method using the same |
| 04/13/2005 | EP1521797A1 Antireflective silicon-containing compositions as hardmask layer |
| 04/13/2005 | CN1606713A Spincoating antireflection paint for photolithography |
| 04/13/2005 | CN1605938A Photoresist polymer and photoresist composition containing the same |
| 04/13/2005 | CN1196975C Manganese sulfide nanoparticle sensitizer, preparing process and use thereof |
| 04/12/2005 | US6878513 Modified gelatin, and silver halide photographic emulsion and photographic light-sensitive material using the same |
| 04/12/2005 | US6878512 Average thickness lower than 0.15 mu m; average diameter at least 1.20 mu m; average aspect ratio of at least 8:1; coefficient of diameter variation COVd of 31%-44%; and coefficient of thickness variation COVt lower than 25%. |
| 04/12/2005 | US6878511 Using silver halide fine grains prepared by mixing a silver salt aqueous solution and a halide aqueous solution including a jet flows; thinner silver halide tabular grain emulsions |
| 04/12/2005 | US6878510 Method of processing silver halide photosensitive material |