Patents for G03B 27 - Photographic printing apparatus (25,157)
04/2008
04/15/2008US7359030 Lithographic apparatus and device manufacturing method
04/15/2008US7359029 Lithographic apparatus and method of reducing thermal distortion
04/15/2008US7357518 Projector
04/10/2008WO2008042578A2 Automatic dynamic baseline creation and adjustment
04/10/2008WO2005036600A3 System and method for automatically mounting a pellicle assembly on a photomask
04/10/2008US20080084550 High throughput wafer stage design for optical lithography exposure apparatus
04/10/2008US20080084549 High refractive index media for immersion lithography and method of immersion lithography using same
04/10/2008US20080084548 Maskless exposure apparatus and method of manufacturing substrate for display using the same
04/10/2008US20080084547 Exposure apparatus and device manufacturing method
04/10/2008US20080084546 Exposure Apparatus,Exposure Method, And For Producing Device
04/10/2008US20080084122 Moving apparatus, exposure apparatus, and device manufacturing method
04/09/2008CN100380242C Document size detecting method, document reading apparatus and imaging apparatus
04/08/2008US7356167 Image processing apparatus and image processing method for correcting image data
04/08/2008US7355764 Image reading system
04/08/2008US7355763 Image scanning apparatus, method and business machine using the same
04/08/2008US7355759 Print order/delivery system and method, digital camera, client information registration device, ordering terminal, and printing system
04/08/2008US7355746 Method and apparatus for printing and/or displaying digital images
04/08/2008US7355681 Optical proximity correction using chamfers and rounding at corners
04/08/2008US7355680 Method for adjusting lithographic mask flatness using thermally induced pellicle stress
04/08/2008US7355679 Lithography arrangement and procedure that produces a lithography
04/08/2008US7355678 Projection system for EUV lithography
04/08/2008US7355677 System and method for an improved illumination system in a lithographic apparatus
04/08/2008US7355676 Environmental system including vacuum scavenge for an immersion lithography apparatus
04/08/2008US7355675 Method for measuring information about a substrate, and a substrate for use in a lithographic apparatus
04/08/2008US7355674 Lithographic apparatus, device manufacturing method and computer program product
04/08/2008US7355673 Method, program product and apparatus of simultaneous optimization for NA-Sigma exposure settings and scattering bars OPC using a device layout
04/08/2008US7355672 Method for the removal of deposition on an optical element, method for the protection of an optical element, device manufacturing method, apparatus including an optical element, and lithographic apparatus
04/08/2008US7355616 Polarization-direction-controlling element and exposure device
04/03/2008US20080080959 Bookbinding apparatus and image forming system
04/03/2008US20080079927 Holder for carrying a photolithography mask in a flattened condition
04/03/2008US20080079926 Near-field exposure mask, near-field exposure apparatus, and near-field exposure method
04/03/2008US20080079925 Processing apparatus
04/03/2008US20080079924 Projection optical system, exposure apparatus, and exposure method
04/03/2008US20080079923 Methods, Systems, and Computer Program Products for Printing Patterns on Photosensitive Surfaces
04/03/2008US20080079921 Substrate Exposure Apparatus and Illumination Apparatus
04/03/2008US20080079920 Wafer exposure device and method
04/03/2008US20080079919 Immersion lithography method
04/03/2008US20080079918 Automatic dynamic baseline creation and adjustment
04/03/2008US20080079917 Developing method and developing unit
04/02/2008EP1906351A2 Print order server, method of controlling same, and control program therefore
04/02/2008EP1906235A1 Method for image formation
04/02/2008CN100379238C Self-service photo burning apparatus
04/01/2008US7352913 System and method for correcting multiple axis displacement distortion
04/01/2008US7352444 Method for arranging and rotating a semiconductor wafer within a photolithography tool prior to exposing the wafer
04/01/2008US7352443 Radially polarized light in lithographic apparatus
04/01/2008US7352442 Aligner, exposing method, method for manufacturing thin-film transistor, display device, and electronic device using shading means
04/01/2008US7352441 Sensor unit, exposure apparatus, and device manufacturing method
04/01/2008US7352440 Substrate placement in immersion lithography
04/01/2008US7352439 Lithography system, control system and device manufacturing method
04/01/2008US7352438 Lithographic apparatus and device manufacturing method
04/01/2008US7352437 Exposure apparatus
04/01/2008US7352436 Lithographic apparatus, projection apparatus and device manufacturing method
04/01/2008US7352435 Lithographic apparatus and device manufacturing method
04/01/2008US7352434 Lithographic apparatus and device manufacturing method
04/01/2008US7352433 Lithographic apparatus and device manufacturing method
03/2008
03/27/2008US20080077427 Print order server, method of controlling same, and control program therefor
03/27/2008US20080076045 Modifiable resist layer for providing a first set of optical properties before exposure and a second set of optical properties after exposure; improving the accuracy of measurements made using optical metrology; electronic devices, integrated circuits
03/27/2008US20080074634 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
03/27/2008US20080074633 Near-field exposure method and apparatus, near-field exposure mask, and device manufacturing method
03/27/2008US20080074632 Illumination optical system, exposure apparatus, and exposure method
03/27/2008US20080074631 Optical Integrator, Illumination Optical Device, Photolithograph, Photolithography, and Method for Fabricating Device
03/27/2008US20080074630 Lithographic apparatus and device manufacturing method
03/27/2008US20080074629 Lithographic apparatus and device manufacturing method
03/25/2008US7349627 Tracking an image-recording medium using a watermark and associated memory
03/25/2008US7349216 Modular electronic device
03/25/2008US7349133 Image reading apparatus
03/25/2008US7349111 Printer for printing sets of color adjusted images
03/25/2008US7349072 Lithographic apparatus and device manufacturing method
03/25/2008US7349071 Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method
03/25/2008US7349070 Multiple level photolithography
03/25/2008US7349069 Lithographic apparatus and positioning apparatus
03/25/2008US7349068 Lithographic apparatus and device manufacturing method
03/25/2008US7349067 Lithographic apparatus and device manufacturing method
03/25/2008US7349066 Apparatus, method and computer program product for performing a model based optical proximity correction factoring neighbor influence
03/25/2008US7349065 Exposure apparatus and device fabrication method
03/25/2008US7349064 Immersion exposure technique
03/25/2008US7349063 Reflection mirror apparatus, exposure apparatus and device manufacturing method
03/25/2008US7348108 Design and layout of phase shifting photolithographic masks
03/25/2008US7347611 Optical guide and image forming apparatus using the same
03/20/2008WO2008033233A2 Imaging apparatus with media pickup
03/20/2008WO2008032588A1 Document illuminating method, document illuminating device, and image reader
03/20/2008US20080068631 Image processing module for a pen-shaped printer
03/20/2008US20080068603 Anti-vibration apparatus, exposure apparatus, and device manufacturing method
03/20/2008US20080068582 Apparatus for supporting a wafer, apparatus for exposing a wafer and method of supporting a wafer
03/20/2008US20080068581 Positioning stage, bump forming apparatus equipped with the positioning stage, and bump forming method performed using the positioning stage
03/20/2008US20080068580 Substrate-retaining unit
03/20/2008US20080068579 Aperture unit and exposure system including the same, and method for replacing apertures of the aperture unit
03/20/2008US20080068578 Projection aligner including correction filters
03/20/2008US20080068577 Lithographic apparatus and device manufacturing method
03/20/2008US20080068576 Projection optical system and method for photolithography and exposure apparatus and method using same
03/20/2008US20080068575 Euv Light Source, Euv Exposure Equipment, And Semiconductor Device Manufacturing Method
03/20/2008US20080068574 Helical Optical Pulse Stretcher
03/20/2008US20080068573 Projection optical system and method for photolithography and exposure apparatus and method using same
03/20/2008US20080068572 Exposure method and apparatus, and method for fabricating device
03/20/2008US20080068571 Immersion exposure apparatus and immersion exposure method, and device manufacturing method
03/20/2008US20080068570 Lithographic apparatus and device manufacturing method
03/20/2008US20080068569 Lithographic system, device manufacturing method, and mask optimization method
03/20/2008US20080068568 Projection Optical Device And Exposure Apparatus
03/20/2008US20080068567 Exposure Apparatus, Exposure Method, and Method for Producing Device
03/20/2008US20080068407 Cartridge with ink level monitoring for a pen-like modular printing device
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