Patents for G03B 27 - Photographic printing apparatus (25,157)
09/2008
09/23/2008US7428083 Document reader and image forming apparatus
09/23/2008US7428081 Image reading apparatus
09/23/2008US7428040 Lithographic apparatus and device manufacturing method
09/23/2008US7428039 Method and apparatus for providing uniform illumination of a mask in laser projection systems
09/23/2008US7428038 Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
09/23/2008US7428037 Optical component that includes a material having a thermal longitudinal expansion with a zero crossing
09/23/2008US7428021 Image processing method, recording medium and apparatus for performing color adjustment to image data using a brightness component, a low-frequency brightness component, and first and second parameters
09/18/2008US20080225261 Exposure apparatus and device manufacturing method
09/18/2008US20080225260 Illuminator for a lithographic apparatus and method
09/18/2008US20080225259 Illumination system with variable adjustment of the illumination
09/18/2008US20080225258 EUV illumination system having a folding geometry
09/18/2008US20080225257 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
09/18/2008US20080225256 Optical integrator system, illumination optical apparatus, exposure apparatus, and device manufacturing method
09/18/2008US20080225255 Conforming seats for clamps used in mounting an optical element, and optical systems comprising same
09/18/2008US20080225254 Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor device
09/18/2008US20080225253 Damper for a stage assembly
09/18/2008US20080225252 Device manufacturing method, lithographic apparatus, and a computer program
09/18/2008US20080225251 Immersion optical lithography system having protective optical coating
09/18/2008US20080225250 Exposure apparatus and method for producing device
09/18/2008US20080225249 Exposure apparatus and method for producing device
09/18/2008US20080225248 Apparatus, systems and methods for removing liquid from workpiece during workpiece processing
09/18/2008US20080225247 Optical element unit for exposure processes
09/18/2008US20080225246 Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
09/18/2008US20080225245 EUV debris mitigation filter and method for fabricating semiconductor dies using same
09/18/2008US20080225244 Lithographic apparatus and method
09/18/2008US20080224251 apparatus comprising a layout of elements configured to modulate radiation beams, projectors for projecting the modulated beam of radiation onto substrates and a controller for controlling the exposure pattern of radiation on the substrate; manufacture of flat panel displays and integrated circuits
09/17/2008EP1969422A2 Projection system with beam homogenizer
09/17/2008CN101268349A System and method for automatically mounting a pellicle assembly on a photomask
09/17/2008CN100419583C Manuscript press plate opening and closing device
09/16/2008US7426044 Hand-held printer assembly with detachable media feed mechanism
09/16/2008US7426018 Lithographic apparatus, illumination system and filter system
09/16/2008US7426017 Focus test mask, focus measurement method and exposure apparatus
09/16/2008US7426016 Exposure apparatus and exposure method
09/16/2008US7426015 Device manufacturing method and lithographic apparatus
09/16/2008US7426014 Dynamic fluid control system for immersion lithography
09/16/2008US7426013 Exposure apparatus and device fabrication method
09/16/2008US7426012 Exposure device for immersion lithography and method for monitoring parameters of an exposure device for immersion lithography
09/16/2008US7426011 Method of calibrating a lithographic apparatus and device manufacturing method
09/12/2008WO2008108210A1 Linear light source apparatus and image reading apparatus provided with the same
09/11/2008US20080220379 Coating a photoresist onto a substrate;selectively exposure; baking in atmosphere containing moisture; replacing with atmosphere not containing moisture; development; suppression of variations in line width dimensions of resist patterns among the exposed substrates; semiconductors
09/11/2008US20080220345 Device manufacturing method, computer program and lithographic apparatus
09/11/2008US20080219562 System and Method for Calculating Aerial Image of a Spatial Light Modulator
09/11/2008US20080218726 Lithographic apparatus and device manufacturing method
09/11/2008US20080218725 Device and method for influencing the polarization distribution in an optical system
09/11/2008US20080218724 Illumination unit, image read apparatus, image formation apparatus
09/11/2008US20080218723 Light amount control, optical writing, and image forming apparatuses
09/11/2008US20080218722 Lithographic apparatus and device manufacturing method
09/11/2008US20080218721 Optical element unit
09/11/2008US20080218720 Exposure apparatus and method of manufacturing device
09/11/2008US20080218719 Exposure apparatus
09/11/2008US20080218718 Lithographic apparatus and device manufacturing method
09/11/2008US20080218717 Lithographic apparatus and device manufacturing method
09/11/2008US20080218716 Method for setting an optical imaging property in a microlithographic projection exposure apparatus, and projection exposure apparatus of this type
09/11/2008US20080218715 Immersion exposure method of and immersion exposure apparatus for making exposure in a state where the space between the projection lens and substrate to be processed is filled with a liquid
09/11/2008US20080218714 Exposure Method, Exposure Apparatus and Device Manufacturing Method
09/11/2008US20080218713 Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, and device manufacturing method
09/11/2008US20080218712 Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus
09/11/2008US20080218711 Lithographic apparatus and device manufacturing method
09/11/2008US20080218710 Exposure apparatus, image forming apparatus and heating method
09/11/2008US20080218709 Removal of deposition on an element of a lithographic apparatus
09/11/2008US20080218708 Exposure apparatus and method of manufacturing device
09/10/2008EP1794650A4 Projection optical device and exposure apparatus
09/10/2008CN101261434A Image recording apparatus and a light-sensitive material distributing device for use therein
09/10/2008CN100418015C Self-locking hinge
09/10/2008CN100417973C Method and apparatus for digital image exposure on photo sensitive material
09/09/2008US7423765 Optical system of a microlithographic projection exposure apparatus
09/09/2008US7423733 Lithographic apparatus, device manufacturing method, and device manufactured thereby with docking system for positioning a patterning device
09/09/2008US7423732 Lithographic apparatus and device manufacturing method utilizing placement of a patterning device at a pupil plane
09/09/2008US7423731 Illumination optical system, exposure apparatus, and exposure method with polarized switching device
09/09/2008US7423730 Lithographic apparatus
09/09/2008US7423729 Method of monitoring the light integrator of a photolithography system
09/09/2008US7423728 Immersion exposure method and apparatus, and manufacturing method of a semiconductor device
09/09/2008US7423727 Lithographic apparatus and device manufacturing method
09/09/2008US7423726 Exposure apparatus and device manufacturing method
09/09/2008US7423725 Lithographic method
09/09/2008US7423724 Exposure apparatus and device manufacturing method
09/09/2008US7423722 Lithographic apparatus and device manufacturing method
09/09/2008US7423721 Lithographic apparatus
09/09/2008US7423720 Lithographic apparatus and device manufacturing method
09/09/2008US7422841 Exposure control for phase shifting photolithographic masks
09/04/2008WO2008105984A2 Integrated large xy rotary positioning table with virtual center of rotation
09/04/2008US20080213705 Pattern exposure method and pattern exposure apparatus
09/04/2008US20080213704 Rapid, accurate local flare measuring; ensures sufficient light quantity; increased opening size above sensor; semiconductors
09/04/2008US20080212062 Exposure apparatus and method of manufacturing device
09/04/2008US20080212061 Illumination optical system, exposure apparatus, and device manufacturing method
09/04/2008US20080212060 Method for Determining Intensity Distribution in the Image Plane of a Projection Exposure Arrangement
09/04/2008US20080212059 Microlithography illumination systems, components and methods
09/04/2008US20080212058 Projection optical system, exposure apparatus, and device fabrication method
09/04/2008US20080212057 Substrate comprising a mark
09/04/2008US20080212056 Exposure Method, Exposure Apparatus, Method for Producing Device, and Method for Evaluating Exposure Apparatus
09/04/2008US20080212054 Stage system and lithographic apparatus comprising such stage system
09/04/2008US20080212053 Device manufacturing method, lithographic apparatus and device manufactured thereby
09/04/2008US20080212052 Optical arrangement and projection exposure system for microlithography with passive thermal compensation
09/04/2008US20080212051 Lithographic apparatus and device manufacturing method
09/04/2008US20080212050 Apparatus and methods for removing immersion liquid from substrates using temperature gradient
09/04/2008US20080212049 Substrate processing apparatus with high throughput development units
09/04/2008US20080212048 Substrate processing method and substrate processing system
09/04/2008US20080212047 Exposure apparatus, exposing method, and device fabricating method
09/04/2008US20080212046 Lithographic apparatus and device manufacturing method
09/04/2008US20080212044 Debris Mitigation System with Improved Gas Distribution
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