Patents for G03B 27 - Photographic printing apparatus (25,157)
11/2007
11/08/2007US20070258073 Enhanced lithographic resolution through double exposure
11/08/2007US20070258072 Exposure apparatus, method for cleaning memeber thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
11/08/2007US20070258071 Advanced exposure techniques for programmable lithography
11/08/2007US20070258070 Method for Determining Exposure Condition, Exposure Method, Exposure Apparatus, and Method for Manufacturing Device
11/08/2007US20070258069 Gas bearing, and lithographic apparatus provided with such a bearing
11/08/2007US20070258068 Exposure Apparatus, Exposure Method, and Device Fabricating Method
11/08/2007US20070258067 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258066 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258065 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258064 Exposure apparatus and device manufacturing method
11/08/2007US20070258063 Exposure apparatus, exposure method, and method for producing device
11/08/2007US20070258062 Environmental system including a transport region for an immersion lithography apparatus
11/08/2007US20070258061 System and method for using a two part cover and a box for protecting a reticle
11/08/2007US20070258060 Hood for immersion lithography
11/08/2007US20070257209 Optimized correction of water thermal deformations in a lithographic process
11/07/2007CN200972565Y Film vertical sticking device of exposure machine
11/07/2007CN101067715A Digital colour enlarge printer with linear motion image processer
11/07/2007CN101067714A Leather belt clamping photographic paper turnover device
11/07/2007CN100347607C Three-colour luminous diode multi light source lighting device
11/07/2007CN100347606C LCD micromotion exposure and development device
11/06/2007US7292376 Device for digitally generating images
11/06/2007US7292317 Lithographic apparatus and device manufacturing method utilizing substrate stage compensating
11/06/2007US7292316 Illumination optical system and exposure apparatus having the same
11/06/2007US7292315 Optimized polarization illumination
11/06/2007US7292314 Exposure device with spatial light modulator and neutral density filters
11/06/2007US7292313 Apparatus and method for providing fluid for immersion lithography
11/06/2007US7292312 Lithographic apparatus and method for calibrating the same
11/06/2007US7292311 Scanning exposure technique
11/06/2007US7292310 Lithographic apparatus and a device manufacturing method
11/06/2007US7292309 Exposure apparatus and device manufacturing method
11/06/2007US7292308 System and method for patterning a flexible substrate in a lithography tool
11/06/2007US7292307 Cooling apparatus, optical element having the same, and exposure apparatus
11/01/2007US20070254493 Integrated thermal unit having vertically arranged bake and chill plates
11/01/2007US20070252971 Substrate holder and exposure apparatus having the same
11/01/2007US20070252969 Stage apparatus and exposure apparatus
11/01/2007US20070252968 Exposure apparatus
11/01/2007US20070252967 Lithographic apparatus and device manufacturing method
11/01/2007US20070252966 Exposure Apparatus, Operation Decision Method, Substrate Processing System, Maintenance Management Method, and Device Manufacuring Method
11/01/2007US20070252965 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
11/01/2007US20070252964 Exposure apparatus and method for producing device
11/01/2007US20070252963 Lithographic Apparatus, Method of Exposing a Substrate, Method of Measurement, Device Manufacturing Method, and Device Manufacturing Thereby
11/01/2007US20070252962 Environmental system including a transport region for an immersion lithography apparatus
11/01/2007US20070252961 Environmental system including a transport region for an immersion lithography apparatus
11/01/2007US20070252960 Exposure Apparatus, Exposure Method, and Device Producing Method
11/01/2007US20070252959 Device for Controlling the Temperature of Elements
11/01/2007US20070252094 Reduction projection objective and projection exposure apparatus including the same
10/2007
10/31/2007EP1575786A4 Transparent measuring device with enhanced visibility lines
10/31/2007CN200969026Y LCD rotary device
10/31/2007CN200969025Y LCD rotary device
10/31/2007CN200969024Y Digital exposure device fixing station
10/31/2007CN200969023Y Photographic paper dark box paper advance mechanism
10/31/2007CN200969022Y Paper advance mechanism for digital colored photo film processor
10/31/2007CN101063801A 图象形成装置 An image forming apparatus
10/31/2007CN101063800A Image forming device
10/31/2007CN100346227C Photographic paper cassette for developing and printing device
10/30/2007US7289212 Lithographic apparatus, device manufacturing method and device manufacturing thereby
10/30/2007US7289194 Positioning apparatus, exposure apparatus, and device manufacturing method
10/30/2007US7289193 Frame structure for turbulence control in immersion lithography
10/30/2007US7289192 Projection exposure device
10/30/2007US7289191 Illumination optical system, and image display apparatus and image exposure apparatus using the same
10/30/2007US7289190 Monitoring apparatus and method particularly useful in photolithographically
10/30/2007US7288864 System and method for cooling motors of a lithographic tool
10/30/2007US7288859 Wafer stage operable in a vacuum environment
10/30/2007US7287865 Display optical system
10/25/2007WO2007119290A1 Linear lighting apparatus and image reader using same
10/25/2007US20070250290 Scanning exposure technique
10/25/2007US20070248898 Targets for alignment of semiconductor masks
10/25/2007US20070248227 Film Fingerprinting
10/25/2007US20070247778 Z-stage with dynamically driven stage mirror and chuck assembly
10/25/2007US20070247610 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model
10/25/2007US20070247609 Assembly of a reticle holder and a reticle
10/25/2007US20070247608 Tesselated Patterns in Imprint Lithography
10/25/2007US20070247607 Stage drive method and stage unit, exposure apparatus, and device manufacturing method
10/25/2007US20070247606 Illumination system
10/25/2007US20070247605 Optical element for correction of aberration, and a lithographic apparatus comprising same
10/25/2007US20070247604 Optimized mirror design for optical direct write
10/25/2007US20070247603 Environmental system including vacuum scavenge for an immersion lithography apparatus
10/25/2007US20070247602 Apparatus and method for maintaining immersion fluid in the gap under the projection lens during wafer exchange in an immersion lithography machine
10/25/2007US20070247601 Cleanup method for optics in immersion lithography
10/25/2007US20070247600 Exposure apparatus and method for producing device
10/25/2007DE19849965B4 Verfahren und Vorrichtung zum Naßabtasten von Filmmaterial Method and apparatus for Naßabtasten footage
10/24/2007EP1754108A4 Apparatus, system and method to vary dimensions of a substrate during nano-scale manufacturing
10/24/2007CN200965616Y A digital photo finishing equipment
10/24/2007CN101061429A Environmental system including vacuum scavenge for an immersion lithography apparatus
10/24/2007CN101059659A Immersion photolithography system and method using inverted wafer-projection optics interface
10/24/2007CN101059647A Digital stereo and planar enlarging apparatus and method for digital image multiple-screen combined projection mosaic imaging
10/24/2007CN101059587A Optical device
10/24/2007CN100345434C Substrate inspection apparatus
10/24/2007CN100345433C Line illuminator and image reader incorporating it
10/24/2007CN100345432C Image sensor
10/24/2007CN100344519C Paper transfer mechanism
10/24/2007CN100344457C Liquid crgstal shutter and printing head
10/23/2007US7286270 Optical reading document board and optical reader
10/23/2007US7286219 Exposure system, semiconductor device, and method for fabricating the semiconductor device
10/23/2007US7286208 In-situ interferometer arrangement
10/23/2007US7286207 Exposing a semiconductor wafer using two different spectral wavelengths and adjusting for chromatic aberration
10/23/2007US7286206 Exposure apparatus
10/23/2007US7286205 Closing disk for immersion head
10/23/2007US7286182 Device for controlling the taking of multiple images
10/23/2007US7286154 Polarization-direction-controlling element and exposure device
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