| Patents for G03B 27 - Photographic printing apparatus (25,157) |
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| 06/24/2008 | US7391501 Immersion liquids with siloxane polymer for immersion lithography |
| 06/24/2008 | US7391500 Light exposure apparatus and method of light exposure using immersion lithography with saturated cyclic hydrocarbon liquid |
| 06/24/2008 | US7391499 Lithographic apparatus and device manufacturing method |
| 06/24/2008 | US7391498 Technique of suppressing influence of contamination of exposure atmosphere |
| 06/24/2008 | US7391497 Image forming state adjusting system, exposure method and exposure apparatus, and program and information storage medium |
| 06/24/2008 | US7391496 Exposure apparatus |
| 06/24/2008 | US7391495 Stage apparatus, exposure system using the same, and device manufacturing method |
| 06/19/2008 | US20080145791 Configured to transfer a pattern onto a substrate; integrated post-exposure bake device; bake substrate to a predefined temperature cycle; higher efficiency processing facility; maintain optimum performance parameters, critical dimension or overlay; asynchronous execution of the respective operations |
| 06/19/2008 | US20080144246 Combination current sensor and relay |
| 06/19/2008 | US20080143996 Processing apparatus |
| 06/19/2008 | US20080143995 Moving apparatus |
| 06/19/2008 | US20080143994 Drive Method of Moving Body, Stage Unit, and Exposure Apparatus |
| 06/19/2008 | US20080143993 Illumination optical system and exposure apparatus |
| 06/19/2008 | US20080143992 Polarized radiation in lithographic apparatus and device manufacturing method |
| 06/19/2008 | US20080143991 Exposure apparatus and device manufacturing method |
| 06/19/2008 | US20080143990 Exposure apparatus and device manufacturing method |
| 06/19/2008 | US20080143989 Method and arrangement for stabilizing the average emitted radiation output of a pulsed radiation source |
| 06/19/2008 | US20080143988 System for calculating transmission utility factor value of photo energy for exposure and method for calculating transmission utility factor value of photo energy utilizing the calculation system |
| 06/19/2008 | US20080143987 Exposure apparatus and device fabrication method |
| 06/19/2008 | US20080143986 Auto-adjust of imaging module mechanical setup |
| 06/19/2008 | US20080143985 Lithography system, control system and device manufacturing method |
| 06/19/2008 | US20080143984 Projection method including pupillary filtering and a projection lens therefor |
| 06/19/2008 | US20080143983 Methods and apparatus for multi-exposure patterning |
| 06/19/2008 | US20080143982 Lithographic system, device manufacturing method, setpoint data optimization method, and apparatus for producing optimized setpoint data |
| 06/19/2008 | US20080143981 Optical arrangement and euv lithography device with at least one heated optical element, operating methods, and methods for cleaning as well as for providing an optical element |
| 06/19/2008 | US20080143980 Substrate Processing Method, Exposure Apparatus, and Method For Producing Device |
| 06/18/2008 | CN100396083C Apparatus and method for editing images |
| 06/18/2008 | CN100396076C Film scanner |
| 06/18/2008 | CN100395659C Original manuscript pressing plate opening and closing device |
| 06/18/2008 | CN100395658C Photosensitire material treatment device and photosensitive material |
| 06/17/2008 | US7388653 Exposure mask and method for divisional exposure |
| 06/17/2008 | US7388652 Wave front sensor with grey filter and lithographic apparatus comprising same |
| 06/17/2008 | US7388651 Focus monitoring method |
| 06/17/2008 | US7388650 Lithographic apparatus and device manufacturing method |
| 06/17/2008 | US7388649 Exposure apparatus and method for producing device |
| 06/17/2008 | US7388648 Lithographic projection apparatus |
| 06/17/2008 | US7388647 Method and system for real time uniformity feedback |
| 06/17/2008 | US7388646 Use in optical applications such as immersion lithography; lower absorbance at wavelengths lower than 250 nm; free of chlorine atoms, even in end groups; made by oxidation of tetrafluoroethylene (TFE) in presence of dilute fluorine gas |
| 06/17/2008 | US7388154 Anti-abrasive mechanism confining flat flexible cable in position in flatbed image scanner |
| 06/12/2008 | US20080138623 Substrate comprising a mark |
| 06/12/2008 | US20080137217 Uniformity correction system having light leak and shadow compensation |
| 06/12/2008 | US20080137057 Film holder for supporting positive film or negative film |
| 06/12/2008 | US20080137055 Lithographic apparatus and device manufacturing method |
| 06/12/2008 | US20080137054 Image exposure apparatus |
| 06/12/2008 | US20080137053 Lithographic Apparatus and Device Manufacturing Method |
| 06/12/2008 | US20080137052 Measuring apparatus, projection exposure apparatus having the same, and device manufacturing method |
| 06/12/2008 | US20080137051 Lithography and Associated Methods, Devices, and Systems |
| 06/12/2008 | US20080137050 Plasma radiation source for a lithographic apparatus |
| 06/12/2008 | US20080137049 Lithographic apparatus, device manufacturing methods, mask and method of characterizing a mask and/or pellicle |
| 06/12/2008 | US20080137048 Exposure apparatus, operation apparatus, computer-readable medium, and device manufacturing method |
| 06/12/2008 | US20080137047 Exposure apparatus and device manufacturing method |
| 06/12/2008 | US20080137046 Apparatus and method for exposing substrate |
| 06/12/2008 | US20080137045 Liguid immersion exposure apparatus, exposure method, and method for producing device |
| 06/12/2008 | US20080137044 Systems and methods for thermally-induced aberration correction in immersion lithography |
| 06/12/2008 | US20080137043 Exposure apparatus, exposure and developing system, and method of manufacturing a device |
| 06/12/2008 | DE19841049B4 Filmabtaster mit einer Halterung für Filmcode-Abtaster A film scanner with a holder for film code scanner |
| 06/11/2008 | CN201072490Y Belt retaining photographic paper turning device |
| 06/11/2008 | CN100394573C Position measurement technique |
| 06/11/2008 | CN100394302C Colour comparator |
| 06/11/2008 | CN100394249C Projection-type display optical system |
| 06/11/2008 | CN100394244C Apparatus and method for providing fluid for immersion lithography |
| 06/10/2008 | US7385733 Imaging optical system and image reading apparatus using the same |
| 06/10/2008 | US7385713 Hand held modular camera assembly with a print sheet dispenser module |
| 06/10/2008 | US7385679 Lithographic apparatus and actuator |
| 06/10/2008 | US7385678 Positioning device and lithographic apparatus |
| 06/10/2008 | US7385677 Lithographic apparatus and device manufacturing method that limits a portion of a patterning device used to pattern a beam |
| 06/10/2008 | US7385676 Mask set having separate masks to form different regions of integrated circuit chips, exposure system including the mask set with an aperture device, and method of using the mask set to expose a semiconductor wafer |
| 06/10/2008 | US7385675 Lithographic apparatus and device manufacturing method |
| 06/10/2008 | US7385674 Exposure apparatus and device manufacturing method |
| 06/10/2008 | US7385673 Immersion lithography with equalized pressure on at least projection optics component and wafer |
| 06/10/2008 | US7385672 Exposure apparatus and method |
| 06/10/2008 | US7385671 High speed lithography machine and method |
| 06/10/2008 | US7385670 Lithographic apparatus, cleaning system and cleaning method for in situ removing contamination from a component in a lithographic apparatus |
| 06/05/2008 | US20080130076 Illumination system particularly for microlithography |
| 06/05/2008 | US20080129978 Exposure apparatus and exposure method |
| 06/05/2008 | US20080129977 Exposure apparatus, control method for the same, and device manufacturing method |
| 06/05/2008 | US20080129976 Shutter blade apparatus, shutter unit, image pickup apparatus, exposure apparatus, and method of manufacturing device |
| 06/05/2008 | US20080129975 Exposure apparatus and device fabrication method |
| 06/05/2008 | US20080129974 Exposure apparatus and device manufacturing method |
| 06/05/2008 | US20080129973 Lithographic apparatus and device manufacturing method |
| 06/05/2008 | US20080129972 Exposure apparatus |
| 06/05/2008 | US20080129971 Exposure apparatus and method for manufacturing device |
| 06/05/2008 | US20080129970 Immersion Exposure System, and Recycle Method and Supply Method of Liquid for Immersion Exposure |
| 06/05/2008 | US20080129969 System and Method For Improving Immersion Scanner Overlay Performance |
| 06/05/2008 | US20080129968 Coating and developing system, coating and developing method and storage medium |
| 06/04/2008 | CN201069511Y Color zooming digital upgrade exposure control table |
| 06/04/2008 | CN101194370A Light emitting unit and lighting apparatus and image scanner using such light emitting unit |
| 06/04/2008 | CN101194207A Environmental control in a reticle SMIF pod |
| 06/04/2008 | CN101191900A Exposure device |
| 06/04/2008 | CN100393097C Image editing device and method |
| 06/03/2008 | US7382912 Method and apparatus for performing target-image-based optical proximity correction |
| 06/03/2008 | US7382500 Variable reflectance cover |
| 06/03/2008 | US7382440 Lithographic apparatus and device manufacturing method |
| 06/03/2008 | US7382439 Lithographic apparatus and device manufacturing method |
| 06/03/2008 | US7382438 Lithographic apparatus and device manufacturing method |
| 06/03/2008 | US7382437 Projection optical system, exposure apparatus and device fabricating method |
| 06/03/2008 | US7382436 Mirror, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| 06/03/2008 | US7382435 Exposure apparatus |
| 06/03/2008 | US7382434 Exposure apparatus and device manufacturing method |
| 06/03/2008 | US7381278 Automated immersion lithography involving irradiating a first photoresist through a lens and an immersion liquid; monitoring accumulation of contaminants on the lens and if detected, removing them by contact with a supercritial fluid; and irradiating a second photoresist through the lens and a liquid |