Patents for G01L 21 - Vacuum gauges (1,613)
11/2007
11/06/2007US7291285 Method and system for line-dimension control of an etch process
11/01/2007US20070251919 bevels comprising a support applied ground potential, supporting a rotating substrate, an electrode having a gap inserted at a predetermined distance from an outer edge of the substrate and a surface covered with a dielectric and a high-frequency power source connected to the electrode
10/2007
10/17/2007CN200962064Y A two-purpose vacuum standard pipe interface
10/11/2007US20070234816 Semiconductor based pressure sensor
10/11/2007US20070234782 Tightness Test for Mems or for Small Encapsulated Components
10/11/2007DE112005002501T5 Pirani-Vakuummessvorrichtung Pirani vacuum gauge
10/09/2007US7279114 Method for stabilizing etching performance
10/09/2007US7278322 Semiconductor based pressure sensor
10/04/2007US20070233489 Speech Synthesis Device and Method
10/04/2007US20070231934 Classification apparatus for semiconductor substrate, classification method of semiconductor substrate, and manufacturing method of semiconductor device
10/04/2007US20070228003 Measuring line widths of collinear line bodies in a mask layer; locating effective line end positions for the line ends based on the line widths; and measuring the distance between the effective line end positions, as an effective line end spacing; accurate prediction for optical proximity corrections
10/03/2007CN200955987Y Portable vacuum gauge calibrating device
10/03/2007CN101046423A Fast response ionization vacuum gauge with high anti-jamming capacity
09/2007
09/27/2007US20070221620 Processes for monitoring the levels of oxygen and/or nitrogen species in a substantially oxygen and nitrogen-free plasma ashing process
09/27/2007US20070221619 Recessing trench to target depth using feed forward data
09/26/2007EP1700093A4 Cold cathode ion gauge
09/20/2007US20070218691 Plasma etching method, plasma etching apparatus and computer-readable storage medium
09/20/2007US20070215575 Method and system for high-speed, precise, laser-based modification of one or more electrical elements
09/20/2007US20070215574 Prediction method and apparatus for substrate processing apparatus
09/12/2007EP1832003A2 Hands-free push-to-talk radio
09/12/2007CN101034029A 真空传感器 Vacuum sensor
09/06/2007US20070208529 Capacitive sensing isolation using reversed biased diodes
09/06/2007DE102006027968A1 Vorrichtung zum Prüfen eines Gases, Verwendung einer solchen Vorrichtung und Verfahren zum Umrüsten einer Produktionsanlage An apparatus for testing a gas, using such a device and method for retrofitting a production plant
08/2007
08/30/2007US20070199919 Surface treatment method, manufacturing method of color filter substrate, and manufacturing method of electro-optical device
08/29/2007EP1825241A1 Method and apparatus for storing vacuum gauge calibration parameters and measurement data on a vacuum gauge structure
08/23/2007US20070193976 Plasma processing apparatus and plasma processing method
08/23/2007US20070193975 Using positive DC offset of bias RF to neutralize charge build-up of etch features
08/21/2007US7260521 Method and device for adaptive bandwidth pitch search in coding wideband signals
08/16/2007US20070187363 Substrate processing apparatus and substrate processing method
08/16/2007US20070187361 forming photoresist coating, etching, inspecting for defects, forming repairing photoresist coating, etching
08/16/2007US20070187358 Device manufacturing method and computer program product
08/16/2007US20070186972 Plasma processing apparatus
08/09/2007US20070181528 Method of etching treatment
08/08/2007CN2932352Y Vacuum test pattern plate
08/08/2007CN2932351Y BD resistance comprehensive tester
08/08/2007CN101014844A Pressure transducer with improved process adapter
08/02/2007DE102006002928A1 Removing water from water/air mixture in calibration station or vacuum tank comprises applying vacuum to first line arranged on separating container and removing water from second line
08/01/2007CN1329720C Determination of the gas pressure in an evacuated thermal insulating board (vacuum panel) by using a heat sink and test layer that are integrated therein
07/2007
07/26/2007WO2007082395A1 Vacuum measuring cell having a membrane
07/26/2007US20070170926 Method and device for measuring ultrahigh vacuum
07/26/2007DE102006003586A1 Vorrichtung und Verfahren zur Diagnose von Vakuumsystemen Apparatus and method for diagnosis of vacuum systems
07/26/2007DE102006001902A1 Verfahren zur Ermittlung eines Gases in einem Unterdruckgefäß mittels der Absorptionsspektroskopie A method for detecting a gas in a vacuum vessel by means of absorption spectroscopy
07/25/2007CN101006550A Methods and apparatus for determining endpoint in a plasma processing system
07/25/2007CN101006332A Pirani gauge
07/19/2007DE202007001146U1 Vakuummessgerät Vacuum gauge
07/18/2007EP1808685A2 Pressure sensor with vibrating member
07/18/2007CN101000272A Method for measuring inner running state of vaccum arc-chutes based on X-ray capacity
07/17/2007US7245133 Integration of photon emission microscope and focused ion beam
07/12/2007WO2007078572A2 Apparatus and method for controlling plasma density profile
07/10/2007US7241397 Honeycomb optical window deposition shield and method for a plasma processing system
07/05/2007WO2007073818A1 System and method for separation of a user’s voice from ambient sound
07/05/2007US20070151946 Method for monitoring edge bead removal process of copper metal interconnection
07/04/2007CN1993607A Method of operating a resistive heat-loss pressure sensor
06/2007
06/28/2007US20070145005 Controlling system and method for operating the same
06/21/2007US20070141729 Apparatus and method for controlling plasma density profile
06/21/2007US20070138136 Method for etching photolithographic substrates
06/13/2007EP1794566A1 Determining gas pressure
06/13/2007EP1794565A1 Pressure transducer with improved process adapter
06/07/2007US20070125748 Method for controlling a thickness of a first layer and method for adjusting the thickness of different first layers
06/06/2007CN1977364A Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
05/2007
05/31/2007US20070120568 Shield arrangement for a vacuum cell
05/31/2007US20070119814 Apparatus and method for detecting an endpoint in a vapor phase etch
05/24/2007US20070114206 Plasma chamber wall segment temperature control
05/24/2007US20070113667 Method and system of providing power to a pressure and temperature sensing element
05/23/2007EP1062520B1 Measuring device with a microsensor and method for producing the same
05/23/2007CN1969175A Pirani gauge
05/16/2007CN1965219A Ionization gauge
05/10/2007WO2007024614A3 Selection of wavelenghts for end point in a time division multiplexed process
05/03/2007WO2007017625A8 Thermal conductivity gauge
05/03/2007US20070095789 Method for automatic determination of semiconductor plasma chamber matching and source of fault by comprehensive plasma monitoring
05/03/2007US20070095788 Method of controlling a chamber based upon predetermined concurrent behavoir of selected plasma parameters as a function of selected chamber paramenters
05/01/2007US7211196 Method and system of discriminating substrate type
04/2007
04/26/2007WO2007028250A3 Method and device for binaural signal enhancement
04/26/2007US20070090091 chemical, plasma vapor deposition; atomic layer deposition
04/25/2007CN1954361A Speech synthesis device and method
04/24/2007US7207226 Semiconductor pressure sensor
04/19/2007US20070087455 Independent control of ion density, ion energy distribution and ion dissociation in a plasma reactor
04/18/2007CN1950686A Encoding device, decoding device, and method thereof
04/17/2007US7206747 Speech command input recognition system for interactive computer display with means for concurrent and modeless distinguishing between speech commands and speech queries for locating commands
04/17/2007US7204934 Forming a hard mask over the substrate and etching a trench in the substrate using the hard mask, and forming a dielectric layer over the hard mask and in the trench, where the dielectric layer lines the trench, conductive material is then applied over the dielectric layer, etching to planarize
04/12/2007US20070080140 Plasma reactor control by translating desired values of m plasma parameters to values of n chamber parameters
04/12/2007US20070080139 Method of controlling a chamber based upon predetermined concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
04/12/2007US20070080138 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of plural chamber parameters
04/12/2007US20070080137 Method of characterizing a chamber based upon concurrent behavior of selected plasma parameters as a function of source power, bias power and chamber pressure
04/11/2007EP1772717A1 Pressure or gas sensor and sensing method using nano-cavities
04/11/2007EP1771711A1 Method of operating a resistive heat-loss pressure sensor
04/11/2007EP1771710A1 Pirani pressure gauge
04/05/2007US20070075039 Electrolytic cells; plate dielectric and electrodes; control discharging of gases
04/05/2007US20070075037 Dimension monitoring method and system
04/05/2007US20070075036 Method and apparatus for measuring plasma density in processing reactors using a short dielectric cap
04/05/2007US20070074574 Micro-electro-mechanical pressure sensor
04/04/2007CN1308983C Vacuum insulated switching apparatus
04/03/2007US7197939 Pressure sensor
03/2007
03/22/2007US20070066064 Methods to avoid unstable plasma states during a process transition
03/15/2007WO2007028250A2 Method and device for binaural signal enhancement
03/15/2007WO2007028246A1 Method and apparatus for directional enhancement of speech elements in noisy environments
03/15/2007US20070056929 Plasma etching apparatus and plasma etching method
03/15/2007CA2621940A1 Method and device for binaural signal enhancement
03/14/2007EP1761947A1 Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
03/14/2007EP1761752A1 Tightness test for mems or for small encapsulated components
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