Patents for G01L 21 - Vacuum gauges (1,613)
07/2006
07/12/2006CN1800799A Wide range electron tunneling type zinc oxide nano probe vacuum gauge and preparation method thereof
07/11/2006US7076421 Method and system for supporting increased channel density
07/11/2006US7073346 Compressor head, internal discriminator, external discriminator, manifold design for refrigerant recovery apparatus and vacuum sensor
07/06/2006WO2006069546A1 A speech processing approach and device of a wireless terminal
07/06/2006WO2005006076A3 Systems for magnification and distortion correction for imprint lithography processes
07/06/2006US20060144818 System for detecting film quality variation and method using the same
07/06/2006US20060144817 Low-pressure removal of photoresist and etch residue
06/2006
06/29/2006US20060138082 Method and apparatus for determining consumable lifetime
06/22/2006WO2006065535A1 Method and apparatus for storing vacuum gauge calibration parameters and measurement data on a vacuum gauge structure
06/13/2006US7059192 Pressure sensor
06/08/2006US20060118517 Etching method
06/07/2006CN1784778A Envelope follower end point detection in time division multiplexed processes
06/01/2006WO2006057148A1 Pirani gauge
05/2006
05/24/2006CN2783323Y Foaming vacuity quick tester for insulation impregnated resin
05/23/2006US7049823 Ionization vacuum gauge
05/23/2006US7047810 Micro-electro-mechanical pressure sensor
05/04/2006US20060091108 Method and apparatus for controlling etch processes during fabrication of semiconductor devices
05/04/2006US20060090850 Chemical processing system and method
04/2006
04/27/2006US20060086461 Etching apparatus and etching method
04/27/2006US20060086189 Vacuum gauge
04/26/2006CN2775636Y Vacuum degree alarm
04/25/2006US7033518 Method and system for processing multi-layer films
04/18/2006US7031905 Audio signal processing apparatus
04/18/2006US7030620 Ionization vacuum gauge
04/18/2006US7030619 Ionization gauge
04/13/2006WO2006039421A1 Pressure transducer with improved process adapter
04/13/2006US20060076315 Semiconductor device manufacturing method and semiconductor device manufacturing apparatus
04/06/2006WO2006036821A2 Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
04/06/2006US20060070703 Method & apparatus to improve plasma etch uniformity
04/05/2006EP1642170A2 Systems for magnification and distortion correction for imprint lithography processes
04/05/2006CN2770080Y Vacuum gauge protector
03/2006
03/30/2006WO2006032534A1 Determining gas pressure
03/30/2006US20060065626 Detection and feed forward of exposed area to improve plasma etching
03/30/2006US20060065625 Periodic patterns and technique to control misalignment between two layers
03/30/2006US20060065624 Irradiating the photoresist layer through a mask to generate a photoacid in the resist, heating to evaporate water from the resist; heating to deprotects the resist; immersion lithography for lowering the water variation in a resist
03/30/2006US20060065623 Methods and apparatus for monitoring a process in a plasma processing system by measuring self-bias voltage
03/30/2006DE102004046020A1 Gasdruck-Bestimmung Gas pressure determination
03/21/2006US7014787 Etching method of organic insulating film
03/16/2006WO2006028779A2 Electrically floating diagnostic plasma probe with ion property sensors
03/16/2006DE102004035728A1 Absperrventil und Druckmesskopf Shut-off valve and pressure gauge head
03/15/2006EP1634280A2 Multi-channel speech processor with increased channel density
03/15/2006CN2765170Y Vacuum gaugehead
03/09/2006US20060048891 Method and apparatus for determining an etch property using an endpoint signal
03/08/2006CN1244907C High frequency intensifier coding method for broadband speech coder and decoder and apparatus
03/02/2006US20060043064 Plasma processing system and method
03/02/2006US20060043063 Electrically floating diagnostic plasma probe with ion property sensors
02/2006
02/28/2006US7004035 Physical value detecting apparatus and housing for physical value detecting means
02/23/2006US20060037938 Method and apparatus for detecting endpoint
02/23/2006DE10245866B4 Vorrichtung zur Vakuumüberwachung einer Anlagekomponente mit evakuiertem Hohlraum, insbesondere für die Glasproduktion Apparatus for vacuum monitoring a system component with an evacuated cavity, especially for glass production
02/21/2006US7001530 Method for detecting the end point by using matrix
02/16/2006US20060032835 Method and apparatus for simulating standard test wafers
02/16/2006US20060032257 Compressor head, internal discriminator, external discriminator, manifold design for refrigeration recovery apparatus
02/15/2006CN1734247A III-V group nitride system semiconductor self-standing substrate, method of making the same and III-V group nitride system semiconductor wafer
02/14/2006CA2347668C Perceptual weighting device and method for efficient coding of wideband signals
02/14/2006CA2347667C Periodicity enhancement in decoding wideband signals
02/09/2006WO2006073622A2 Low-pressure removal of photoresist and etch residue
02/09/2006US20060027324 Plasma processing apparatus and plasma processing method
02/08/2006EP1623457A2 Envelope follower end point detection in time division multiplexed processes
02/02/2006WO2006012297A1 Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
02/02/2006WO2006011954A2 Diagnostic plasma measurement device having patterned sensors and features
02/02/2006WO2006010884A1 Pirani pressure gauge
02/02/2006US20060021970 Method and apparatus for non-invasive measurement and analysis of semiconductor process parameters
02/02/2006US20060021444 Method of operating a resistive heat-loss pressure sensor
02/01/2006CN1728327A Vacuum gauge bead
02/01/2006CN1727860A Gain-constrained noise suppression
01/2006
01/26/2006WO2006008412A1 Tightness test for mems or for small encapsulated components
01/25/2006CN2754077Y Foundation soil vacuum degree sensor
01/19/2006US20060012373 Cold-cathode ionisation manometer having a longer service life due to two separate cathodes
01/19/2006US20060011583 Materials and gas chemistries for processing systems
01/12/2006US20060006139 Selection of wavelengths for end point in a time division multiplexed process
01/05/2006US20060000800 Process monitoring methods in a plasma processing apparatus, monitoring units, and a sample processing method using the monitoring units
01/04/2006EP1611593A2 Louvered beam stop for lowering x-ray limit of a total pressure gauge
12/2005
12/29/2005US20050287815 Method and apparatus for reducing aspect ratio dependent etching in time division multiplexed etch processes
12/29/2005US20050284570 Diagnostic plasma measurement device having patterned sensors and features
12/28/2005EP1540294B1 Cold-cathode ionisation manometer having a longer service life due to two separate cathodes
12/21/2005CN1711465A Apparatus and methods for heat loss pressure measurement
12/13/2005US6973834 Method and apparatus for measuring pressure of a fluid medium and applications thereof
12/01/2005US20050263484 Adjustable shielding plate for adjusting an etching area of a semiconductor wafer and related apparatus and methods
11/2005
11/24/2005WO2005111568A1 Encoding device, decoding device, and method thereof
11/17/2005WO2005109399A1 Speech synthesis device and method
11/10/2005WO2005091330A3 Louvered beam stop for lowering x-ray limit of a total pressure gauge
11/10/2005US20050247669 Method for repairing a phase shift mask
11/09/2005CN1226601C Pocket tester for high voltage vacuum tube
11/02/2005EP1493007B1 Determination of the gas pressure in an evacuated thermal insulating board (vacuum panel) by using a heat sink and test layer that are integrated therein
11/02/2005CN1691245A Cold cathode electron gun and vacuum gauge tube using the same
11/01/2005US6961407 Device to detect pressure in an x-ray tube
10/2005
10/27/2005US20050237066 Cold cathode device and vacuum gauge using same
10/20/2005WO2005098386A1 Microfabricated hot wire vacuum sensor
10/19/2005CN1685466A Apparatus and method for use of optical system with a plasma processing system
10/13/2005WO2005065417A3 Cold cathode ion gauge
10/06/2005US20050220133 Method and system for supporting increased channel density
10/06/2005US20050218115 Anti-clogging nozzle for semiconductor processing
10/06/2005US20050218114 Method and system for performing a chemical oxide removal process
09/2005
09/29/2005WO2005091331A2 An ionization gauge
09/29/2005WO2005091330A2 Louvered beam stop for lowering x-ray limit of a total pressure gauge
09/29/2005US20050212066 Microfabricated hot wire vacuum sensor
09/29/2005US20050211669 Method and system of discriminating substrate type
09/20/2005US6945119 Apparatus and methods for heat loss pressure measurement
09/15/2005US20050199067 Determination of the gas pressure in an evacuated thermal insulating board (vacuum panel) by using a heat sink and test layer that are intergrated therein
09/06/2005US6939409 Cleaning method and etching method
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