Patents for C30B 25 - Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth (13,302)
01/1986
01/15/1986EP0167703A2 A method of homogeneous chemical vapour deposition
01/14/1986US4564509 Method and apparatus for improved gettering for reactant gases
01/08/1986EP0090817B1 Thin films of compounds and alloy compounds of group iii and group v elements
01/02/1986EP0166032A2 Carrier rack of quartz glass for substrate wafers
12/1985
12/31/1985US4561915 Process for epitaxial growth on a corrugated wafer
12/18/1985EP0164928A2 Vertical hot wall CVD reactor
12/17/1985US4558660 Semiconductor fabricating apparatus
12/10/1985US4557794 Method for forming a void-free monocrystalline epitaxial layer on a mask
12/03/1985US4556436 Method of preparing single crystalline cubic silicon carbide layers
11/1985
11/21/1985EP0161829A2 Process for preparing diamond thin film
11/21/1985EP0161747A1 Semiconductor production method
11/19/1985US4554078 Methods of and apparatus for effluent disposal
11/12/1985US4552740 Process for producing amorphous and crystalline silicon nitride
11/05/1985US4550684 Cooled optical window for semiconductor wafer heating
10/1985
10/23/1985EP0158698A2 Method of manufacturing B type silicon nitride whiskers
10/22/1985US4548658 Growth of lattice-graded epilayers
09/1985
09/24/1985US4543267 Method of making a non-single-crystalline semi-conductor layer on a substrate
09/24/1985CA1194196A1 Masking techniques in chemical vapor deposition
09/11/1985EP0154561A2 Improved apparatus and method for laser-induced chemical vapor deposition
09/10/1985US4540876 Furnace suitable for heat-treating semiconductor bodies
09/03/1985US4539068 Vapor deposition, crystallization
08/1985
08/29/1985WO1985003727A1 Deposition technique
08/27/1985CA1192475A1 Manufacture of cadmium mercury telluride
08/20/1985US4536379 Production of silicon carbide
08/06/1985US4533820 Radiant heating apparatus
08/06/1985US4533410 Process of vapor phase epitaxy of compound semiconductors
07/1985
07/23/1985US4530818 Wall welded to flange; maintaining gas flow through bell
07/16/1985US4529617 Continuously depositing amorphous element on support; radiation with electromagnetic waves
07/10/1985EP0147967A2 Induction heated reactor system for chemical vapor deposition
07/09/1985CA1190126A1 High mobility amorphous silicon displaying non- dispersive transport properties
07/09/1985CA1190043A1 Conductive silicon carbide
07/03/1985EP0146985A2 Process for making thin ferrimagnetic monocrystalline garnet films by cathodic sputtering
06/1985
06/25/1985US4525335 Whiskers from rice husks or cellulose and sand or glass; carbonizi
06/04/1985US4521393 Method of manufacturing β type silicon nitride whiskers
05/1985
05/29/1985EP0143053A2 Apparatus for providing depletion-free uniform thickness cvd thin-film on semiconductor wafers
05/29/1985EP0142495A1 Inverted positive vertical flow chemical vapor deposition reactor chamber.
05/21/1985US4518846 Heater assembly for molecular beam epitaxy furnace
05/21/1985US4518455 CVD Process
05/15/1985EP0141561A2 A process for producing devices having semi-insulating indium phosphide based compositions
05/14/1985US4517220 Deposition and diffusion source control means and method
05/14/1985US4517047 Gallium arsenide molecular beam epitaxial semiconductors
05/08/1985EP0140625A1 Tellurides
05/07/1985US4515104 Contiguous wafer boat
05/07/1985CA1186599A1 Epitaxial crystals and fabrication thereof
05/02/1985EP0139134A2 Deposition and diffusion source control means and method
05/02/1985EP0138963A1 Diethylberyllium dopant source for mocvd grown epitaxial semiconductor layers.
04/1985
04/23/1985US4512391 Apparatus for thermal treatment of semiconductor wafers by gas conduction incorporating peripheral gas inlet
04/09/1985US4510177 Method and apparatus for vapor phase deposition
04/09/1985US4509456 Apparatus for guiding gas for LP CVD processes in a tube reactor
04/02/1985US4508931 Catenated phosphorus materials, their preparation and use, and semiconductor and other devices employing them
04/02/1985US4508590 Method for the deposition of high-quality crystal epitaxial films of iron
03/1985
03/27/1985EP0135308A1 Cooled optical window for semiconductor wafer heating
03/27/1985EP0134947A1 Method and apparatus for improved gettering for reactant gases
03/26/1985US4507169 Method and apparatus for vapor phase growth of a semiconductor
03/26/1985US4506815 Bubbler cylinder and dip tube device
03/19/1985US4505950 Method of manufacturing a multiple-layer, non-single-crystalline semiconductor on a substrate
03/12/1985US4504453 Method of manufacturing crystalline silicon carbide
03/12/1985US4504329 Process for the epitaxial deposition of III-V compounds utilizing a binary alloy as the metallic source
02/1985
02/26/1985CA1183102A1 Low temperature process for depositing oxide layers by photochemical vapor deposition
02/19/1985US4500504 Reacting silica gel containing iron, nickel, or cobalt compound with carbon black
02/19/1985US4499853 Distributor tube for CVD reactor
02/12/1985US4499354 Susceptor for radiant absorption heater system
02/05/1985US4497683 Process for producing dielectrically isolated silicon devices
01/1985
01/30/1985EP0132408A2 Method and apparatus for growing layers or producing coatings on a substrate
01/29/1985US4496828 Susceptor assembly
01/23/1985EP0132037A1 A process for the production of a compound crystal
01/16/1985EP0131208A1 Susceptor assembly
01/15/1985US4493977 Method for heating semiconductor wafers by a light-radiant heating furnace
01/08/1985US4492716 Method of making non-crystalline semiconductor layer
01/08/1985US4492681 Method for the preparation of silicon carbide fibers
12/1984
12/18/1984US4489128 Structure containing epitaxial crystals on a substrate
12/18/1984US4488507 Susceptors for organometallic vapor-phase epitaxial (OMVPE) method
12/11/1984US4487640 Method for the preparation of epitaxial films of mercury cadmium telluride
12/05/1984EP0127499A1 Process for the amorphous growth of a material with irradiation crystallisation
11/1984
11/27/1984US4484538 Apparatus for providing depletion-free uniform thickness CVD thin-film on semiconductor wafers
11/20/1984CA1178180A1 Method for producing semiconductor grade silicon
11/20/1984CA1178179A1 Combination gas curtains for continuous chemical vapor deposition production of silicon bodies
11/20/1984CA1178178A1 Gas curtain continuous chemical vapor deposition production of semiconductor bodies
11/20/1984CA1178177A1 Process for increasing silicon thermal decomposition deposition rates from silicon halide-hydrogen reaction gases
11/13/1984US4482423 Protection of semiconductor substrates during epitaxial growth processes
11/13/1984US4482422 Method for growing a low defect monocrystalline layer on a mask
11/08/1984WO1984004334A1 Inverted positive vertical flow chemical vapor deposition reactor chamber
11/06/1984US4481229 Method for growing silicon-including film by employing plasma deposition
10/1984
10/31/1984EP0123318A2 Acicular particulate material containing iron carbide
10/30/1984US4479845 Vapor growth with monitoring
10/16/1984US4477308 Controlling molecular orientation and crystallization by heating a disorded low-temperature metal to react with the substrate
10/11/1984WO1984003995A1 Diethylberyllium dopant source for mocvd grown epitaxial semiconductor layers
10/11/1984WO1984003905A1 Tetramethyltin dopant source for mocvd grown epitaxial semiconductor layers
09/1984
09/26/1984EP0119654A1 A furnace suitable for heat-treating semiconductor bodies
09/19/1984EP0119130A1 Transparent heating apparatus having at least two zones at different temperatures
08/1984
08/29/1984EP0117051A1 Growth of semiconductors
08/28/1984US4468283 Method for etching and controlled chemical vapor deposition
08/28/1984US4468278 Process for mono-crystal growth in a closed tubular chamber
08/21/1984US4466381 Coating of semiconductor wafers and apparatus therefor
08/14/1984CA1172524A1 Manufacture of group iii-v compounds
08/08/1984EP0114876A1 Ultra-pure epitaxial silicon and process for its manufacture.
08/07/1984US4464222 Process for increasing silicon thermal decomposition deposition rates from silicon halide-hydrogen reaction gases
07/1984
07/31/1984CA1171940A1 Vapor mass flow controller system
07/25/1984EP0113954A1 A substrate for manufacturing single crystal thin films
07/24/1984US4461783 Non-single-crystalline semiconductor layer on a substrate and method of making same