Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 1 - Etching metallic material by chemical means
Patents for C23F 1 - Etching metallic material by chemical means (16,062)
11/2012
11/06/2012US8304021 Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device
11/06/2012US8303834 Plasma processing apparatus and plasma etching method
11/06/2012US8303833 High resolution plasma etch
11/06/2012US8303831 Methods for fabricating semiconductor devices
11/06/2012US8303827 Method for making micro-electro-mechanical system device
11/06/2012US8303764 Apparatus and methods for transporting and processing substrates
11/06/2012US8303716 High throughput processing system for chemical treatment and thermal treatment and method of operating
11/06/2012US8303715 High throughput thermal treatment system and method of operating
11/06/2012US8303712 Substrate processing apparatus, method for manufacturing semiconductor device, and process tube
11/06/2012US8302554 Apparatus and method for rapid cooling of large area substrates in vacuum
11/01/2012WO2012148931A1 Internal faraday shield having distributed chevron patterns and correlated positioning relative to external inner and outer tcp coil
11/01/2012US20120276746 Manufacturing method of semiconductor device and apparatus for manufacturing semiconductor device
11/01/2012US20120276335 Porous medium with increased hydrophobicity and method of manufacturing the same
11/01/2012US20120273463 Substrate treating apparatus and substrate treating method
11/01/2012US20120273462 Etching device and a method for etching a material of a workpiece
11/01/2012US20120273458 Method and apparatus for processing a substrate with a focused particle beam
11/01/2012US20120273136 Plasma Processing Apparatus
10/2012
10/31/2012EP2518759A1 Etchant and method for manufacturing semiconductor device using same
10/31/2012CN102762770A Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein
10/31/2012CN102759412A Manufacturing method of coating-matrix cutting temperature sensor
10/31/2012CN102758204A Method for removing nickel from surface of superconducting cable
10/31/2012CN101962776B Solder stripping agent and preparation method thereof
10/31/2012CN101567309B Device for blending etching solution and device for determining concentration of etching solution
10/31/2012CN101356304B Optical metrological scale and laser-based manufacturing method therefor
10/30/2012US8298625 Multiple phase RF power for electrode of plasma chamber
10/30/2012US8298433 Methods for removing an edge polymer from a substrate
10/30/2012US8298372 Quartz window having gas feed and processing equipment incorporating same
10/30/2012US8298371 Plasma processing apparatus
10/30/2012US8298370 Apparatus for chemical vapor deposition (CVD) with showerhead
10/30/2012US8298338 Chemical vapor deposition apparatus
10/30/2012US8298336 High strip rate downstream chamber
10/30/2012US8297225 Capacitive CVD reactor and methods for plasma CVD process
10/30/2012US8297223 Method and apparatus for particle filtration and enhancing tool performance in film deposition
10/26/2012WO2012143939A2 System and method for demographic analytics based on multimodal information
10/25/2012US20120271249 Method for chemical etching of a needle cannula
10/25/2012US20120270342 In-situ measurement of feature dimensions
10/25/2012US20120270054 Roll-to-roll doping method of graphene film, and doped graphene film
10/25/2012US20120268720 Optical device, method for manufacturing the same, and projector apparatus including the same
10/25/2012US20120267346 Support assembly
10/25/2012US20120267049 Grounding assembly for vacuum processing apparatus
10/25/2012US20120266810 Planarization system for high wafer topography
10/24/2012EP2515326A1 Etchant and method for manufacturing semiconductor device using same
10/24/2012EP2514855A1 Composition for etching ruthenium-based metal and method for preparing same
10/24/2012EP2514853A2 Coating-forming liquid composition and coating-forming method therewith
10/24/2012CN202499915U Acid etching waste liquid copper recovery system
10/24/2012CN202499910U Acid etching liquid regeneration and copper recovery system
10/24/2012CN202499909U Device for recycling electrolytic copper in alkaline etching solution
10/24/2012CN202499908U Alkaline etching liquid regeneration and copper recovery system
10/24/2012CN202499907U Micro-etching waste liquid recycling and copper recycling system
10/24/2012CN102753980A Manufacturing method for contact for current inspection jig, contact for current inspection jig manufactured using said method, and current inspection jig provided with said contact
10/24/2012CN102753652A Etchant composition
10/24/2012CN102747426A Texture liquid for preparing submicron suede-like monocrystalline silicon wafer and preparation method thereof
10/24/2012CN102747368A Etchant for maraging steel and examination method of maraging steel macrostructure
10/24/2012CN102747367A Non-halogenated etchant and method of manufacturing a display substrate using the non-halogenated etchant
10/24/2012CN102747366A Method for etching metal tag
10/23/2012US8293648 Mass production method of semiconductor integrated circuit device and manufacturing method of electronic device
10/23/2012US8293128 Apparatus for processing substrate and method of doing the same
10/23/2012US8293127 Plasma etching method
10/23/2012US8293069 Inductively coupled plasma apparatus
10/23/2012US8293068 Plasma processing apparatus
10/23/2012US8293066 Apparatus and methods for transporting and processing substrates
10/23/2012US8293065 Apparatus for etching substrate and fabrication line for fabricating liquid crystal display using the same
10/23/2012US8293015 Apparatuses and methods for atomic layer deposition
10/23/2012US8293014 Substrate processing apparatus and reaction tube for processing substrate
10/23/2012US8293013 Dual path gas distribution device
10/23/2012US8292693 Using optical metrology for wafer to wafer feed back process control
10/23/2012US8291857 Apparatuses and methods for atomic layer deposition
10/18/2012WO2012141863A1 Multi-frequency hollow cathode system for substrate plasma processing
10/18/2012WO2012141862A1 Multi-frequency hollow cathode and systems implementing the same
10/18/2012WO2012141484A2 Bowl-shaped structure, method for manufacturing same, and bowl array
10/18/2012WO2012103885A4 Separating device and method for producing a crucible for said separating device
10/18/2012US20120262795 Concentric ring dielectric lens
10/18/2012US20120261073 Conforming graphene to a target substrate
10/18/2012US20120261072 Apparatus for reducing etching marks on solar cell surface
10/17/2012EP2511398A1 Application of treatment fluids to components
10/17/2012CN202492581U Acid etching solution cyclic regeneration unit for printed wiring board
10/17/2012CN202492580U Acid etching liquid recycling device of PCB (Printed Circuit Board)
10/17/2012CN202492579U Regenerative control device for acidic cupric chloride etchant
10/17/2012CN202492578U Electroplating microetching device
10/17/2012CN102732888A Method and system for regenerating and recycling acidic etching waste liquor
10/17/2012CN102732887A Method and system for cyclic utilization and copper extraction of waste alkaline etching liquid
10/17/2012CN102732886A Matte manufacturing solution of solar energy single crystal silicon wafers and its preparation method
10/17/2012CN102732885A Magnetic-field-assisted silicon micro-nano processing technology and equipment
10/17/2012CN102730892A Method for cyclically utilizing nitric acid in wet process of surface treatment
10/17/2012CN102730891A System for cyclically utilizing nitric acid in wet process of surface treatment
10/17/2012CN102730745A Process for removing nickel from high-purity plating-stage copper sulfate
10/17/2012CN102730742A Technique for producing soluble copper oxide from acidic etching waste liquor
10/17/2012CN102286746B Recycling and regeneration of acid etching solution and copper recycling device
10/17/2012CN102206822B Silicon core corrosion process
10/17/2012CN101381873B Etching solution and conductor pattern forming method
10/16/2012US8288284 Substrate processing method, semiconductor chip manufacturing method, and resin-adhesive-layer-backed semiconductor chip manufacturing method
10/16/2012US8287967 Method and apparatus for processing workpiece
10/16/2012US8287750 Plasma processing method and plasma processing apparatus
10/16/2012US8287745 Method for fabricating probe tip
10/16/2012US8287688 Substrate support for high throughput chemical treatment system
10/16/2012US8287650 Low sloped edge ring for plasma processing chamber
10/16/2012CA2507164C Stripping method for a hollow rotating part and device to start such a process
10/11/2012US20120258280 Extended life textured chamber components and method for fabricating same
10/11/2012US20120257490 Gratings For Waveguide Coupling
10/11/2012US20120255678 Multi-Frequency Hollow Cathode System for Substrate Plasma Processing
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