Patents for C23F 1 - Etching metallic material by chemical means (16,062)
03/2013
03/19/2013US8398770 Deposition system for thin film formation
03/19/2013US8398769 Chemical vapor deposition apparatus
03/19/2013US8397668 Plasma processing apparatus
03/19/2013US8397667 Process and apparatus for the plasma coating of workpieces with spectral evaluation of the process parameters
03/19/2013US8397555 Scanning probe devices
03/14/2013WO2013036371A2 Pulsed plasma chamber in dual chamber configuration
03/14/2013WO2013033932A1 Wet etching device and method
03/14/2013US20130065396 Apparatus including gas distribution member supplying process gas and radio frequency (rf) power for plasma processing
03/14/2013US20130064502 Plasmonic Transducer Having Two Metal Elements with a Gap Disposed Therebetween
03/14/2013US20130062309 Method and system for modifying resist openings using multiple angled ions
03/14/2013US20130062307 Method of making a mask, method of patterning by using this mask and method of manufacturing a micro-device
03/13/2013EP2566995A1 Process for producing a crystalline surface layer
03/13/2013CN202786437U Etching solution recycling and copper recovering device
03/13/2013CN202786436U Waste liquor recovery device
03/13/2013CN102971898A Current collector
03/13/2013CN102967693A Penetrant detection and defect mending method in titanium alloy cast piece machining
03/13/2013CN102965667A Method for regenerating and recycling waste etching solution in stainless steel etching production line
03/13/2013CN102230228B Wool making agent used for surface treatment on single crystalline silicon solar cell and application method thereof
03/12/2013US8394877 Method for manufacturing porous structure and method for forming pattern
03/12/2013US8394289 Composition for etching treatment of resin molded article
03/12/2013US8394282 Adaptive nanotopography sculpting
03/12/2013US8394233 Electrode orientation and parallelism adjustment mechanism for plasma processing systems
03/12/2013US8394231 Plasma process device and plasma process method
03/12/2013US8394230 Plasma processing apparatus
03/12/2013US8394229 Susceptor ring
03/12/2013US8394228 Apparatus for removing material from one or more substrates
03/12/2013US8394201 Atomic layer deposition apparatus
03/12/2013US8393073 Method to control mask profile for read sensor definition
03/07/2013WO2013032047A1 Etchant liquid composition for a metal layer, including copper and titanium
03/07/2013WO2013029785A1 Method for the removal and recovery of metals and precious metals from substrates
03/07/2013US20130060114 Test element for analyzing a body fluid
03/07/2013US20130059448 Pulsed Plasma Chamber in Dual Chamber Configuration
03/07/2013US20130057557 High area stacked layered metallic structures and related methods
03/07/2013US20130056443 Plasma treatment in fabricating directional drilling assemblies
03/07/2013US20130056438 Composition and method for micro etching of copper and copper alloys
03/07/2013US20130056154 Abnormality detecting unit and abnormality detecting method
03/07/2013US20130056022 Bare aluminum baffles for resist stripping chambers
03/06/2013EP2565295A1 Method for stripping gamma-gamma prime coating from gamma-gamma prime alloy
03/06/2013CN202766623U Continuous production device for producing weldability aluminum plate
03/06/2013CN202766622U Dedicated device for producing weldability aluminum plate by binary dip zinc-nickel iron plating process
03/06/2013CN202766621U Dedicated device for producing weldability aluminum plate by quaternary dip zinc tin nickel iron iron plating process
03/06/2013CN202766620U Dedicated device for producing weldability aluminum plate by ternary dip zinc nickel iron process
03/06/2013CN202766619U Dedicated device for producing weldability aluminum plate by binary dip zinc-iron process
03/06/2013CN202766618U Dedicated device for producing weldability aluminum plate by dip zinc iron plating process
03/06/2013CN102953061A Automatic addition system for etching-solution recycle equipment
03/06/2013CN102950099A Super-hydrophobic material and preparation method thereof
03/06/2013CN102061473B Etching system and etching solution regeneration method
03/06/2013CN101877362B Silicon substrate with period structure
03/05/2013US8390469 External conditions audio playback system and method
03/05/2013US8388854 Methods of forming nanodots using spacer patterning techniques and structures formed thereby
03/05/2013US8388853 Non-contact substrate processing
03/05/2013US8388800 Apparatus for wet processing substrate
03/05/2013US8388755 Thermalization of gaseous precursors in CVD reactors
03/05/2013US8388753 Coating apparatus
03/05/2013US8387562 Plasma processor and plasma processing method
03/05/2013US8387560 Plasma processing unit
03/05/2013US8387559 Semiconductor manufacturing plant
02/2013
02/28/2013WO2013027444A1 Copper foil for printed wiring board and laminated body using same
02/28/2013WO2012177017A3 Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant
02/28/2013US20130050226 Die-cut through-glass via and methods for forming same
02/28/2013US20130048904 Etching liquid for a copper/titanium multilayer thin film
02/28/2013US20130048607 Method and device for wet treatment of plate-like articles
02/28/2013US20130048606 Methods for in-situ chamber dry clean in photomask plasma etching processing chamber
02/28/2013US20130048602 Method of Manufacturing a Metallized Ceramic Substrate
02/28/2013US20130048598 Plating method of circuit substrate, production method of plated circuit substrate, and silver etching liquid
02/28/2013DE102011111629A1 Verfahren zur Herstellung periodischer kristalliner Silizium-Nanostrukturen A process for preparing crystalline silicon-periodic nanostructures
02/28/2013DE102011052999A1 Treating object e.g. semiconductor substrate including silicon solar cell substrate, by arranging object in a treatment liquid, adding treatment promoting gas to treatment liquid, and introducing gas, via membrane, into treatment liquid
02/27/2013EP2562292A1 Chemical stripping composition and method
02/27/2013CN202755059U Etching liquid waste processing device
02/27/2013CN202755058U Mould spray texturing machine
02/27/2013CN102942278A Method for treating acidic copper-containing waste liquid
02/26/2013US8383523 Method for texturing silicon wafers, treatment liquid therefor, and use
02/26/2013US8383003 Polishing systems
02/26/2013US8383002 Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
02/26/2013US8382995 Piezoelectric devices and methods for manufacturing same
02/26/2013US8382942 Method and apparatus for reducing substrate backside deposition during processing
02/26/2013US8382940 Device and method for producing chlorine trifluoride and system for etching semiconductor substrates using this device
02/26/2013US8382939 Plasma processing chamber with enhanced gas delivery
02/26/2013US8381678 Wide area atmosphere pressure plasma jet apparatus
02/26/2013US8381677 Prevention of film deposition on PECVD process chamber wall
02/21/2013US20130045604 Plasma processing apparatus and plasma processing method
02/21/2013US20130045547 Plasma processing apparatus and plasma processing method
02/21/2013DE112010005514T5 Nassätz-Spannvorrichtung Wet etching jig
02/20/2013EP2558605A1 Method for recycling of obsolete printed circuit boards
02/20/2013CN202744628U Recovery processing system for silicon wafer alkaline corrosion waste liquor
02/20/2013CN202744627U Etching machine with measuring function
02/20/2013CN202744626U Etching device
02/20/2013CN102939407A Etchant for metal wiring and method for manufacturing metal wiring using the same
02/20/2013CN102939396A Method for recycling of obsolete printed circuit boards
02/19/2013US8377829 Method of manufacturing a capacitor deep trench and of etching a deep trench opening
02/19/2013US8377325 Etchant for metal wiring and method for manufacturing metal wiring using the same
02/19/2013US8377324 Methods for removing coatings from a metal component
02/19/2013US8377323 Mold having nanometric features, method for realizing such a mold and corresponding use of it in a method for realizing an array of carbon nanotubes
02/19/2013US8377321 Method of forming a nozzle and an ink chamber of an ink jet device by etching a single crystal substrate
02/19/2013US8377320 Method of forming an undercut microstructure
02/19/2013US8377316 Structure and method for creating surface texture of compliant coatings on piezo ink jet imaging drums
02/19/2013US8377315 Method for manufacturing porous microstructures, porous microstructures manufactured according to this method, and the use thereof
02/19/2013US8377255 Plasma processing apparatus and method of controlling distribution of a plasma therein
02/19/2013US8377254 Plasma processing apparatus
02/19/2013US8377252 Apparatus for spraying etchant onto printed circuit board
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