Patents for C23F 1 - Etching metallic material by chemical means (16,062)
01/2013
01/29/2013US8361230 Magnetic mask holder
01/29/2013US8360002 In-situ flux measurement devices, methods, and systems
01/29/2013CA2692210C Electrodialysis method for purifying of silicate-containing potassium hydroxide etching solution
01/24/2013US20130023127 Method of forming a contact hole and apparatus for performing the same
01/24/2013US20130021405 Substrate structure for ejection chip and method for fabricating substrate structure
01/24/2013US20130020283 Polishing solution for copper polishing, and polishing method using same
01/24/2013US20130020204 Magnetic write head having an electroplated write pole with a leading edge taper
01/23/2013CN102888657A Additive for fluffing agent of crystalline silicon solar cell
01/23/2013CN102888608A Corrosive for displaying austenitic stainless steel grain boundary of fine grains and method for preparing corrosive
01/23/2013CN102888607A Scavenging agent composite for quickly scavenging nickel-cadmium diffusion coating and deplating method of scavenging agent composite
01/23/2013CN102888606A Chemical corrosive liquid for magnesium alloy microsection and application of chemical corrosive liquid
01/23/2013CN102168266B Circuit board browning solution for high-temperature halogen-free board
01/23/2013CN101819971B Thin film transistor for liquid crystal display
01/17/2013WO2013009794A1 Methods of dechucking and system thereof
01/17/2013WO2013009495A1 Methods of removing a protective layer
01/17/2013WO2013008708A1 Substrate processing device
01/17/2013WO2012161430A3 Method of machining metal plate for manufacturing scaled model, method of manufacturing scaled model, and scaled model
01/17/2013WO2012157908A3 Texturing composition of a substrate and method of using same
01/17/2013US20130017668 Wafer dicing using hybrid split-beam laser scribing process with plasma etch
01/17/2013US20130015158 Dry etching method
01/17/2013US20130014894 Methods and apparatus for controlling power distribution in substrate processing systems
01/16/2013EP2546387A1 Adhesion promotion of metal to laminate with a multi-functional compound
01/16/2013EP2546372A2 Metallic component for medical, surgical and implantological use
01/16/2013CN202671660U Micro super-roughening microetch pre-treatment machine
01/16/2013CN202671659U Roller in acid corrosion tank
01/16/2013CN202671658U Equipment for producing pure chemical corrosion foil
01/16/2013CN102881581A Process of forming slit in substrate and etching gas composition
01/16/2013CN102877135A Additive for alkali environment-protecting type no-alcoholic felting liquid of mono-crystal silicone chip and using method thereof
01/16/2013CN102877067A Additive of electrolytic acidic cupric chloride solution
01/16/2013CN102877066A Method for enlarging surface area of ultrahigh voltage electrode foil by corrosion
01/15/2013US8354032 Method of manufacturing a micromechanical part
01/15/2013US8354001 Processing thin wafers
01/15/2013US8353986 Substrate processing apparatus
01/10/2013WO2013005631A1 Etching liquid for copper or compound having copper as primary component
01/10/2013WO2013005155A2 Apparatus for treating a wafer-shaped article
01/10/2013WO2013004624A1 Method for providing organic resist adhesion to a copper or copper alloy surface
01/10/2013WO2012154764A3 Method for achieving smooth side walls after bosch etch process
01/10/2013WO2012141484A3 Bowl-shaped structure, method for manufacturing same, and bowl array
01/10/2013WO2012130929A3 Cathodic protection by coating for cooling circuits or other holes or channels
01/10/2013US20130012028 High purity, environmentally clean method and apparatus, for high rate, liquid anisotropic etching of single crystal silicon or etching of polycrystalline silicon, using an overpressure of ammonia gas above aqueous ammonium hydroxide
01/10/2013US20130009090 Aluminum Etchant
01/10/2013US20130008871 Methods for automatically determining capacitor values and systems thereof
01/10/2013US20130008779 Method and apparatus for ion beam polishing
01/10/2013US20130008609 Plasma processing apparatus
01/10/2013US20130008602 Apparatus for treating a wafer-shaped article
01/09/2013CN202658233U Activation tank
01/09/2013CN202657952U Preparation mechanism of silicon base structure
01/09/2013CN102864480A Preparation method of titanium dioxide nanotube array with three-dimensional network structure
01/09/2013CN102268674B Non-cyanide chemical nickel-stripping solution
01/09/2013CN101985752B Spray etching device
01/09/2013CN101760199B Two-liquid acid etching liquid oxidant
01/09/2013CN101631416B Device for processing air plasma jet large area surface
01/08/2013US8349202 Methods for controlling bevel edge etching in a plasma chamber
01/08/2013US8349200 Method of fine patterning semiconductor device
01/08/2013US8349128 Method and apparatus for stable plasma processing
01/08/2013US8349126 Apparatus for etching edge of wafer
01/08/2013US8349125 Cleaning device for transmission electron microscopes
01/08/2013US8349085 Substrate processing apparatus
01/08/2013US8349084 Apparatus and systems for intermixing cadmium sulfide layers and cadmium telluride layers for thin film photovoltaic devices
01/08/2013US8349081 Gas distributor with pre-chambers arranged in planes
01/03/2013US20130004763 Method of patterning a stack
01/03/2013US20130004118 Optical interposer with common angled surface
01/03/2013US20130003179 Composite with nano-structured layer and method of making the same
01/03/2013US20130001198 Method and apparatus for controlling and monitoring the potential
01/03/2013US20130001197 Plasma processing method
01/03/2013US20130001196 Projected Plasma Source
01/03/2013US20130001195 Method of stack patterning using a ion etching
01/03/2013US20130001188 Method to protect magnetic bits during planarization
01/03/2013US20130001187 Method for manufacturing a magnetoresistive sensor using simultaneously formed hard bias and electrical lapping guide
01/03/2013US20130000846 Photoresist double patterning apparatus
01/02/2013EP2542038A1 Method of forming circuits upon flexible laminate substrate
01/02/2013EP2540870A1 Etching agent, etching method and liquid for preparing etching agent
01/02/2013EP2540869A1 Surface roughening agent for aluminum, and surface roughening method using said surface roughening agent
01/02/2013CN202643918U Chemical treatment tank device for silicon wafer texturization
01/02/2013CN202643915U High precision groove body heat exchange system
01/02/2013CN202643914U Novel air-aided exhaust cover plate
01/02/2013CN202643846U Etching waste liquid treatment system of printing plate
01/02/2013CN202643380U Water-saving system for water station of copper foil production water
01/02/2013CN102859663A Jig for wet etching
01/02/2013CN102858093A Plating method of circuit substrate, production method of plated circuit substrate and silver etching liquid
01/02/2013CN102848517A Composite of metal and resin
01/02/2013CN102220645B Method for texturing silicon wafer cut by diamond wire
01/02/2013CN101916740B In-situ dry clean chamber for front end of line fabrication
01/02/2013CN101544770B Herstellung superhydrophober polymer
01/02/2013CN101514456B Etching liquid and cuprum wiring forming method by using the same
01/01/2013US8344482 Etching apparatus and etching method for substrate bevel
01/01/2013US8343308 Ceiling plate and plasma process apparatus
01/01/2013US8343307 Showerhead assembly
01/01/2013US8343305 Method and apparatus for diagnosing status of parts in real time in plasma processing equipment
01/01/2013US8343277 Substrate processing apparatus
01/01/2013US8342121 Plasma processing apparatus
12/2012
12/27/2012WO2012177017A2 Metal wire etchant liquid and method for manufacturing a liquid crystal display using the etchant
12/27/2012US20120327092 Planarized spacer for cover plate over electromechanical systems device array
12/27/2012US20120326076 Tool for manufacturing semiconductor structures and method of use
12/27/2012US20120325776 Apparatus for processing substrate and method of doing the same
12/27/2012US20120325656 Electron beam sculpting of tunneling junction for nanopore dna sequencing
12/27/2012US20120325407 Plasma confinement rings having reduced polymer deposition characteristics
12/27/2012US20120325405 Methods of fabricating large-area, semiconducting nanoperforated graphene materials
12/26/2012EP2537960A1 Etching solution for multilayer thin film having copper layer and molybdenum layer contained therein
12/26/2012CN202626296U Recycling device of waste tin-stripping liquid
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