Patents for B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes (7,565)
03/2006
03/21/2006US7016000 Apparatus and method for rubbing LCD substrate
03/21/2006US7015641 Reduced veiling glare cathode window
03/21/2006US7014669 Catalytic composition for chemical-mechanical polishing, method of using same, and substrate treated with same
03/21/2006US7014552 Method and system for cleaning a polishing pad
03/21/2006US7014541 Work piece carrier with adjustable pressure zones and barriers and a method of planarizing a work piece
03/21/2006US7014540 Device for the precision working of planar surfaces
03/21/2006US7014539 Method and apparatus for minimizing agglomerate particle size in a polishing fluid
03/21/2006US7014537 Method of processing a semiconductor substrate
03/21/2006US7014536 Wafer polishing method
03/21/2006US7014535 Carrier head having low-friction coating and planarizing machine using same
03/21/2006US7014534 Method for manufacturing substrate
03/21/2006US7014533 Method for smoothing the surface of a gas turbine blade
03/21/2006US7014528 Grinding machine and grinding fluid supply-nozzle therefor
03/21/2006US7014527 Die level testing using machine grooved storage tray with vacuum channels
03/16/2006US20060057946 Apparatus and method for sharpening tool blades
03/16/2006US20060057945 Chemical mechanical polishing process
03/16/2006US20060057944 Chemical mechanical polishing process
03/16/2006US20060057942 Polishing apparatus, polishing head and polishing method
03/16/2006US20060057940 Polishing apparatus and method for producing semiconductors using the apparatus
03/16/2006DE102005023469A1 Polierkissen, das Nuten aufweist, die konfiguriert sind, um Mischwirbel während eines Polierens zu fördern A polishing pad, comprising grooves that are configured to encourage mixing vortex during polishing
03/15/2006CN1745966A Digital controlled development and creep ultrasonic grinding process and apparatus for engineer ceramic blade profiles
03/14/2006US7011574 Polyelectrolyte dispensing polishing pad
03/14/2006US7011569 Method and apparatus for polishing workpiece
03/14/2006US7011566 Methods and systems for conditioning planarizing pads used in planarizing substrates
03/09/2006US20060052040 Method for manufacturing microporous CMP materials having controlled pore size
03/09/2006US20060052039 Method of and apparatus for magnetic-abrasive machining of wafers
03/09/2006US20060052036 System and method detecting malfunction of pad conditioner in polishing apparatus
03/09/2006DE102004043157A1 Verfahren und Vorrichtung zur Schleifbearbeitung eines Schneidwerkzeuges, insbesondere eines Messers Method and apparatus for grinding a cutting tool, in particular a knife
03/08/2006EP1632310A1 Abrasiv throwing wheel and blade assembly therefor
03/08/2006EP1631416A2 Improved chemical mechanical polishing compositions for copper and associated materials and method of using same
03/08/2006CN2763968Y Chemical-mechanical abrading device
03/08/2006CN1744285A 制造系统 Manufacturing System
03/07/2006US7008303 Web lift system for chemical mechanical planarization
03/07/2006US7008302 Chemical mechanical polishing equipment and conditioning thereof
03/07/2006US7008301 Polishing uniformity via pad conditioning
03/07/2006US7008300 Advanced wafer refining
03/07/2006US7008299 Apparatus and method for mechanical and/or chemical-mechanical planarization of micro-device workpieces
03/07/2006US7008297 Combined eddy current sensing and optical monitoring for chemical mechanical polishing
03/02/2006WO2006023350A1 Method of centerless grinding
03/02/2006US20060046623 Method and apparatus for reduced wear polishing pad conditioning
03/02/2006US20060046622 Polishing pad with microporous regions
03/02/2006US20060046620 Process for forming spherical components
03/01/2006CN1741875A Apparatus and method for polishing semiconductor wafers
02/2006
02/28/2006US7005382 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing process, production process of semiconductor device and material for preparing an aqueous dispersion for chemical mechanical polishing
02/28/2006US7004826 Device for smoothing gear wheels
02/28/2006US7004824 Method and apparatus for detecting and dispersing agglomerates in CMP slurry
02/28/2006US7004823 Multi-zone grinding and/or polishing sheet
02/28/2006US7004822 Chemical mechanical polishing and pad dressing method
02/28/2006US7004821 Process for bevelling an ohthalmic lens including a plotting stage without contact
02/28/2006US7004817 Carrier assemblies, planarizing apparatuses including carrier assemblies, and methods for planarizing micro-device workpieces
02/28/2006US7004814 CMP process control method
02/23/2006US20060040595 Method and system for chemical mechanical polishing pad cleaning
02/23/2006US20060040594 Apparatus and method for fabricating liquid crystal display panel
02/23/2006US20060040593 Method for polishing silicon carbide crystal substrate
02/23/2006US20060040592 Tool and process for chrome plating a vehicle wheel surface
02/23/2006US20060040591 Polishing liquids for activating and/or conditioning fixed abrasive polishing pads, and associated systems and methods
02/23/2006US20060040585 Method and apparatus for abrasive circular machining
02/23/2006US20060040584 Method and apparatus for grinding
02/22/2006EP1627245A2 Reduced veiling glare cathode window
02/22/2006CN1737410A Pin structure of planetary rotary member of planetary reduction mechanism, and method for manufacturing pin
02/21/2006US7001256 Carrier head with a non-stick membrane
02/21/2006US7001255 Thermostat gasket cleaner
02/21/2006US7001254 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
02/21/2006US7001253 an abrasive, a carrier, and either boric acid, or a conjugate base in a non-buffered aqueous solution; abrasive can be fixed on a pad or suspended in solution; high speed polishing, planarization efficiency, uniformity
02/21/2006US7001251 Method and apparatus for releasably attaching a polishing pad to a chemical-mechanical planarization machine
02/21/2006US7001250 Synchronous tape head polishing device and method
02/21/2006US7001248 Fine tilting adjustment mechanism for grinding machine
02/21/2006US7001242 Method and apparatus of eddy current monitoring for chemical mechanical polishing
02/16/2006US20060035568 Polishing pad conditioners having abrasives and brush elements, and associated systems and methods
02/16/2006US20060035566 Superabrasive tool
02/16/2006US20060034021 Methods of manufacturing magnetic heads with reference and monitoring devices
02/14/2006US6997789 Method and apparatus for planarizing a microelectronic substrate with a tilted planarizing surface
02/14/2006US6997788 Multi-tool, multi-slurry chemical mechanical polishing
02/14/2006US6997787 Process for copper free chrome plating of a vehicle wheel surface
02/14/2006US6997786 Method of preparing a sanding block to repair a damaged surface profile
02/14/2006US6997785 Wafer planarization composition and method of use
02/14/2006US6997783 Method of and apparatus for removing a film layer on a glass plate and glass-plate working apparatus having the apparatus
02/14/2006US6997782 Polishing apparatus and a method of polishing and cleaning and drying a wafer
02/14/2006US6997781 Fixed-abrasive chemical-mechanical planarization of titanium nitride
02/14/2006US6997776 Process for producing a semiconductor wafer
02/09/2006US20060030247 Cleaning sheet and method for a probe
02/09/2006US20060030246 Buffing head and method for reconditioning an optical disc
02/09/2006US20060030245 Grindstone and method for producing optical element
02/09/2006US20060030244 Substrate polishing apparatus
02/09/2006US20060030243 Polishing composition
02/09/2006US20060030242 Shaped polishing pads for beveling microfeature workpiece edges, and associate system and methods
02/09/2006US20060030158 Chemical mechanical polishing; an abrasive, an organic oxidizerquinone moiety, a paraphenylenediamine, a phenazine, a thionine, a phenoxazine, phenoxathiin, an indigo, or an indophenol compound, and a liquid carrier
02/09/2006US20060030145 Methods of forming a conductive contact through a dielectric
02/09/2006US20060028770 Magnetic head with electro lapping guide and manufacturing method
02/09/2006US20060027542 Method to eliminate defects on the periphery of a slider due to conventional machining processes
02/08/2006CN1732065A Device and method for machining workpieces
02/07/2006US6994611 (CMP); polishing head for holding and applying first or second a wafer to the CMP pad surface; and a chemical dispenser for uniformly applying pad cleaning chemicals appropriate for either copper or oxide wafer surface across the CMP pad surface
02/07/2006US6994610 Electrolytic integrated polishing apparatus that integrates elution by electrolyte and abrasion by a grindstone and enables high precision polishing of the internal surface of a long sized cylindrical aluminum tube such as hydraulic cylinder
02/07/2006US6994609 Chemical mechanical planarization system with replaceable pad assembly
02/07/2006US6994607 Polishing pad with window
02/07/2006US6993948 Methods for altering residual stresses using mechanically induced liquid cavitation
02/07/2006CA2497731C Magnetorheological polishing devices and methods
02/07/2006CA2234761C Deterministic magnetorheological finishing
02/02/2006WO2006012094A2 A method of and apparatus for magnetic-abrasive machining of wafers
02/02/2006WO2005120772A3 A method of working gemstones
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