Patents for B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes (7,565)
05/2006
05/09/2006US7040960 Use of bioactive glass for cutting bioactive glasses
05/09/2006US7040959 Variable rate dispensing system for abrasive material and method thereof
05/09/2006US7040955 Chemical-mechanical planarization tool force calibration method and system
05/09/2006US7040953 Substrate for information recording media and manufacturing method thereof, and information recording medium
05/04/2006US20060094341 Polishing tool with several pressure zones
05/04/2006US20060094340 Process for manufacturing optical and semiconductor elements
05/04/2006US20060094338 Chemical mechanical polishing apparatus and chemical mechanical polishing method using the same
05/04/2006US20060094337 Pad conditioner test apparatus and method
05/04/2006US20060092570 Disk drive slider design for thermal fly-height control and burnishing-on-demand
05/03/2006CN1765579A Equipment and method for removing CMP pad from platen
05/02/2006US7037969 Blending a melamine compound with a cellulosic material; compression molding; cooling, grinding; blending urea compound with nano-clay; compression molding; cooling, gringing; blending
05/02/2006US7037350 adding polymeric abrasive particles carrying electrostatic charge to the aqueous solution, wherein the polymeric particles in the aqueous solution have an electrical charge sufficient to create an electrostatic repulsive force between proximate particles
05/02/2006US7037180 Method and apparatus for surface treatment of a long piece of material
05/02/2006US7037179 Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates
04/2006
04/27/2006US20060089091 Rotational processor with drive rollers
04/27/2006US20060089090 High pressure cleaning and decontamination system
04/27/2006US20060089086 Working device and method for working a stack of plate-shaped elements
04/27/2006DE102005047114A1 Schleifprozess und Vorrichtung mit Anordnung zum Schleifen mit konstanter Schleiflast Grinding process and apparatus arrangement for grinding with a constant grinding load
04/26/2006EP1648974A2 Slurries and methods for chemical-mechanical planarization of copper
04/26/2006CN1253287C Predeformation working method and fixture for bearing non-circular ball track
04/25/2006US7033409 Compositions for chemical mechanical planarization of tantalum and tantalum nitride
04/25/2006US7033260 Substrate holding device and polishing device
04/25/2006US7033255 Chamfer processing method and device for plate material
04/25/2006US7033252 Wafer carrier with pressurized membrane and retaining ring actuator
04/25/2006US7033250 Method for chemical mechanical planarization
04/25/2006US7033248 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
04/25/2006US7033246 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces
04/20/2006US20060084369 Polishing apparatus
04/20/2006US20060084368 Burr removal apparatus
04/20/2006US20060084367 Method of sharpening cutting edges
04/20/2006US20060084366 Combination router-end mill cutter tool, edger with combination tool, and method of edging eyeglass lenses
04/20/2006US20060081573 Method for smoothing and polishing surfaces by treating them with energetic radiation
04/20/2006US20060081153 Color coat sanding guide
04/19/2006CN1761552A Use of an abrasive article with agglomerates
04/18/2006US7029747 nonporous uniform transparent polymer elastic support layer and a semitransparent polishing layer that has a higher hardness than the support layer; both made of compatible materials so that a structural border between the layers does not exist; open pores defined by the embedded liquid microelements
04/18/2006US7029508 Catalyst attached to solid and used to promote free radical formation in CMP formulations
04/18/2006US7029386 Retaining ring assembly for use in chemical mechanical polishing
04/18/2006US7029379 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same
04/18/2006US7029377 Buffing head and method for reconditioning an optical disc
04/18/2006US7029375 Retaining ring structure for edge control during chemical-mechanical polishing
04/18/2006US7029374 Method for cleaning semiconductor wafers
04/18/2006US7029373 Chemical mechanical polishing compositions for metal and associated materials and method of using same
04/18/2006US7029372 Method of forming an electrode equipped in an apparatus for manufacturing an array substrate of a liquid crystal display device
04/18/2006US7029368 Apparatus for controlling wafer temperature in chemical mechanical polishing
04/18/2006US7028378 Method of shot blasting and a machine for implementing such a method
04/13/2006WO2006039413A2 Cmp pade dresser with oriented particles and associated methods
04/13/2006US20060079157 Apparatus and method for manufacturing or working optical elements and/or optical forming elements, and such element
04/13/2006US20060079156 Method for processing a substrate using multiple fluid distributions on a polishing surface
04/13/2006US20060079155 Wafer grinding method
04/13/2006US20060079154 Chemical mechanical polishing process for manufacturing semiconductor devices
04/12/2006CN2770870Y Peripheral movable magnetic grinding apparatus
04/12/2006CN2770869Y Translational magnetic grinding apparatus
04/11/2006US7025668 Gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafers
04/11/2006US7025661 Chemical mechanical polishing process
04/11/2006US7025659 Simultaneous planarization of pole piece and coil materials for write head applications
04/11/2006US7025658 Platen and head rotation rates for monitoring chemical mechanical polishing
04/06/2006WO2006034695A1 Method for polishing particularly of optically-active surfaces such as lenses
04/06/2006US20060073774 CMP pad dresser with oriented particles and associated methods
04/06/2006US20060073773 High pressure pad conditioning
04/06/2006US20060073772 Eyeglass lens processing apparatus
04/06/2006US20060073771 Method and device for producing ophthalmic lenses and other shaped bodies with optically active surfaces
04/06/2006US20060073769 Polishing method
04/06/2006US20060073767 Apparatus and method for mechanical and/or chemical-mechanical planarization of micro-device workpieces
04/06/2006US20060073766 Magnetic spindle for machine tool
04/06/2006US20060073765 Grinding process and apparatus with arrangement for grinding with constant grinding load
04/06/2006DE10392532B4 Poröse Schleifgegenstände mit Schleifagglomeraten und Verfahren zum Herstellen der Schleifagglomerate Porous abrasive articles with abrasive agglomerates and methods of making the abrasive agglomerates
04/06/2006DE102004047563A1 Verfahren zum Polieren A method of polishing
04/05/2006CN2769018Y Filming equipment for glazed polishing tile nano-antidirty materials
04/05/2006CN1755901A Chemical mechanical polishing technique
04/04/2006US7021999 Rinse apparatus and method for wafer polisher
04/04/2006US7021998 Method and device for finishing surface of long material
04/04/2006US7021997 Multifunctional whetstone
04/04/2006US7021996 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces
04/04/2006US7021995 CMP pad conditioner having working surface inclined in radially outer portion
04/04/2006US7021994 Method and apparatus for metalworking using a coolant fluid
04/04/2006US7021993 Method of polishing a substrate with a polishing system containing conducting polymer
04/04/2006US7021990 Method and apparatus for circular grinding
03/2006
03/30/2006US20060068684 Polishing method and polishing system
03/30/2006US20060068683 Machining apparatus using a rotary machine tool to machine a workpiece
03/30/2006US20060068681 Wafer polishing method and apparatus
03/30/2006US20060067004 Critically exposed lapping of magnetic sensors for target signal output
03/29/2006CN1752287A Rare-earth transfer film method for increasing corrosion-resistance of light metal and its composite material surface
03/29/2006CN1751849A Speed variation control method for high speed grinding machine
03/29/2006CN1751848A High-precision mechanical sharpening method for diamond cutter with high-efficiency and low-cost
03/28/2006US7018274 Polishing pad having slurry utilization enhancing grooves
03/28/2006US7018273 Platen with diaphragm and method for optimizing wafer polishing
03/28/2006US7018272 Pressure feed grinding of AMLCD substrate edges
03/28/2006US7018270 Method and apparatus for cutting semiconductor wafers
03/28/2006US7018268 Protection of work piece during surface processing
03/23/2006US20060063474 Method for producing a mirror from a titanium-based material, and a mirror made from such a material
03/23/2006US20060063473 Method for inspecting grinding wheels
03/23/2006US20060063472 Method for polishing substrate
03/23/2006US20060063470 Semiconductor wafer material removal apparatus and method for operating the same
03/23/2006US20060063469 Advanced chemical mechanical polishing system with smart endpoint detection
03/23/2006US20060059785 Protectively coating diamond particles with a chemically bound braze alloy containing a less reactive element, such as copper, zinc, tin, titanium, silicon, chromium, tungsten or zirconium, or carbides or nitrides therof; increased particle retention
03/23/2006CA2577155A1 Apparatus and method for removing enamel from a person's tooth
03/22/2006EP1059141B1 Hand scaler polishing unit and hand scaler polishing apparatus
03/22/2006CN1750236A Inlaid polishing pad and method of producing the same
03/22/2006CN1246885C Polish tool and its use method and device
03/22/2006CN1246125C End point detection system for chemical and mechanical polishing
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