Patents for B24B 1 - Processes of grinding or polishing; Use of auxiliary equipment in connection with such processes (7,565) |
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05/09/2006 | US7040960 Use of bioactive glass for cutting bioactive glasses |
05/09/2006 | US7040959 Variable rate dispensing system for abrasive material and method thereof |
05/09/2006 | US7040955 Chemical-mechanical planarization tool force calibration method and system |
05/09/2006 | US7040953 Substrate for information recording media and manufacturing method thereof, and information recording medium |
05/04/2006 | US20060094341 Polishing tool with several pressure zones |
05/04/2006 | US20060094340 Process for manufacturing optical and semiconductor elements |
05/04/2006 | US20060094338 Chemical mechanical polishing apparatus and chemical mechanical polishing method using the same |
05/04/2006 | US20060094337 Pad conditioner test apparatus and method |
05/04/2006 | US20060092570 Disk drive slider design for thermal fly-height control and burnishing-on-demand |
05/03/2006 | CN1765579A Equipment and method for removing CMP pad from platen |
05/02/2006 | US7037969 Blending a melamine compound with a cellulosic material; compression molding; cooling, grinding; blending urea compound with nano-clay; compression molding; cooling, gringing; blending |
05/02/2006 | US7037350 adding polymeric abrasive particles carrying electrostatic charge to the aqueous solution, wherein the polymeric particles in the aqueous solution have an electrical charge sufficient to create an electrostatic repulsive force between proximate particles |
05/02/2006 | US7037180 Method and apparatus for surface treatment of a long piece of material |
05/02/2006 | US7037179 Methods and apparatuses for making and using planarizing pads for mechanical and chemical-mechanical planarization of microelectronic substrates |
04/27/2006 | US20060089091 Rotational processor with drive rollers |
04/27/2006 | US20060089090 High pressure cleaning and decontamination system |
04/27/2006 | US20060089086 Working device and method for working a stack of plate-shaped elements |
04/27/2006 | DE102005047114A1 Schleifprozess und Vorrichtung mit Anordnung zum Schleifen mit konstanter Schleiflast Grinding process and apparatus arrangement for grinding with a constant grinding load |
04/26/2006 | EP1648974A2 Slurries and methods for chemical-mechanical planarization of copper |
04/26/2006 | CN1253287C Predeformation working method and fixture for bearing non-circular ball track |
04/25/2006 | US7033409 Compositions for chemical mechanical planarization of tantalum and tantalum nitride |
04/25/2006 | US7033260 Substrate holding device and polishing device |
04/25/2006 | US7033255 Chamfer processing method and device for plate material |
04/25/2006 | US7033252 Wafer carrier with pressurized membrane and retaining ring actuator |
04/25/2006 | US7033250 Method for chemical mechanical planarization |
04/25/2006 | US7033248 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
04/25/2006 | US7033246 Systems and methods for monitoring characteristics of a polishing pad used in polishing micro-device workpieces |
04/20/2006 | US20060084369 Polishing apparatus |
04/20/2006 | US20060084368 Burr removal apparatus |
04/20/2006 | US20060084367 Method of sharpening cutting edges |
04/20/2006 | US20060084366 Combination router-end mill cutter tool, edger with combination tool, and method of edging eyeglass lenses |
04/20/2006 | US20060081573 Method for smoothing and polishing surfaces by treating them with energetic radiation |
04/20/2006 | US20060081153 Color coat sanding guide |
04/19/2006 | CN1761552A Use of an abrasive article with agglomerates |
04/18/2006 | US7029747 nonporous uniform transparent polymer elastic support layer and a semitransparent polishing layer that has a higher hardness than the support layer; both made of compatible materials so that a structural border between the layers does not exist; open pores defined by the embedded liquid microelements |
04/18/2006 | US7029508 Catalyst attached to solid and used to promote free radical formation in CMP formulations |
04/18/2006 | US7029386 Retaining ring assembly for use in chemical mechanical polishing |
04/18/2006 | US7029379 Wafer holding plate for wafer grinding apparatus and method for manufacturing the same |
04/18/2006 | US7029377 Buffing head and method for reconditioning an optical disc |
04/18/2006 | US7029375 Retaining ring structure for edge control during chemical-mechanical polishing |
04/18/2006 | US7029374 Method for cleaning semiconductor wafers |
04/18/2006 | US7029373 Chemical mechanical polishing compositions for metal and associated materials and method of using same |
04/18/2006 | US7029372 Method of forming an electrode equipped in an apparatus for manufacturing an array substrate of a liquid crystal display device |
04/18/2006 | US7029368 Apparatus for controlling wafer temperature in chemical mechanical polishing |
04/18/2006 | US7028378 Method of shot blasting and a machine for implementing such a method |
04/13/2006 | WO2006039413A2 Cmp pade dresser with oriented particles and associated methods |
04/13/2006 | US20060079157 Apparatus and method for manufacturing or working optical elements and/or optical forming elements, and such element |
04/13/2006 | US20060079156 Method for processing a substrate using multiple fluid distributions on a polishing surface |
04/13/2006 | US20060079155 Wafer grinding method |
04/13/2006 | US20060079154 Chemical mechanical polishing process for manufacturing semiconductor devices |
04/12/2006 | CN2770870Y Peripheral movable magnetic grinding apparatus |
04/12/2006 | CN2770869Y Translational magnetic grinding apparatus |
04/11/2006 | US7025668 Gradient polishing pad made from paper-making fibers for use in chemical/mechanical planarization of wafers |
04/11/2006 | US7025661 Chemical mechanical polishing process |
04/11/2006 | US7025659 Simultaneous planarization of pole piece and coil materials for write head applications |
04/11/2006 | US7025658 Platen and head rotation rates for monitoring chemical mechanical polishing |
04/06/2006 | WO2006034695A1 Method for polishing particularly of optically-active surfaces such as lenses |
04/06/2006 | US20060073774 CMP pad dresser with oriented particles and associated methods |
04/06/2006 | US20060073773 High pressure pad conditioning |
04/06/2006 | US20060073772 Eyeglass lens processing apparatus |
04/06/2006 | US20060073771 Method and device for producing ophthalmic lenses and other shaped bodies with optically active surfaces |
04/06/2006 | US20060073769 Polishing method |
04/06/2006 | US20060073767 Apparatus and method for mechanical and/or chemical-mechanical planarization of micro-device workpieces |
04/06/2006 | US20060073766 Magnetic spindle for machine tool |
04/06/2006 | US20060073765 Grinding process and apparatus with arrangement for grinding with constant grinding load |
04/06/2006 | DE10392532B4 Poröse Schleifgegenstände mit Schleifagglomeraten und Verfahren zum Herstellen der Schleifagglomerate Porous abrasive articles with abrasive agglomerates and methods of making the abrasive agglomerates |
04/06/2006 | DE102004047563A1 Verfahren zum Polieren A method of polishing |
04/05/2006 | CN2769018Y Filming equipment for glazed polishing tile nano-antidirty materials |
04/05/2006 | CN1755901A Chemical mechanical polishing technique |
04/04/2006 | US7021999 Rinse apparatus and method for wafer polisher |
04/04/2006 | US7021998 Method and device for finishing surface of long material |
04/04/2006 | US7021997 Multifunctional whetstone |
04/04/2006 | US7021996 Apparatus and method for conditioning a contact surface of a processing pad used in processing microelectronic workpieces |
04/04/2006 | US7021995 CMP pad conditioner having working surface inclined in radially outer portion |
04/04/2006 | US7021994 Method and apparatus for metalworking using a coolant fluid |
04/04/2006 | US7021993 Method of polishing a substrate with a polishing system containing conducting polymer |
04/04/2006 | US7021990 Method and apparatus for circular grinding |
03/30/2006 | US20060068684 Polishing method and polishing system |
03/30/2006 | US20060068683 Machining apparatus using a rotary machine tool to machine a workpiece |
03/30/2006 | US20060068681 Wafer polishing method and apparatus |
03/30/2006 | US20060067004 Critically exposed lapping of magnetic sensors for target signal output |
03/29/2006 | CN1752287A Rare-earth transfer film method for increasing corrosion-resistance of light metal and its composite material surface |
03/29/2006 | CN1751849A Speed variation control method for high speed grinding machine |
03/29/2006 | CN1751848A High-precision mechanical sharpening method for diamond cutter with high-efficiency and low-cost |
03/28/2006 | US7018274 Polishing pad having slurry utilization enhancing grooves |
03/28/2006 | US7018273 Platen with diaphragm and method for optimizing wafer polishing |
03/28/2006 | US7018272 Pressure feed grinding of AMLCD substrate edges |
03/28/2006 | US7018270 Method and apparatus for cutting semiconductor wafers |
03/28/2006 | US7018268 Protection of work piece during surface processing |
03/23/2006 | US20060063474 Method for producing a mirror from a titanium-based material, and a mirror made from such a material |
03/23/2006 | US20060063473 Method for inspecting grinding wheels |
03/23/2006 | US20060063472 Method for polishing substrate |
03/23/2006 | US20060063470 Semiconductor wafer material removal apparatus and method for operating the same |
03/23/2006 | US20060063469 Advanced chemical mechanical polishing system with smart endpoint detection |
03/23/2006 | US20060059785 Protectively coating diamond particles with a chemically bound braze alloy containing a less reactive element, such as copper, zinc, tin, titanium, silicon, chromium, tungsten or zirconium, or carbides or nitrides therof; increased particle retention |
03/23/2006 | CA2577155A1 Apparatus and method for removing enamel from a person's tooth |
03/22/2006 | EP1059141B1 Hand scaler polishing unit and hand scaler polishing apparatus |
03/22/2006 | CN1750236A Inlaid polishing pad and method of producing the same |
03/22/2006 | CN1246885C Polish tool and its use method and device |
03/22/2006 | CN1246125C End point detection system for chemical and mechanical polishing |