Patents
Sitemap › G03 - Photography; Cinematography; Analogous techniques using waves other than optical waves; Electrography; Holography › G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; Materials therefor; Originals therefor; Apparatus specially adapted therefor › G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
10/1980
10/29/1980EP0018249A1 Illumination device for producing from a predetermined surface zone a divergent light bundle, and a motive transfer system comprising such a device
10/29/1980EP0017927A2 Process for preparing photopolymerized elastomeric printing plates not displaying surface stickiness
10/29/1980EP0017703A1 Copolymerizable (2-cyano-3,3-diarylacryloxy)alkylene compounds, a method of making them and the use of these compounds as ultraviolet light absorbers
10/28/1980US4230794 Improving etch resistance of a casein-based photoresist
10/28/1980US4230793 Process for the production of solder masks for printed circuits
10/28/1980US4230792 Lithographic printing plate from silver halide emulsion
10/28/1980US4230790 Photopolymerizable compositions useful in dry film photoresist
10/28/1980US4230788 Method of manufacturing an external electrically conducting metal pattern
10/28/1980US4230781 Method for making etch-resistant stencil with dichromate-sensitized alkali-caseinate coating
10/28/1980US4230770 Metal photopolymer substrates
10/28/1980US4230740 Heat stable, non-yellowing photopolymer compositions
10/28/1980US4230492 P-chlorobenzenesulfonic acid, diazo resin
10/28/1980US4229879 Two-sided, photodegradation of resin
10/21/1980US4229520 Photo-polymerization and development process which produces dot-etchable material
10/21/1980US4229519 Photo-polymerizable water-developable composition and elements
10/21/1980US4229518 Photohardenable elements with a non-tacky matte finish
10/21/1980US4229517 Dot-etchable photopolymerizable elements
10/21/1980US4229514 Photosensitive composition
10/21/1980CA1088057A1 Light-sensitive copying compositions and photoinitiators contained therein
10/21/1980CA1087898A1 Projection printing using transparent covering layers
10/16/1980EP0020473A4 Phosphine activated photosensitive compositions and photopolymer printing plates made therefrom.
10/15/1980EP0017563A1 Object for the manufacture of visual aids comprising a photopolymerisable composition on a transparent carrier
10/15/1980EP0017336A1 Photopolymerisable elements, and relief printing plates made therefrom
10/15/1980EP0017316A2 Apparatus for treating the surface of cylindrical objects
10/15/1980EP0017144A1 An apparatus for precisely moving a table
10/15/1980EP0017044A2 A system for positioning a utilization device
10/15/1980EP0017032A2 Method of producing a solid state device by differential plasma etching of resists
10/15/1980EP0016925A1 Method of depositing metal on metal patterns on dielectric substrates
10/15/1980EP0007898A4 High-resolution X-ray lithographic system and a method for fabricating microminiature devices by irradiating with such a system.
10/14/1980US4228232 Nonsticking lithographic printing plates
10/14/1980CA1087434A1 Radiation sensitive composition containing a quaternary ammonium salt and chemical sensitizer
10/14/1980CA1087384A1 Method and apparatus for producing nozzle arrays for ink jet printers
10/07/1980US4226933 Method of manufacturing a decorative panel
10/07/1980US4226932 Integrated circuits, thermal diffusion barriers
10/07/1980US4226686 Photoresists, electrochemical machining
10/07/1980US4226569 Wafer loading and positioning device
10/01/1980EP0016679A1 Photomasking substances, process for preparing them and mask obtained
10/01/1980EP0016663A1 Process for preparing photopolymerizable organopolysiloxane compositions; use of these compositions
10/01/1980EP0016299A1 System for and method of reproducing an image
09/1980
09/30/1980US4225695 Lacquers for leather
09/30/1980US4225664 X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate)
09/30/1980US4225663 Abhesive layer capable of repelling oleo ink when dry; photobonded to it in image areas an oleo-ink receptive layer
09/30/1980US4225661 Photoreactive coating compositions and photomechanical plates produced therewith
09/30/1980US4225225 High registration photomask machine and computerized numerical control system
09/30/1980US4225224 Process and apparatus for laser illumination of printing plates
09/23/1980US4224399 Photocrosslinkable compositions for lithographic printing plates
09/23/1980US4224398 Photopolymerizable latex systems
09/23/1980US4224369 Method for coating or printing using acrylated epoxidized soybean oil urethane compositions
09/23/1980US4224361 High temperature lift-off technique
09/23/1980US4224225 Photopolymerization initiator
09/18/1980WO1980001978A1 Solid state devices by differential plasma etching of resists
09/17/1980EP0015789A1 Optical photorepeating projection device
09/17/1980EP0015459A1 Article comprising a negative X-ray resist containing poly(2,3-dichloro-1-propyl acrylate) and poly(glycidyl methacrylate-co-ethyl acrylate) and method using this resist
09/17/1980EP0015441A2 Laminated film structure of aromatic polyester and process for production thereof
09/16/1980US4223088 Photolithography
09/16/1980US4223087 Treating surface with solution of a ferricyanide anion and a complexing agent; oxidation
09/16/1980US4222656 Apparatus and method for processing exposed lithographic plates
09/16/1980CA1085968A1 Resist development control system
09/09/1980US4221859 Photopolymerizable composition with oxalic acid photoinitiator
09/09/1980US4221858 Exposure, silver halide emulsions, tanning
09/09/1980US4221646 Treated polyetherurethane photopolymer composition containing triaryl phosphine
09/09/1980CA1085537A1 Polymers for increasing the viscosity of photosensitive resins
09/09/1980CA1085212A1 Use of volatile carboxylic acids in improved photoresists containing quinone diazides
09/04/1980WO1980001847A1 Negative x-ray resist containing poly(2,3-dichloro-1-propyl acrylate)and poly(glycidyl methacrylate-co-ethyl acrylate)
09/04/1980WO1980001846A1 Contrast colorant for photopolymerizable compositions
09/03/1980EP0015004A2 Dry-developing photosensitive dry film resist, a solder mask made thereof, and process for using the dry film resist
09/03/1980EP0014785A1 Coating method and curable compositions
09/02/1980US4220707 Amine curing agent, reductive metal compound
09/02/1980US4220704 And an unsaturated monomer; printing plates
09/02/1980US4220702 Neutralizing solution containing colloidal fine particles in combination with a hygroscopic polyol
09/02/1980US4220700 Mordants, anionic dyes
09/02/1980CA1084758A1 Process for the manufacture of planographic printing forms
08/1980
08/26/1980US4219654 Photoinitiators
08/26/1980US4218799 Wash-out apparatus for printing machines
08/26/1980CA1084517A1 Photopolymerisable ketones
08/26/1980CA1084322A1 Photographically transferring a design to a flat or arcuate surface
08/26/1980CA1084214A1 Weld joint
08/21/1980WO1980001721A1 Process and attachment for adjusting the image surface and/or the object surface in optical copying unit
08/20/1980EP0014673A1 Light curable polymers with side groups derived from indenon, their production and utilization
08/20/1980EP0014293A1 Photocurable unsaturated polyester resin compositions and process for curing them
08/20/1980EP0014237A2 Photosensitive coating composition and its use in the production of a negative resist image
08/19/1980US4218532 Photolithographic technique for depositing thin films
08/19/1980US4218531 Addition of ethylenically unsaturated materials to control odor in photopolymerizable epoxy compositions
08/19/1980US4218136 Method of and apparatus for aligning photomask
08/12/1980US4217408 Printing plate material
08/12/1980US4217407 Light-sensitive O-quinone diazide containing copying material
08/12/1980US4217168 Magnetic core formed from laminations
08/06/1980EP0014012A1 Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
08/05/1980US4216306 Film-forming polymerizable resin of benzophenone dianhydride, epoxy compound and unsaturate carboxylic acid
08/05/1980US4216289 Process for the production of printing plates
08/05/1980US4216288 Heat curable cationically polymerizable compositions and method of curing same with onium salts and reducing agents
08/05/1980US4216287 Photo-curable composite containing a screen material in a liquid resin
08/05/1980US4216019 Photographically produced stencils
08/05/1980US4215935 Method and device for the projection printing of a mask onto a semiconductor substrate
08/05/1980US4215934 Printing apparatus
08/05/1980US4215928 Apparatus for treating the surfaces of cylindrical objects in a number of sequential steps
08/05/1980US4215927 Lithographic plate processing apparatus
08/05/1980CA1083168A1 Viscosity stabilization of vicinal acryloxy hydroxyl derivatives of linseed oil
07/1980
07/29/1980US4215194 Photoresist masking
07/29/1980US4215193 Comprising a colorless spheroidal-shaped polymer/ d to ion exchange membrane
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