Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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02/02/1982 | CA1117400A1 Process and gas for removal of materials in plasma environment |
02/02/1982 | CA1117350A1 Etch-bleaching liquid containing citric acid and alkylene oxide polymer as stabilizing agents for hydrogen peroxide |
01/27/1982 | EP0044553A1 Method of making relief structures of double resin layers of integrated circuits using high-energy radiation |
01/27/1982 | EP0044457A2 Process for two-photon holographic recording |
01/27/1982 | EP0044345A1 Process for making video and similar discs. |
01/26/1982 | US4312936 Electron beams, positives |
01/26/1982 | US4312935 Class of E-beam resists based on conducting organic charge transfer salts |
01/26/1982 | US4312934 Photosensitive compositions |
01/26/1982 | US4312585 Method and apparatus for treating graphic arts process photosensitive materials |
01/26/1982 | CA1116947A1 Method of rendering an ink strippable |
01/26/1982 | CA1116919A1 Flame retardant radiation sensitive element of photopolymerizable composition containing halogen and an acrylonitrile containing polymeric binder |
01/26/1982 | CA1116897A1 High resolution halftone microimages and method therefor |
01/26/1982 | CA1116837A1 Method for making an air cooled combustor |
01/20/1982 | EP0044274A2 Photopolymerisation by means of carbamoylsulfoxonium salts |
01/20/1982 | EP0044220A1 Dry planographic printing plate for direct printing |
01/20/1982 | EP0043991A2 Method of burning-in light-sensitive layers in the production of printing plates |
01/19/1982 | US4311785 Method for the preparation of highly heat-resistant relief structures and the use thereof |
01/19/1982 | US4311783 Dimers derived from unsymmetrical 2,4,5,-triphenylimidazole compounds as photoinitiators |
01/19/1982 | US4311782 Polyether of orthocarboxylic ester |
01/19/1982 | US4311773 Method of producing color filters |
01/19/1982 | US4311390 Interferometrically controlled stage with precisely orthogonal axes of motion |
01/19/1982 | US4311381 Method and apparatus for producing printing patterns |
01/19/1982 | CA1116777A1 Photo curing of unsaturated resins |
01/19/1982 | CA1116465A1 Fiberous substrate letterpress photopolymer printing plate |
01/13/1982 | EP0043716A2 Photosensitive composition and pattern forming process using same |
01/13/1982 | EP0043623A1 Cylindrical sleeve for use in a printing operation as well as method for manufacturing such a sleeve |
01/13/1982 | EP0043508A2 Apparatus for the transport and the alignment of printing plates |
01/13/1982 | EP0043480A2 Process for forming metallic images |
01/13/1982 | EP0043458A2 Process for forming a metallurgy interconnection system |
01/13/1982 | EP0043438A2 Methylene chloride-methane sulfonic acid stripping compositions and methods for using same |
01/12/1982 | US4310641 Polyamide-imide modified with a cinnamoyl group |
01/12/1982 | US4310616 Method and apparatus for developing and treating PS plates |
01/12/1982 | US4310615 Image transfer element having release layer |
01/12/1982 | US4310613 Quaternary ammonium salt antisludging agents |
01/12/1982 | CA1116059A1 Phenol-free and chlorinated hydrocarbon-free photoresist stripper |
01/08/1982 | EP0044345A4 Process for making video and similar discs. |
01/06/1982 | EP0043132A1 A developer for dry planographic printing plates |
01/06/1982 | EP0043116A2 Negative-working resists for recording high-energy radiation |
01/06/1982 | EP0043073A2 Photocurable polyurethane film coatings |
01/06/1982 | EP0042894A1 A process for forming microcircuits |
01/05/1982 | US4309529 Water-dispersible energy curable heterocyclic group-containing polyesters |
01/05/1982 | US4309331 Used in manufacture of printed circuits, printing plates, photoresists |
01/05/1982 | US4308799 Polysiloxane, alkoxysilane, and organotitanium or zirconium compound |
01/05/1982 | CA1115587A1 Photosensitive patternable coating composition containing the reaction product of an epoxidized non linear novoluc and an ethylenically unsaturated carboxylic acid |
01/05/1982 | CA1115586A1 Photoresist material comprising an o-quinone diazide photosensitizer, an alkali soluble polymer and a rosinous material |
12/30/1981 | EP0042704A2 Method of forming a pattern employing a photosensitive composition |
12/30/1981 | EP0042632A1 Recording material and method for the production of metal images |
12/30/1981 | EP0042567A2 Photopolymerisable mixtures with aroylphosphonic acid esters as photoinitiators |
12/30/1981 | EP0042562A2 Positive-working radiation-sensitive composition |
12/29/1981 | US4308586 Method for the precise determination of photoresist exposure time |
12/29/1981 | US4308400 Sensitizers for photopolymerization |
12/29/1981 | US4308394 Photopolymerizable photoinitiators |
12/29/1981 | US4308368 Photosensitive compositions with reaction product of novolak co-condensate with o-quinone diazide |
12/29/1981 | US4308367 Hydroxyl-containing compositions and their polymerization |
12/29/1981 | US4308340 Developer, release agent, nonionic surfactant |
12/29/1981 | US4308338 Production of wear-resistant printing plates |
12/29/1981 | US4308337 Uniform light exposure of positive photoresist for replicating spiral groove in plastic substrate |
12/29/1981 | CA1115274A1 Amide-modified urethane acrylate radiation curable compounds and coating compositions and methods of making same |
12/23/1981 | EP0042109A2 Lithographic process and resulting article |
12/23/1981 | EP0042105A1 Photosensitive copying material and method of producing the same |
12/23/1981 | EP0042104A1 Photosensitive copying material and method of producing the same |
12/22/1981 | US4307181 Masking agent for the deposition of a material and method for such a deposition using this masking agent |
12/22/1981 | US4307180 Process of forming recessed dielectric regions in a monocrystalline silicon substrate |
12/22/1981 | US4307179 Photoresist patterns |
12/22/1981 | US4307178 Plasma develoment of resists |
12/22/1981 | US4307177 Method of using polymerizable compositions containing onium salts |
12/22/1981 | US4307176 On electron resists |
12/22/1981 | US4307173 An 0-quinone diazide and an aromatic sulfonic acid |
12/22/1981 | US4307172 Imaging light-sensitive material with etchable opaque polyamide underlayer and light-sensitive resist overlayer |
12/22/1981 | US4307165 Plural imaging component microcellular arrays, processes for their fabrication, and electrographic compositions |
12/22/1981 | CA1114974A1 Photopolymerizable latex systems |
12/22/1981 | CA1114771A1 Radiation curable coating compositions |
12/22/1981 | CA1114674A1 Method and apparatus for manipulating and transporting image media |
12/16/1981 | EP0041678A2 Process for the production of highly heat-resistant relief structures, and their use |
12/16/1981 | EP0041677A2 Radiation reactive precursors of highly heat-resistant polymers, and their use |
12/16/1981 | EP0041675A2 4-Halogen-5-(trichloromethyl-phenyl)-oxazole derivatives, process for preparing them and radiation-sensitive compositions containing them |
12/16/1981 | EP0041674A2 2-(Trichloro-methyl-phenyl)-4-halogen-oxazole derivatives, process for preparing them and radiation-sensitive compositions containing them |
12/16/1981 | EP0041643A2 Self-trimming photosensitive layer |
12/16/1981 | EP0041642A2 Integrated laminating process |
12/16/1981 | EP0041640A2 Photopolymerizable composition |
12/16/1981 | EP0041639A2 Laminating process |
12/15/1981 | US4306013 Asymmetrical radiation exposure of spin coated photoresist to obtain uniform thickness coating used to replicate spiral grooves in plastic substrate |
12/15/1981 | US4306011 Phenolic resins and sulfonyl chloride of benzo or naphthoquinone diazide |
12/15/1981 | US4306010 Photosensitive o-quinone diazide composition and photosensitive lithographic printing plate |
12/15/1981 | US4306006 Method of directly manufacturing reticle patterns on chrome-coated plates by means of a pattern generator |
12/15/1981 | US4305854 Radiation curable pressure sensitive adhesive |
12/15/1981 | US4305796 Methods of preparing polyimides and artifacts composed thereof |
12/15/1981 | CA1114548A1 Photopolymerisable resins |
12/15/1981 | CA1114541A1 Photosensitive coating composition and use thereof |
12/09/1981 | EP0041292A1 Process of forming a metal article, process of manufacturing a plastics mask upon a metal carrier and installation for applying a plastics mask upon the surface of a metal carrier |
12/08/1981 | US4304923 Photopolymerizable oligomer |
12/08/1981 | US4304843 Mixture of acrylate or anionic polymer particles and colorant particles |
12/08/1981 | US4304842 Process and apparatus for the manufacture of a relief printing form and the printing form thus manufactured |
12/08/1981 | US4304841 Disulfide compound to lower sensitivity to oxygen |
12/08/1981 | US4304840 Method of delineating a desired integrated circuit pattern upon a circuit substrate |
12/08/1981 | US4304839 Positive working multilayer photosensitive tonable element |
12/08/1981 | US4304838 Photopolymerizable composition and recording materials utilizing the same |
12/08/1981 | US4304836 Surlay proofing method |
12/08/1981 | US4304832 And a copolymer of an alkyl acrylic ester, an acrylic acid, and an acrylonitrile; durable lithographic printing plates |
12/08/1981 | US4304705 Radiation-curable polymers containing pendant unsaturated peptide groups derived from azlactone polymers |