Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
07/1978
07/18/1978US4101326 Process for making stabilized polyesters used in radiation-sensitive compositions for lithographic plates having improved wear life including hindered phenols and phosphoric acid esters
07/18/1978US4101324 Printing plate and method for forming the same having small projections in non-image areas
07/18/1978US4101323 Radiation-sensitive copying composition
07/11/1978US4100560 Multi-purpose modification for lithographic plate-maker
07/11/1978US4100321 Glycidyl acrylate polymers
07/11/1978US4099973 Photo-sensitive bis-azide containing composition
07/04/1978US4099062 Electron beam lithography process
07/04/1978US4098917 Method of providing a patterned metal layer on a substrate employing metal mask and ion milling
07/04/1978US4098785 Thermoplastic duplication plate making method
07/04/1978US4098712 Alkaline solution and a bromate or iodate
06/1978
06/27/1978US4097618 Sputter etching of wet layer, electron beam, ion bombardment
06/27/1978US4097283 Water-soluble composition admixture of copolymer having ethylenic unsaturation in side chain and anthraquinone photosensitizer
06/27/1978US4097279 Bonding, heat sealing
06/27/1978US4097142 Optical pattern tracer
06/27/1978US4097125 Image forming optical system
06/27/1978US4096626 Method of making multi-layer photosensitive glass ceramic charge plate
06/20/1978US4096308 Screen printing meshes
06/20/1978US4096290 Resist mask formation process with haloalkyl methacrylate copolymers
06/20/1978US4096242 Ultraviolet and heat resistance
06/20/1978US4095891 On-the-fly photoresist exposure apparatus
06/13/1978US4094679 Process for reducing halftone dot images
06/13/1978US4094677 Chemical fabrication of overhanging ledges and reflection gratings for surface wave devices
06/13/1978US4094282 Ignition timing control apparatus for engine during warm-up
06/06/1978US4093990 Method for the production of mask patterns for integrated semiconductor circuits
06/06/1978US4093754 Method of making decorative panels
06/06/1978US4093577 Esterifying with an unsaturated fatty acid a resin produced from a dialkylaminobenzoic acid or a carboxy-containing benzophenone with a polybasic acid and a polyhydric alcohol
06/06/1978US4093465 Oleophilic, film-forming, for printing
06/06/1978US4093464 Novolaks, polyalkyl acrylate or methacrylate o-naphthoquinone diazide sulfonic acid derivative, printing
06/06/1978US4093461 Positive working thermally stable photoresist composition, article and method of using
06/06/1978US4093378 Alignment apparatus
05/1978
05/30/1978US4092651 Device and method for exposing phosphor dots in a color television picture tube
05/30/1978US4092442 Integrated circuits
05/30/1978US4092173 Films, paper, microfiche, irradiation polymerization of unsaturated compound containing carbamate groups
05/30/1978US4092172 Photocurable composition comprising a copolymer of a maleic acid monoester with an α-olefine
05/30/1978US4092170 Diazonium resin salt, film forming resin, surfactant
05/30/1978US4092166 Heat treatment
05/23/1978US4091194 Unsaturated glycidyl ethers and esters, latent polymerization catalyst
05/23/1978US4091141 Photocurable elastomeric polyester composition, fibrous articles impregnated therewith and method of making same
05/23/1978US4090936 Photohardenable compositions
05/23/1978US4090880 Lithographic printing plate and method of making same
05/16/1978US4089815 Photopolymerization initiators
05/16/1978US4089762 Photopolymerizable compositions
05/16/1978US4089687 Actinic radiation crosslinkable polymer, hexavalent chromium
05/09/1978US4088896 Actinic radiation emissive pattern defining masks for fine line lithography and lithography utilizing such masks
05/09/1978US4088554 Initiators for photopolymerization
05/09/1978US4088498 Photopolymerizable copying composition
05/09/1978US4088490 Single level masking process with two positive photoresist layers
05/09/1978US4088489 Heat resistant polymers, photosensitive prepolymer, exposure, annealing
05/02/1978US4087729 Position finely adjusting apparatus
05/02/1978US4087601 Manufacture of ethylene/n-butyl acrylate copolymers
05/02/1978US4087569 Prebaking treatment for resist mask composition and mask making process using same
05/02/1978US4087370 Treatment with carboxylic acids, an alcohol and their halogenated derivatives
05/02/1978US4087281 Method of producing optical image on chromium or aluminum film with high-energy light beam
05/02/1978US4087280 Method for enhancing the image contrast in color television picture tubes
05/02/1978US4087279 Method for toning tacky surfaces
05/02/1978US4087182 Process and apparatus for producing a photopolymer plate having relief images thereon
05/02/1978US4086870 Novel resist spinning head
04/1978
04/25/1978US4086210 Coatings for photoresists or lithographic printing plates
04/25/1978US4086093 Dry planographic printing plate
04/25/1978US4086092 Process for making photosensitive lithographic printing plates involving sequentially coating with potassium zirconium fluoride and sodium silicate
04/25/1978US4086090 Photoresist layer, masking, phosphor screen for color picture tube
04/25/1978US4086089 Glass of oxides of sodium and silicon and silver halides
04/18/1978US4085019 Unsaturated amides
04/18/1978US4084970 Organic volume phase holographic recording media using sucrose benzoate
04/18/1978US4084967 Photographic elements containing vesicles of rhodopsin and lipids
04/18/1978US4084903 High-precision mask photorepeater
04/18/1978US4084506 Metal mask for use in screen printing
04/11/1978US4083725 Cinnamic acid photosensitive resin and a halogen substituted benzanthrone sensitizer
04/11/1978US4083724 Method of making light sensitive polymerizable compositions
04/11/1978US4083634 Pattern exposure apparatus using polychromatic light source
04/11/1978US4083301 Stencil exposure seal combination
04/04/1978US4082556 Light-sensitive polymeric compounds
04/04/1978US4082455 Automatic copying from single negative for offset printing process
04/04/1978US4082453 Fabrication of rectangular relief profiles in photoresist
03/1978
03/28/1978USRE29596 Branched chain dodecyl isomeric mixtures of 2-(5-dodecyl-2-hydroxy phenyl) benzotriazole as stabilizers for heat and light sensitive materials
03/28/1978US4081815 Apparatus for guiding sheet material into counterrotating brushes
03/28/1978US4081577 Automatic
03/28/1978US4081282 Dry transfer image systems with non-light sensitive frangible layer
03/28/1978US4081277 Method for making a solid-state color imaging device having an integral color filter and the device
03/28/1978US4081276 Treating substrate with photoinitiator, exposure, to form catalyst, contacting with cationically polymerizable organic material
03/21/1978US4080382 Haloalkyl benzophenone compounds suitable for use as initiators for photopolymerization
03/21/1978US4080275 Photopolymerizable benzoyl benzoate compositions
03/21/1978US4080267 Method for forming thick self-supporting masks
03/14/1978US4079183 Polymerizable esters
03/14/1978US4079159 Metal, photopolymerized resin
03/14/1978US4079041 Containing photosensitive maleimido groups, photocurable
03/14/1978US4078488 Method of preparing a printing screen by molding
03/07/1978US4078102 With base activated aldehyde or ketone
03/07/1978US4078098 Acrylate polymer relief image with added water as development promoter
03/07/1978US4077806 Light sensitive composition and products thereof
03/07/1978US4077717 Apparatus for making a color selection mask for a color cathode ray tube
03/07/1978US4077324 Method of fountainless lithography
02/1978
02/28/1978US4076536 Dry photopolymer imaging article having a diazonium salt and epoxide copolymer
02/28/1978US4076535 A dry emulsion film, liquid emulsion on a screen fabric
02/28/1978US4076531 Incorporating cyclohexylamine in the silver halide emulsion layer
02/21/1978US4075175 Preparation of photosensitive polyaldehydes
02/21/1978US4075051 Method of trimming photoresist film
02/21/1978US4075015 Vinyl pyrrolidone polymer, aryl sulfonamide-formaldehyde resin, azo sensitizer
02/14/1978US4074031 Process for preparing electron beam resists
02/14/1978US4074009 Driographic master