Patents for C23F 1 - Etching metallic material by chemical means (16,062)
10/2014
10/07/2014US8851133 Method and apparatus of holding a device
10/02/2014WO2014159888A1 Methods of etching films comprising transition metals
10/02/2014WO2014156414A1 Copper etching solution
10/02/2014US20140295626 Etchant composition, and method of manufacturing a display substrate using the same
10/02/2014US20140291288 Method for etching film having transition metal
09/2014
09/30/2014US8846539 Apparatus including showerhead electrode and heater for plasma processing
09/30/2014US8846163 Method for removing oxides
09/30/2014US8845910 Aluminum alloy composite and method for joining thereof
09/30/2014US8845857 Substrate processing apparatus
09/30/2014US8845854 Laser, plasma etch, and backside grind process for wafer dicing
09/30/2014US8845853 Substrate processing apparatus and substrate processing method
09/30/2014US8845852 Polishing pad and method of producing semiconductor device
09/30/2014US8845848 Magnesium alloy member
09/30/2014US8845810 Substrate damage prevention system and method
09/30/2014US8845806 Shower plate having different aperture dimensions and/or distributions
09/25/2014WO2014152435A1 High aspect ratio dense pattern-programmable nanostructures utilizing metal assisted chemical etching
09/25/2014WO2014151895A2 Method and apparatus for generating highly repetitive pulsed plasmas
09/25/2014US20140284306 Method for manufacturing porous structure and method for forming pattern
09/25/2014DE102013204830A1 Verfahren und Vorrichtung zur Behandlung einer Halbleiterscheibe mit einem Ätzmedium Method and apparatus for treating a semiconductor wafer with an etching medium
09/24/2014EP2782176A1 Titanium material for solid polymer fuel cell separators, method for producing same, and solid polymer fuel cell using same
09/23/2014US8840726 Apparatus for thin-film deposition
09/23/2014US8840725 Chamber with uniform flow and plasma distribution
09/23/2014CA2618915C Methods and compositions for acid treatment of a metal surface
09/18/2014US20140263185 Etching Solutions
09/18/2014US20140263183 Support fixture for acid etching pcd cutting inserts
09/18/2014US20140263181 Method and apparatus for generating highly repetitive pulsed plasmas
09/18/2014US20140262805 Aqueous composition for etching of copper and copper alloys
09/18/2014US20140262026 Process kit for deposition and etching
09/16/2014US8834730 Nanoporous membrane and manufacturing method thereof
09/16/2014US8834674 Plasma etching apparatus
09/16/2014US8834673 Process chamber having gate slit opening and closing apparatus
09/16/2014US8833299 Divided annular rib type plasma processing apparatus
09/12/2014WO2014134708A1 Method of recovering nickel or cobalt while mitigating corrosion
09/11/2014US20140251945 Method of etching metal layer
09/11/2014DE102013203995A1 Verfahren und Vorrichtung zum Schützen eines Substrats während einer Bearbeitung mit einem Teilchenstrahl Method and apparatus for protecting a substrate during a particle beam processing with a
09/09/2014US8828876 Dual mandrel sidewall image transfer processes
09/09/2014US8828258 Stainless steel separator for fuel cell and the manufacturing method thereof
09/09/2014US8828257 Plasma processing apparatus and operation method thereof
09/09/2014US8828256 Method for fabricating carbon nanotube film
09/09/2014US8828255 Method for etching a material in the presence of a gas
09/09/2014US8828244 Method for building a substrate holder
09/09/2014US8828213 Stainless substrate having a gold-plating layer, and process of forming a partial gold-plating pattern on a stainless substrate
09/09/2014US8828185 Dry non-plasma treatment system and method of using
09/09/2014US8828182 Process chamber gas flow improvements
09/09/2014US8828141 Substrate processing apparatus and method for manufacturing semiconductor device
09/09/2014US8826857 Plasma processing assemblies including hinge assemblies
09/09/2014US8826855 C-shaped confinement ring for a plasma processing chamber
09/04/2014WO2014133792A1 A system and method for performing a wet etching process
09/04/2014DE10162576B4 Ätzmittel und Verfahren zum Bilden eines Matrixsubstrats für Flüssigkristallanzeigevorrichtungen Etchant and method for forming a matrix substrate for liquid crystal display devices
09/02/2014US8822345 Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
09/02/2014US8821750 Metal polishing slurry and polishing method
09/02/2014US8821740 Nanowire manufacturing method
09/02/2014US8821684 Substrate plasma processing apparatus and plasma processing method
09/02/2014US8821682 Electron induced chemical etching and deposition for local circuit repair
09/02/2014US8821681 Apparatus and method for wet treatment of disc-like articles
09/02/2014US8821642 Apparatus for manufacturing flat-panel display
09/02/2014US8821099 Load port module
08/2014
08/28/2014US20140238953 Etching agent for copper or copper alloy
08/26/2014US8815746 Apparatus and method for producing microcomponents and use of
08/26/2014US8815112 Liquid processing method, recording medium having recorded program for executing liquid processing method therein and liquid processing apparatus
08/26/2014US8815060 Method for minimizing magnetically dead interfacial layer during COC process
08/26/2014US8815047 Plasma chemical reactor
08/26/2014US8815014 Method and system for performing different deposition processes within a single chamber
08/20/2014EP2766509A1 Resistor
08/19/2014US8808972 Optical films and methods of making the same
08/19/2014US8808564 Method and apparatus for selective nitridation process
08/19/2014US8808496 Plasma tuning rods in microwave processing systems
08/19/2014US8808454 Gas injection unit for chemical vapor desposition apparatus
08/19/2014US8808453 System for abating the simultaneous flow of silane and arsine
08/19/2014US8807978 Template manufacturing method, template inspecting method and inspecting apparatus, nanoimprint apparatus, nanoimprint system, and device manufacturing method
08/19/2014US8807914 Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber
08/19/2014US8807075 Shutter disk having a tuned coefficient of thermal expansion
08/19/2014CA2780092C Methods and apparatus for manufacturing an intravascular stent
08/14/2014US20140224767 Automated algorithm for tuning of feedforward control parameters in plasma processing system
08/13/2014EP2764138A1 Etching device for the electrolytic etching of copper
08/13/2014EP2763808A1 Method of processing a composite body
08/13/2014CN103985806A 一种led芯片p面电极、制备p面电极用刻蚀液及p面电极制备方法 One kind of led chip p-plane electrodes were prepared by etching liquid p-plane electrodes and electrode surface preparation method p
08/13/2014CN103985805A 一种led芯片p面厚铝电极、制备厚铝电极用刻蚀液及厚铝电极制备方法 One kind of led chip p thick aluminum electrode surface, thick aluminum electrode was prepared by etching liquid and thick aluminum electrode preparation method
08/13/2014CN103981523A 一种超亲水性Ti6Ai7Ni表面喷砂酸蚀处理方法 A super-hydrophilic surface blasting etching treatment Ti6Ai7Ni
08/13/2014CN103981522A 一种陶瓷插芯钢线蚀刻机 A ceramic ferrule wire etcher
08/13/2014CN103981486A 金属遮罩制造方法以及金属遮罩 Metal mask manufacturing method, and a metal mask
08/13/2014CN102282645B 衬底处理系统中的静电吸盘 A substrate processing system with an electrostatic chuck
08/13/2014CN101812724B 硅成膜装置及其使用方法 A silicon film forming apparatus and method of use
08/12/2014US8802569 Method of fabricating a semiconductor device
08/12/2014US8801952 Conformal oxide dry etch
08/12/2014US8801950 Reduction of a process volume of a processing chamber using a nested dynamic inert volume
08/12/2014US8801949 Method of forming open-network polishing pads
08/12/2014US8801948 TFT mask reduction
08/12/2014US8801896 Method and apparatus for stable plasma processing
08/12/2014US8801895 Semiconductor manufacturing equipment and manufacturing method of the same
08/12/2014US8801894 Sub-10 NM line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers
08/12/2014US8801893 Method of cooling a wafer support at a uniform temperature in a capacitively coupled plasma reactor
08/12/2014US8800484 Plasma processing apparatus
08/12/2014US8800483 Methods and systems for plasma deposition and treatment
08/07/2014US20140220303 Door skin, a method of etching a plate for forming a wood grain pattern in the door skin, and an etched plate formed therefrom
08/07/2014US20140217065 Multi-step method and apparatus for etching compounds containing a metal
08/07/2014US20140217063 Metal structural body-containing polymer film, method for manufacturing metal structural body-containing polymer film, and method for manufacturing patterned structural body
08/07/2014US20140217062 Porous Metal Etching
08/06/2014EP2761059A1 Methods of continuously wet etching a patterned substrate
08/06/2014CN203754810U 一种新型的蚀刻机 A new etching machine
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