Patents
Sitemap › C23 - Coating metallic material; Coating material with metallic material; Chemical surface treatment; Diffusion treatment of metallic material; Coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general; Inhibiting corrosion of metallic material or incrustation in general › C23F - Non-mechanical removal of metallic material from surfaces; Inhibiting corrosion of metallic material; Inhibiting incrustation in general; Multi-step processes for surface treatment of metallic material involving at least one process provided for in class and at least one process covered by subclass  or or class › C23F 1 - Etching metallic material by chemical means
Patents for C23F 1 - Etching metallic material by chemical means (16,062)
12/2014
12/09/2014US8904957 Plasma processor and plasma processing method
12/04/2014US20140353278 Copper foil for producing graphene and method of producing graphene using the same
12/02/2014US8901004 Plasma etch method to reduce micro-loading
12/02/2014US8900478 Etchant and method for manufacturing semiconductor device using same
12/02/2014US8900404 Plasma processing systems with mechanisms for controlling temperatures of components
12/02/2014US8900403 Semiconductor processing system having multiple decoupled plasma sources
12/02/2014US8900402 Semiconductor processing system having multiple decoupled plasma sources
12/02/2014US8900399 Integrated method and system for manufacturing monolithic panels of crystalline solar cells
12/02/2014US8900364 High productivity vapor processing system
12/02/2014US8900363 Inline vacuum processing apparatus, method of controlling the same, and information recording medium manufacturing method
11/2014
11/27/2014US20140349488 Etching Gas
11/25/2014US8894876 Etchant for electrode and method of fabricating thin film transistor array panel using the same
11/25/2014US8894872 Etching compositions, methods and printing components
11/25/2014US8894870 Multi-step method and apparatus for etching compounds containing a metal
11/25/2014US8894869 Lithography process using directed self assembly
11/25/2014US8894806 Plasma processing apparatus and plasma processing method
11/25/2014US8894804 Plasma unconfinement sensor and methods thereof
11/25/2014US8894767 Flow control features of CVD chambers
11/18/2014US8889226 Method of bonding a metal to a substrate
11/18/2014US8889032 Metal wire etchant and method of forming metal wire using the same
11/18/2014US8889025 Etching composition
11/18/2014US8889024 Plasma etching method
11/18/2014US8889023 Plasma processing apparatus and plasma processing method
11/18/2014US8889021 Process condition sensing device and method for plasma chamber
11/18/2014US8888952 Apparatus for wet treatment of plate-like articles
11/18/2014US8888951 Plasma processing apparatus and electrode for same
11/18/2014US8888950 Apparatus for plasma processing and method for plasma processing
11/18/2014US8888948 Apparatus and method for controlling relative particle concentrations in a plasma
11/18/2014US8888947 Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements
11/18/2014US8888917 Restricted radiated heating assembly for high temperature processing
11/18/2014US8887569 Inertial sensor and method of manufacturing the same
11/13/2014US20140335411 Etched silicon structures, method of forming etched silicon structures and uses thereof
11/13/2014US20140335301 Method of Bonding Two Substrates and Device Manufactured Thereby
11/13/2014US20140332713 Etching method and etching liquid used therein
11/11/2014US8883029 Method of making a gas distribution member for a plasma processing chamber
11/11/2014US8883027 Methods for removing a metal oxide from a substrate
11/11/2014US8883022 Mask blank and method of manufacturing an imprinting mold
11/11/2014US8883021 MEMS nanostructures and methods of forming the same
11/11/2014US8883014 Monolithically formed EWOD device and method of making the same
11/11/2014US8882962 Plasma processing apparatus
11/11/2014US8882961 Substrate treatment apparatus
11/11/2014US8882960 Substrate treating apparatus and substrate treating method
11/11/2014US8882923 Substrate processing apparatus and method of manufacturing semiconductor device
11/11/2014US8882921 Thin film deposition apparatus
11/06/2014US20140326696 Microetching solution for copper, replenishment solution therefor and method for production of wiring board
11/04/2014US8877084 Method for refreshing an acid bath solution
11/04/2014US8877081 Etching method and etching apparatus
11/04/2014US8877078 Method for recycling of silica waste and method for preparing nanoporous or spherical materials
11/04/2014US8877072 Three-dimensional fractal graduated-branching hierarchical structures and fabrication method thereof
11/04/2014US8877005 Plasma processing apparatus and electrode used therein
11/04/2014US8877004 Plasma processing apparatus and plasma processing method
11/04/2014US8877003 Method for the plasma cleaning of the surface of a material coated with an organic substance and the installation for carrying out said method
11/04/2014US8877002 Internal member of a plasma processing vessel
11/04/2014US8877000 Shower head gas injection apparatus with secondary high pressure pulsed gas injection
11/04/2014US8876978 Method for regenerating gas turbine blade and gas turbine blade regenerating apparatus
11/04/2014US8875657 Balancing RF bridge assembly
10/2014
10/28/2014US8871653 Etching agent, etching method and liquid for preparing etching agent
10/28/2014US8871108 Process for removing carbon material from substrates
10/28/2014US8871107 Subtractive plasma etching of a blanket layer of metal or metal alloy
10/28/2014US8871064 Electromagnet array in a sputter reactor
10/28/2014US8869742 Plasma processing chamber with dual axial gas injection and exhaust
10/28/2014US8869741 Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
10/23/2014US20140312374 Method for Forming Projections and Depressions, Sealing Structure, and Light-Emitting Device
10/23/2014US20140312266 Polishing slurry and method of polishing using the same
10/21/2014US8865597 Ta—TaN selective removal process for integrated device fabrication
10/21/2014US8865012 Methods for processing a substrate using a selectively grounded and movable process kit ring
10/21/2014US8864959 Method for manufacturing workpieces with ion-etched surface
10/21/2014US8864937 Substrate treatment apparatus
10/21/2014US8864936 Apparatus and method for processing substrate
10/21/2014US8864935 Plasma generator apparatus
10/21/2014US8864934 Plasma processing apparatus, plasma processing method, and storage medium
10/21/2014US8864933 Substrate treatment apparatus and substrate treatment method
10/21/2014US8864932 Plasma processing apparatus, electrode temperature adjustment device and electrode temperature adjustment method
10/21/2014US8864931 Mask trimming
10/16/2014US20140305903 Method for manufacturing a bonded body of galvanized steel sheet and adherend
10/14/2014US8859479 Chemical stripping composition and method
10/14/2014US8859432 Bare aluminum baffles for resist stripping chambers
10/14/2014US8858818 Method for minimizing defects in a semiconductor substrate due to ion implantation
10/14/2014US8858816 Enhanced etch and deposition profile control using plasma sheath engineering
10/14/2014US8858815 Scanned source oriented nanofiber formation
10/14/2014US8858814 Photomask blank, processing method, and etching method
10/14/2014US8858754 Plasma processing apparatus
10/14/2014US8858753 Focus ring heating method, plasma etching apparatus, and plasma etching method
10/14/2014US8858716 Vacuum processing apparatus
10/14/2014US8858715 Device for layered deposition of various materials on a semiconductor substrate, as well as a lift pin for use in such a device
10/14/2014US8858712 Electrode for use in plasma processing apparatus and plasma processing apparatus
10/14/2014US8857371 Apparatus for generating dielectric barrier discharge gas
10/09/2014US20140299571 Plasma processing method and plasma processing apparatus
10/09/2014DE102013204830B4 Verfahren und Vorrichtung zur Behandlung einer Halbleiterscheibe mit einem Ätzmedium Method and apparatus for treating a semiconductor wafer with an etching medium
10/07/2014US8852967 Dissolution rate monitor
10/07/2014US8852685 Coating method for gas delivery system
10/07/2014US8852448 Method for fabricating 3D structure having hydrophobic surface by dipping method
10/07/2014US8852390 Substrate processing apparatus
10/07/2014US8852389 Plasma processing apparatus and plasma processing method
10/07/2014US8852387 Plasma processing apparatus and shower head
10/07/2014US8852385 Plasma etching apparatus and method
10/07/2014US8852349 Wafer processing hardware for epitaxial deposition with reduced auto-doping and backside defects
10/07/2014US8852348 Heat exchange pedestal with coating of diamond-like material
10/07/2014US8852347 Apparatus for chemical vapor deposition control
10/07/2014US8852346 Mask frame assembly for thin layer deposition and organic light emitting display device
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