Patents for C09K 13 - Etching, surface-brightening or pickling compositions (3,392) |
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06/28/2000 | EP1014433A1 Dry etching gas |
06/14/2000 | EP1009203A2 Methods for manufacture of electronic devices |
06/02/2000 | WO2000031786A1 Etching solution, etched article and method for etched article |
06/02/2000 | WO2000031785A1 Etching solution, etched article and method for etched article |
05/31/2000 | EP1003615A1 Method for passivation of a metallization layer |
05/30/2000 | US6068787 Chemical mechanical polishing; mixture of catalyst and stabilizer |
05/25/2000 | WO2000029646A1 Process for metallizing a plastic surface |
05/25/2000 | CA2350422A1 Process for metallizing a plastic surface |
05/18/2000 | WO2000028586A2 Copper chemical-mechanical polishing process using a fixed abrasive polishing pad and a copper layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
05/18/2000 | WO2000028585A1 Tungsten chemical-mechanical polishing process using a fixed abrasive polishing pad and a tungsten layer chemical-mechanical polishing solution specifically adapted for chemical-mechanical polishing with a fixed abrasive pad |
05/16/2000 | US6064081 Silicon-germanium-carbon compositions and processes thereof |
05/10/2000 | CN1252398A Clearing bismuth-base metal oxide |
05/04/2000 | WO2000024842A1 A chemical mechanical polishing slurry system having an activator solution |
04/18/2000 | US6051419 Genes which influence pichia proteolytic activity, and uses therefor |
04/04/2000 | US6044851 Removal residues |
03/30/2000 | WO2000017281A1 Polishing liquid for polishing components, preferably wafers, especially for chemically-mechanically polishing components of this type |
03/30/2000 | DE19842709A1 Polierflüssigkeit zum Polieren von Bauelementen, vorzugsweise Wafern, insbesondere zum Chemisch-Mechanischen Polieren derartiger Bauelemente Polishing liquid for polishing devices, preferably wafers, in particular for mechanical chemical polishing of such devices |
03/29/2000 | EP0989597A1 A composition and method for selectively etching a silicon nitride film |
03/23/2000 | DE19926599A1 Aqueous alkaline solution, especially for anisotropic etching of semiconductor materials e.g. silicon, contains a group five element or compound addition to achieve low surface roughness |
03/21/2000 | US6039891 Polishing composition of urea, alumina, ammonium persulfate and succinic acid |
03/15/2000 | CN1247486A Method for passivation of metallization layer |
03/14/2000 | US6037265 Etching the conductive layer in a high density plasma comprising a halogen gas and carbon monoxide to produce a supports |
03/02/2000 | WO2000011107A1 Ito etching composition |
02/22/2000 | US6027997 An electroconductive layer, e.g. tungsten, deposited in a plug opening is chemomechanical polished using slurry comprising abrasive and copper sulfate or copper perchlorate to form plug |
02/08/2000 | US6022837 Method for rinsing a polished memory hard disk |
01/26/2000 | CN1242729A Composition and slurry useful for metal CMP |
01/19/2000 | CN1241457A Method for cleaning PZT thin film |
01/13/2000 | WO2000002238A1 Post etch cleaning composition and process for dual damascene system |
01/05/2000 | EP0968979A1 Etching of Bi-based metal oxides ceramics |
12/30/1999 | DE19928570A1 Semiconductor device, especially a multilayer circuit structure, production process |
12/15/1999 | CN1238812A Multi-oxidizer slurry for chemical mechanical polishing |
12/08/1999 | EP0962964A1 Detergent for processes for producing semiconductor devices or producing liquid crystal devices |
12/08/1999 | EP0698072B1 Process for metal cleaning |
11/30/1999 | US5993686 Fluoride additive containing chemical mechanical polishing slurry and method for use of same |
11/24/1999 | CN1236482A Detergent for process for producing semiconductor device or producing liquid crystal device |
11/23/1999 | US5990060 Cleaning liquid and cleaning method |
11/23/1999 | US5989449 Composition and method for stripping tin and tin-lead from copper surfaces |
11/18/1999 | DE19860780A1 Semiconductor device used in the manufacture of integrated circuits |
11/03/1999 | EP0799495A4 Silicon-germanium-carbon compositions and processes thereof |
11/02/1999 | US5976988 Etching material and etching method |
11/02/1999 | US5976396 Method for etching |
10/26/1999 | US5972124 Method for cleaning a surface of a dielectric material |
10/12/1999 | US5965779 Fluorooxetane compound and process for its preparation |
10/05/1999 | US5961877 3.5-15.8 mole percent of hf; 0.2-9.7 mole percent of hno3; 34.8-82.6 mole percent of acetic acid; 12.3-46.5 mole percent of h2o; and wherein the molecular ratio of hno.sub.3 to hf is less than about 0.78. |
09/16/1999 | WO1999046353A1 Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
09/16/1999 | CA2309583A1 Methods and apparatus for cleaning semiconductor substrates after polishing of copper film |
09/01/1999 | CN1227279A Etching composition and use thereof |
08/31/1999 | US5944909 Heating an aqueous solution of nitric or hydrochloric acid and wetting agent |
08/24/1999 | CA2059488C Method for cleaning or extracting hydrocarbon based substances |
08/18/1999 | CN1225938A Gas for removing deposit and removal method using same |
08/17/1999 | US5939336 Aqueous solutions of ammonium fluoride in propylene glycol and their use in the removal of etch residues from silicon substrates |
08/17/1999 | CA2110297C Methods of fabricating dual anode, flat panel electrophoretic displays |
08/12/1999 | WO1999040235A1 Method for etching |
08/03/1999 | US5932024 Decoating titanium and other metallized glass surfaces |
07/27/1999 | US5928529 Composition and method for stripping tin and tin-lead from copper surfaces |
07/21/1999 | CN1044264C Baths and method for chemically polishing stainless steel surfaces |
07/13/1999 | US5922135 Method of removing residual wax from silicon wafer polishing plate |
07/01/1999 | WO1999033094A1 Selective silicon oxide etchant formulation including fluoride salt, chelating agent and glycol solvent |
06/23/1999 | EP0924282A1 Gas for removing a deposit and its use |
06/15/1999 | US5911907 Nitric acid, ferric nitrate, stabilizer consisting of a 4-amino-1,2,4-triazole, a 3-amino-5-methylisoxazole, a sulfanilamide, and a sulfamide, such which inhibits exothermic conditions, emission of toxic nox gas, and copper attack. |
06/09/1999 | CN1218986A Etching method for poly crystalline silicon |
06/08/1999 | US5909742 Metal cleaning method |
05/26/1999 | EP0918081A1 Etching composition and use |
05/25/1999 | US5906708 Vapor depositing an etching-stop dielectric layer |
05/12/1999 | EP0691676B1 Wet-etching composition for semiconductors excellent in wettability |
05/05/1999 | CN1216059A Composition for cleaning and etching electronic display and substrate |
04/28/1999 | CN1215222A Etchant and method using same to making semiconductor device |
04/27/1999 | US5897377 Semiconductor device manufacturing method with use of gas including acyl-group-containing compound |
04/06/1999 | USRE36185 Citrate buffer, hydrogen peroxide |
04/01/1999 | WO1999015287A1 Brightening systems for copper-base alloys |
03/16/1999 | US5882425 Semiconductor wafers with post etching residues removed by applying ammonium fluoride with carbon dioxide |
03/16/1999 | CA2027402C Pretreating composition containing s-triazine compound |
02/11/1999 | WO1999007010A1 Detergent for processes for producing semiconductor devices or producing liquid crystal devices |
02/10/1999 | EP0896042A1 A polishing composition including an inhibitor of tungsten etching |
02/09/1999 | US5868855 Surface processing method and surface processing device for silicon substrates |
02/04/1999 | WO1999005706A1 A polishing composition including an inhibitor of tungsten etching |
01/27/1999 | EP0892840A1 A composition for cleaning and etching electronic display and substrate |
01/20/1999 | EP0733091A4 Wheel cleaning composition containing acid fluoride salts |
01/05/1999 | US5855811 Cleaning composition containing tetraalkylammonium salt and use thereof in semiconductor fabrication |
12/30/1998 | EP0887323A1 Selective etching of silicate |
12/30/1998 | CN1203205A Selective etching of silicate |
12/23/1998 | CN1202892A Process for preparing bis-alkoxy-triazinyl-amino-containing stilbene disulphonic acids or their derivatives |
12/01/1998 | US5843322 Process for etching N, P, N+ and P+ type slugs and wafers |
12/01/1998 | US5842815 Chemical treatment of treading surfaces |
11/03/1998 | US5831053 Polypeptide |
10/20/1998 | US5824601 Hydrogen fluoride, sacrificial oxide |
10/07/1998 | EP0640120B1 Etching compositions |
09/16/1998 | EP0863884A2 Process for preparing bis-alkoxy-triazinyl-amino-containing stilbene disulphonic acids or their derivatives |
09/08/1998 | US5803956 Hydrofluoric acid and a hydrocarbon nonionic surfactant;etching, cleaning semiconductors |
09/01/1998 | US5800577 Polishing composition for chemical mechanical polishing |
08/19/1998 | EP0858984A1 Method for improving the adherence on mineral surfaces which contain silicon |
08/12/1998 | EP0857706A1 Compositions for the treatment of mineral surfaces containing silicon |
07/30/1998 | WO1998032546A1 Method for passivation of a metallization layer |
07/23/1998 | WO1998031768A1 A composition for cleaning and etching electronic display and substrate |
07/21/1998 | US5783495 Treating with hydrofluoric acid and alkylammonium hydroxide |
07/16/1998 | WO1998030667A1 Semiconductor wafer cleaning composition and method with aqueous ammonium fluoride and amine |
07/16/1998 | WO1998030652A1 Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces |
07/16/1998 | CA2248568A1 Acid deoxidizing/etching composition and process suitable for vertical aluminum surfaces |
07/15/1998 | EP0852615A1 Chemical mechanical polishing composition and process |
07/08/1998 | CN1187021A Method for removing membrance coated on bulb for use of cathode ray tube |