| Patents for C08F 232 - Copolymers of cyclic compounds containing no unsaturated aliphatic radicals in a side chain, and having one or more carbon-to-carbon double bonds in a carbocyclic ring system (1,954) |
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| 06/23/2005 | DE10354336A1 Farbiges Dekormaterial aus Cycloolefin-Oligomeren Colored decorative material of cyclic olefin oligomers |
| 06/23/2005 | DE10354334A1 Dekormaterial aus Cycloolefin-Oligomeren Decorative material of cyclic olefin oligomers |
| 06/22/2005 | EP1155057B1 In mold addition polymerization of norbornene-type monomers using group 10 metal complexes |
| 06/22/2005 | CN1630671A High softening point copolymer, production process for the same and hydrogenated product thereof |
| 06/22/2005 | CN1630668A Hydrogenated copolymer, production process for the same, and hot melt adhesive composition containing the same |
| 06/22/2005 | CN1630551A Process for producing film forming resins for photoresist compositions |
| 06/21/2005 | US6908974 Addition polymer using coordination catalyst |
| 06/16/2005 | WO2005054312A1 Process for producing cycloolefin addition polymer |
| 06/16/2005 | US20050130061 Coating of a polymer of maleic anhydride to and dimethyl 1,4-dihydro-1,4-methanoindene-5,8-dicarboxylic aciprevent diffused light reflection and notching by the semiconductor substrate and to reduce standing waves; uniformity for forming ultra-fine patterns by photolithography using 193 nm Argon fluoride |
| 06/15/2005 | EP1539690A2 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 06/08/2005 | EP1538169A1 Cycloolefin addition copolymer and optical transparent material |
| 06/07/2005 | US6902859 Chemically amplified resist composition and method for forming patterned film using same |
| 06/07/2005 | US6902772 Silicon-containing polymer, resist composition and patterning process |
| 06/02/2005 | WO2005049677A1 Decorating material made of cycloolefin oligomers |
| 06/02/2005 | WO2005049657A2 Colored decorative material comprised of cyclo-olefin oligomers |
| 06/02/2005 | WO2005031462B1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 06/01/2005 | EP1535934A1 Hydrogenated copolymer, process for producing the same, and hot-melt adhesive composition containing the same |
| 05/31/2005 | US6899995 Protecting groups in polymers, photoresists and processes for microlithography |
| 05/26/2005 | US20050112495 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 05/25/2005 | CN1618827A C9 maleic anhydride copolymer and its preparation method |
| 05/24/2005 | US6897272 Diimine palladium or nickel complex having bulky substituents on the imine nitrogen having steric bulk sufficient to form a polymer with alpha-olefin, ethylene, or cyclopentene repeat units. |
| 05/24/2005 | US6897005 Mixture containing acid generator |
| 05/19/2005 | US20050107552 radiation transparent curable non-aromatic polymers having adhesion, dimensional stability, solvent, heat and chemical resistance, used as substrate, polarization, protective, retardation or diffusion films for liquid crystal displays; luminescence |
| 05/17/2005 | US6894134 α-olefins and olefin polymers and processes therefor |
| 05/17/2005 | US6893793 Photosensitive polymer and chemically amplified photoresist composition containing the same |
| 05/11/2005 | CN1615321A Process for the oligomerization of alpha olefins having low unsaturation, the resulting polymers, and lubricants containing same |
| 05/05/2005 | US20050096437 Molding for automobile |
| 04/27/2005 | EP0968181B1 Perfluorynated sulphone salts, and their uses as ionic conduction materials |
| 04/26/2005 | US6884564 Fluorinated polymers having ester groups and photoresists for microlithography |
| 04/12/2005 | US6878501 Polymer, chemically amplified resist composition and patterning process |
| 04/07/2005 | WO2005031462A1 Low-polydispersity photoimageable polymers and photoresists and processes for microlithography |
| 04/05/2005 | US6875556 Resist compositions and patterning process |
| 04/05/2005 | US6875555 Preparation and use of EXO-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes) |
| 03/30/2005 | EP1518869A1 High-softening-point copolymer, process for producing the same, and product of hydrogenation thereof |
| 03/17/2005 | US20050058932 Preparation and use of exo-2-fluoroalkyl(bicyclo[2.2.1] hept-5-enes) |
| 03/15/2005 | US6866984 Including 2-hydroxyethyl-5-norbornene-2-carboxylate monomer; deep ultraviolet submicrolithography; etch and heat resis-tance; adhesiveness; tetramethyl ammonium hydroxide solution developing |
| 03/03/2005 | WO2005019277A1 Process for producing cycloolefin addition polymer |
| 03/02/2005 | EP1509814A2 Acetal protected polymers and photoresists compositions thereof |
| 02/24/2005 | WO2004014960A3 Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography |
| 02/23/2005 | CN1583813A Preparation of poly(2, 5-diakoxy-1, 4-benzene) |
| 02/22/2005 | US6858371 Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same |
| 02/10/2005 | WO2005012427A1 Polymerizable composition and formed article using the same |
| 02/08/2005 | CA2062201C Process for the preparation of chemically homogeneous cycloolefin copolymers |
| 02/08/2005 | CA2020640C Process for the preparation of cycloolefin polymers |
| 02/01/2005 | US6849381 Copolymers and photoresist compositions comprising same |
| 01/27/2005 | US20050020793 Fluorinated copolymers for microlithography |
| 01/26/2005 | CN1186361C Blue light-emitting superbranched conjugated polymer and preparing process thereof |
| 01/20/2005 | US20050014092 Novel compound, polymer, resist composition, and patterning process |
| 01/18/2005 | US6844403 A crosslinkable polyalkenamer copolymer which has a reactive silyl group; protective films for a liquid crystal display device, heat resistance, dimensional stability, adhesion, solvent and chemical resistance, noncracking |
| 01/18/2005 | US6844134 For semiconductors; high transmittance; improved dry etching resistance, adhesiveness, and wettability |
| 01/13/2005 | US20050008975 Chemical resistance; bonding strength; accuracte patterns; photolithography |
| 01/05/2005 | EP1492829A1 Hydrocarbon mixtures comprising modified polycyclic aromatic hydrocarbons |
| 12/28/2004 | US6835525 Polymer, resist composition and patterning process |
| 12/15/2004 | CN1555387A Polymeric compositions for forming optical waveguides; optical waveguides formed therefrom; and methods for making same |
| 12/15/2004 | CN1554680A In mold addition polymerization composition of norbornene-type monomers and its crosslinking addition polymer |
| 12/14/2004 | US6830870 Acetal protected polymers and photoresists compositions thereof |
| 12/09/2004 | DE10036692B4 Modifiziertes Olefin-Cycloolefin-Alkylstyrol-Copolymer The modified olefin-cycloolefin copolymer alkylstyrene |
| 12/07/2004 | CA2107724C Substrate composed of at least one cycloolefin copolymer for recording media and process for producing it |
| 12/02/2004 | US20040242825 A polymer having random units of the title diene and vinyl aromatic monomer; excellent properties including heat resistance, transparency, nonhygroscopicity, chemical resistance, solvent resistance, molding processability; optic films |
| 12/01/2004 | EP1481285A1 Fluorinated copolymers for microlithography |
| 11/30/2004 | US6825291 Hydrogenation of this resin produces light colored, thermally stable products that are useful as tackifiers in adhesives. |
| 11/30/2004 | CA2115196C Semi-crystalline cycloolefin copolymer film |
| 11/24/2004 | CN1176960C Viscosity increaser and preparing process thereof |
| 11/23/2004 | CA2115195C Flexible cycloolefin copolymer film |
| 11/18/2004 | US20040229157 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 11/02/2004 | US6811960 Provides photoresist monomers, photoresist polymers derived from the same, processes for producing such photoresist polymers, photoresist compositions comprising such polymers, and processes for producing a photoresist pattern using such |
| 10/28/2004 | WO2004076495A3 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 10/27/2004 | CN1173232C Chemical enlargement type positive photoetching gum compositions |
| 10/26/2004 | US6808859 Dissolved only slightly in developing solutions, superior in etch resistance, thermal resistance and adhesiveness; copolymer of a norbornene carboxylic ester, and/or vinylene carbonate or maleic anhydride |
| 10/19/2004 | US6806335 PolymEric compound and resin composition for photoresist |
| 10/19/2004 | US6806029 Pattern formation material and pattern formation method |
| 10/13/2004 | CN1537124A Polymer suitable for photoresist compositons |
| 10/06/2004 | EP1115480B1 Microparticles produced from cyclic olefin copolymers and their use for the controlled release of active agents |
| 10/06/2004 | CN1534902A Cyclo olefin copolymer optical communication element |
| 10/05/2004 | US6800418 Fluorine-containing photosensitive polymer having hydrate structure and resist composition comprising the same |
| 09/21/2004 | US6794110 Development of latent images |
| 09/16/2004 | US20040180287 Fluorinated polymers having ester groups and photoresists for microlithography |
| 09/14/2004 | US6790922 Linear, isotactic polymers, process for preparing same, and use thereof |
| 09/10/2004 | WO2004076495A2 Vinyl addition polycyclic olefin polymers prepared with non-olefinic chain transfer agents and uses thereof |
| 09/08/2004 | EP1454952A1 OLEFINIC THERMOPLASTIC ELASTOMER, PROCESS FOR PRODUCTION THEREOF, OLEFINIC THERMOPLASTIC ELASTOMER COMPOSITIONS, PROCESS FOR PRODUCING THE SAME AND MOLDINGS THEREOF |
| 09/08/2004 | EP1453870A1 PROCESS FOR THE OLIGOMERIZATION OF $g(a)OLEFINS HAVING LOW UNSATURATION, THE RESULTING POLYMERS, AND LUBRICANTS CONTAINING SAME |
| 09/01/2004 | EP0988331B1 Method for the preparation of copolymers of ethylene/norbornene-type monomers with cationic palladium catalysts |
| 08/31/2004 | US6784268 Ether, polymer, resist composition and patterning process |
| 08/25/2004 | CN1524201A Photoresist composition for deep ultraviolet lithography |
| 08/18/2004 | CN1162752C Cross linking agent for photoresist, and photoresist combination containing the same |
| 08/17/2004 | US6777162 Photosensitive polymer and photoresist composition thereof |
| 08/17/2004 | US6777157 Copolymers and photoresist compositions comprising same |
| 08/12/2004 | US20040157752 Process for the oligomerization of alpha-olefins having low unsaturation, the resulting polymers, and lubricants containing same |
| 08/12/2004 | US20040157156 Fluorinated vinyl sulfonate compound for use as monomer |
| 08/12/2004 | US20040157155 Polymers, resist compositions and patterning process |
| 08/05/2004 | WO2004065438A1 Resin composition |
| 08/03/2004 | US6770415 Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same |
| 07/29/2004 | US20040144752 Resist compositions and patterning process |
| 07/28/2004 | EP1034197B1 Ethylene polymer compositions with norbornene comonomer |
| 07/28/2004 | CN1159319C Novel monomer and its polymer used for anti-photoetching agent, and their compositions |
| 07/27/2004 | US6767966 Polymer mixture containing an amorphous polyolefin which contain cycloaliphatic olefins |
| 07/22/2004 | WO2004060992A1 Molding for automobile |
| 07/22/2004 | CA2478018A1 Molding for automobile |
| 07/21/2004 | EP1439198A1 Resin composition |
| 07/21/2004 | EP1438635A1 Fluorinated polymers having ester groups and photoresists for microlithography |